Patents by Inventor N. William Parker

N. William Parker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10366860
    Abstract: An x-ray target, a method of using the x-ray target, and a computer program product with instructions for carrying out a method of using the x-ray target. The x-ray target includes a substrate made from a soft x-ray producing material and a high aspect ratio structure made from a hard x-ray producing material. The hard x-ray producing material is embedded in the substrate, formed on the substrate, cantilevered out from the edge of the substrate, or any combination thereof. The high aspect ratio structure comprises a plurality of high aspect ratio structures arranged in one or more grids or arrays, and the high aspect ratio structures in one of the one or more grids or arrays are arranged to form a Hadamard matrix structure.
    Type: Grant
    Filed: February 21, 2018
    Date of Patent: July 30, 2019
    Assignee: FEI Company
    Inventors: N. William Parker, Mark W. Utlaut, Laurens Franz Taemsz Kwakman, Thomas G. Miller
  • Publication number: 20180190467
    Abstract: An x-ray target, a method of using the x-ray target, and a computer program product with instructions for carrying out a method of using the x-ray target. The x-ray target includes a substrate made from a soft x-ray producing material and a high aspect ratio structure made from a hard x-ray producing material. The hard x-ray producing material is embedded in the substrate, formed on the substrate, cantilevered out from the edge of the substrate, or any combination thereof. The high aspect ratio structure comprises a plurality of high aspect ratio structures arranged in one or more grids or arrays, and the high aspect ratio structures in one of the one or more grids or arrays are arranged to form a Hadamard matrix structure.
    Type: Application
    Filed: February 21, 2018
    Publication date: July 5, 2018
    Applicant: FEI Company
    Inventors: N. William Parker, Mark W. Utlaut, Laurens Franz Taemsz Kwakman, Thomas G. Miller
  • Patent number: 9972474
    Abstract: An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding the specimen, and multiple x-ray detectors positioned within the vacuum chamber, at different takeoff angles with respect to the sample's x-ray emission position in the chamber. Takeoff angles are provided to improve the counting efficiency of the various sensors. Multiple detectors of different types may be supported within the vacuum chamber on a mechanical support system, which may be adjustable. A method includes operating the sensors to optimize the time required for accurate x-ray counting by gathering data at the multiple takeoff angles.
    Type: Grant
    Filed: July 31, 2016
    Date of Patent: May 15, 2018
    Assignee: FEI Company
    Inventors: Cornelis van Beek, Frederick H. Schamber, N. William Parker
  • Patent number: 9934930
    Abstract: An x-ray target, a method of using the x-ray target, and a computer program product with instructions for carrying out a method of using the x-ray target. The x-ray target includes a substrate made from a soft x-ray producing material and a high aspect ratio structure made from a hard x-ray producing material. The hard x-ray producing material is embedded in the substrate, formed on the substrate, cantilevered out from the edge of the substrate, or any combination thereof. The high aspect ratio structure comprises a plurality of high aspect ratio structures arranged in one or more grids or arrays, and the high aspect ratio structures in one of the one or more grids or arrays are arranged to form a Hadamard matrix structure.
    Type: Grant
    Filed: March 12, 2015
    Date of Patent: April 3, 2018
    Assignee: FEI Company
    Inventors: N. William Parker, Mark W. Utlaut, Laurens Franz Taemsz Kwakman, Thomas G. Miller
  • Publication number: 20180033589
    Abstract: An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding the specimen, and multiple x-ray detectors positioned within the vacuum chamber, at different takeoff angles with respect to the sample's x-ray emission position in the chamber. Takeoff angles are provided to improve the counting efficiency of the various sensors. Multiple detectors of different types may be supported within the vacuum chamber on a mechanical support system, which may be adjustable. A method includes operating the sensors to optimize the time required for accurate x-ray counting by gathering data at the multiple takeoff angles.
