Patents by Inventor Naoki Kobayashi
Naoki Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240079425Abstract: An image pickup module includes: a lens unit including a first principal surface and a second principal surface; an image pickup unit including a third principal surface and a fourth principal surface on which an external electrode is disposed; a wiring board including a hole and a bonding electrode disposed on a bottom surface of the hole; a solder that bonds the bonding electrode and the external electrode; a rigid member that defines a spacing between the fourth principal surface and the bottom surface; and a second resin disposed between the fourth principal surface and the bottom surface.Type: ApplicationFiled: November 14, 2023Publication date: March 7, 2024Applicant: OLYMPUS CORPORATIONInventors: Naoki ITO, Takatoshi IGARASHI, Keiichi KOBAYASHI, Takahiro SHIMOHATA
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Patent number: 11919031Abstract: A coating device includes a head, a wiping mechanism, an arm, and a controller. The head includes a nozzle surface for discharging a coating material. The wiping mechanism wipes the nozzle surface. The arm holds the head. The controller controls movement of the head via the arm. The controller relatively moves the head with respect to the wiping mechanism to wipe the nozzle surface.Type: GrantFiled: October 28, 2020Date of Patent: March 5, 2024Assignee: KYOCERA CORPORATIONInventors: Naoki Kobayashi, Daisuke Hozumi, Ryota Nagaike, Nobuaki Yamakuchi
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Publication number: 20240055782Abstract: A terminal fitting comprising: a first terminal portion in which first tab portions, extending from a first tab continuous connecting portion, are arranged; a second terminal portion in which second tab portions, extending from a second tab continuous connecting portion, are arranged; a connecting portion connecting the first and second terminal portions; and a contact portion to be connected to an external terminal. The terminal fitting has a three-dimensional shape in which the terminal fitting having a preliminary shape is bent at the connecting portion. In the three-dimensional shape, the first terminal portion and the second terminal portion are three-dimensionally arranged to be connected at the connecting portion. In the preliminary shape, the first terminal portion and the second terminal portion are arranged to be fitted to each other, and the first tab continuous connecting portion and the second tab continuous connecting portion are connected at the connecting portion.Type: ApplicationFiled: July 17, 2023Publication date: February 15, 2024Inventors: Masaki Tanaka, Naoki Kobayashi, Jun Ishikawa
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Patent number: 11879943Abstract: A system for detecting changes in an electronic component and a method for operating a data processing system for finding events that predict an electronic component's failure are disclosed. The system includes an input port that receives a data stream that includes an ordered sequence of data values generated by the electronic component. A controller identifies a segment of the data stream (EDS), transforms the EDS to a CSV, and compares the CSV to a plurality of reference signature vectors (RSVs) to determine if the CSV is similar to any of the RSVs. Information identifying a new CSV is stored in an RSV database if the new CSV is similar to one of the RSVs, and a new RSV is created if the new CSV is not similar to any of the RSVs in said RSV database. A predictor RSV that occurs as the electronic component ages is identified.Type: GrantFiled: May 31, 2021Date of Patent: January 23, 2024Assignee: KEYSIGHT TECHNOLOGIES, INC.Inventors: Masaharu Goto, Kiyoshi Chikamatsu, Naoki Kobayashi
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Publication number: 20240019782Abstract: The present invention is a composition for forming a metal oxide film including (A) an organic-inorganic composite material and (B) a solvent, (A) the organic-inorganic composite material being a reaction product of a metal source (I) and an organic source (II), the metal source (I) containing one or more compounds derived from a metal compound represented by the general formula (I-1), and the organic source (II) containing a compound having a unit represented by the general formula (II-1) and a cardo structure. The present invention provides a composition for forming a metal oxide film which has excellent coatability relative to a previously-known material for forming a metal oxide film and also has high filling and planarizing properties, a patterning process using the material, and a method for forming a metal oxide film.Type: ApplicationFiled: July 6, 2023Publication date: January 18, 2024Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Naoki KOBAYASHI, Nobuhiro NAGAMACHI, Daisuke KORI
