Patents by Inventor Myung Ho Lee
Myung Ho Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240150654Abstract: The present invention relates to a composition for selectively etching silicon on a surface on which a silicon oxide film (SiO2) and silicon (Si) are exposed. According to the present invention, it is possible to improve etch selectivity of silicon on the semiconductor surface.Type: ApplicationFiled: December 8, 2022Publication date: May 9, 2024Inventors: Gi Young KIM, Hak Soo KIM, Jeong Sik OH, Myung Ho LEE, Myung Geun SONG
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Publication number: 20240145167Abstract: A multilayer capacitor includes a body including dielectric layers and internal electrodes and external electrodes disposed on an external surface of the body and connected to the internal electrodes. The body includes a first surface and a second surface to which the internal electrodes are exposed, the first surface and the second surface opposing each other in a first direction, a third surface and a fourth surface opposing each other in a second direction which is a direction in which the dielectric layers are stacked, and a fifth surface and a sixth surface opposing each other in a third direction. At least one of the internal electrodes include a first bottleneck structure having a first directional length of a third-directional outer region smaller than an inner region thereof and a second bottleneck structure having a third directional length of a first directional outer region smaller than an inner region thereof.Type: ApplicationFiled: January 10, 2024Publication date: May 2, 2024Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Jong Ho Lee, Myung Chan Son, Sim Chung Kang, Eun Jin Shim, Sun Hwa Kim, Byung Soo Kim
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Patent number: 11958341Abstract: A vehicular air-conditioning apparatus includes a photocatalytic module in which light is radiated on a photocatalytic filter to sterilize the photocatalytic filter. In particular, vehicular air-conditioning apparatus incudes: a duct to allow conditioned air to flow therethrough; the photocatalytic filter mounted in the duct and coated with a photocatalytic material to remove harmful substances in reaction to light energy; and a rotation unit rotatably mounted in the duct. In particular, the rotation unit is provided with a light source to radiate light toward the photocatalytic filter. When the rotation unit is rotated, a position of the light source is changed in a rotational direction of the rotation unit such that the light is radiated on the photocatalytic filter over an increased range. Thus, a filter sterilization effect is improved over the entire area of the photocatalytic filter with reduced number of light sources.Type: GrantFiled: October 27, 2020Date of Patent: April 16, 2024Assignees: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATIONInventors: Jae Seung Lee, Gee Young Shin, Dae Hee Lee, Dong Ho Kwon, Seung Sik Han, Myung Hoe Kim
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Patent number: 11951804Abstract: An air-conditioning device for mobilities and an air-conditioning control system for mobilities using the same, which are capable of performing independent air-conditioning control for each seat when a mobility is heated and cooled, thereby preventing wastage of heating and cooling energy by performing individual air conditioning for each seat depending on whether a passenger is seated, and ensuring comfort of all passengers by providing conditioned air to each seat.Type: GrantFiled: July 18, 2022Date of Patent: April 9, 2024Assignees: HYUNDAI MOTOR COMPANY, KIA CORPORATIONInventors: Su Yeon Kang, Gee Young Shin, Dae Hee Lee, Myung Hoe Kim, Dong Ho Kwon
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Publication number: 20240103958Abstract: A method performed by a managing server includes: receiving, from an electronic device, operation data of the electronic device; identifying, by using artificial intelligence (AI), a device usage pattern of the electronic device; identifying, by using the AI, information related to a failure or an abnormal operation of the electronic device and a solution to the failure or the abnormal operation based on the device usage pattern and the operation data received from the electronic device; and transmitting, to a user terminal, the information related to the failure or the abnormal operation of the electronic device and the solution to the failure or the abnormal operation.Type: ApplicationFiled: December 4, 2023Publication date: March 28, 2024Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jae-Hun LEE, Myung-Sun KIM, Ayush JAIN, Tae-Ho SWANG, Jae-Hong KIM, Hye-Jung CHO