    Type: Application
    Filed: July 31, 2016
    Publication date: February 1, 2018
    Applicant: FEI Company
    Inventors: Frederick H. Schamber, Cornelis van Beek, N. William Parker
  • Patent number: 9767984
    Abstract: A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: September 19, 2017
    Inventors: Kevin Kagarice, Charles Otis, N. William Parker
  • Patent number: 9733164
    Abstract: A system for creating a substantially planar face in a substrate, the system including directing one or more beams at a first surface of a substrate to remove material from a first location, the beam being offset from a normal to the first surface by a curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate about an axis other than an axis normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the curtaining angle; and scanning the one or more beams in across the second surface to mill one or more finishing cuts.
    Type: Grant
    Filed: June 11, 2012
    Date of Patent: August 15, 2017
    Assignee: FEI Company
    Inventors: Andrew B. Wells, N. William Parker, Clive D. Chandler, Mark W. Utlaut
  • Patent number: 9627174
    Abstract: A high brightness ion source with a gas chamber includes multiple channels, wherein the multiple channels each have a different gas. An electron beam is passed through one of the channels to provide ions of a certain species for processing a sample. The ion species can be rapidly changed by directing the electrons into another channel with a different gas species and processing a sample with ions of a second species. Deflection plates are used to align the electron beam into the gas chamber, thereby allowing the gas species in the focused ion beam to be switched quickly.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: April 18, 2017
    Assignee: FEI Company
    Inventors: Gregory A. Schwind, N. William Parker
  • Patent number: 9591735
    Abstract: An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
    Type: Grant
    Filed: June 21, 2012
    Date of Patent: March 7, 2017
    Assignee: FEI COMPANY
    Inventors: Sean Kellogg, Andrew B. Wells, James B. McGinn, N. William Parker, Mark W. Utlaut
  • Patent number: 9494516
    Abstract: A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert “reporter” genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (GoIs), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (PoIs) coded for by the GoIs. One goal of biologists is more precise localization of PoIs within cells. The invention is a method and system for enabling more rapid and precise PoI localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels.
    Type: Grant
    Filed: May 26, 2015
    Date of Patent: November 15, 2016
    Assignee: FEI COMPANY
    Inventors: N. William Parker, Mark W. Utlaut
  • Patent number: 9478390
    Abstract: A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column. The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.
    Type: Grant
    Filed: June 30, 2014
    Date of Patent: October 25, 2016
    Assignee: FEI COMPANY
    Inventors: N. William Parker, Marcus Straw, Jorge Filevich, Aurelien Philippe Jean Maclou Botman, Steven Randolph, Clive Chandler, Mark Utlaut
  • Patent number: 9349564
    Abstract: A transmissive lens in a charged particle beam column for detecting X-rays and light is provided. The final lens may include elements that are transmissive for X-rays for EDS imaging and analysis or elements that are transmissive for light for cathodoluminescent (CL) imaging and analysis. The final lens may be constructed and arranged to include elements that are transmissive for both X-rays and light for combined EDS and CL imaging and analysis.
    Type: Grant
    Filed: July 17, 2014
    Date of Patent: May 24, 2016
    Assignee: FEI Company
    Inventors: N. William Parker, Marcus Straw, Jorge Filevich
  • Publication number: 20160104599
    Abstract: A high brightness ion source with a gas chamber includes multiple channels, wherein the multiple channels each have a different gas. An electron beam is passed through one of the channels to provide ions of a certain species for processing a sample. The ion species can be rapidly changed by directing the electrons into another channel with a different gas species and processing a sample with ions of a second species. Deflection plates are used to align the electron beam into the gas chamber, thereby allowing the gas species in the focused ion beam to be switched quickly.
    Type: Application
    Filed: December 17, 2015
    Publication date: April 14, 2016
    Applicant: FEI Company
    Inventors: Gregory A. Schwind, N. William Parker
  • Publication number: 20160093470
    Abstract: A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.
