Abstract: The present invention provides a stretchable film that is excellent in stretch and strength and water repellency on the film surface, and a method for forming the stretchable film. The present invention was accomplished by a stretchable film including a resin having a branched siloxane bond having 3 to 11 silicon atoms on a side chain and having a urethane bond on a main chain.

Abstract: The present invention provides a biomedical electrode composition capable of forming a living body contact layer for a biomedical electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the biomedical electrode is soaked in water or dried. The present invention was accomplished by a biomedical electrode composition including a polymer compound having both the ionic repeating unit “a” and the repeating unit “b” of (meth)acrylate, in which the ionic repeating unit “a” is a repeating unit of sodium salt, potassium salt, or ammonium salt including a partial structure represented by the following general formula (1), and the repeating unit “b” of (meth)acrylate is a repeating unit represented by the following general formula (2).

Abstract: The present invention provides: a biological electrode composition formable a living body contact layer for a biological electrode which is excellent in conductivity and biocompatibility, as well as light in the weight thereof and producible at a low cost, and in addition, which does not cause a significant decrease in the conductivity thereof regardless of under a water-wet condition and a dry condition; a polymer compound which can be suitably used for the biological electrode composition; a polymerizable monomer suitable as a raw material of the polymer compound; a biological electrode having a living body contact layer formed of the biological electrode composition; and a method for producing the same; and wherein, the polymerizable monomer is represented by the following general formula (1).

Abstract: The present invention provides a bio-electrode composition including a polymer compound having both an ionic repeating unit A and a (meth)acrylate repeating unit B, wherein the ionic repeating unit A is a repeating unit selected from the group consisting of sodium salt, potassium salt, and ammonium salt having either or both partial structures shown by the following general formulae (1-1) and (1-2), and the (meth)acrylate repeating unit B is a repeating unit shown by the following general formula (2). This can form a living body contact layer for a bio-electrode with excellent electric conductivity, biocompatibility, and light weight, which can be manufactured at low cost and does not cause large lowering of the electric conductivity even when it is wetted with water or dried.

Abstract: The present invention provides a stretchable film including: a cured product of a composition which contains (A) a poly(meth)acrylate compound having a polymerizable double bond and a siloxane bond, (B) a (meth)acrylate compound having a urethane bond, and (C) an organic solvent having a boiling point in the range of 115 to 200° C. at atmospheric pressure; wherein the component (A) is localized in the direction of the surface of the film. The stretchable film of the present invention is excellent in stretchability and strength as well as repellency on the film surface.

Abstract: The present invention provides a stretchable film including: a cured product of a composition which contains (A) a (meth)acrylate compound having silsesquioxane, (B) a (meth)acrylate compound other than the component (A) having a urethane bond, and (C) an organic solvent having a boiling point in the range of 115 to 200° C. at atmospheric pressure; wherein the component (A) is localized in the direction of a surface of the film. The stretchable film of the present invention is excellent in stretchability and strength as well as repellency on the film surface.

Abstract: An adhesive composition including a resin and electro-conductive material, wherein the electro-conductive material is an ammonium salt of fluorosulfonic acid having 5 or more carbon atoms shown by the general formula (1): (R1—X—Z—SO3?)n Mn+ (1), wherein, R1 represents a monovalent hydrocarbon group having 1 to 40 carbon atoms and optionally substituted by a heteroatom or optionally interposed by heteroatom; X represents any of a single bond, ether group, ester group, and amide group; Z represents an alkylene group having 2 to 4 carbon atoms, containing 1 to 6 fluorine atoms, and optionally containing a carbonyl group; M+ represents a cation having one or two ammonium cation structures. This can form a living body contact layer for a bio-electrode with excellent electric conductivity, biocompatibility, and light weight, which manufactures at low cost and does not cause large lowering of the electric conductivity even when it is wetted with water or dried.

