Patents by Inventor Mostafa Maazouz

Mostafa Maazouz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Focused charged particle column for operation at different beam energies at a target
    Patent number: 8742361
    Abstract: A charged particle column having improved performance at multiple beam energies. The column employs a four-element objective lens to enable improved beam focusing performance at both high and low beam energies at a target, with differing focus voltage configurations for different beam energies. By changing the voltages applied to the four electrodes of the objective lens, different focusing conditions may be rapidly configured, enabling rapid toggling between optimized imaging and optimized processing of a target.
    Type: Grant
    Filed: June 7, 2012
    Date of Patent: June 3, 2014
    Assignee: FEI Company
    Inventors: Mostafa Maazouz, Jonathan H. Orloff
  • Focused Charged Particle Column for Operation at Different Beam Energies at a Target
    Publication number: 20130327952
    Abstract: A charged particle column having improved performance at multiple beam energies. The column employs a four-element objective lens to enable improved beam focusing performance at both high and low beam energies at a target, with differing focus voltage configurations for different beam energies. By changing the voltages applied to the four electrodes of the objective lens, different focusing conditions may be rapidly configured, enabling rapid toggling between optimized imaging and optimized processing of a target.
    Type: Application
    Filed: June 7, 2012
    Publication date: December 12, 2013
    Applicant: FEI Company
    Inventors: Mostafa Maazouz, Jonathan H. Orloff
  • IMAGING AND PROCESSING FOR PLASMA ION SOURCE
    Publication number: 20130320229
    Abstract: Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
    Type: Application
    Filed: May 10, 2013
    Publication date: December 5, 2013
    Applicant: FEI Company
    Inventors: Tom Miller, Sean Kellogg, Shouyin Zhang, Mostafa Maazouz, Anthony Graupera
  • IN-CHAMBER ELECTRON DETECTOR
    Publication number: 20120199738
    Abstract: A secondary particle detector 302 for a charged particle beam system 300 includes a scintillator 304 and a transducer 312, such as a photomultiplier tube, positioned within a vacuum chamber 107. Unlike prior art Everhart-Thornley detectors, the photomultiplier is positioned within the vacuum chamber, which improves detection by eliminating optical couplings and provides flexibility in positioning the detector.
    Type: Application
    Filed: April 18, 2012
    Publication date: August 9, 2012
    Applicant: FEI COMPANY
    Inventors: ROBERT GERLACH, Mostafa Maazouz, Trevor Dingle, Mark Utlaut, James McGinn
  • In-chamber electron detector
    Patent number: 8164059
    Abstract: A secondary particle detector 302 for a charged particle beam system 300 includes a scintillator 304 and a transducer 312, such as a photomultiplier tube, positioned within a vacuum chamber 107. Unlike prior art Everhart-Thornley detectors, the photomultiplier is positioned within the vacuum chamber, which improves detection by eliminating optical couplings and provides flexibility in positioning the detector.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: April 24, 2012
    Assignee: FEI Company
    Inventors: Robert Gerlach, Mostafa Maazouz, Trevor Dingle, Mark Utlaut, James McGinn
  • IN-CHAMBER ELECTRON DETECTOR
    Publication number: 20080308742
    Abstract: A secondary particle detector 302 for a charged particle beam system 300 includes a scintillator 304 and a transducer 312, such as a photomultiplier tube, positioned within a vacuum chamber 107. Unlike prior art Everhart-Thornley detectors, the photomultiplier is positioned within the vacuum chamber, which improves detection by eliminating optical couplings and provides flexibility in positioning the detector.
    Type: Application
    Filed: June 18, 2008
    Publication date: December 18, 2008
    Applicant: FEI COMPANY
    Inventors: Robert Gerlach, Mostafa Maazouz, Trevor Dingle