Abstract: A photosensitive resin composition including an ethylenically unsaturated compound, a resin having a polarity that increases by the action of an acid, and metal atoms, in which a total content of the metal atoms is from 1 ppt to 30 ppb with respect to a total mass of the photosensitive resin composition, and a content of the ethylenically unsaturated compound is from 0.0001% by mass to 1% by mass with respect to the total mass of the photosensitive resin composition, and a method for producing the same; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the photosensitive resin composition.

Abstract: A vapor chamber includes a body sheet, and a first sheet stacked on the body sheet. The body sheet includes a vapor flow channel portion through which vapor of a working fluid flows and a liquid flow channel portion which is in communication with the vapor flow channel portion and through which liquid of the working fluid flows. The vapor flow channel portion includes a vapor passage extending in a first direction. The first sheet includes a first sheet inner surface facing the body sheet and a first sheet groove provided in the first sheet inner surface. The first sheet groove is provided at a position of overlapping with the vapor passage in a plan view and extends in a direction intersecting with the first direction.

Abstract: A method for producing an arylamine compound, wherein a chemical compound represented by formula (B) is reacted by addition reaction with a carbon atom having a bound hydrogen atom on a benzene ring of a chemical compound represented by formula (A), in the presence of one or more acids selected from Lewis acids or sulfonic acids; to produce a chemical compound represented by formula (C) including a partial structure represented by formula (D).

Abstract: A positive electrode layer for an all-solid-state battery, includes a first phase including a positive electrode active material containing Li, a second phase including a garnet-type solid electrolyte containing Li, Bi, M2, and O, and a third phase different from the first phase and the second phase. The third phase includes a Li—Bi-M2-O-based compound containing Li, Bi, M2, and O, and M2 is at least one element selected from the group consisting of Ca, Sr, Ba, Mg, Y, and Rb.

Abstract: There is provided an imaging device including a semiconductor substrate and a plurality of imaging elements that are arrayed in a matrix in a first direction and a second direction on the semiconductor substrate and perform photoelectric conversion on incident light. Each of the plurality of imaging elements includes a plurality of pixels that are provided in a predetermined unit region of the semiconductor substrate to be adjacent to each other and contains impurities of a first conductivity type, a separation section that separates the plurality of pixels, two first element separation walls that are provided along two first side surfaces extending in the second direction of the predetermined unit region to pierce through at least a part of the semiconductor substrate, and a first diffusion region provided in the semiconductor substrate around the first element separation wall and the separation section and containing impurities of a second conductivity type.

Abstract: A device includes an elastic base, a device body provided on the base, a wiring line provided on the base, a coupling member coupled to the wiring line, and an electrically conductive adhesive layer provided between the wiring line and the coupling member. The wiring line extends from the electrically conductive adhesive layer to the device body. The wiring line has a wiring portion overlapping with the electrically conductive adhesive layer. The degree of polymerization of the electrically conductive adhesive layer decreases in the extending direction of the wiring portion.

Abstract: Provided is an electrophotographic photosensitive member including a support, a charge-generating layer, a first hole-transporting layer, and a second hole-transporting layer, wherein the second hole-transporting layer contains a hole-transportable compound represented by the formula (1) (mass: W1, energy value of the highest occupied molecular orbital: CTM1HOMO), and a hole-transportable compound represented by the formula (2) (mass: W2) and/or a hole-transportable compound represented by the formula (3) (mass: W3) (energy value of the highest occupied molecular orbital: CTM2HOMO), wherein a value calculated from the expression (I) is from 0.05% by mass to 5.0% by mass, and wherein the expression (II) is satisfied: (W2+W3)/(W1+W2+W3)×100 (% by mass)—Expression (I); and 0.05 (eV)?|CTM2HOMO|-|CTM1HOMO|?0.30 (eV)—(II).

Abstract: A method for producing an arylamine compound, wherein a chemical compound represented by formula (B) is reacted by addition reaction with a carbon atom having a bound hydrogen atom on a benzene ring of a chemical compound represented by formula (A), in the presence of one or more acids selected from Lewis acids or sulfonic acids; to produce a chemical compound represented by formula (C) including a partial structure represented by formula (D).

Abstract: A device includes an elastic base, a device body provided on the base, a wiring line provided on the base, a coupling member coupled to the wiring line, and an electrically conductive adhesive layer provided between the wiring line and the coupling member. The wiring line extends from the electrically conductive adhesive layer to the device body. The wiring line has a wiring portion overlapping with the electrically conductive adhesive layer. The degree of polymerization of the electrically conductive adhesive layer decreases in the extending direction of the wiring portion.

Abstract: A transparent electrode device includes: a substrate; an electrode region formed on the substrate using a transparent electroconductive film; and an insulating region disposed on the substrate and adjacent to the electrode region, in which a plurality of random island patterns including patterns having a width of 100 ?m or greater, formed using the transparent electroconductive film, are disposed mutually distanced from one another.