Abstract: An adhesive composition including a resin and an electro-conductive material, wherein the electro-conductive material is one or more salts selected from sodium salt, potassium salt, and calcium salt having two fluorosulfonic acid structures per molecule and 5 or more carbon atoms shown by formula (1): ?O3S—Y—La-A-Lb-Y—SO3? (Mn+)2/n (1), wherein, A represents a divalent hydrocarbon group having 1-30 carbon atoms and optionally substituted by a heteroatom or optionally interposed by a heteroatom; La and Lb each represent a linking group like an ether group, ester group; Y represents an alkylene group having 2-4 carbon atoms, containing 1-6 fluorine atoms, and optionally containing a carbonyl group; Mn+ represents any of Na+, K+, Ca2+. This can form a living body contact layer for a bio-electrode with excellent electric conductivity, biocompatibility, and light weight, which can be manufactured at low cost and without large lowering of electric conductivity even when it is wetted with water or dried.

Abstract: An adhesive composition including resin and electro-conductive material, wherein the electro-conductive material is one or more salts from sodium salt, potassium salt, and calcium salt of fluorosulfonic acid having 5 or more carbon atoms shown by the general formula (1): (R1—X—Y—SO3?)nMn+(1), wherein, R1 represents a monovalent hydrocarbon group having 1-30 carbon atoms and optionally substituted by a heteroatom or optionally interposed by a heteroatom; X represents any of a single bond, ether group, ester group, and amide group; Y represents a linear or branched alkylene group having 2-4 carbon atoms, containing 1-6 fluorine atoms, and optionally containing a carbonyl group; Mn+ represents any of a sodium ion, potassium ion, and calcium ion. This can form a living body contact layer for a bio-electrode with electric conductivity, biocompatibility, and light weight, which can be manufactured at low cost and without electric conductivity large lowering even when wetted with water or dried.

Abstract: The present invention provides a stretchable film including: a cured product of a composition which contains (A) a (meth)acrylate compound having a siloxane bond, (B) a (meth)acrylate compound other than the component (A) having a urethane bond, and (C) an organic solvent having a boiling point in the range of 115 to 200° C. at atmospheric pressure; wherein the component (A) is localized in the direction of a surface of the film. The stretchable film of the present invention is excellent in stretchability and strength as well as repellency on the film surface.

Abstract: The present invention provides a bio-electrode including an electro-conductive base material and a living body contact layer formed on the electro-conductive base material; wherein the living body contact layer contains a resin layer and particles dispersed in the resin layer, the particles being coated with gold, platinum, silver, or alloy of these metals; a thickness of the resin layer is equal to or thinner than an average particle size of the particles; the resin layer contains a silicon-containing resin and a non-silicon-containing resin; and the silicon-containing resin is localized in the direction of a surface of the resin layer. The bio-electrode of the present invention is superior in electric conductivity and biocompatibility, light in weight, can be manufactured at low cost, and can combine repellency of the resin layer surface and adhesion properties of the resin layer to particles.

Abstract: The present invention provides a biological electrode including an electro-conductive base material and a living body contact layer formed on the electro-conductive base material; wherein the living body contact layer includes a resin layer and particles dispersed in the resin layer, the particles being coated with gold, silver, or platinum, and a thickness of the resin layer is equal to or thinner than an average particle size of the particles. The biological electrode of the present invention is superior in electric conductivity and biocompatibility, light in weight, and can be manufactured at low cost.

Abstract: The present invention provides a method for producing a composition for forming a coating film for a lithography used in manufacture of a semiconductor device by using a producing apparatus provided with a metal adsorbent and a filter, comprising the steps of: (1) introducing a solvent used in the composition into the producing apparatus, (2) circulating the solvent in the producing apparatus to adsorb a metal impurity by the metal adsorbent, (3) adding a raw material of the composition into the circulated solvent and homogenizing them to prepare the composition, and (4) circulating the prepared composition in the producing apparatus to remove a microscopic foreign matter by the filter. This method enables to produce a composition for forming a coating film for a lithography with its metal impurities, which cause an etching defect, extremely reduced.

