Patents by Inventor Munehiro Ogasawara

Munehiro Ogasawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10950410
    Abstract: Provided is a multiple electron beam inspection apparatus including: an irradiation source irradiating a substrate with multiple electron beams; a stage on which is cable of mounting the substrate; an electromagnetic lens provided between the irradiation source and the stage, the electromagnetic lens generating a lens magnetic field, the multiple electron beams being capable of passing through the lens magnetic field; an electrostatic lens provided in the lens magnetic field, the electrostatic lens including a plurality of through-holes and a plurality of electrodes, the plurality of through-holes having wall surfaces respectively, each of the multiple electron beams being capable of passing through the corresponding each of the plurality of through-holes, each of the plurality of electrodes provided on each of the wall surfaces of the plurality of through-holes, at least one of the through-holes provided apart from a central axis of trajectory of the multiple electron beams having a spiral shape; and a power
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: March 16, 2021
    Assignee: NuFlare Technology, Inc.
    Inventors: Kazuhiko Inoue, Atsushi Ando, Munehiro Ogasawara
  • Patent number: 10886102
    Abstract: A multiple-electron-beam irradiation apparatus includes a first electrostatic lens, configured using the substrate used as a bias electrode by being applied with a negative potential, a control electrode to which a control potential is applied and a ground electrode to which a ground potential is applied, configured to provide dynamic focusing of the multiple electron beams onto the substrate, in accordance with change of the height position of the surface of the substrate, by generating an electrostatic field, wherein the control electrode is disposed on an upstream side of a maximum magnetic field of the lens magnetic field of the first electromagnetic lens with respect to a direction of a trajectory central axis of the multiple electron beams, and a ground electrode is disposed on an upstream side of the control electrode with respect to the direction of the trajectory central axis.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: January 5, 2021
    Assignees: NuFlare Technology, Inc., NuFlare Technology America, Inc.
    Inventors: Kazuhiko Inoue, Munehiro Ogasawara, Steven Golladay
  • Publication number: 20200395189
    Abstract: Aberration corrector includes a lower electrode substrate to be formed therein with plural first passage holes having a first hole diameter and making multiple electron beams pass therethrough, and to be arranged thereon plural electrode sets each being plural electrodes of four or more poles, surrounding a first passage hole, for each of the plural first passage holes, and an upper electrode substrate above the lower one, to be formed therein with plural second passage holes making multiple electron beams pass therethrough, whose size from the top of the upper electrode substrate to the middle of way to the back side of the upper electrode substrate is a second hole diameter, and whose size from the middle to the back side is a third hole diameter larger than each of the first and second hole diameters, wherein a shield electrode is on inner walls of plural second passage holes.
    Type: Application
    Filed: May 21, 2020
    Publication date: December 17, 2020
    Applicant: NuFlare Technology, Inc.
    Inventors: Kazuhiko INOUE, Munehiro OGASAWARA
  • Patent number: 10790110
    Abstract: According to one aspect of the present invention, a charged particle beam irradiation apparatus includes an electromagnetic lens configured to refract the charged particle beam; a plurality of electrodes arranged in a magnetic field of the electromagnetic lens and arranged to surround an outer space of a passage region of the charged particle beam; a supply mechanism configured to supply a gas to the space surrounded by the plurality of electrodes; a potential control circuit configured to control potentials of the plurality of electrodes so that a plasma is generated in the space surrounded by the plurality of electrodes and movements of electrons or positive ions generated by the plasma are controlled; and a stage configured to dispose a substrate irradiated with a charged particle beam passing through the electromagnetic lens, wherein the substrate is irradiated with light radiated by the plasma.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: September 29, 2020
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventor: Munehiro Ogasawara
  • Patent number: 10784081
    Abstract: A charged particle beam lithography apparatus, includes a plurality of multiple-beam sets, each of which including a plurality of irradiation sources each generating an independent charged particle beam, a plurality of objective deflectors, each arranged for a corresponding charged particle beam, and configured to deflect the corresponding charged particle beam to a desired position on a substrate, and a plurality of electrostatic or electromagnetic lens fields each to focus the corresponding charged particle beam on the target object; a plurality of common deflection amplifiers, arranged for each multiple-beam set, and each of the plurality of common deflection amplifiers being configured to commonly control the plurality of objective deflectors arranged in a same multiple-beam set; a plurality of individual ON/OFF mechanisms configured to individually turn ON/OFF a beam irradiated from each irradiation source; and one or more multiple-beam clusters including the plurality of multiple-beam sets.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: September 22, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Munehiro Ogasawara
  • Patent number: 10784073
    Abstract: A blanking deflector includes a first electrode being plate-like, a second electrode electrically separated from the first electrode, and arranged such that a first space is formed between the first and second electrodes, and a third electrode electrically separated from the first electrode, and arranged such that a second space, sufficiently wider than the first space, is formed between the first and third electrodes, wherein a transmission line, in which the second and third electrodes are electrically connected at, at least, input and output sides, is formed by the first, second, and third electrodes, multi-beams of a charged particle beam are made to pass through the second space between the first and third electrodes, and the multi-beams are deflected for blanking control by a voltage signal applied from the input side to between the first electrode, and a connected group of the second and third electrodes electrically connected.
