Patents by Inventor Nag B. Patibandla

Nag B. Patibandla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10821573
    Abstract: Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.
    Type: Grant
    Filed: October 19, 2015
    Date of Patent: November 3, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Rajeev Bajaj, Daniel Redfield, Mahendra C. Orilall, Boyi Fu, Aniruddh Khanna, Jason G. Fung, Mario Cornejo, Ashwin Chockalingam, Mayu Yamamura, Veera Raghava Reddy Kakireddy, Ashavani Kumar, Venkat Hariharan, Gregory E. Menk, Fred C. Redeker, Nag B. Patibandla, Hou T. Ng, Robert E. Davenport, Amritanshu Sinha
  • Publication number: 20200325353
    Abstract: Polishing articles and methods of manufacturing polishing articles used in polishing processes and cleaning processes are provided. More particularly, implementations disclosed herein relate to composite polishing articles having tunable properties such as hydrophilicity and zeta potential. 3D printed chemical-mechanical planarization (CMP) pads composed of UV curable acrylic chemistry are generally hydrophobic in nature. Such hydrophobic behavior affects the wetting properties with abrasive-based polishing slurries such as ceria-base slurries. However, in order to increase the planarization and removal rate while decreasing defects, hydrophilic pads are preferred. In addition, it is desirable that the zeta potential (Zp) of the pads be tunable over a wide range of conditions at different pH values. Implementations of the present disclosure include methods for increasing the hydrophilicity and tuning the Zp of the pads with anionic additives and pads produced using these methods.
    Type: Application
    Filed: October 30, 2019
    Publication date: October 15, 2020
    Inventors: Uma SRIDHAR, Sivapackia GANAPATHIAPPAN, Ashwin CHOCKALINGAM, Yingdong LUO, Daniel REDFIELD, Rajeev BAJAJ, Nag B. PATIBANDLA, Hou T. NG, Sudhakar MADHUSOODHANAN
  • Patent number: 10800103
    Abstract: An additive manufacturing apparatus includes a platform, a dispenser to dispense a plurality of layers of feed material on a top surface of the platform, and an energy delivery assembly. The energy delivery assembly includes a light source to emit one or more light beams, a first reflective member having a plurality of reflective facets, and at least one second reflective member. The first reflective member is rotatable such that sequential facets sweep the light beam sequentially along a path on the uppermost layer. The at least one second reflective member is movable such that the at least one second reflective surface is repositionable to receive at least one of the at least one light beam and redirect the at least one of at least one light beam along a two-dimensional path on the uppermost layer.
    Type: Grant
    Filed: November 13, 2017
    Date of Patent: October 13, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Hou T. Ng, Nag B. Patibandla, Ajey M. Joshi, Raanan Zehavi, Jeffrey L. Franklin, Kashif Maqsood
  • Publication number: 20200303616
    Abstract: A physical vapor deposition system includes a chamber, three target supports to targets, a movable shield positioned having an opening therethrough, a workpiece support to hold a workpiece in the chamber, a gas supply to deliver nitrogen gas and an inert gas to the chamber, a power source, and a controller. The controller is configured to move the shield to position the opening adjacent each target in turn, and at each target cause the power source to apply power sufficient to ignite a plasma in the chamber to cause deposition of a buffer layer, a device layer of a first material that is a metal nitride suitable for use as a superconductor at temperatures above 8° K on the buffer layer, and a capping layer, respectively.
    Type: Application
    Filed: March 18, 2020
    Publication date: September 24, 2020
    Inventors: Mingwei Zhu, Zihao Yang, Nag B. Patibandla, Ludovic Godet, Yong Cao, Daniel Lee Diehl, Zhebo Chen
  • Publication number: 20200299830
    Abstract: A structure including a metal nitride layer is formed on a workpiece by pre-conditioning a chamber that includes a metal target by flowing nitrogen gas and an inert gas at a first flow rate ratio into the chamber and igniting a plasma in the chamber before placing the workpiece in the chamber, evacuating the chamber after the preconditioning, placing the workpiece on a workpiece support in the chamber after the preconditioning, and performing physical vapor deposition of a metal nitride layer on the workpiece in the chamber by flowing nitrogen gas and the inert gas at a second flow rate ratio into the chamber and igniting a plasma in the chamber. The second flow rate ratio is less than the first flow rate ratio.
