Patents by Inventor Naoki Kobayashi

Naoki Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240079425
    Abstract: An image pickup module includes: a lens unit including a first principal surface and a second principal surface; an image pickup unit including a third principal surface and a fourth principal surface on which an external electrode is disposed; a wiring board including a hole and a bonding electrode disposed on a bottom surface of the hole; a solder that bonds the bonding electrode and the external electrode; a rigid member that defines a spacing between the fourth principal surface and the bottom surface; and a second resin disposed between the fourth principal surface and the bottom surface.
    Type: Application
    Filed: November 14, 2023
    Publication date: March 7, 2024
    Applicant: OLYMPUS CORPORATION
    Inventors: Naoki ITO, Takatoshi IGARASHI, Keiichi KOBAYASHI, Takahiro SHIMOHATA
  • Patent number: 11919031
    Abstract: A coating device includes a head, a wiping mechanism, an arm, and a controller. The head includes a nozzle surface for discharging a coating material. The wiping mechanism wipes the nozzle surface. The arm holds the head. The controller controls movement of the head via the arm. The controller relatively moves the head with respect to the wiping mechanism to wipe the nozzle surface.
    Type: Grant
    Filed: October 28, 2020
    Date of Patent: March 5, 2024
    Assignee: KYOCERA CORPORATION
    Inventors: Naoki Kobayashi, Daisuke Hozumi, Ryota Nagaike, Nobuaki Yamakuchi
  • Publication number: 20240055782
    Abstract: A terminal fitting comprising: a first terminal portion in which first tab portions, extending from a first tab continuous connecting portion, are arranged; a second terminal portion in which second tab portions, extending from a second tab continuous connecting portion, are arranged; a connecting portion connecting the first and second terminal portions; and a contact portion to be connected to an external terminal. The terminal fitting has a three-dimensional shape in which the terminal fitting having a preliminary shape is bent at the connecting portion. In the three-dimensional shape, the first terminal portion and the second terminal portion are three-dimensionally arranged to be connected at the connecting portion. In the preliminary shape, the first terminal portion and the second terminal portion are arranged to be fitted to each other, and the first tab continuous connecting portion and the second tab continuous connecting portion are connected at the connecting portion.
    Type: Application
    Filed: July 17, 2023
    Publication date: February 15, 2024
    Inventors: Masaki Tanaka, Naoki Kobayashi, Jun Ishikawa
  • Patent number: 11879943
    Abstract: A system for detecting changes in an electronic component and a method for operating a data processing system for finding events that predict an electronic component's failure are disclosed. The system includes an input port that receives a data stream that includes an ordered sequence of data values generated by the electronic component. A controller identifies a segment of the data stream (EDS), transforms the EDS to a CSV, and compares the CSV to a plurality of reference signature vectors (RSVs) to determine if the CSV is similar to any of the RSVs. Information identifying a new CSV is stored in an RSV database if the new CSV is similar to one of the RSVs, and a new RSV is created if the new CSV is not similar to any of the RSVs in said RSV database. A predictor RSV that occurs as the electronic component ages is identified.
    Type: Grant
    Filed: May 31, 2021
    Date of Patent: January 23, 2024
    Assignee: KEYSIGHT TECHNOLOGIES, INC.
    Inventors: Masaharu Goto, Kiyoshi Chikamatsu, Naoki Kobayashi
  • Publication number: 20240019782
    Abstract: The present invention is a composition for forming a metal oxide film including (A) an organic-inorganic composite material and (B) a solvent, (A) the organic-inorganic composite material being a reaction product of a metal source (I) and an organic source (II), the metal source (I) containing one or more compounds derived from a metal compound represented by the general formula (I-1), and the organic source (II) containing a compound having a unit represented by the general formula (II-1) and a cardo structure. The present invention provides a composition for forming a metal oxide film which has excellent coatability relative to a previously-known material for forming a metal oxide film and also has high filling and planarizing properties, a patterning process using the material, and a method for forming a metal oxide film.
