Abstract: In a semiconductor device, it is preferable to suppress a variation in characteristics of a temperature sensor. The semiconductor device is provided that includes a semiconductor substrate having a first conductivity type drift region, a transistor section provided in the semiconductor substrate, a diode section provided in the semiconductor substrate, a second conductivity type well region exposed at an upper surface of the semiconductor substrate, a temperature sensing unit that is adjacent to the diode section in top view and is provided above the well region, and an upper lifetime control region that is provided in the diode section, at the upper surface side of the semiconductor substrate, and in a region not overlapping with the temperature sensing unit in top view.

Abstract: A method of manufacturing a semiconductor device from a semiconductor wafer in which a plurality of semiconductor chips are formed. The method includes a first process of forming an active region on a first main surface side of the semiconductor wafer and a second process of forming a first process control monitor (PCM) on a second main surface side of the semiconductor wafer. The method further includes before the second process, a third process of forming a second PCM on the first main surface side of the semiconductor wafer. The first PCM and the second PCM are formed at an area located at the same position in a plan view of the semiconductor wafer.

Abstract: There is provided a semiconductor device including: a semiconductor substrate that has an upper surface and a lower surface and that is provided with a drift region of a first conductivity type; a trench portion that is provided to reach the drift region from the upper surface of the semiconductor substrate; and a mesa portion that is interposed between trench portions, in which the mesa portion has a base region of a second conductivity type that is provided between the drift region and the upper surface, and a first region that has a concentration peak of a hydrogen chemical concentration at a first depth position in the mesa portion.

Abstract: In a semiconductor device, it is preferable to suppress a variation in characteristics of a temperature sensor. The semiconductor device is provided that includes a semiconductor substrate having a first conductivity type drift region, a transistor section provided in the semiconductor substrate, a diode section provided in the semiconductor substrate, a second conductivity type well region exposed at an upper surface of the semiconductor substrate, a temperature sensing unit that is adjacent to the diode section in top view and is provided above the well region, and an upper lifetime control region that is provided in the diode section, at the upper surface side of the semiconductor substrate, and in a region not overlapping with the temperature sensing unit in top view.

Abstract: A semiconductor device, including a semiconductor module and a conducting board. The semiconductor module includes a semiconductor chip and an external connecting terminal which has a first end electrically connected to the semiconductor chip and a second end extending from the semiconductor chip. The conducting board has a terminal hole penetrating therethrough, an inlet and an outlet of the terminal hole being respectively on two opposite surfaces of the conducting board. The conducting board is electrically connected to the external connecting terminal, of which the second end fits into the terminal hole from the inlet toward the outlet, and is fixed therein by solder. At least one of the terminal hole and the second end of the external connecting terminal has a lock part. The second end of the external connecting terminal, inserted into the terminal hole, is locked by the lock part and thereby remains in the terminal hole.

Abstract: Directly beneath p?-type base regions, n-type storage regions are provided. The storage regions contain hydrogen donors as an impurity and have an impurity concentration higher than that of the n?-type drift region. The storage regions are formed by hydrogen ion irradiation from a back surface of a semiconductor substrate. The storage regions have a peak hydrogen concentration and are at positions that coincide with where the hydrogen ions have been irradiated. By the hydrogen ion irradiation, a crystal defect region that is a carrier lifetime killer region is formed concurrently with the storage regions, closer to the back surface of the semiconductor substrate than are storage regions. The crystal defect region has a crystal defect density with a peak density at a position closer to the back surface of the semiconductor substrate than are the storage regions. A semiconductor device having such storage regions and a carrier lifetime killer region is enabled.

Abstract: Provided is a semiconductor device, wherein: in a semiconductor substrate, a lifetime control region is provided from at least a part of a transistor portion to a diode portion; the transistor portion includes a main region, a boundary region located between the main region and the diode portion and overlapped with the lifetime control region, and a plurality of gate trench portions; the plurality of gate trench portions include a first gate trench portion provided in the main region and a second gate trench portion provided in the boundary region; and a gate resistance component of the first gate trench portion is different from a gate resistance component of the second gate trench portion.

Abstract: A semiconductor device having a semiconductor substrate that includes a first-conductivity-type substrate and a first-conductivity-type epitaxial layer, and a plurality of trenches reaching a predetermined depth from a main surface of the semiconductor substrate to terminate in the first-conductivity-type epitaxial layer. The semiconductor substrate includes a hydrogen-donor introduced part, of which a concentration of a hydrogen donor is greatest at a depth position that is separate from bottoms of the trenches by a distance at least two times of the depth of the trenches. The impurity concentration of an impurity dopant of the first-conductivity-type substrate being lower than that of the first-conductivity-type epitaxial layer.

Abstract: A semiconductor device includes a semiconductor substrate having a drift region, and an edge terminal structure portion provided between the active region and an end portion of the semiconductor substrate on an upper surface of the semiconductor substrate. The edge terminal structure portion includes a plurality of guard rings of a second conductivity type which are in contact with the upper surface, and a high concentration region of the first conductivity type which has a higher doping concentration than the drift region and is provided, between adjacent two of the guard rings, from a position shallower than lower ends of the guard rings to a position deeper than the lower ends of the guard rings. Each of the guard rings has a region that is not covered by the high concentration region as viewed from a lower surface side.