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Patent number: 11939505Abstract: Provided are a silicon nitride film etching composition, a method of etching a silicon nitride film using the same, and a manufacturing method of a semiconductor device. Specifically, a silicon nitride film may be stably etched with a high selection ratio relative to a silicon oxide film, and when the composition is applied to an etching process at a high temperature and a semiconductor manufacturing process, not only no precipitate occurs but also anomalous growth in which the thickness of the silicon oxide film is rather increased does not occur, thereby minimizing defects and reliability reduction.Type: GrantFiled: August 30, 2021Date of Patent: March 26, 2024Assignee: ENF Technology Co., Ltd.Inventors: Dong Hyun Kim, Hyeon Woo Park, Sung Jun Hong, Myung Ho Lee, Myung Geun Song, Hoon Sik Kim, Jae Jung Ko, Myong Euy Lee, Jun Hyeok Hwang
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Patent number: 11940501Abstract: The present invention relates to a method and an apparatus for diagnosing low voltage of a secondary battery cell. The method for diagnosing low voltage of a secondary battery cell according to an embodiment of the present invention includes pre-aging a battery cell, charging the battery cell according to a preset charging condition, measuring a parameter for determining low voltage failure of the battery cell, comparing the measured parameter with a reference parameter, and performing formation when the battery cell is determined to be normal.Type: GrantFiled: October 4, 2019Date of Patent: March 26, 2024Assignee: LG ENERGY SOLUTION, LTD.Inventors: Yong Tae Lee, Myung Hoon Ko, Jee Ho Kim, Gyung Soo Kang
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Patent number: 11935701Abstract: A capacitor component includes a body including dielectric layers, first and second internal electrodes, laminated in a first direction, facing each other, and first and second cover portions, disposed on outermost portions of the first and second internal electrodes, and first and second external electrodes, respectively disposed on both external surfaces of the body in a second direction, perpendicular to the first direction, and respectively connected to the first and second internal electrodes. An indentation including a glass is disposed at at least one of boundaries between the first internal electrodes and the first external electrode or one of boundaries between the second internal electrodes and the second external electrode.Type: GrantFiled: April 4, 2023Date of Patent: March 19, 2024Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Jang Yeol Lee, Ji Hong Jo, Yoo Jeong Lee, Myung Jun Park, Jong Ho Lee, Hye Young Choi, Jae Hyun Lee, Hyun Hee Gu
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Publication number: 20240083384Abstract: A vehicle seat reinforcement device includes a leg portion mounted on a floor panel, a seat cushion frame slidably mounted on the leg portion, and a load reinforcing structure connected between the leg portion and the seat cushion frame, wherein when a seat belt anchorage load is transferred to the seat cushion frame, the seat cushion frame is locked to the leg portion by the load reinforcing structure.Type: ApplicationFiled: February 3, 2023Publication date: March 14, 2024Applicants: Hyundai Motor Company, Kia Corporation, Daechang Seat Co.,LTD-Dongtan, Hyundai Transys Inc.Inventors: Sang Soo LEE, Chan Ho JUNG, Mu Young KIM, Sang Hark LEE, Ho Suk JUNG, Deok Soo LIM, Sang Do PARK, In Sun BAEK, Sin Chan YANG, Chan Ki CHO, Myung Soo LEE, Jae Yong JANG, Jun Sik HWANG, Ho Sung KANG, Hae Dong KWAK, Hyun Tak KO
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Patent number: 11930179Abstract: An image encoding/decoding method is provided. An image decoding method of the present invention may comprise deriving an intra-prediction mode of a current luma block, deriving an intra-prediction mode of a current chroma block based on the intra-prediction mode of the current luma block, generating a prediction block of the current chroma block based on the intra-prediction mode of the current chroma block, and the deriving of an intra-prediction mode of a current chroma block may comprise determining whether or not CCLM (Cross-Component Linear Mode) can be performed for the current chroma block.Type: GrantFiled: December 27, 2019Date of Patent: March 12, 2024Assignees: Electronics and Telecommunications Research Institute, INDUSTRY ACADEMY COOPERATION FOUNDATION OF SEJONG UNI, CHIPS & MEDIA, INC, INDUSTRY-UNIVERSITY COOPERATION FOUNDATION KOREA AEROSPACE UNIVERSITYInventors: Sung Chang Lim, Jung Won Kang, Ha Hyun Lee, Jin Ho Lee, Hui Yong Kim, Yung Lyul Lee, Ji Yeon Jung, Nam Uk Kim, Myung Jun Kim, Yang Woo Kim, Dae Yeon Kim, Jae Gon Kim, Do Hyeon Park
