Patents by Inventor Nan Lin

Nan Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260202751
    Abstract: A method and device for generating extreme ultraviolet lithography light source, where the method comprises generating micron-thick, uniform, and stable metallic liquid film target material in vacuum environment, and using focused 2-micron wavelength laser beam to irradiate target material to produce extreme ultraviolet (EUV) light; the device comprises 2-micron solid-state laser module, liquid film generation and maintenance module, laser focusing and energy coupling module, and EUV light collection and transmission module. Two-micron solid-state laser module is used to irradiate metallic liquid film target to generate EUV light. Liquid film generation and maintenance module ensures uniform and stable micron-thick metallic liquid film through precise temperature and flow control. Laser focusing and energy coupling module adjusts spatiotemporal distribution of laser pulses to facilitate efficient absorption of driving energy by liquid film target.
    Type: Application
    Filed: July 18, 2025
    Publication date: July 16, 2026
    Inventors: Nan LIN, Yunjie ZHANG
  • Patent number: 12683099
    Abstract: This application relates to electrocardiogram (ECG) button assemblies and electronic devices. An example ECG button assembly includes a button part, a plastic tube, a metal tube, an elastic piece, and a conductive sheet. The housing is provided with a via hole, and the plastic tube is embedded in the via hole. A first through hole is provided at an interior of the plastic tube, the metal tube is embedded in the first through hole, the conductive sheet is connected to one end that is of the metal tube and that is located at an interior of the housing, and the conductive sheet is in contact with and electrically connected to a circuit board.
    Type: Grant
    Filed: October 31, 2023
    Date of Patent: July 14, 2026
    Assignee: Huawei Technologies Co., LTD.
    Inventors: Kemin Zhang, Menglong Zhao, Qian He, Wenjian Yang, Zhuang Liu, Nan Lin
  • Patent number: 12681204
    Abstract: A multi-sector data correction method for gamma imaging while drilling includes the steps of: (a) dividing each gamma imaging sector into a plurality of counting zones; (b) counting a number of valid counting pulses for each counting zone at a predetermined time interval during MWD; (c) constructing a plurality of measurement vectors based on a value of recording times of each counting zone; (d) establishing a correction matrix with a conditional number less than a set value through an optimization algorithm; and (e) calculating a gamma intensity of each measured sector with the plurality of measurement vectors and the correction matrix as constructed, so as to complete the correction on the measurement data of each measured sector for each predetermined time interval. This method eliminate problems such as rotational measurement distortion of the gamma imaging while drilling tool and improve the accuracy of calculating the formation dip angle.
    Type: Grant
    Filed: October 15, 2021
    Date of Patent: July 14, 2026
    Assignees: CHINA PETROLEUM & CHEMICAL CORPORATION, SINOPEC PETROLEUM ENGINEERING TECHNOLOGY SERVICE CO., LTD, SINOPEC SHENGLI PETROLEUM ENGINEERING CO., LTD, SINOPEC MATRIX CORPORATION, GEOSTEERING & LOGGING RESEARCH INSTITUTE, SINOPEC MATRIX CORPORATION
    Inventors: Luyang Ding, Ningning Yang, Haiquan Tang, Xizhou Wang, Zhen Yang, Nan Lin, Mingquan Huang, Qinglong Liu, Quanjin Yang, Xiaolin Zhang, Zhiyong Zhang, Chuntian Han, Hai Ma, Xiaohui Cui, Chao Lu, Xin Cheng
  • Publication number: 20260180594
    Abstract: A data-compression determining and processing method for resistivity logging includes steps of determining logging requirements, and collecting downhole data to be processed by a resistivity logging device; and selecting a compression processing approach based on compression requirements, so as to compress the downhole data to be processed. A two-segment data processing approach is selected when a required compression ratio is less than a preset compression ratio, and a three-segment data processing approach is selected when the required compression ratio is larger than or equal to the preset compression ratio. This method performs targeted compression for different types of data obtained in logging operations.
    Type: Application
    Filed: October 25, 2023
    Publication date: June 25, 2026
    Inventors: Baizhi WU, Shouwei ZHANG, Xili XI, Zhen YANG, Tongzheng GUO, Shugang HOU, Defu ZANG, Nan LIN
  • Patent number: 12663370
    Abstract: Disclosed is a metrology apparatus and method for measurement of a diffractive structure on a substrate. The metrology apparatus comprises a radiation source operable to provide first radiation for excitation of the diffractive structure such that high harmonic second radiation is generated from said diffractive structure and/or substrate; and a detection arrangement operable to detect said second radiation, at least a portion of which having been diffracted by said diffractive structure.