    Type: Application
    Filed: March 18, 2020
    Publication date: September 24, 2020
    Inventors: Mingwei Zhu, Zihao Yang, Nag B. Patibandla, Ludovic Godet, Yong Cao, Daniel Lee Diehl, Zhebo Chen
  • Patent number: 10780497
    Abstract: An additive manufacturing apparatus for forming a part includes a support, a first dispenser to deliver a layer of first particles on a support or an underlying layer on the support, a second dispenser to deliver second particles onto the layer of first particles such that the second particles infiltrate into the layer of first particles, an energy source to fuse the first particle and second particles to form a fused layer of the part, and a controller coupled to the first dispenser, second dispenser and energy source.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: September 22, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Hou T. Ng, Nag B. Patibandla, Ajey M. Joshi, Ashavani Kumar, Kasiraman Krishnan
  • Patent number: 10773509
    Abstract: A method and apparatus for manufacturing polishing articles used in polishing processes are provided. In one implementation, a method of forming a polishing pad is provided. The method comprises depositing an uncured first layer of a pad forming photopolymer on a substrate. The method further comprises positioning a first optical mask over the first layer of the uncured pad forming photopolymer. The first optical mask includes a patterned sheet of material having at least one aperture. The method further comprises exposing the uncured first layer of the pad forming photopolymer to electromagnetic radiation to selectively polymerize exposed portions of the uncured first layer of the pad forming photopolymer to form pad-supporting structures within the first layer of pad forming photopolymer.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: September 15, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Hou T. Ng, Nag B. Patibandla, Rajeev Bajaj, Daniel Redfield, Ashwin Chockalingam, Mayu Yamamura, Mario Cornejo
  • Patent number: 10758978
    Abstract: An additive manufacturing apparatus includes a platform, one or more supports positioned above the platform, an actuator, a first powder dispenser that is attached to and moves with a first support from the one or more supports and is configured to selectively dispense a first powder onto the build area, a first binder material dispenser configured to selectively dispense a first binder material on a voxel-by-voxel basis to an uppermost layer of powder in the build area to form a volume of the layer having powder and binder material and corresponding to a cross-sectional portion of a part being built, a third dispensing system configured to deliver a densification material to the layer of powder or the combined layer of powder and binder material, and an energy source configured to emit radiation toward the platform so as to solidify the binder material.
    Type: Grant
    Filed: March 21, 2018
    Date of Patent: September 1, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Hou T. Ng, Nag B. Patibandla, Daihua Zhang
  • Patent number: 10730240
    Abstract: An additive manufacturing apparatus includes a platform, a dispenser to dispense a plurality of layers of feed material on a top surface of the platform, and an energy delivery system. The energy deliver system includes a light source to emit a light beam, and a reflective member having a plurality of reflective facets. The reflective member is positioned in a path of the light beam to receive the light beam and redirect the light beam toward the top surface of the platform to deliver energy to an uppermost layer of the layers of feed material to fuse the feed material. The reflective member is rotatable such that sequential facets sweep the light beam sequentially along a path on the uppermost layer.
    Type: Grant
    Filed: November 13, 2017
    Date of Patent: August 4, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Hou T. Ng, Nag B. Patibandla, Ajey M. Joshi, Raanan Zehavi, Jeffrey L. Franklin, Kashif Maqsood
  • Patent number: 10717265
    Abstract: An additive manufacturing system includes a platen having a top surface to support an object being manufactured, a support structure, an actuator coupled to at least one of the platen or the support structure to create relative motion there between along a first axis parallel to the top surface, a plurality of printheads mounted on the support structure, and an energy source. Each printhead includes a dispenser to deliver a plurality of successive layers of feed material over the platen. The printheads are spaced along a second axis perpendicular to the first axis such that during motion along the first axis the plurality of printheads dispense feed material in a plurality of parallel swaths along the first axis. The energy source is configured to fuse at least a portion of the feed material.