Abstract: A sensor apparatus includes: a sensor panel that includes an input operation surface and is configured to detect positional coordinates of a detection object that comes into contact with the input operation surface; a casing; and a pressure-sensitive sensor that includes a first electrode fixed on the sensor panel side, a second electrode fixed on the casing side, and an elastic member that is provided between the sensor panel and the casing and elastically supports the sensor panel with respect to the casing, includes, between the first electrode and the second electrode, a first area formed with a first capacitance and a second area formed with a second capacitance larger than the first capacitance, and is configured to detect a pressing force input to the input operation surface as a change in a capacitance between the first electrode and the second electrode.

Abstract: A first defect classification section uses a pre-inspection test target as the inspected piece, and classifies the defects, based on results of the defect inspection executed a plurality of times by the defect detection system, into first defects detected constantly in each of the plurality of times of inspection, and into second defects detected only in a part of, but not in the residual part of the plurality of times of inspection.

Abstract: A transparent electrode device includes: a substrate; an electrode region formed on the substrate using a transparent electroconductive film; and an insulating region disposed on the substrate and adjacent to the electrode region, in which a plurality of random island patterns including patterns having a width of 100 ?m or greater, formed using the transparent electroconductive film, are disposed mutually distanced from one another.

Abstract: A defect review apparatus includes a storage device which stores data about a defect of an inspection target object; a first imaging device which captures an image located in a position on a surface of the inspection target object, the position being specified by information regarding the position of the inspection target object which has been input; and a control device which controls the first imaging device. The storage device stores: first defect detection data including a defect number as which the defect of the inspection target object detected by a first defect detection process is labeled, and information regarding the position of the defect; and second defect data including a defect number as which the defect of the inspection target object detected by a second defect detection process is labeled, and information regarding its position.

Abstract: A distinguishing size for distinguishing a pseudo defect from a defect caused by a process trouble is stored in a first storage area. Defect data are stored in a second storage area. A processing unit detects a defect on a wafer surface, and stores the defect data in the second storage area. Before a defect detection process is completed for all areas of the wafer surface, a size of a defect detected in a partial area is compared with the distinguishing size stored in the first storage area. If the detected defect has a size equal to or larger than the distinguishing size, an alarm is output through an output unit, whereas if a defect having a size equal to or larger than the distinguishing size is not detected, the defect detection process is executed for the area still not subjected to the defect detection process.

Abstract: A sensor apparatus includes: a sensor panel that includes an input operation surface and is configured to detect positional coordinates of a detection object that comes into contact with the input operation surface; a casing; and a pressure-sensitive sensor that includes a first electrode fixed on the sensor panel side, a second electrode fixed on the casing side, and an elastic member that is provided between the sensor panel and the casing and elastically supports the sensor panel with respect to the casing, includes, between the first electrode and the second electrode, a first area formed with a first capacitance and a second area formed with a second capacitance larger than the first capacitance, and is configured to detect a pressing force input to the input operation surface as a change in a capacitance between the first electrode and the second electrode.

Abstract: A sensor element is provided that includes a flexible transparent base material, a first conductive pattern, and a second conductive pattern. The flexible transparent base material has a first surface and a second surface opposite to the first surface. The first conductive pattern is configured to electrostatically detect an operation position of an input operator in a first direction, the first conductive pattern being formed on the first surface. The second conductive pattern is configured to electrostatically detect an operation position of the input operator in a second direction different from the first direction, the second conductive pattern being formed on the second surface.

Abstract: Scattered light from the surface of a sample subjected to the same process as a process for an inspection object is observed, a defect is detected from an intensity of scattered light, and a position of the detected defect and an intensity of scattered light caused by the detected defect are acquired. Defects detected are classified into a group detectable by observing secondary electrons emitted when an electron beam is applied to the surface of the sample and a group not detectable. A decision threshold value of a scattered light intensity for extracting defects to be counted is determined, in accordance with a result of classification by the above steps and the intensity of scattered light caused by the detected defect.

Abstract: A reference substrate for defect detection sensitivity calibration has: patterns and programmed defective portions which are cone defects with different sizes and are formed at random on a silicon substrate. By using the reference substrate for defect detection sensitivity calibration, it is possible to obtain an index, usable in manufacturing management, for determining sensitivity adjustment after a lamp is replaced in an illumination part of a defect inspection apparatus.

Abstract: A defect review apparatus includes a storage device which stores data about a defect of an inspection target object; a first imaging device which captures an image located in a position on a surface of the inspection target object, the position being specified by information regarding the position of the inspection target object which has been input; and a control device which controls the first imaging device. The storage device stores: first defect detection data including a defect number as which the defect of the inspection target object detected by a first defect detection process is labeled, and information regarding the position of the defect; and second defect data including a defect number as which the defect of the inspection target object detected by a second defect detection process is labeled, and information regarding its position.