Patents by Inventor Naoki Nakajo

Naoki Nakajo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6894317
    Abstract: A semiconductor element including an electrically insulating substrate, semiconductor layers including first and second semiconductor layers of different conduction types and formed on the electrically insulating substrate, a first electrode formed on the first semiconductor layer, and a second electrode formed on the second semiconductor layer revealed by etching at least the first semiconductor layer, wherein a die-bonding electrode is formed on a side surface of the second electrode, on a side surface of the second semiconductor layer and on a region of from a side surface to a bottom surface of the electrically insulating substrate. Metal-metal contact is formed between the die-bonding electrode and the side surface of the second electrode, so that low-resistance contact is obtained here.
    Type: Grant
    Filed: June 11, 2002
    Date of Patent: May 17, 2005
    Assignee: Toyoda Gosei Co., Ltd.
    Inventor: Naoki Nakajo
  • Publication number: 20050093008
    Abstract: A light emitting element has: a light emitting layer of semiconductor; and a diffusion layer that has a refractive index equal to or greater than that of the light emitting layer and that diffuses light emitted from the light emitting layer to increase the external radiation efficiency of the light emitting element. The light emitting layer has a refractive index equal to or greater than that of any layers formed between the light emitting layer and the diffusion layer.
    Type: Application
    Filed: October 28, 2004
    Publication date: May 5, 2005
    Applicant: Toyoda Gosei Co., Ltd.
    Inventors: Yoshinobu Suehiro, Naoki Nakajo
  • Publication number: 20040040152
    Abstract: Disclosed is a manufacturing method of a liquid jet recording head which includes a forming step of forming a recess portion between a flexible film wiring board and a recording element board, a providing step of providing in the recess portion an electrical connecting portion for electrically connecting the flexible film wiring board and the recording element board, a membrane curing step of injecting first resin into the recess portion to cure the first resin in a membrane form, and a covering step of covering an upper portion of the electrical connecting portion and the first resin with second resin subsequent to the membrane curing step. The electrical connecting portion is protected against liquid droplets and the like, and its electrical reliability is improved.
    Type: Application
    Filed: August 29, 2003
    Publication date: March 4, 2004
    Inventors: Hiroyuki Kigami, Manabu Tanimoto, Naoki Nakajo, Junichiro Iri
  • Publication number: 20020185647
    Abstract: A semiconductor element including an electrically insulating substrate, semiconductor layers including first and second semiconductor layers of different conduction types and formed on the electrically insulating substrate, a first electrode formed on the first semiconductor layer, and a second electrode formed on the second semiconductor layer revealed by etching at least the first semiconductor layer, wherein a die-bonding electrode is formed on a side surface of the second electrode, on a side surface of the second semiconductor layer and on a region of from a side surface to a bottom surface of the electrically insulating substrate. Metal-metal contact is formed between the die-bonding electrode and the side surface of the second electrode, so that low-resistance contact is obtained here.
    Type: Application
    Filed: June 11, 2002
    Publication date: December 12, 2002
    Inventor: Naoki Nakajo
  • Publication number: 20020043331
    Abstract: A wafer surface is irradiated with ultraviolet rays which has a central wavelength of 172 nm and which is emitted from an excimer lamp so that organic contaminations such as photo resist residues and so on are oxidized and removed from the wafer surface. Thus, cleaning of the wafer surface is carried out.
    Type: Application
    Filed: August 24, 2001
    Publication date: April 18, 2002
    Applicant: TOYODA GOSEI CO., LTD.
    Inventors: Toshiya Uemura, Naoki Nakajo