Patents by Inventor N. William Parker
N. William Parker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20130134855Abstract: An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.Type: ApplicationFiled: November 30, 2011Publication date: May 30, 2013Applicant: FEI CompanyInventors: Sean Kellogg, Anthony Graupera, N. William Parker, Andrew B. Wells, Mark W. Utlaut, Walter Skoczylas, Gregory A. Schwind, Shouyin Zhang, Noel Smith
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Publication number: 20130112890Abstract: A multi-element electrostatic chicane energy filter, with the addition of electrostatic quadrupole and hexapole excitations to the dipole elements. A charged particle energy filter according to the present invention with a combination of dipole, quadrupole, and hexapole elements capable of producing a line focus at an aperture reduces space-charge effects and aperture damage. A preferred embodiment allows the filter to act as a conjugate blanking system. The energy filter is capable of narrowing the energy spread to result in a smaller beam.Type: ApplicationFiled: August 31, 2012Publication date: May 9, 2013Applicant: FEI COMPANYInventors: N. William Parker, Wesley Hughes
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Publication number: 20130015765Abstract: An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.Type: ApplicationFiled: July 13, 2011Publication date: January 17, 2013Applicant: FEI CompanyInventors: Anthony Graupera, Sean Kellogg, Mark W. Utlaut, N. William Parker
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Publication number: 20120305127Abstract: A method and structure are described for preventing the accidental introduction of gasoline into the fuel system of a diesel-powered vehicle. In a first preferred embodiment, a gasoline fuel nozzle is configured with a magnet, such as magnetic strips, and the entrance to a fill tube of a diesel-powered is configured with a magnetic field sensor ring. When an incorrect fueling operation, such as the introduction of gasoline into the fuel tank of the diesel-powered vehicle, is attempted the sensor ring alerts the operator visually and/or audibly before fueling starts, thereby preventing incorrect fueling. In alternative embodiments, sensing of an attempted incorrect fueling operation may require only the sensor ring.Type: ApplicationFiled: June 3, 2011Publication date: December 6, 2012Inventors: Curtis Roys, N. William Parker
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Patent number: 8319181Abstract: A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert “reporter” genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (GoIs), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (PoIs) coded for by the GoIs. One goal of biologists is more precise localization of PoIs within cells. The invention is a method and system for enabling more rapid and precise PoI localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels.Type: GrantFiled: January 30, 2011Date of Patent: November 27, 2012Assignee: FEI CompanyInventors: N. William Parker, Mark W. Utlaut
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Patent number: 8314410Abstract: A combined laser and charged particle beam system. A pulsed laser enables milling of a sample at material removal rates several orders of magnitude larger than possible for a focused ion beam. In some embodiments, a scanning electron microscope enables high resolution imaging of the sample during laser processing. In some embodiments, a focused ion beam enables more precise milling of the sample. A method and structure for deactivating the imaging detectors during laser milling enables the removal of imaging artifacts arising from saturation of the detector due to a plasma plume generated by the laser beam. In some embodiments, two types of detectors are employed: type-1 detectors provide high gain imaging during scanning of the sample with an electron or ion beam, while type-2 detectors enable lower gain imaging and endpoint detection during laser milling.Type: GrantFiled: April 7, 2011Date of Patent: November 20, 2012Assignee: FEI CompanyInventors: Marcus Straw, Mark W. Utlaut, N. William Parker
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Patent number: 8294093Abstract: An E×B Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.Type: GrantFiled: April 19, 2011Date of Patent: October 23, 2012Assignee: FEI CompanyInventors: David Tuggle, N. William Parker
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Publication number: 20120261566Abstract: A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.Type: ApplicationFiled: April 19, 2011Publication date: October 18, 2012Applicant: FEI CompanyInventors: David Tuggle, N. William Parker, Mark W. Utlaut
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Publication number: 20120261587Abstract: An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.Type: ApplicationFiled: April 2, 2012Publication date: October 18, 2012Applicant: FEI CompanyInventors: Sean Kellogg, N. William Parker, Mark W. Utlaut, Anthony Graupera
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Publication number: 20120261565Abstract: An ExB Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.Type: ApplicationFiled: April 19, 2011Publication date: October 18, 2012Applicant: FEI CompanyInventors: David Tuggle, N. William Parker
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Patent number: 8283629Abstract: A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.Type: GrantFiled: April 19, 2011Date of Patent: October 9, 2012Assignee: FEI CompanyInventors: David Tuggle, N. William Parker, Mark W. Utlaut
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Patent number: 8242457Abstract: A charged particle shaped beam column includes: a charged particle source; a gun lens configured to provide a charged particle beam approximately parallel to the optic axis of the column; an objective lens configured to form the charged particle shaped beam on the surface of a substrate, wherein the disk of least confusion of the objective lens does not coincide with the surface of the substrate; an optical element with 8N poles disposed radially symmetrically about the optic axis of the column, the optical element being positioned between the condenser lens and the objective lens, wherein N is an integer greater than or equal to 1; and a power supply configured to apply excitations to the 8N poles of the optical element to provide an octupole electromagnetic field. The octupole electromagnetic field is configured to induce azimuthally-varying third-order deflections to the beam trajectories passing through the 8N-pole optical element.Type: GrantFiled: March 17, 2008Date of Patent: August 14, 2012Assignees: Multibeam Corporation, Tokyo Electron LimitedInventor: N. William Parker