Abstract: The present invention provides a method for producing a composition for forming an organic film, the composition being used in a process of manufacturing a semiconductor apparatus, the method including the steps of (1) washing a compound having an aromatic skeleton by an acid, (2) preparing a composition solution containing the washed compound, (3) filtering the prepared composition solution through a filter, and (4) putting the filtered composition solution into a container made of an organic resin. There can be provided a method for producing a composition for forming an organic film that can form an organic film in which defects after dry etching are reduced.

Abstract: The present invention provides a method for producing a resist composition used in a process for producing a semiconductor apparatus, the method including the steps of: cleaning an apparatus for producing the resist composition with a cleaning liquid; applying the cleaning liquid on an evaluation substrate by spin-coating after removing the cleaning liquid from the apparatus for producing the resist composition; repeating the step of cleaning and the step of applying until the change in the density of defects having a size of 100 nm or more on the evaluation substrate between before and after the application of the cleaning liquid becomes 0.2/cm2 or less; and producing the resist composition by using the apparatus for producing the resist composition after the step of repeating. There can be provided a method for producing a resist composition capable of producing a resist composition whose coating defects are reduced.

Abstract: Provided by the present invention is a method for producing a resist composition, especially a silicon-containing resist underlayer film composition, with fewer film defects, the composition used in immersion exposure, double patterning, development by an organic solvent, and so forth. Specifically, provided is a method for producing a resist composition to be used for manufacturing a semiconductor device, wherein the resist composition is filtered using a filter which filters through 5 mg or less of an eluate per unit surface area (m2) in an extraction using an organic solvent.

Abstract: This is to provide a process for manufacturing a resist composition which can prepare a resist composition lowered in coating defects, and the manufacturing process is a process for manufacturing a resist composition to be used in a process for manufacturing a semiconductor apparatus, the process comprising the steps of: cleaning a manufacturing apparatus for a resist composition with a cleaning solution; analyzing the cleaning solution taken out from the manufacturing apparatus; repeating the step of cleaning and the step of analyzing until a concentration of metal components contained in the cleaning solution becomes 5 ppb or less; and manufacturing the resist composition by using the manufacturing apparatus after the step of repeating.

Abstract: The invention provides a method for forming a silicon-containing resist underlayer film, the method for coating and forming a silicon-containing resist underlayer film by spin coating method comprising: feeding an aqueous alkaline solution in a pipe of an apparatus for coating and forming a film by spin coating method to clean therein; supplying a silicon-containing resist underlayer film composition via the pipe; and coating the silicon-containing resist underlayer film on a substrate to form a film. There can be provided a method for forming a silicon-containing resist underlayer film capable of reducing coating defects after forming a film by cleaning and removing a precipitate derived from silicon-containing resist underlayer film composition that precipitates and adheres in a pipe of an apparatus for coating and forming a film.

Abstract: The present invention provides a method for manufacturing a resist composition which is used in a manufacturing process of a semiconductor apparatus, comprising the steps of: cleaning a manufacturing apparatus for the resist composition with a cleaning solution; analyzing the cleaning solution taken out from the manufacturing apparatus; repeating the step of cleaning and the step of analyzing until a concentration of a nonvolatile component(s) contained in the cleaning solution became 10 ppm or less; and manufacturing the resist composition by using the manufacturing apparatus after the step of repeating. There can be provided a method for manufacturing a resist composition which can manufacture a resist composition lowered in coating defects.

Abstract: The present invention provides a method for producing a resist composition used in a process for producing a semiconductor apparatus, the method including the steps of: cleaning an apparatus for producing the resist composition with a cleaning liquid; applying the cleaning liquid on an evaluation substrate by spin-coating after removing the cleaning liquid from the apparatus for producing the resist composition; repeating the step of cleaning and the step of applying until the change in the density of defects having a size of 100 nm or more on the evaluation substrate between before and after the application of the cleaning liquid becomes 0.2/cm2 or less; and producing the resist composition by using the apparatus for producing the resist composition after the step of repeating. There can be provided a method for producing a resist composition capable of producing a resist composition whose coating defects are reduced.