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Publication number: 20230314705Abstract: In order to achieve an optical transmitter that is reduced in size and price, an optical waveguide module includes a wavelength controller that controls a wavelength of output light output from a light source, and a wavelength locker that receives an input of the output light and outputs an electric signal indicating a relation between a wavelength of the output light and a target wavelength, wherein the wavelength controller and the wavelength locker are formed as a semiconductor optical waveguide on the same semiconductor substrate.Type: ApplicationFiled: January 17, 2023Publication date: October 5, 2023Applicant: NEC CorporationInventor: Naoki KOBAYASHI
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Publication number: 20230305405Abstract: The present invention is a composition for forming a silicon-containing metal hard mask, including: (A) a metal oxide nanoparticle; (B) a thermally crosslinkable polysiloxane (Sx) having no aromatic-ring-containing organic group; and (C) a solvent. This provides a composition for forming a silicon-containing metal hard mask that has a high effect of inhibiting collapse of an ultrafine pattern in a multilayer resist method, that can form a resist pattern having excellent LWR, that has more excellent dry etching resistance and wet removability than a conventional silicon-containing underlayer film material, and that has more excellent filling ability than a conventional metal hard mask material.Type: ApplicationFiled: March 21, 2023Publication date: September 28, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Naoki KOBAYASHI, Kanata TAKIZAWA, Ryo MITSUI, Toshiharu YANO
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Publication number: 20230291649Abstract: A management system stores peripheral information apparatus management information for managing a configuration of a peripheral information apparatus on a network of a to-be-managed information apparatus. The peripheral information apparatus management information indicates an identifier of the peripheral information apparatus recognized in the network. The management system receives, from the to-be-managed information apparatus, current peripheral information apparatus configuration information indicating a configuration of the peripheral information apparatus in a current network of the to-be-managed information apparatus. The current peripheral information apparatus configuration information indicates an identifier of the peripheral information apparatus recognized in the current network.Type: ApplicationFiled: August 15, 2022Publication date: September 14, 2023Inventors: Naoki KOBAYASHI, Shinya TAKEUCHI, Hiroshi HAYAKAWA
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Publication number: 20230280648Abstract: The present invention is a composition for forming a metal oxide film, comprising (A) a metal oxide nanoparticle, (B) a flowability accelerator, which is a compound and/or a polymer having a molecular weight of 5000 or less represented by one or more selected from the following general formulae (I), (II) and (III), and (C) an organic solvent, wherein a weight ratio of the (A) metal oxide nanoparticle to the (B) flowability accelerator is 10/90 to 90/10. This makes it possible to provide a composition for forming a metal oxide film having excellent dry etching resistance relative to a previously-known organic underlayer film composition and also has high filling and planarizing properties, a patterning process using the composition, and a method for forming a metal oxide film (resist underlayer film).Type: ApplicationFiled: February 7, 2023Publication date: September 7, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Naoki Kobayashi, Daisuke Kori, Toshiharu Yano
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Publication number: 20230271804Abstract: A medium processing apparatus includes a liquid applier, a crimper, a stapler, and circuitry. The liquid applier applies liquid to a liquid application position of a medium. The crimper presses and deforms at least a part to which the liquid is applied by the liquid applier, to bind a plurality of media including the medium to which the liquid is applied. The stapler performs stapling with a staple on a medium bundle in which the plurality of media is bound by the crimper. The circuitry controls operations of the crimper, the liquid applier, and the stapler, and selectively switches between first binding performed by the liquid applier and the crimper and second binding performed by only the stapler, in accordance with information on the medium or a binding position at which the medium bundle is bound by the crimper.Type: ApplicationFiled: February 24, 2023Publication date: August 31, 2023Applicant: Ricoh Company, Ltd.Inventors: Kohta ABE, Kei SASAKI, Kazuki SETO, Kazuki MISHINA, Naoki KOBAYASHI