    Type: Application
    Filed: July 6, 2023
    Publication date: January 18, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Nobuhiro NAGAMACHI, Daisuke KORI
  • Publication number: 20230314705
    Abstract: In order to achieve an optical transmitter that is reduced in size and price, an optical waveguide module includes a wavelength controller that controls a wavelength of output light output from a light source, and a wavelength locker that receives an input of the output light and outputs an electric signal indicating a relation between a wavelength of the output light and a target wavelength, wherein the wavelength controller and the wavelength locker are formed as a semiconductor optical waveguide on the same semiconductor substrate.
    Type: Application
    Filed: January 17, 2023
    Publication date: October 5, 2023
    Applicant: NEC Corporation
    Inventor: Naoki KOBAYASHI
  • Publication number: 20230305405
    Abstract: The present invention is a composition for forming a silicon-containing metal hard mask, including: (A) a metal oxide nanoparticle; (B) a thermally crosslinkable polysiloxane (Sx) having no aromatic-ring-containing organic group; and (C) a solvent. This provides a composition for forming a silicon-containing metal hard mask that has a high effect of inhibiting collapse of an ultrafine pattern in a multilayer resist method, that can form a resist pattern having excellent LWR, that has more excellent dry etching resistance and wet removability than a conventional silicon-containing underlayer film material, and that has more excellent filling ability than a conventional metal hard mask material.
    Type: Application
    Filed: March 21, 2023
    Publication date: September 28, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Kanata TAKIZAWA, Ryo MITSUI, Toshiharu YANO
  • Publication number: 20230291649
    Abstract: A management system stores peripheral information apparatus management information for managing a configuration of a peripheral information apparatus on a network of a to-be-managed information apparatus. The peripheral information apparatus management information indicates an identifier of the peripheral information apparatus recognized in the network. The management system receives, from the to-be-managed information apparatus, current peripheral information apparatus configuration information indicating a configuration of the peripheral information apparatus in a current network of the to-be-managed information apparatus. The current peripheral information apparatus configuration information indicates an identifier of the peripheral information apparatus recognized in the current network.
    Type: Application
    Filed: August 15, 2022
    Publication date: September 14, 2023
    Inventors: Naoki KOBAYASHI, Shinya TAKEUCHI, Hiroshi HAYAKAWA
  • Publication number: 20230280648
    Abstract: The present invention is a composition for forming a metal oxide film, comprising (A) a metal oxide nanoparticle, (B) a flowability accelerator, which is a compound and/or a polymer having a molecular weight of 5000 or less represented by one or more selected from the following general formulae (I), (II) and (III), and (C) an organic solvent, wherein a weight ratio of the (A) metal oxide nanoparticle to the (B) flowability accelerator is 10/90 to 90/10. This makes it possible to provide a composition for forming a metal oxide film having excellent dry etching resistance relative to a previously-known organic underlayer film composition and also has high filling and planarizing properties, a patterning process using the composition, and a method for forming a metal oxide film (resist underlayer film).
    Type: Application
    Filed: February 7, 2023
    Publication date: September 7, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki Kobayashi, Daisuke Kori, Toshiharu Yano
  • Publication number: 20230271804
    Abstract: A medium processing apparatus includes a liquid applier, a crimper, a stapler, and circuitry. The liquid applier applies liquid to a liquid application position of a medium. The crimper presses and deforms at least a part to which the liquid is applied by the liquid applier, to bind a plurality of media including the medium to which the liquid is applied. The stapler performs stapling with a staple on a medium bundle in which the plurality of media is bound by the crimper. The circuitry controls operations of the crimper, the liquid applier, and the stapler, and selectively switches between first binding performed by the liquid applier and the crimper and second binding performed by only the stapler, in accordance with information on the medium or a binding position at which the medium bundle is bound by the crimper.
    Type: Application
    Filed: February 24, 2023
    Publication date: August 31, 2023
    Applicant: Ricoh Company, Ltd.
