Abstract: A photomask is provided. The photomask comprises: a low thermal expansion material (LTEM) substrate including a first surface and a second surface; a reflective layer disposed on the first surface of the low thermal expansion material substrate and including first material layers and second material layers, which are stacked alternately; a light absorbing pattern on the reflective layer; and a conductive layer on the second surface of the low thermal expansion material substrate, wherein the low thermal expansion material substrate includes a correction defect correcting the light absorbing pattern, and the conductive layer is one of ruthenium oxide (RuO2), iridium oxide (IrO2), and/or a combination thereof.

Abstract: Disclosed are a curved cover for curved display and a curved type display apparatus including the same in which the curved type display apparatus includes a curved part that includes a front part covering one edge of a display panel having a curved shape, and the front part includes a curved part having a curved shape and a bending part provided at each of both edges of the curved part.

Abstract: An organic light emitting diode (OLED) display device including a substrate having a display region and a non-display region surrounding the display region; an OLED on the substrate in the display region; an encapsulation substrate bonded to the substrate via an adhesive layer such that the encapsulation substrate and the substrate face each other; and a step-difference compensation portion in the non-display region and configured to compensate for a step difference between the display region and the non-display region.

Abstract: Disclosed are a curved cover for curved display and a curved type display apparatus including the same in which the curved type display apparatus includes a curved part that includes a front part covering one edge of a display panel having a curved shape, and the front part includes a curved part having a curved shape and a bending part provided at each of both edges of the curved part.

Abstract: Disclosed are a curved cover for curved display and a curved type display apparatus including the same in which the curved type display apparatus includes a curved part that includes a front part covering one edge of a display panel having a curved shape, and the front part includes a curved part having a curved shape and a bending part provided at each of both edges of the curved part.

Abstract: An organic light emitting device includes a base substrate defining an active area and a pad area that surrounds the active area, an organic light emitting layer formed on the active area, a first protective layer formed to cover the active area, where the organic light emitting layer is formed, and the pad area, a second protective layer formed to cover the first protective layer, and a dam formed between the first protective layer and the second protective layer, wherein the dam is located at a boundary between the active area and the pad area and includes a groove that is positioned separate from an outer portion of the active area.

Abstract: Disclosed are a curved cover for curved display and a curved type display apparatus including the same in which the curved type display apparatus includes a curved part that includes a front part covering one edge of a display panel having a curved shape, and the front part includes a curved part having a curved shape and a bending part provided at each of both edges of the curved part.

Abstract: An organic light emitting device includes a base substrate defining an active area and a pad area that surrounds the active area, an organic light emitting layer formed on the active area, a first protective layer formed to cover the active area, where the organic light emitting layer is formed, and the pad area, a second protective layer formed to cover the first protective layer, and a dam formed between the first protective layer and the second protective layer, wherein the dam is located at a boundary between the active area and the pad area and includes a groove that is positioned separate from an outer portion of the active area.

Abstract: An organic light emitting device includes a base substrate defining an active area and a pad area that surrounds the active area, an organic light emitting layer formed on the active area, a first protective layer formed to cover the active area, where the organic light emitting layer is formed, and the pad area, a second protective layer formed to cover the first protective layer, and a dam formed between the first protective layer and the second protective layer, wherein the dam is located at a boundary between the active area and the pad area and includes a groove that is positioned separate from an outer portion of the active area.

Abstract: Disclosed are an ink composition for an imprint lithography and a roll printing, wherein in forming patterns of the LCD device using the imprint lithography and the roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, and wherein the ink composition is endurable even at a high temperature of 90-250° C.

Abstract: An organic light emitting device includes a base substrate defining an active area and a pad area that surrounds the active area, an organic light emitting layer formed on the active area, a first protective layer formed to cover the active area, where the organic light emitting layer is formed, and the pad area, a second protective layer formed to cover the first protective layer, and a dam formed between the first protective layer and the second protective layer, wherein the dam is located at a boundary between the active area and the pad area and includes a groove that is positioned separate from an outer portion of the active area.

Abstract: Disclosed are an ink composition for an imprint lithography and a roll printing, wherein in forming patterns of the LCD device using the imprint lithography and the roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, and wherein the ink composition is endurable even at a high temperature of 90-250° C.

Abstract: A photosensitive resin composition and a method for forming an organic film on a substrate are provided. Because the photosensitive resin composition for imprinting includes an erythrotol-based monomer or oligomer, an organic film formed by the photosensitive resin composition for imprinting has improved restoring force. Therefore, the photosensitive resin composition is appropriate for imprinting processes.

Abstract: An organic light emitting diode (OLED) display device including a substrate having a display region and a non-display region surrounding the display region; an OLED on the substrate in the display region; an encapsulation substrate bonded to the substrate via an adhesive layer such that the encapsulation substrate and the substrate face each other; and a step-difference compensation portion in the non-display region and configured to compensate for a step difference between the display region and the non-display region.

Abstract: A method of forming a photomask using a calibration pattern that may exactly transfer a desired pattern to a substrate. The method includes providing one-dimensional calibration design patterns each having first design measures and providing two-dimensional calibration design patterns each having second design measures; obtaining one-dimensional calibration measured patterns using the one-dimensional calibration design patterns and obtaining two-dimensional calibration measured patterns using the two-dimensional calibration design patterns; obtaining first measured measures of the one-dimensional calibration measured patterns and obtaining second measured measures of the two-dimensional calibration measured patterns; establishing a correlation between the first measured measures and the second measured measures; and converting a main measured measure of a main pattern into a corresponding one of the first measured measures using the correlation.

Abstract: A method for inspecting a uniformity of CD (CD) of a photo mask pattern increases a production yield. The method obtains a CD by precisely measuring a photo mask by using, an electron microscope. Then, a measurement image having, a plurality of patterns formed in the photo mask is obtained by photographing the photo mask at a high speed through an optical microscope. A gray level based on the CD is calculated by capturing just a pattern area in the measurement image, and an estimated value and a correlation coefficient is obtained, when an open density of the measurement image is relatively low. Accordingly, a uniformity of CD can be confirmed more clearly in a measurement of high speed for a measurement image having a relatively low open density.

Abstract: A method of forming a photomask using a calibration pattern that may exactly transfer a desired pattern to a substrate. The method includes providing one-dimensional calibration design patterns each having first design measures and providing two-dimensional calibration design patterns each having second design measures; obtaining one-dimensional calibration measured patterns using the one-dimensional calibration design patterns and obtaining two-dimensional calibration measured patterns using the two-dimensional calibration design patterns; obtaining first measured measures of the one-dimensional calibration measured patterns and obtaining second measured measures of the two-dimensional calibration measured patterns; establishing a correlation between the first measured measures and the second measured measures; and converting a main measured measure of a main pattern into a corresponding one of the first measured measures using the correlation.

Abstract: A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.

Abstract: Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.

Abstract: A photomask or equivalent optical component includes a scattering element in the medium of a substrate, which actively modifies (adjusts/filters the intensity, shape, and/or components of) light that propagates through the substrate. The substrate has a front surface and a back surface and is transparent to exposure light of a photolithography process, i.e., light of given wavelength, at least one mask pattern at the front surface of the substrate and the image of which is to be transferred to an electronic device substrate in a photolithographic process using the photomask, a blind pattern at the front surface of the substrate and opaque to the exposure light, and the scattering element. The scattering element, in addition to being formed in the medium of the substrate, is situated below the blind pattern as juxtaposed with the blind pattern in the direction of the thickness of the substrate.