    Type: Grant
    Filed: November 16, 2017
    Date of Patent: September 22, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Munehiro Ogasawara
  • Publication number: 20200286704
    Abstract: A multiple electron beam irradiation apparatus includes a forming mechanism which forms multiple primary electron beams; a plurality of electrode substrates being stacked in each of which a plurality of openings of various diameter dimensions are formed, the plurality of openings being arranged at passage positions of the multiple primary electron beams, and through each of which a corresponding one of the multiple primary electron beams passes, the plurality of electrode substrates being able to adjust an image plane conjugate position of each of the multiple primary electron beams depending on a corresponding one of the various diameter dimensions; and a stage which is capable of mounting thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode substrates.
    Type: Application
    Filed: March 5, 2020
    Publication date: September 10, 2020
    Applicants: NuFlare Technology, Inc, NuFlare Technology America, Inc
    Inventors: Kazuhiko INOUE, Atsushi Ando, Munehiro Ogasawara, John Hartley
  • Publication number: 20200266033
    Abstract: A charged particle beam lithography apparatus, includes a plurality of multiple-beam sets, each of which including a plurality of irradiation sources each generating an independent charged particle beam, a plurality of objective deflectors, each arranged for a corresponding charged particle beam, and configured to deflect the corresponding charged particle beam to a desired position on a substrate, and a plurality of electrostatic or electromagnetic lens fields each to focus the corresponding charged particle beam on the target object; a plurality of common deflection amplifiers, arranged for each multiple-beam set, and each of the plurality of common deflection amplifiers being configured to commonly control the plurality of objective deflectors arranged in a same multiple-beam set; a plurality of individual ON/OFF mechanisms configured to individually turn ON/OFF a beam irradiated from each irradiation source; and one or more multiple-beam clusters including the plurality of multiple-beam sets.
    Type: Application
    Filed: April 21, 2020
    Publication date: August 20, 2020
    Applicant: NuFlare Technology, Inc.
    Inventor: Munehiro OGASAWARA
  • Patent number: 10734190
    Abstract: A multiple electron beam irradiation apparatus includes an electromagnetic lens configured to refract multiple electron beams incident, an aberration corrector arranged in the magnetic field of the electromagnetic lens and configured to be able to individually apply a bias potential and a deflection potential to each of the multiple electron beams, and an objective lens configured to focus the multiple electron beams, a trajectory of the each of which has been individually corrected by the bias potential and the deflection potential, onto a target object.
    Type: Grant
    Filed: May 17, 2019
    Date of Patent: August 4, 2020
    Assignees: NuFlare Technology, Inc., NuFlare Technology America, Inc.
    Inventors: Atsushi Ando, Munehiro Ogasawara, Riki Ogawa, John Hartley
  • Publication number: 20200211812
    Abstract: A multiple electron beam irradiation apparatus includes a shaping aperture array substrate to form multiple primary electron beams, a plurality of electrode array substrates stacked each to dispose thereon a plurality of electrodes each arranged at a passage position of each of the multiple primary electron beams, each of the multiple primary electron beams surrounded by an electrode of the plurality of electrodes when each of the multiple primary electron beams passes through the passage position, the first wiring and the second wiring applied with one of different electric potentials, and a stage to mount thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode array substrates, wherein, in each of the plurality of electrode array substrates, each of the plurality of electrodes is electrically connected to either one of the first wiring and the second wiring.