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Publication number: 20120193530Abstract: A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert “reporter” genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (GoIs), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (PoIs) coded for by the GoIs. One goal of biologists is more precise localization of PoIs within cells. The invention is a method and system for enabling more rapid and precise PoI localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels.Type: ApplicationFiled: January 30, 2011Publication date: August 2, 2012Applicant: FEI COMPANYInventors: N. William Parker, Mark W. Utlaut
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Publication number: 20120168638Abstract: A charged particle source for a focused particle beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), scanning electron microscope (SEM), or focused ion beam (FIB) system is disclosed. The source employs a multiplicity of independently-addressable emitters within a small region which can be centered on the axis of the charged particle system. All of the emitters may be individually controlled to enable emission from one or more tips simultaneously. A mode with only one emitter activated corresponds to high brightness, while modes with multiple emitters simultaneously activated provides high angular intensities with lower brightness. Source lifetimes can be extended through sequential use of single emitters. A combined mechanical and electrical alignment procedure for all emitters is described.Type: ApplicationFiled: December 30, 2011Publication date: July 5, 2012Applicant: FEI COMPANYInventor: N. William Parker
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Patent number: 8137048Abstract: A robot assembly for transferring substrates includes a central tube assembly oriented along a central axis, perpendicular to a substrate transfer plane, and having an inner surface that forms part of a first enclosure at a first pressure, and an outer surface that forms part of a second enclosure at a second, different pressure. The robot assembly further includes a transfer robot which itself includes multiple rotor assemblies, each configured to rotate parallel to the substrate transfer plane. The various rotor assemblies are organized in pairs, each pair having one rotor fitted with a telescoping support arm/end effector arrangement to support substrates thereon, and the other rotor fitted with inner and outer actuator arms that cooperate to effect radial movement of the corresponding end effector of the paired rotor assembly. Each rotor is controlled to effect the transfer of substrates within a wafer processing system asynchronously and at differing heights.Type: GrantFiled: September 27, 2007Date of Patent: March 20, 2012Assignee: VSERV TechnologiesInventors: Mahendran Chidambaram, Quoc Truong, Jerry Schock, N. William Parker
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Publication number: 20110272592Abstract: An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.Type: ApplicationFiled: June 21, 2011Publication date: November 10, 2011Applicant: FEI CompanyInventors: Sean Kellogg, Andrew B. Wells, James B. McGinn, N. William Parker, Mark W. Utlaut, Anthony Graupera
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Publication number: 20110248164Abstract: A combined laser and charged particle beam system. A pulsed laser enables milling of a sample at material removal rates several orders of magnitude larger than possible for a focused ion beam. In some embodiments, a scanning electron microscope enables high resolution imaging of the sample during laser processing. In some embodiments, a focused ion beam enables more precise milling of the sample. A method and structure for deactivating the imaging detectors during laser milling enables the removal of imaging artifacts arising from saturation of the detector due to a plasma plume generated by the laser beam. In some embodiments, two types of detectors are employed: type-1 detectors provide high gain imaging during scanning of the sample with an electron or ion beam, while type-2 detectors enable lower gain imaging and endpoint detection during laser milling.Type: ApplicationFiled: April 7, 2011Publication date: October 13, 2011Applicant: FEI COMPANYInventors: Marcus Straw, Mark W. Utlaut, N. William Parker
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Patent number: 7941237Abstract: A flat panel display substrate (FPDS) testing system configured such that prior to testing, the FPDS is loaded into a pallet to prevent breakage, and to provide electrical connections to test pads on the FPDS. The system achieves high throughput by testing FPDSs using one or more charged particle beams simultaneously with the following operations: unloading of already-tested substrates, loading of substrates ready for testing, assembly of pallets, and alignment of electrical contactors to a large number of FPDS test pads. The system design eliminates a prior art X-Y stage, and all moving electrical connections to the FPDS during testing, reducing costs and improving reliability. In one embodiment, the FPDS testing system has three subsystems: a process chamber, loadlock assembly, and pallet elevator; in another embodiment, the functions of loadlock and pallet elevator are combined to reduce system footprint.Type: GrantFiled: April 19, 2006Date of Patent: May 10, 2011Assignee: Multibeam CorporationInventors: N. William Parker, S. Daniel Miller, Tirunelveli S. Ravi
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Patent number: 7928404Abstract: The invention provides methods for conjugate blanking of a charged particle beam within a charged particle column using a beam blanker. The beam blanker comprises a first deflector, a second deflector and a blanking aperture, the first deflector being positioned between a gun lens and a main lens, the second deflector being positioned between the first deflector and the main lens, the blanking aperture being positioned between the second deflector and the main lens, and the first deflector, the second deflector and the blanking aperture being aligned on the optical axis of the column.Type: GrantFiled: May 13, 2008Date of Patent: April 19, 2011Assignee: Multibeam CorporationInventor: N. William Parker
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Patent number: 7786454Abstract: A direct-write electron beam lithography system employing a patterned beam-defining aperture to enable the generation of high current-density shaped beams without the need for multiple beam-shaping apertures, lenses and deflectors is disclosed. Beam blanking is accomplished without the need for an intermediate crossover between the electron source and the wafer being patterned by means of a double-deflection blanker, which also facilitates proximity effect correction. A simple type of “moving lens” is utilized to eliminate off-axis aberrations in the shaped beam. A method for designing the patterned beam-defining aperture is also disclosed.Type: GrantFiled: September 12, 2008Date of Patent: August 31, 2010Assignees: Tokyo Electron Limited, Multibeam Systems Inc.Inventor: N. William Parker