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Patent number: 11926807Abstract: A cleaning composition for removing post-etch or post-ash residues from a semiconductor substrate, and a cleaning method using the same are disclosed. The cleaning composition can comprise water; a fluorine compound; an alkanolamine compound; and a corrosion inhibitor. The corrosion inhibitor is a mixture of a first corrosion inhibitor and a second corrosion inhibitor. When using the cleaning composition, it is possible to efficiently remove the residues of various aspects existing on a surface of the substrate or the semiconductor device without damage to a substrate or a semiconductor device including various metal layers, insulating layers, etc. Accordingly, when a highly integrated and miniaturized semiconductor device is manufactured, it may be advantageously applied to the removal of residues generated on the surface of the substrate or the semiconductor device.Type: GrantFiled: September 14, 2021Date of Patent: March 12, 2024Assignee: ENF TECHNOLOGY CO., LTD.Inventors: Jun Her, Na Rae Yim, Hyun Jin Jung, Myung Ho Lee, Myung Geun Song
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Publication number: 20240071689Abstract: A method of manufacturing a multilayer electronic component includes forming a stack by stacking a plurality of ceramic green sheets on which conductive patterns are disposed on a support film, cutting the stack in a second direction, perpendicular to a first direction which is a stacking direction of the plurality of ceramic green sheets, cutting the stack in a third direction, perpendicular to the first and second directions, to obtain a plurality of unit chips, separating the unit chip from the support film, arranging the unit chip such that one of side surfaces of the unit chip is in contact with an adhesive tape, and attaching another one of the side surfaces to a ceramic green sheet for a side margin portion, and forming a side margin portion on the another one of side surfaces.Type: ApplicationFiled: March 28, 2023Publication date: February 29, 2024Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Myung Chan SON, Yong PARK, Jong Ho LEE, Eun Jung LEE, Jung Tae PARK, Min Woo KIM, Ji Hyeon LEE, Sun Mi KIM
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Patent number: 11916258Abstract: A secondary battery comprises an electrode assembly, a can, and an insulator. The electrode assembly includes a first electrode, a separator, and a second electrode alternately stacked and wound. The can has an accommodation part accommodating the electrode assembly therein, and the can comprises a first can and a second can having cylindrical shapes open in a direction facing each other. The insulator insulates an overlapping portion between the first can and the second can. The first can is electrically connected to the first electrode, and the second can is electrically connected to the second electrode. The insulator has a short-circuit induction through-part defined by a through-hole or a cutoff line, such that a short circuit occurs between the first can and the second can through the short-circuit induction through-part when it is deformed in shape as heat or a pressure is applied to contract or expand the insulator.Type: GrantFiled: October 4, 2019Date of Patent: February 27, 2024Assignee: LG Energy Solution, Ltd.Inventors: Gyung Soo Kang, Jee Ho Kim, Yong Tae Lee, Myung Hoon Ko, Jung Il Park, Ki Youn Kim
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Patent number: 11791253Abstract: A display device comprises a pad terminal area and a first circuit board attached to the pad terminal area. The pad terminal area comprises a first pad terminal area having a first pad terminal row of first pad terminals and a second pad terminal area having a second pad terminal row of second pad terminals. The first circuit board comprises a first film having a first lead terminal row of first lead terminals and a second film having a second lead terminal row of second lead terminals. The first lead terminals are connected to the first pad terminals, the second lead terminals are connected to the second pad terminals, an end of the second film protrudes outward from an end of the first film, and the second pad terminal area overlaps an area between the end of the first film and the end of the second film.Type: GrantFiled: August 16, 2021Date of Patent: October 17, 2023Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Seung Jun Lee, Myung Ho Lee
