Abstract: A heat spreader apparatus includes a first portion; a second portion; and a connecting portion between the first and second portions, with high-conductivity axes and a low-conductivity axis, the low-conductivity axis being directed between the first and second portions. In one or more embodiments, the first, second, and connecting portions are thermally anisotropic blocks, and the apparatus forms a rectangular prism.

Abstract: A hybrid bonded semiconductor structure includes a first substrate and a second substrate each having an interface joined in a hybrid bond. Each substrate has a die portion and a crackstop structure adjacent the die portion. One or more voids in the first substrate and the second substrate are formed in or about a portion of a periphery of each crackstop structure. At least some of the one or more voids in the first substrate and the second substrate are substantially aligned to form a unified void with airgaps across the hybrid bond interface.

Abstract: A semiconductor integrated circuit device includes: an active bridge; a first chiplet and a second chiplet mounted onto the active bridge; and a short-to-long converter circuit (SLCC) that has analog and digital portions. The active bridge includes at least the analog portion of the SLCC, which is electrically connected to at least the first chiplet; and a short-reach physical layer that electrically connects the first chiplet and the second chiplet. The first chiplet includes a first logic core; a first chiplet interface that is electrically connected between the first logic core and the SLCC; and a second chiplet interface that is electrically connected between the first logic core and the second chiplet. The second chiplet includes a second logic core; and a third chiplet interface that is electrically connected between the second logic core and the second chiplet interface. The active bridge also can include a built-in-self-test (BIST) circuit.

Abstract: An exemplary method includes at a bonding temperature, bonding a semiconductor chip to an organic laminate substrate using solder; without cooldown from the bonding temperature to room temperature, at an underfill dispense temperature, dispensing underfill between the semiconductor chip and the organic laminate substrate; and curing the underfill within a range of temperatures above the underfill dispense temperature. Another exemplary method includes depositing a first solder on pads of an organic laminate substrate; contacting a second solder on pillars of a semiconductor chip to the first solder on the pads of the organic laminate substrate; and solder bonding the semiconductor chip to the organic laminate substrate.

Abstract: A semiconductor device and formation thereof. The semiconductor device includes a first semiconductor structure, a second semiconductor structure, and a plurality of pillars interconnecting the first semiconductor structure and the second semiconductor structure. The plurality of pillars include a first solder layer and a second solder layer, wherein the first solder layer has a higher melting point than the second solder layer.

Abstract: Techniques for interconnecting chips using a bridge chip having through vias is provided. In one aspect, a structure includes: a bridge chip attached to at least a first chip and a second chip, wherein the bridge chip has at least one conductive through via connecting the bridge chip to one of the first chip and the second chip. The bridge chip can include a wiring layer having metal lines present between a first capping layer and a second capping layer, and the at least one conductive through via can directly contact at least a sidewall of at least one of the metal lines. A method of integrating chips using the present bridge chip is also provided.

Abstract: An exemplary method includes at a bonding temperature, bonding a semiconductor chip to an organic laminate substrate using solder; without cooldown from the bonding temperature to room temperature, at an underfill dispense temperature, dispensing underfill between the semiconductor chip and the organic laminate substrate; and curing the underfill within a range of temperatures above the underfill dispense temperature. Another exemplary method includes depositing a first solder on pads of an organic laminate substrate; contacting a second solder on pillars of a semiconductor chip to the first solder on the pads of the organic laminate substrate; and solder bonding the semiconductor chip to the organic laminate substrate.

Abstract: The present invention discloses embodiments of a semiconductor chip with one or more bottom external (power or ground) connections, a front side power network layer, a device layer, and a grind side power network layer. The device layer has a plurality of devices. One or more of the devices has one or more device power connections and one or more device ground connections and the device layer has a front side and a back grind side. The front side power network layer has power, ground, signal, and other connections that connect to respective device power and device ground connections from/through the top front side layer. In like manner, power, ground, signal, and other connections connect to respective device power and device ground connections from/through the bottom of grind side power network layer. (Alternative, e.g., external conduit connections are disclosed.

Abstract: An approach forming semiconductor structure composed of one or more stacked semiconductor devices with a first semiconductor device on a substrate, a first interconnect wiring structure over the first semiconductor device, a second interconnect wiring structure under a second semiconductor device joined to the first wiring interconnect structure, and a third wiring interconnect structure on the second semiconductor device where the first semiconductor device and the second semiconductor device are each one of a memory device or a logic device. The approach includes each of the first interconnect wiring structure, the second interconnect wiring structure, and the third interconnect wiring structure with a contact pitch to the first semiconductor device and to both sides of the second semiconductor device that is less than one hundred nanometers.

Abstract: A multichip module with a vertical stack of a logic chip, a translator chip, and at least one memory chip. The multichip module includes a logic chip, a translator chip over and vertically connecting to the logic chip, and at least one memory chip above and vertically connecting to the translator chip where the translator chip is one of a chip with active devices or a passive chip.