    Type: Application
    Filed: December 23, 2019
    Publication date: July 2, 2020
    Applicants: NuFlare Technology, Inc., NuFlare Technology America, Inc.
    Inventors: Kazuhiko INOUE, Atsushi Ando, Munehiro Ogasawara, John Hartley
  • Publication number: 20200203121
    Abstract: According to one aspect of the present invention, an optical system adjustment method of an image acquisition apparatus includes: extracting one primary electron beam after another from primary electron beams at a plurality of preset positions among multiple primary electron beams; and adjusting, a first detector being capable of individually detecting multiple secondary electrons emitted due to irradiation of a target with the multiple primary electron beams, a trajectory of the one primary electron beam using a primary electron optics while detecting secondary electrons corresponding to the one primary electron beam for each of the primary electron beams extracted one by one using a movable second detector having an inspection surface of a size capable of detecting the multiple secondary electrons as a whole and arranged on an optical path for guiding the multiple secondary electrons to the first detector.
    Type: Application
    Filed: February 27, 2020
    Publication date: June 25, 2020
    Applicant: NuFlare Technology, Inc.
    Inventors: Munehiro OGASAWARA, Nobutaka KIKUIRI, Atsushi ANDO
  • Patent number: 10685809
    Abstract: A charged particle beam lithography apparatus, includes a plurality of multiple-beam sets, each of which including a plurality of irradiation sources each generating an independent charged particle beam, a plurality of objective deflectors, each arranged for a corresponding charged particle beam, and configured to deflect the corresponding charged particle beam to a desired position on a substrate, and a plurality of electrostatic or electromagnetic lens fields each to focus the corresponding charged particle beam on the target object; a plurality of common deflection amplifiers, arranged for each multiple-beam set, and each of the plurality of common deflection amplifiers being configured to commonly control the plurality of objective deflectors arranged in a same multiple-beam set; a plurality of individual ON/OFF mechanisms configured to individually turn ON/OFF a beam irradiated from each irradiation source; and one or more multiple-beam clusters including the plurality of multiple-beam sets.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: June 16, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Munehiro Ogasawara
  • Publication number: 20200176216
    Abstract: Provided is a multiple electron beam inspection apparatus including: an irradiation source irradiating a substrate with multiple electron beams; a stage on which is cable of mounting the substrate; an electromagnetic lens provided between the irradiation source and the stage, the electromagnetic lens generating a lens magnetic field, the multiple electron beams being capable of passing through the lens magnetic field; an electrostatic lens provided in the lens magnetic field, the electrostatic lens including a plurality of through-holes and a plurality of electrodes, the plurality of through-holes having wall surfaces respectively, each of the multiple electron beams being capable of passing through the corresponding each of the plurality of through-holes, each of the plurality of electrodes provided on each of the wall surfaces of the plurality of through-holes, at least one of the through-holes provided apart from a central axis of trajectory of the multiple electron beams having a spiral shape; and a power
    Type: Application
    Filed: November 18, 2019
    Publication date: June 4, 2020
    Applicant: NuFlare Technology, Inc.
    Inventors: Kazuhiko INOUE, Atsushi ANDO, Munehiro OGASAWARA
  • Patent number: 10629406
    Abstract: According to one aspect of the present invention, an optical system adjustment method of an image acquisition apparatus includes: extracting one primary electron beam after another from primary electron beams at a plurality of preset positions among multiple primary electron beams; and adjusting, a first detector being capable of individually detecting multiple secondary electrons emitted due to irradiation of a target with the multiple primary electron beams, a trajectory of the one primary electron beam using a primary electron optics while detecting secondary electrons corresponding to the one primary electron beam for each of the primary electron beams extracted one by one using a movable second detector having an inspection surface of a size capable of detecting the multiple secondary electrons as a whole and arranged on an optical path for guiding the multiple secondary electrons to the first detector.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: April 21, 2020
    Assignee: NuFlare Technology, Inc.