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Publication number: 20230212457Abstract: The present invention relates to a composition for selectively etching silicon on a surface on which a metal film and silicon (Si) are exposed. According to the present invention, it is possible to improve etch selectivity of silicon on the semiconductor surface on which the metal film and silicon are exposed.Type: ApplicationFiled: December 8, 2022Publication date: July 6, 2023Inventors: Jeong Sik OH, Tae Ho KIM, Gi Young KIM, Myung Ho LEE, Myung Geun SONG
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Publication number: 20230196518Abstract: An image processing apparatus includes a discrete wavelet transform (DWT) device that performs DWT and down sampling for a first source image to divide the first source into a low-frequency sub-image including a low-frequency component in a horizontal direction and a vertical direction and a plurality of high-frequency sub-images including a high-frequency component in at least one of the horizontal direction or the vertical direction, a frame memory storing a low-frequency sub-image of a second source image, a first noise reduction device that reduces noise in the low-frequency sub-image of the first source image using the low-frequency sub-image of the second source image, and an inverse discrete wavelet transform (IDWT) device that applies IDWT to the low-frequency sub-image of the first sub-image, which is reduced in noise through the first noise reduction device, and the high-frequency sub-images of the first image to restore the first source image.Type: ApplicationFiled: December 15, 2022Publication date: June 22, 2023Inventors: Myung Ho LEE, Hyun Sik JANG
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Patent number: 11632046Abstract: A power voltage generator includes a booster, a voltage sensor, a constant voltage controller and a constant current controller. The booster is configured to boost an input voltage to an output voltage based on an on-off operation of a switch. The voltage sensor is configured to generate a sensing voltage by sensing the output voltage. The constant voltage controller is configured to generate a first switching signal to control the switch by comparing the sensing voltage with a reference voltage. The constant current controller is configured to generate a gain based on a ratio of an electrode signal of the switch and a target signal by comparing the electrode signal of the switch with the target signal.Type: GrantFiled: May 30, 2022Date of Patent: April 18, 2023Assignee: Samsung Display Co., Ltd.Inventors: Kyun Ho Kim, Jung-taek Kim, Joon Suk Baik, Sang Su Han, Jae Woo Ryu, Myung Ho Lee
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Publication number: 20230092160Abstract: The present invention relates to a composition for selectively etching silicon on a surface on which a metal film and silicon (Si) are exposed. According to the present invention, it is possible to improve etch selectivity of silicon on the semiconductor surface on which the metal film and silicon are exposed.Type: ApplicationFiled: September 6, 2022Publication date: March 23, 2023Inventors: Jeong Sik OH, Tae Ho KIM, Gi young KIM, Myung Ho LEE, Myung Geun SONG, Pilgu KANG, Youngmee KANG, Eunseok OH
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Publication number: 20230086417Abstract: The present invention relates to a composition for treating a semiconductor substrate, and particularly to a composition for treating an edge portion of a wafer coated with polysilazane. According to the composition for treating a semiconductor substrate according to the present invention, it is possible to uniformly maintain the quality of the composition in terms of management and to uniformly treat the boundary of the wafer in terms of processing. In addition, by improving the straightness of the boundary portion where polysilazane is removed, it is possible to significantly reduce the defect rate of the product and to stably improve the productivity yield.Type: ApplicationFiled: July 22, 2022Publication date: March 23, 2023Inventors: Jeong Sik OH, Tae Ho KIM, Gi Young KIM, Myung Ho LEE, Myung Geun SONG
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Publication number: 20230076065Abstract: The present invention relates to a composition for selectively etching silicon on a surface on which a metal film and silicon (Si) are exposed. According to the present invention, it is possible to improve etch selectivity of silicon on the semiconductor surface on which the metal film and silicon are exposed.Type: ApplicationFiled: August 24, 2022Publication date: March 9, 2023Inventors: Gi Young KIM, Tae Ho KIM, Jeong Sik OH, Myung Ho LEE, Myung Geun SONG