    Type: Grant
    Filed: September 15, 2016
    Date of Patent: July 21, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Hou T. Ng, Raanan Zehavi, Nag B. Patibandla
  • Publication number: 20200227294
    Abstract: A method and apparatus for forming an optical stack having uniform and accurate layers is provided. A processing tool used to form the optical stack comprises, within an enclosed environment, a first transfer chamber, an on-board metrology unit, and a second transfer chamber. A first plurality of processing chambers is coupled to the first transfer chamber or the second transfer chamber. The on-board metrology unit is disposed between the first transfer chamber and the second transfer chamber. The on-board metrology unit is configured to measure one or more optical properties of the individual layers of the optical stack without exposing the layers to an ambient environment.
    Type: Application
    Filed: January 16, 2019
    Publication date: July 16, 2020
    Inventors: Mingwei ZHU, Zihao YANG, Nag B. PATIBANDLA, Daniel DIEHL, Yong CAO, Weimin ZENG, Renjing ZHENG, Edward BUDIARTO, Surender Kumar GURUSAMY, Todd EGAN, Niranjan R. KHASGIWALE
  • Publication number: 20200207071
    Abstract: An additive manufacturing apparatus includes a dispensing system positionable over a platen to deliver a powder, an actuator to move the dispensing system along a scan axis, and an energy source to fuse a portion of the powder. The dispensing system has a hopper to hold the powder and a dispenser. The dispenser includes a channel extending along a longitudinal axis from a proximal end to a distal end. The proximal end of the channel of the dispenser is configured to receive the powder from the powder source. A powder conveyor is positioned within the channel to move the powder from the proximal end along a length of the channel, and a plurality of apertures are arranged along the longitudinal axis of the channel. The dispenser is configured such that flow of powder through each aperture is independently controllable.
    Type: Application
    Filed: March 5, 2020
    Publication date: July 2, 2020
    Inventors: Hou T. Ng, Raanan Zehavi, Nag B. Patibandla
  • Patent number: 10692923
    Abstract: An apparatus for positioning micro-devices on a substrate includes one or more supports to hold a donor substrate and a destination substrate, an adhesive dispenser to deliver adhesive on micro-devices on the donor substrate, a transfer device including a transfer surface to transfer the micro-devices from the donor substrate to the destination substrate, and a controller. The controller is configured to operate the adhesive dispenser to selectively dispense the adhesive onto selected micro-devices on the donor substrate based on a desired spacing of the selected micro-devices on the destination substrate. The controller is configured to operate the transfer device such that the transfer surface engages the adhesive on the donor substrate to cause the selected micro-devices to adhere to the transfer surface and the transfer surface then transfers the selected micro-devices from the donor substrate to the destination substrate.
    Type: Grant
    Filed: June 27, 2018
    Date of Patent: June 23, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Mingwei Zhu, Sivapackia Ganapathiappan, Boyi Fu, Hou T. Ng, Nag B. Patibandla
  • Patent number: 10668533
    Abstract: An additive manufacturing system includes a platen having a top surface to support an object being manufactured, a feed material dispenser to deliver a plurality of successive layers of feed material over the platen, an energy source positioned above the platen to fuse at least a portion of an outermost layer of feed material, and a coolant fluid dispenser to deliver a coolant fluid onto the outermost layer of feed material after at least a portion of the outermost layer has been fused.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: June 2, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Hou T. Ng, Nag B. Patibandla, Ajey M. Joshi, Bharath Swaminathan, Ashavani Kumar, Eric Ng, Bernard Frey, Kasiraman Krishnan
  • Publication number: 20200147750
    Abstract: Embodiments of the disclosure generally provide polishing pads having a composite pad body and methods for forming the polishing pads. In one embodiment, the composite pad body includes one or more first features formed from a first material or a first composition of materials, and one or more second features formed from a second material or a second composition of materials, wherein the one or more first features and the one or more second features are formed by depositing a plurality of layers comprising the first material or first composition of materials and second material or second composition of materials.