    Inventors: Munehiro Ogasawara, Nobutaka Kikuiri, Atsushi Ando
  • Patent number: 10622186
    Abstract: In one embodiment, a charged particle beam writing apparatus includes a deflector deflecting a charged particle beam, a first correcting lens and a second correcting lens correcting a focus position of the charged particle beam, a focus correction amount calculator calculating a first correction amount for the focus position according to a change in a height position of a sample surface, and calculating a second correction amount for the focus position according to a change in shot size of the charged particle beam, a first DAC (digital to analog converter) amplifier applying a voltage for a ground potential based on the first correction amount to the first correcting lens, and a second DAC amplifier applying a voltage for a ground potential based on the second correction amount to the second correcting lens, an output of the second DAC amplifier being smaller than an output of the first DAC amplifier.
    Type: Grant
    Filed: November 28, 2018
    Date of Patent: April 14, 2020
    Assignee: NuFlare Technology, Inc.
    Inventors: Takuya Uemura, Takashi Nakamura, Hideki Matsui, Munehiro Ogasawara, Rieko Nishimura, Tatsuya Murofushi, Yoshiaki Hattori
  • Publication number: 20200013585
    Abstract: A multiple-electron-beam irradiation apparatus includes a first electrostatic lens, configured using the substrate used as a bias electrode by being applied with a negative potential, a control electrode to which a control potential is applied and a ground electrode to which a ground potential is applied, configured to provide dynamic focusing of the multiple electron beams onto the substrate, in accordance with change of the height position of the surface of the substrate, by generating an electrostatic field, wherein the control electrode is disposed on an upstream side of a maximum magnetic field of the lens magnetic field of the first electromagnetic lens with respect to a direction of a trajectory central axis of the multiple electron beams, and a ground electrode is disposed on an upstream side of the control electrode with respect to the direction of the trajectory central axis.
    Type: Application
    Filed: July 3, 2019
    Publication date: January 9, 2020
    Applicants: NuFlare Technology, Inc., NuFlare Technology America, Inc.
    Inventors: Kazuhiko INOUE, Munehiro OGASAWARA, Steven GOLLADAY
  • Patent number: 10504686
    Abstract: A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: December 10, 2019
    Assignee: NuFlare Technology, Inc.
    Inventors: Munehiro Ogasawara, Takanao Touya
  • Publication number: 20190371565
    Abstract: In one embodiment, a charged particle beam writing apparatus includes an emitter emitting a charged particle beam, a first aperture shaping the charged particle beam, a second aperture shaping the charged particle beam transmitted through the first aperture, a projection lens projecting the charged particle beam transmitted through the first aperture on the second aperture, an object lens focusing the charged particle beam transmitted through the second aperture, the object lens being a magnetic field-type lens, and an electrostatic lens performing focus correction of the charged particle beam in accordance with a surface height of a substrate that is a writing target. The electrostatic lens is disposed inside the object lens, a positive voltage is applied to an electrode of the electrostatic lens. A strength of a magnetic field of the object lens at an upper end of the electrode has a predetermined value or less.
    Type: Application
    Filed: June 4, 2019
    Publication date: December 5, 2019
    Applicant: NuFlare Technology, Inc.
    Inventors: Takanao TOUYA, Hirofumi Morita, Munehiro Ogasawara
  • Publication number: 20190355547
    Abstract: A multiple electron beam irradiation apparatus includes an electromagnetic lens configured to refract multiple electron beams incident, an aberration corrector arranged in the magnetic field of the electromagnetic lens and configured to be able to individually apply a bias potential and a deflection potential to each of the multiple electron beams, and an objective lens configured to focus the multiple electron beams, a trajectory of the each of which has been individually corrected by the bias potential and the deflection potential, onto a target object.
    Type: Application
    Filed: May 17, 2019
    Publication date: November 21, 2019
    Applicants: NuFlare Technology, Inc., NuFlare Technology America, Inc.
    Inventors: Atsushi Ando, Munehiro Ogasawara, Riki Ogawa, John Hartley
  • Patent number: 10451976
    Abstract: An electron beam irradiation apparatus includes a first electrode being annular, arranged along the optical axis of the electron beam, at the downstream from the deflector, and in the magnetic field of the objective lens, to which a first potential being positive is variably applied, a second electrode being annular, arranged in the magnetic field of the objective lens and between the deflector and the first electrode, to which a second potential being positive and higher than the first potential is applied, and a third electrode being annular, arranged in the magnetic field of the objective lens and to be opposite to the second electrode with respect to the first electrode, to which a third potential lower than the first potential is applied.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: October 22, 2019
    Assignee: NuFlare Technology, Inc.
    Inventor: Munehiro Ogasawara