    Type: Application
    Filed: September 30, 2014
    Publication date: March 31, 2016
    Applicant: FEI Company
    Inventors: Kevin Kagarice, Charles Otis, N. William Parker
  • Publication number: 20160032281
    Abstract: A functionalized specimen support for use in charged particle microscopy is provided that includes a specimen support surface configured to support specimens during an interrogation of the specimens with a charged particle microscope, the specimen support surface having functionalized sites, each functionalized site configured to maintain position of a portion of one of the specimens at the functionalized site by way of attachment, attraction, or a combination thereof.
    Type: Application
    Filed: July 31, 2014
    Publication date: February 4, 2016
    Applicant: FEI Company
    Inventors: Mark Utlaut, N. William Parker
  • Publication number: 20160020062
    Abstract: A transmissive lens in a charged particle beam column for detecting X-rays and light is provided. The final lens may include elements that are transmissive for X-rays for EDS imaging and analysis or elements that are transmissive for light for cathodoluminescent (CL) imaging and analysis. The final lens may be constructed and arranged to include elements that are transmissive for both X-rays and light for combined EDS and CL imaging and analysis.
    Type: Application
    Filed: July 17, 2014
    Publication date: January 21, 2016
    Applicant: FEI Company
    Inventors: N. William Parker, Marcus Straw, Jorge Filevich
  • Publication number: 20150380205
    Abstract: A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.
    Type: Application
    Filed: June 30, 2014
    Publication date: December 31, 2015
    Applicant: FEI Company
    Inventors: N. William Parker, Mark Straw, Jorge Filevich, Aurelien Philippe Jean Maclou Botman, Steven Randolph, Clive Chandler, Mark Utlaut
  • Patent number: 9224569
    Abstract: A high brightness ion source with a gas chamber includes multiple channels, wherein the multiple channels each have a different gas. An electron beam is passed through one of the channels to provide ions of a certain species for processing a sample. The ion species can be rapidly changed by directing the electrons into another channel with a different gas species and processing a sample with ions of a second species. Deflection plates are used to align the electron beam into the gas chamber, thereby allowing the gas species in the focused ion beam to be switched quickly.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: December 29, 2015
    Assignee: FEI Company
    Inventors: Gregory A. Schwind, N. William Parker
  • Patent number: 9204036
    Abstract: An apparatus to permit a viewer of a digital microscopy original image to manipulate the display and/or the microscope to obtain an enhanced view of a region of interest within the original image. In one preferred embodiment a spotlight mode matches the gray shade scale for a spotlight region-of-interest to the pixel intensity variation present in the spotlight region. The gray shade scale used for the spotlight mode may then be generalized to the original image. In a preferred embodiment, spotlight mode provides an easy mechanism for permitting a user to command a re-imaging of a selected spotlight region from a displayed image. Such re-imaging may permit the use of imaging parameter selections that better fit the spotlight region.
    Type: Grant
    Filed: January 18, 2013
    Date of Patent: December 1, 2015
    Assignee: FEI Company
    Inventors: Alan Bahm, N. William Parker, Mark W. Utlaut
  • Publication number: 20150303021
    Abstract: An x-ray target, a method of using the x-ray target, and a computer program product with instructions for carrying out a method of using the x-ray target. The x-ray target includes a substrate made from a soft x-ray producing material and a high aspect ratio structure made from a hard x-ray producing material. The hard x-ray producing material is embedded in the substrate, formed on the substrate, cantilevered out from the edge of the substrate, or any combination thereof. The high aspect ratio structure comprises a plurality of high aspect ratio structures arranged in one or more grids or arrays, and the high aspect ratio structures in one of the one or more grids or arrays are arranged to form a Hadamard matrix structure.
    Type: Application
    Filed: March 12, 2015
    Publication date: October 22, 2015
    Applicant: FEI Company
    Inventors: N. William Parker, Mark W. Utlaut, Laurens Franz Taemsz Kwakman, Thomas G. Miller