    Inventors: Kohta ABE, Kei SASAKI, Kazuki SETO, Kazuki MISHINA, Naoki KOBAYASHI
  • Publication number: 20230244147
    Abstract: A composition for forming an organic film, containing: a material for forming an organic film shown by the following general formula; and an organic solvent, where R1 represents a hydrogen atom, an allyl group, or a propargyl group, R2 represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group having 1 to 4 carbon atoms, an alkynyloxy group having 2 to 4 carbon atoms, an alkenyloxy group having 2 to 4 carbon atoms, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a trifluoromethyl group, or a trifluoromethyloxy group, m = 0 or 1, n = 1 or 2, 1 = 0 or 1, k represents an integer of 0 to 2, W represents a divalent organic group having 1 to 40 carbon atoms, and each V independently represents a hydrogen atom or a linking moiety.
    Type: Application
    Filed: September 15, 2022
    Publication date: August 3, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke KORI, Yasuyuki YAMAMOTO, Naoki KOBAYASHI
  • Publication number: 20230218208
    Abstract: A medical photometer includes a signal producing section that produces a first control signal to emit a first light having a first wavelength, a second control signal to emit a second light having a second wavelength, a third control signal to emit a third light having a third wavelength, and a fourth control signal to emit a fourth light having a fourth wavelength, a signal acquiring section that acquires a first to fourth intensity signals, a processor, and a memory that stores instructions. In the medical photometer, the first wavelength and the second wavelength are selected as two wavelengths at each of which an extinction coefficient of blood is a first value. The third wavelength and the fourth wavelength are selected as two wavelengths at each of which the extinction coefficient of the blood is a second value which is different from the first value.
    Type: Application
    Filed: March 8, 2023
    Publication date: July 13, 2023
    Applicant: NIHON KOHDEN CORPORATION
    Inventors: Yoshinori UEDA, Naoki KOBAYASHI, Kazumasa ITO, Hideki FUJISAKI, Teiji UKAWA
  • Publication number: 20230168585
    Abstract: A resist underlayer film material contains (A) a resin having a compound shown in the following general formula (1A), and (B) an organic solvent. Mw/Mn of the compound shown in the general formula (1A) is 1.00?Mw/Mn?1.25. This provides: a resist underlayer film material having all of favorable dry etching resistance, heat resistance to 500° C. or higher, and high filling and planarizing properties; and methods for forming a resist underlayer film and patterning processes which use the material.
    Type: Application
    Filed: November 10, 2022
    Publication date: June 1, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Daisuke KORI, Yasuyuki YAMAMOTO, Hironori SATOH, Toshiharu YANO
  • Publication number: 20230161251
    Abstract: An organic film forming composition, containing: a material shown by formula (I) and/or (II); and an organic solvent, where R1 and R4 each represent a hydrogen atom, an allyl or propargyl group, R2 and R5 each represent a substituent, R3 and R6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkynyl group having 2 to 4 carbon atoms, or an alkenyl group having 2 to 4 carbon atoms. “m” and “i” represent 0 or 1, “k” and “q” represent an integer of 0 to 2, “n” represent 1 or 2, “h”, and “j” represent an integer of 0 to 2 and satisfy the relationship 1?h+j?4, and “1” and “r” represent 0 or 1. W represents a single bond or divalent group shown by formulae (3). Each V independently represents a hydrogen atom or linking moiety.
    Type: Application
    Filed: November 15, 2022
    Publication date: May 25, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke KORI, Naoki KOBAYASHI
  • Publication number: 20230152695
    Abstract: The present invention provides a resist underlayer film material used in a multilayer resist method, the material containing: (A) a resin having a structural unit shown by the following general formula (1); and (B) an organic solvent. The resin content is 20 mass % or more. This provides: a resist underlayer film material having excellent filling property and adhesiveness, and favorable planarizing property; and a patterning process and a method for forming a resist underlayer film which use the material.