    Type: Grant
    Filed: October 12, 2021
    Date of Patent: June 23, 2026
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Michael Kraus, Sylvianne Dorothea Christina Roscam Abbing, Filippo Campi, ZhuangYan Zhang, Petrus Wilhelmus Smorenburg, Nan Lin, Stefan Michiel Witte, Arie Jeffrey Den Boef
  • Publication number: 20260153835
    Abstract: A method for preparing a polarization volume holographic grating capable of achieving different diffraction efficiencies includes: coating a top surface of a substrate medium with a photo-alignment layer; covering a top surface of the photo-alignment layer with a mask, and performing interference exposure using two orthogonal circularly-polarized beams; removing the mask, and then coating the top surface of the photo-alignment layer with a layer of liquid crystal solution of a preset concentration; placing the liquid crystal solution into a nitrogen environment, and curing the liquid crystal solution under UV irradiation to obtain a liquid crystal film; removing a disordered liquid crystal film in a non-grating region on the substrate medium using a laser cleaning device, so as to obtain a PVG; and covering a surface of the PVG with a graded-UV-transmittance filter, and exposing the grating through the filter to UV light to obtain PVG regions.
    Type: Application
    Filed: January 27, 2026
    Publication date: June 4, 2026
    Applicant: SOUTHEAST UNIVERSITY
    Inventors: Nan LIN, Yuning Zhang, Yishi Weng, Chuang Wang, Yuchen Gu, Ran Wei
  • Patent number: 12624940
    Abstract: Disclosed is an illumination source comprising a gas delivery system being configured to provide a gas target for generating an emitted radiation at an interaction region of the gas target, and an interferometer for illuminating at least part of the gas target with an interferometer radiation to measure a property of the gas target.
    Type: Grant
    Filed: June 14, 2021
    Date of Patent: May 12, 2026
    Assignee: ASML Netherlands B. V.
    Inventors: Wenjie Jin, Petrus Wilhelmus Smorenburg, Nan Lin, Christina Lynn Porter, David O'Dwyer, Cord Louis Arnold, Sjoerd Nicolaas Lambertus Donders
  • Publication number: 20260093173
    Abstract: Pellicle inspection device for extreme ultraviolet lithography masks comprises inspection light source module to generate light source with wavelength in extreme ultraviolet band and equipped with extreme ultraviolet irradiation time control electronic shutter and light source transmission system; sample platform module in vacuum chamber to fix, move and rotate sample to switch between different performance tests of pellicle and achieve irradiation of extreme ultraviolet light source at different positions and angles of incidence on pellicle; module for detecting impact of contaminants on mask imaging to study impact of different types and sizes of contaminants below 50 ?m and distance between pellicle and mask on mask imaging and determine optimal distance; module for measuring transmissivity, transmittance uniformity, and reflectivity of pellicle to measure optical properties of pellicle at different angles of incidence and study impact of chemical changes of pellicle on optical properties.
    Type: Application
    Filed: July 21, 2025
    Publication date: April 2, 2026
    Inventors: Nan LIN, Jing CAO, Ziyi ZHANG
  • Publication number: 20260063644
    Abstract: Methods of determining the risk of developing adjudicated arthropathy (AA) and/or progression to total joint replacement (TJR) and determining the treatment response to an NGF antagonist or NSAID treatment in a subject by determination of an OA proteomic risk score for the subject are presented herein.
    Type: Application
    Filed: September 5, 2024
    Publication date: March 5, 2026
    Inventors: Charles Paulding, Nan Lin, Lei Chen
  • Publication number: 20260017873
    Abstract: Disclosed are apparatuses, systems, and techniques to render images with global illumination using efficient ray tracing, light source identification, and reservoir resampling that deploys temporal and spatial reservoirs.
    Type: Application
    Filed: September 22, 2025
    Publication date: January 15, 2026
    Inventors: Yaobin Ouyang, Nan Lin, Jacopo Pantaleoni, Markus Kettunen, Shiqiu Liu
  • Publication number: 20260010123
    Abstract: An electronic device includes a panel assembly, a middle frame assembly, and a bottom case assembly. The middle frame assembly includes a metal appearance layer and an insulating structure layer. At least one connection portion that extends toward the inside of the accommodation cavity is disposed on an inner wall of the metal appearance layer. The structure layer is disposed on the inner wall of the metal appearance layer, and the battery assembly is fastened to the structure layer. A mounting portion that fits with the connection portion is disposed on the structure layer, one end of the connection portion penetrates into the mounting portion, and the other end is exposed from the mounting portion. A circuit board of the control assembly is fastened and electrically connected to a part that is of the connection portion and that is exposed from the mounting portion.
    Type: Application
    Filed: September 15, 2025
    Publication date: January 8, 2026
    Applicant: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Kemin Zhang, Wenjian Yang, Zhuang Liu, Nan Lin, Xiangeng You, Peipei Zhu
  • Publication number: 20250374464
    Abstract: Glass includes a first portion. The first portion includes a target texture structure and a light-transparent deformation object. The target texture structure is configured to reduce deformation stress of the glass. The light-transparent deformation object is arranged in a space of the target texture structure to cause a visual effect of the target texture structure to disappear.