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Publication number: 20230244147Abstract: A composition for forming an organic film, containing: a material for forming an organic film shown by the following general formula; and an organic solvent, where R1 represents a hydrogen atom, an allyl group, or a propargyl group, R2 represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group having 1 to 4 carbon atoms, an alkynyloxy group having 2 to 4 carbon atoms, an alkenyloxy group having 2 to 4 carbon atoms, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a trifluoromethyl group, or a trifluoromethyloxy group, m = 0 or 1, n = 1 or 2, 1 = 0 or 1, k represents an integer of 0 to 2, W represents a divalent organic group having 1 to 40 carbon atoms, and each V independently represents a hydrogen atom or a linking moiety.Type: ApplicationFiled: September 15, 2022Publication date: August 3, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daisuke KORI, Yasuyuki YAMAMOTO, Naoki KOBAYASHI
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Publication number: 20230218208Abstract: A medical photometer includes a signal producing section that produces a first control signal to emit a first light having a first wavelength, a second control signal to emit a second light having a second wavelength, a third control signal to emit a third light having a third wavelength, and a fourth control signal to emit a fourth light having a fourth wavelength, a signal acquiring section that acquires a first to fourth intensity signals, a processor, and a memory that stores instructions. In the medical photometer, the first wavelength and the second wavelength are selected as two wavelengths at each of which an extinction coefficient of blood is a first value. The third wavelength and the fourth wavelength are selected as two wavelengths at each of which the extinction coefficient of the blood is a second value which is different from the first value.Type: ApplicationFiled: March 8, 2023Publication date: July 13, 2023Applicant: NIHON KOHDEN CORPORATIONInventors: Yoshinori UEDA, Naoki KOBAYASHI, Kazumasa ITO, Hideki FUJISAKI, Teiji UKAWA
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Publication number: 20230168585Abstract: A resist underlayer film material contains (A) a resin having a compound shown in the following general formula (1A), and (B) an organic solvent. Mw/Mn of the compound shown in the general formula (1A) is 1.00?Mw/Mn?1.25. This provides: a resist underlayer film material having all of favorable dry etching resistance, heat resistance to 500° C. or higher, and high filling and planarizing properties; and methods for forming a resist underlayer film and patterning processes which use the material.Type: ApplicationFiled: November 10, 2022Publication date: June 1, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Naoki KOBAYASHI, Daisuke KORI, Yasuyuki YAMAMOTO, Hironori SATOH, Toshiharu YANO
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Publication number: 20230161251Abstract: An organic film forming composition, containing: a material shown by formula (I) and/or (II); and an organic solvent, where R1 and R4 each represent a hydrogen atom, an allyl or propargyl group, R2 and R5 each represent a substituent, R3 and R6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkynyl group having 2 to 4 carbon atoms, or an alkenyl group having 2 to 4 carbon atoms. “m” and “i” represent 0 or 1, “k” and “q” represent an integer of 0 to 2, “n” represent 1 or 2, “h”, and “j” represent an integer of 0 to 2 and satisfy the relationship 1?h+j?4, and “1” and “r” represent 0 or 1. W represents a single bond or divalent group shown by formulae (3). Each V independently represents a hydrogen atom or linking moiety.Type: ApplicationFiled: November 15, 2022Publication date: May 25, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daisuke KORI, Naoki KOBAYASHI
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Publication number: 20230152695Abstract: The present invention provides a resist underlayer film material used in a multilayer resist method, the material containing: (A) a resin having a structural unit shown by the following general formula (1); and (B) an organic solvent. The resin content is 20 mass % or more. This provides: a resist underlayer film material having excellent filling property and adhesiveness, and favorable planarizing property; and a patterning process and a method for forming a resist underlayer film which use the material.Type: ApplicationFiled: October 20, 2022Publication date: May 18, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hironori SATOH, Daisuke KORI, Naoki KOBAYASHI, Toshiharu YANO