Abstract: A semiconductor element includes a conductive pad. The semiconductor element further includes a first layer of a first polyimide material having an uppermost surface. The first layer includes a via trench extending through the first layer from the uppermost surface to the conductive pad. The semiconductor element further includes a second layer of a second polyimide material arranged in direct contact with the uppermost surface. The second layer includes a line trench extending to the uppermost surface. The semiconductor element further includes a conductive structure arranged in the via trench and the line trench such that copper is in direct contact with the second polyimide material.

Abstract: A semiconductor device includes an electronic circuit within a device layer; wherein the device layer is between a thin layer of wiring for signal connections having a first thickness and a thick layer of wiring for power having a second thickness, the second thickness being greater than the first thickness; a silicon layer above the device layer, the thin layer of wiring, and the thick layer of wiring; a first via connection from a top of the semiconductor device to the thin layer of wiring; a second via connection from the top of the semiconductor device to the thick layer of wiring; and a packaging substrate with a connection to the thick layer of wiring.

Abstract: A packaged device that carries multiple component devices uses a back-mounted structure to reduce the area of the substrates in the package. The package includes a first organic laminate substrate and a second organic laminate substrate. The first organic laminate substrate is the base substrate of the packaged device. The second organic laminate substrate has higher wiring density than the first organic laminate substrate. The second organic laminate substrate is joined to a top surface (or module mounting side) of the first organic laminate substrate. A first component device is mounted on a top surface of the second organic laminate substrate. A second component device is mounted on a bottom surface of the second organic laminate substrate. The second component device recesses into a cavity at the top surface of the first organic laminate substrate.

Abstract: A semiconductor device and formation thereof. The semiconductor device includes a first semiconductor structure, a second semiconductor structure, and a plurality of pillars interconnecting the first semiconductor structure and the second semiconductor structure. The plurality of pillars include a first solder layer and a second solder layer, wherein the first solder layer has a higher melting point than the second solder layer.

Abstract: A method of fabricating an under-bump metallurgy (UBM) structure that is free of gold processing includes forming a titanium layer on top of a far back of line (FBEOL) of a semiconductor. A first copper layer is formed on top of the titanium layer. A photoresist (PR) layer is formed on top of the first copper layer between traces of the FBEOL to provide a cavity to the FBEOL traces. A top copper layer is formed on top of the first copper layer. A protective surface layer (PSL) is formed on top of the top copper layer.

Abstract: Techniques for interconnecting chips using a bridge chip having through vias is provided. In one aspect, a structure includes: a bridge chip attached to at least a first chip and a second chip, wherein the bridge chip has at least one conductive through via connecting the bridge chip to one of the first chip and the second chip. The bridge chip can include a wiring layer having metal lines present between a first capping layer and a second capping layer, and the at least one conductive through via can directly contact at least a sidewall of at least one of the metal lines. A method of integrating chips using the present bridge chip is also provided.

Abstract: A semiconductor structure includes a power distribution network including a first buried power rail, a power wire, and a first buried via electrically interconnecting the first buried power rail and the power wire. Each of the first buried power rail, the power wire, and the first buried via have a liner on a corresponding bottom surface thereof and sidewalls thereof. The structure also includes a dielectric layer outward of the power distribution network; a first field effect transistor outward of the dielectric layer; a first via trench contact electrically interconnecting a source/drain region of the transistor to the first buried power rail; a first outer wire outward of the first field effect transistor; and an electrical path electrically interconnecting the first outer wire with the power wire.

Abstract: The present invention discloses embodiments of a semiconductor chip with one or more bottom external (power or ground) connections, a front side power network layer, a device layer, and a grind side power network layer. The device layer has a plurality of devices. One or more of the devices has one or more device power connections and one or more device ground connections and the device layer has a front side and a back grind side. The front side power network layer has power, ground, signal, and other connections that connect to respective device power and device ground connections from/through the top front side layer. In like manner, power, ground, signal, and other connections connect to respective device power and device ground connections from/through the bottom of grind side power network layer. (Alternative, e.g., external conduit connections are disclosed.

Abstract: An interconnect for a semiconductor device includes a laminate substrate; a first plurality of electrical devices in or on a surface of the laminate substrate; a redistribution layer having a surface disposed on the surface of the laminate substrate; a second plurality of electrical devices in or on the surface of the redistribution layer; and a plurality of transmission lines between the first plurality of electrical devices and the second plurality of electrical devices. The surface of the laminate substrate and the surface of the redistribution layer are parallel to each other to form a dielectric structure and a conductor structure.

Abstract: A lidded chip package apparatus has reduced latent thermal stress in an under-chip high-CTE layer of the chip package because the lid of the package was adhered to a substrate of the package and cured during a same thermal excursion as when underfill was dispensed and cured under a chip of the package, and the chip package was cooled from the combined underfill and lidding process to room temperature with the lid adhered to the chip and the substrate, thereby reducing latent thermal stress in the under-chip high-CTE layer of the chip package.