    Type: Application
    Filed: October 20, 2022
    Publication date: May 18, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hironori SATOH, Daisuke KORI, Naoki KOBAYASHI, Toshiharu YANO
  • Publication number: 20230152702
    Abstract: A material for forming a filling film for inhibiting semiconductor substrate pattern collapse contains: (A) a polymer having a structural unit shown by the following general formula (1); (B) a residual-solvent removal promoter containing a compound shown by the following general formula (2); and (C) an organic solvent. A ratio Mw/Mn of a weight-average molecular weight Mw and a number-average molecular weight Mn of the polymer (A) in terms of polystyrene by a gel permeation chromatography method is 2.50?Mw/Mn?9.00. The residual-solvent removal promoter (B) is contained in an amount of 0.1 to 40 parts by mass based on 100 parts by mass of the polymer (A). The material for forming a filling film for inhibiting semiconductor substrate pattern collapse contains no acid generator.
    Type: Application
    Filed: October 20, 2022
    Publication date: May 18, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Daisuke KORI, Keisuke NIIDA, Toshiharu YANO
  • Publication number: 20230148990
    Abstract: Provided is a patient monitor and an ultrasonic wave information display method that provide a screen by which a relationship between a depth and a motion in a body of a subject can be easily grasped. An input and output interface acquires a reflected wave indicating a motion generated at each depth by an ultrasonic wave irradiated at a plurality of depths in the body. A control unit displays, on a display unit in terms of at least one of the following expressions, a change over time in an index value of the motion at each depth of the subject calculated from the reflected wave. A plurality of waveforms corresponding to each depth; and map information in which a relationship between the depth and magnitude of the index value is mapped to at least one of a color and a pattern.
    Type: Application
    Filed: March 12, 2021
    Publication date: May 18, 2023
    Inventors: Mitsuhiro OURA, Naoki KOBAYASHI
  • Patent number: 11646688
    Abstract: The present invention includes a phase angle detection unit generating a phase angle signal switched at a timing at which a cogging torque generated with the rotation of a rotor of a brushless DC motor reaches near a peak on a negative side hindering the rotation of the rotor, an inverter circuit energizing coils of respective phases of the brushless DC motor by switching elements according to an input of a driving signal, an energization period calculation unit calculating an energization period Tw from a target rotation speed set for the brushless DC motor, and a drive control unit energizing the coils sequentially by outputting the driving signal to the respective switching elements for each energization period, gradually increasing a duty of the driving signals to the switching elements at a start of each energization period, and decreasing the duty after the phase angle signal is switched.
    Type: Grant
    Filed: December 22, 2021
    Date of Patent: May 9, 2023
    Assignee: MIKUNI CORPORATION
    Inventor: Naoki Kobayashi
  • Patent number: 11642053
    Abstract: A medical photometer includes a signal producing section that produces a first control signal to emit a first light having a first wavelength, a second control signal to emit a second light having a second wavelength, a third control signal to emit a third light having a third wavelength, and a fourth control signal to emit a fourth light having a fourth wavelength, a signal acquiring section that acquires a first to fourth intensity signals, a processor, and a memory that stores instructions. In the medical photometer, the first wavelength and the second wavelength are selected as two wavelengths at each of which an extinction coefficient of blood is a first value. The third wavelength and the fourth wavelength are selected as two wavelengths at each of which the extinction coefficient of the blood is a second value which is different from the first value.
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: May 9, 2023
    Assignee: NIHON KOHDEN CORPORATION
    Inventors: Yoshinori Ueda, Naoki Kobayashi, Kazumasa Ito, Hideki Fujisaki, Teiji Ukawa
  • Publication number: 20230121798
    Abstract: A material for forming an organic film, containing: a compound shown by formula (1); and an organic solvent. In formula (1), R1 represents one of the following formulae (2), R2 represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group, an alkynyloxy group, an alkenyloxy group, a linear, branched, or cyclic alkyl group, a trifluoromethyl group, or a trifluoromethyloxy group, “n” represents 0 or 1, “m” represents an integer of 1 to 3, “p” represents 0 or 1, “1” represents an integer of 0 to 2, and W represents a divalent organic group having 2 to 40 carbon atoms. The objective: a compound which allows the formation of an organic underlayer film having excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, favorable film-formability and adhesiveness to a substrate; and a material for forming an organic film containing the compound.
    Type: Application
    Filed: October 4, 2022
    Publication date: April 20, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke KORI, Naoki KOBAYASHI, Yasuyuki YAMAMOTO