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Publication number: 20230152702Abstract: A material for forming a filling film for inhibiting semiconductor substrate pattern collapse contains: (A) a polymer having a structural unit shown by the following general formula (1); (B) a residual-solvent removal promoter containing a compound shown by the following general formula (2); and (C) an organic solvent. A ratio Mw/Mn of a weight-average molecular weight Mw and a number-average molecular weight Mn of the polymer (A) in terms of polystyrene by a gel permeation chromatography method is 2.50?Mw/Mn?9.00. The residual-solvent removal promoter (B) is contained in an amount of 0.1 to 40 parts by mass based on 100 parts by mass of the polymer (A). The material for forming a filling film for inhibiting semiconductor substrate pattern collapse contains no acid generator.Type: ApplicationFiled: October 20, 2022Publication date: May 18, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Naoki KOBAYASHI, Daisuke KORI, Keisuke NIIDA, Toshiharu YANO
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Publication number: 20230148990Abstract: Provided is a patient monitor and an ultrasonic wave information display method that provide a screen by which a relationship between a depth and a motion in a body of a subject can be easily grasped. An input and output interface acquires a reflected wave indicating a motion generated at each depth by an ultrasonic wave irradiated at a plurality of depths in the body. A control unit displays, on a display unit in terms of at least one of the following expressions, a change over time in an index value of the motion at each depth of the subject calculated from the reflected wave. A plurality of waveforms corresponding to each depth; and map information in which a relationship between the depth and magnitude of the index value is mapped to at least one of a color and a pattern.Type: ApplicationFiled: March 12, 2021Publication date: May 18, 2023Inventors: Mitsuhiro OURA, Naoki KOBAYASHI
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Patent number: 11646688Abstract: The present invention includes a phase angle detection unit generating a phase angle signal switched at a timing at which a cogging torque generated with the rotation of a rotor of a brushless DC motor reaches near a peak on a negative side hindering the rotation of the rotor, an inverter circuit energizing coils of respective phases of the brushless DC motor by switching elements according to an input of a driving signal, an energization period calculation unit calculating an energization period Tw from a target rotation speed set for the brushless DC motor, and a drive control unit energizing the coils sequentially by outputting the driving signal to the respective switching elements for each energization period, gradually increasing a duty of the driving signals to the switching elements at a start of each energization period, and decreasing the duty after the phase angle signal is switched.Type: GrantFiled: December 22, 2021Date of Patent: May 9, 2023Assignee: MIKUNI CORPORATIONInventor: Naoki Kobayashi
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Patent number: 11642053Abstract: A medical photometer includes a signal producing section that produces a first control signal to emit a first light having a first wavelength, a second control signal to emit a second light having a second wavelength, a third control signal to emit a third light having a third wavelength, and a fourth control signal to emit a fourth light having a fourth wavelength, a signal acquiring section that acquires a first to fourth intensity signals, a processor, and a memory that stores instructions. In the medical photometer, the first wavelength and the second wavelength are selected as two wavelengths at each of which an extinction coefficient of blood is a first value. The third wavelength and the fourth wavelength are selected as two wavelengths at each of which the extinction coefficient of the blood is a second value which is different from the first value.Type: GrantFiled: September 18, 2018Date of Patent: May 9, 2023Assignee: NIHON KOHDEN CORPORATIONInventors: Yoshinori Ueda, Naoki Kobayashi, Kazumasa Ito, Hideki Fujisaki, Teiji Ukawa
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Publication number: 20230121798Abstract: A material for forming an organic film, containing: a compound shown by formula (1); and an organic solvent. In formula (1), R1 represents one of the following formulae (2), R2 represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group, an alkynyloxy group, an alkenyloxy group, a linear, branched, or cyclic alkyl group, a trifluoromethyl group, or a trifluoromethyloxy group, “n” represents 0 or 1, “m” represents an integer of 1 to 3, “p” represents 0 or 1, “1” represents an integer of 0 to 2, and W represents a divalent organic group having 2 to 40 carbon atoms. The objective: a compound which allows the formation of an organic underlayer film having excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, favorable film-formability and adhesiveness to a substrate; and a material for forming an organic film containing the compound.Type: ApplicationFiled: October 4, 2022Publication date: April 20, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daisuke KORI, Naoki KOBAYASHI, Yasuyuki YAMAMOTO