    Type: Application
    Filed: May 29, 2025
    Publication date: December 4, 2025
    Inventors: Shaopeng PENG, Hailong WU, Nan LIN
  • Patent number: 12477060
    Abstract: This application provides a call prompt method, a call device, a readable storage medium, and a chip system. The method includes: enabling a call prompt mode; identifying a first audio feature of call audio received by the call device; determining a call state based on the first audio feature; and performing call prompting based on a call prompting manner corresponding to the call state.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: November 18, 2025
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventor: Nan Lin
  • Publication number: 20250329102
    Abstract: Apparatuses, systems, and techniques to ray trace caustics in a scene using feedback of photon information between frames. In at least one embodiment, photon tracing determines photon footprints in an individual frame as a result of individual photons interacting with one or more caustic-casting objects in that frame, and uses those photon footprints to facilitate photon tracing in subsequent frames.
    Type: Application
    Filed: May 1, 2025
    Publication date: October 23, 2025
    Inventors: Yaobin Ouyang, Nan Lin
  • Publication number: 20250315983
    Abstract: Approaches presented herein provide for the generation of images involving one or more particle simulations to represent visual features or objects such a smoke or fire. Translucent sprites having similar material properties can be grouped, and a single intersection of a traced ray determined with respect to a boundary of the group. A single call to a hit shader (or other such component) can be performed for the sprite group as a whole. The individual sprites can be reoriented in the hit shader as appropriate, such as with respect to the direction of the traced ray or orientation of a main camera used for the image, but also to account for reflections, refractions, diffractions, or other such secondary effects. Since the sprites have similar material properties, the locations of the intersected sprites of the group can be used to determine and blend color values for the sprites, to be returned as a single color value for the ray with respect to the entire sprite group.
    Type: Application
    Filed: April 22, 2024
    Publication date: October 9, 2025
    Inventors: Yujin Zhanglin, Xueqing Yang, Nan Lin
  • Patent number: 12423906
    Abstract: Disclosed are apparatuses, systems, and techniques to render images with global illumination using efficient ray tracing, light source identification, and reservoir resampling that deploys temporal and spatial reservoirs.
    Type: Grant
    Filed: March 18, 2024
    Date of Patent: September 23, 2025
    Assignee: NVIDIA Corporation
    Inventors: Yaobin Ouyang, Nan Lin, Jacopo Pantaleoni, Markus Kettunen, Shiqiu Liu
  • Publication number: 20250293616
    Abstract: A method for optimizing an inverter for soft switching according to at least some example embodiments includes calculating efficiency values of the inverter based on a plurality of possible resonant inductance values and a plurality of possible resonant capacitance values, calculating change of voltage over time values of the inverter based on the plurality of possible resonant inductance values and the plurality of possible resonant capacitance values, and selecting a resonant inductance value of the plurality of possible resonant inductance values and a resonant capacitance value of the plurality of possible resonant capacitance values based on the calculated efficiency values of the inverter and the calculated change of voltage over time values.
    Type: Application
    Filed: January 15, 2025
    Publication date: September 18, 2025
    Applicant: Deere & Company
    Inventors: Nan LIN, Brij N. SINGH, Yuheng WU, Zachary WEHRI, Long WU
  • Patent number: 12411421
    Abstract: Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lithographic process and associated method. The metrology apparatus comprises a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target. The configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation.
    Type: Grant
    Filed: October 28, 2021
    Date of Patent: September 9, 2025
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Michael Kraus, Sylvianne Dorothea Christina Roscam Abbing, Filippo Campi, ZhuangYan Zhang, Petrus Wilhelmus Smorenburg, Nan Lin, Stefan Michiel Witte, Arie Jeffrey Den Boef
  • Publication number: 20250266219
    Abstract: This application relates to electrocardiogram (ECG) button assemblies and electronic devices. An example ECG button assembly includes a button part, a plastic tube, a metal tube, an elastic piece, and a conductive sheet. The housing is provided with a via hole, and the plastic tube is embedded in the via hole. A first through hole is provided at an interior of the plastic tube, the metal tube is embedded in the first through hole, the conductive sheet is connected to one end that is of the metal tube and that is located at an interior of the housing, and the conductive sheet is in contact with and electrically connected to a circuit board.
    Type: Application
    Filed: October 31, 2023
    Publication date: August 21, 2025
    Inventors: Kemin ZHANG, Menglong ZHAO, Qian HE, Wenjian YANG, Zhuang LIU, Nan LIN
  • Publication number: 20250199479
    Abstract: A water-resistant assembly is provided which, is mounted to a housing of an electronic device. A switch in the water-resistant assembly can move under an external force, so that an inner cavity of the electronic device is connected to or disconnected from outside. The electronic device includes a housing, a water-resistant and breathable film, and the water-resistant assembly. The housing encloses a housing space, the housing has a housing through hole, and one end of the housing through hole is connected to the housing space through the water-resistant and breathable film. The water-resistant assembly is located at one end that is of the housing through hole and that is far away from the water-resistant and breathable film. According to the application, the electronic device is enabled to operate reliably in both a daily scenario and a high water pressure scenario.
    Type: Application
    Filed: January 29, 2023
    Publication date: June 19, 2025
    Inventors: Nan Lin, Menglong Zhao, Wenjian Yang, Zhuang Liu, Kemin Zhang