Abstract: A semiconductor device includes an edge terminal structure portion provided between the active portion and an end portion of the semiconductor substrate on an upper surface of the semiconductor substrate, in which the edge terminal structure portion has a first high concentration region of the first conductivity type which has a donor concentration higher than a doping concentration of the bulk donor in a region between the upper surface and a lower surface of the semiconductor substrate, an upper surface of the first high concentration region is located on an upper surface side of the semiconductor substrate, and a lower surface of the first high concentration region is located on a lower surface side of the semiconductor substrate.

Abstract: Provided is a semiconductor device comprising a semiconductor substrate having a transistor section and a diode section, wherein both the transistor section and the diode section each have a drift region of a first conductivity-type provided inside the semiconductor substrate, and a base region of a second conductivity-type provided above the drift region inside the semiconductor substrate, inside the semiconductor substrate, a lifetime control region including lifetime killers is provided below the base region from at least a part of the transistor section to the diode section, and in the transistor section, a threshold value adjusting section for adjusting a threshold value of the transistor section is provided overlapping the lifetime control region as seen from an upper surface of the semiconductor substrate.

Abstract: A step-down chopper circuit having a filter reactor includes: a capacitor series circuit having a first capacitor and a second capacitor; a first series circuit having a semiconductor switching element and a diode, which is connected in parallel with the first capacitor, and a second series circuit having a diode and a semiconductor switching element, which is connected in parallel with the second capacitor; a chopper reactor whose one end is connected to a connection point of the first series circuit; and an output capacitor connected between the other end of the chopper reactor and a connection point of the second series circuit, in which a bypass current path with respect to the capacitor, which is configured to bypass a short-circuit current, is formed when one of the first series circuit and the second series circuit becomes a short-circuit state.

Abstract: Provided is a semiconductor device including a semiconductor substrate; a hydrogen donor that is provide inside the semiconductor substrate in a depth direction, has a doping concentration that is higher than a doping concentration of a dopant of the semiconductor substrate, has a doping concentration distribution peak at a first position that is a predetermined distance in the depth direction of the semiconductor substrate away from one main surface of the semiconductor substrate, and has a tail of the doping concentration distribution where the doping concentration is lower than at the peak, farther on the one main surface side than where the first position is located; and a crystalline defect region having a crystalline defect density center peak at a position shallower than the first position, in the depth direction of the semiconductor substrate.

Abstract: In a semiconductor device, it is preferable to suppress a variation in characteristics of a temperature sensor. The semiconductor device is provided that includes a semiconductor substrate having a first conductivity type drift region, a transistor section provided in the semiconductor substrate, a diode section provided in the semiconductor substrate, a second conductivity type well region exposed at an upper surface of the semiconductor substrate, a temperature sensing unit that is adjacent to the diode section in top view and is provided above the well region, and an upper lifetime control region that is provided in the diode section, at the upper surface side of the semiconductor substrate, and in a region not overlapping with the temperature sensing unit in top view.

Abstract: A method of manufacturing a semiconductor device from a semiconductor wafer in which a plurality of semiconductor chips are formed. The method includes a first process of forming an active region on a first main surface side of the semiconductor wafer and a second process of forming a first process control monitor (PCM) on a second main surface side of the semiconductor wafer. The method further includes before the second process, a third process of forming a second PCM on the first main surface side of the semiconductor wafer. The first PCM and the second PCM are formed at an area located at the same position in a plan view of the semiconductor wafer.

Abstract: In a three-level chopper apparatus, a protection switch circuit is controllable to change a current pathway through which an overvoltage is applied to a second capacitor or a first capacitor to a current pathway through which no overvoltage is applied to the second capacitor or the first capacitor.

Abstract: A semiconductor device including a diode region provided in a semiconductor substrate is provided, the diode region including a base region of a first conductivity type exposed on an upper surface of the semiconductor substrate, a cathode region of a second conductivity type exposed on a lower surface of the semiconductor substrate, an inter-cathode region of a first conductivity type exposed on the lower surface of the semiconductor substrate and alternately arranged with the cathode region in a predetermined direction, and a floating region of a second conductivity type provided above the cathode region and above the inter-cathode region.

Abstract: A step-down chopper circuit having a filter reactor includes: a capacitor series circuit having a first capacitor and a second capacitor; a first series circuit having a semiconductor switching element and a diode, which is connected in parallel with the first capacitor, and a second series circuit having a diode and a semiconductor switching element, which is connected in parallel with the second capacitor; a chopper reactor whose one end is connected to a connection point of the first series circuit; and an output capacitor connected between the other end of the chopper reactor and a connection point of the second series circuit, in which a bypass current path with respect to the capacitor, which is configured to bypass a short-circuit current, is formed when one of the first series circuit and the second series circuit becomes a short-circuit state.

Abstract: Signal relay board for power semiconductor modules enabling electrical connection between power semiconductor modules and a drive unit driving same. A first wire layer, a second wire layer, a third wire layer, and a fourth wire layer of a multiphase wire portion are assigned with a first control wire layer serving as a path to provide a control signal to a first semiconductor device of the modules, a first ground wire layer serving as a path to provide a ground potential to a low potential side terminal of the first semiconductor device of the semiconductor modules, a second control wire layer serving as a path to provide a control signal to a second semiconductor device of the modules, and a second ground wire layer serving as a path to provide a ground potential to the second semiconductor device of the modules.

Abstract: In a step-down chopper circuit, a distance between a plurality of first mounting portions of a first semiconductor package that houses a switching device circuit and a distance between a plurality of second mounting portions of a second semiconductor package that houses a backflow prevention diode circuit are different from each other.