    Type: Application
    Filed: January 17, 2020
    Publication date: May 14, 2020
    Inventors: Rajeev BAJAJ, Kasiraman KRISHNAN, Mahendra C. ORILALL, Daniel REDFIELD, Fred C. REDEKER, Nag B. PATIBANDLA, Gregory E. MENK, Jason G. FUNG, Russell Edward PERRY, Robert E. DAVENPORT
  • Publication number: 20200127164
    Abstract: Oxygen controlled PVD AlN buffers for GaN-based optoelectronic and electronic devices is described. Methods of forming a PVD AlN buffer for GaN-based optoelectronic and electronic devices in an oxygen controlled manner are also described. In an example, a method of forming an aluminum nitride (AlN) buffer layer for GaN-based optoelectronic or electronic devices involves reactive sputtering an AlN layer above a substrate, the reactive sputtering involving reacting an aluminum-containing target housed in a physical vapor deposition (PVD) chamber with a nitrogen-containing gas or a plasma based on a nitrogen-containing gas. The method further involves incorporating oxygen into the AlN layer.
    Type: Application
    Filed: December 19, 2019
    Publication date: April 23, 2020
    Inventors: Mingwei Zhu, Nag B. Patibandla, Rongjun Wang, Daniel Lee Diehl, Vivek Agrawal, Anantha Subramani
  • Patent number: 10625338
    Abstract: Additive manufacturing of an object includes dispensing a plurality of successive layers of powder over a top surface of a platform, fusing an object region in each of the plurality of successive layers to form the object, and fusing a brace region in a particular layer from the plurality of layers to form a brace structure to inhibit lateral motion of the powder. The brace structure is spaced apart from the particular object region by a gap of unfused powder.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: April 21, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Hou T. Ng, Nag B. Patibandla, Ajey M. Joshi, Bharath Swaminathan, Ashavani Kumar, Eric Ng, Bernard Frey, Kasiraman Krishnan
  • Publication number: 20200101657
    Abstract: A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.
    Type: Application
    Filed: December 2, 2019
    Publication date: April 2, 2020
    Inventors: Kasiraman KRISHNAN, Daniel REDFIELD, Russell Edward PERRY, Gregory E. MENK, Rajeev BAJAJ, Fred C. REDEKER, Nag B. PATIBANDLA, Mahendra C. ORILALL, Jason G. FUNG
  • Patent number: 10603892
    Abstract: An additive manufacturing apparatus includes a dispensing system positionable over a platen to deliver a powder, an actuator to move the dispensing system along a scan axis, and an energy source to fuse a portion of the powder. The dispensing system has a hopper to hold the powder and a dispenser. The dispenser includes a channel extending along a longitudinal axis from a proximal end to a distal end. The proximal end of the channel of the dispenser is configured to receive the powder from the powder source. A powder conveyor is positioned within the channel to move the powder from the proximal end along a length of the channel, and a plurality of apertures are arranged along the longitudinal axis of the channel. The dispenser is configured such that flow of powder through each aperture is independently controllable.
    Type: Grant
    Filed: June 13, 2019
    Date of Patent: March 31, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Hou T. Ng, Raanan Zehavi, Nag B. Patibandla
  • Patent number: 10596763
    Abstract: An additive manufacturing apparatus includes a platform, a first support, a first actuator to create relative motion along a first axis such that the first support scans across the platform, one or more printheads supported on the first support above the platform and configured to dispense successive layers of feed material to form a polishing pad, a second support, a second actuator to create relative motion along a second axis substantially perpendicular to the first axis such that the second support scans across the platform in a direction perpendicular to the first axis, and a plurality of individually addressable energy sources supported on the second support above the platform, and a controller. The energy sources are arranged in an array that extends at least along the first axis and configured to emit radiation toward the platform.
    Type: Grant
    Filed: November 10, 2017
    Date of Patent: March 24, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Hou T. Ng, Nag B. Patibandla, Sivapackia Ganapathiappan