Abstract: A temporary protective film comprising a support film and an adhesive layer provided on one surface or both surfaces of the support film is disclosed. The coefficient of linear expansion at 30° C. to 200° C. of the temporary protective film may be greater than or equal to 16 ppm/° C. and less than or equal to 20 ppm/° C. in at least one in-plane direction of the temporary protective film.

Abstract: A temporary protective film for semiconductor sealing molding includes a support film and an adhesive layer provided on one surface or both surfaces of the support film and containing a resin and a silane coupling agent. The content of the silane coupling agent in the temporary protective film may be more than 5% by mass and less than or equal to 35% by mass with respect to the total mass of the resin.

Abstract: A temporary protective film for semiconductor encapsulation molding includes a support film and an adhesive layer. The adhesive layer contains a thermoplastic resin and at least one compound selected from the group consisting of sorbitol polyglycidyl ether, polyethylene glycol diglycidyl ether, a glycidyl ether of an aliphatic alcohol having 10 to 20 carbon atoms, glycerol polyglycidyl ether, a polyalkylene glycol ester of a fatty acid having 2 to 30 carbon atoms, a dipentaerythritol ester of a fatty acid having 2 to 20 carbon atoms, polyethylene glycol monoalkyl ether, and polyethylene glycol dialkyl ether.

Abstract: A temporary protective film for semiconductor encapsulation molding includes a support film and an adhesive layer. The adhesive layer contains a thermoplastic resin and a low-molecular-weight additive having a molecular weight of less than 1000. The adhesive layer is configured to contain the low-molecular-weight additive so that X2 is smaller than X1 when X1 is a proportion of an oxygen atom in a surface of a copper plate as determined after the temporary protective film is bonded to the surface of the copper plate in a direction in which the adhesive layer comes into contact with the copper plate to form a bonded body having the copper plate and the temporary protective film, and then the bonded body is initially heated at 180° C. for 1 hour, while X2 is a proportion of the oxygen atom in the surface of the copper plate as determined after the bonded body is subjected to a thermal treatment at 400° C. for 2 minutes subsequent to the initial heating.

Abstract: A reel body is the reel body in which an adhesive film having an adhesive layer on a base material layer is wound around a winding core. The adhesive film does not have a protective layer on the adhesive layer and is wound around the winding core in a state in which the adhesive layer and the base material layer are contiguous to each other in the radial direction of the winding core. A width of the winding core in an axial direction is smaller than a width of the adhesive film. In a rolled body of the adhesive film, an overhang portion jutting out in the axial direction of the winding core is provided.

Abstract: Provided is an adhesive film production apparatus for producing an adhesive film having an adhesive layer on a base material layer, the adhesive film production apparatus including: a feeding roller that continuously feeds a raw film of the adhesive film; a cutting part that cuts the raw film of the adhesive film into a plurality of adhesive films having predetermined widths; and a plurality of winding cores that wind each of the plurality of adhesive films, wherein each of the plurality of winding cores has a width larger than a width of the adhesive film as an object of winding.

Abstract: Provided is an adhesive film production apparatus for producing an adhesive film having an adhesive layer on a base material layer, the adhesive layer having an elastic modulus at 230° C. of 1 MPa or greater and having a glass transition temperature higher than normal temperature, the adhesive film production apparatus including a feeding roller; a cutting part; and a plurality of winding cores, wherein the raw film of the adhesive film is wound on the feeding roller such that the adhesive layer faces outward, and wherein in the conveyance path of the adhesive film traveling from the cutting part toward the winding core, the number of times of the adhesive layer of the adhesive film bending in a convex manner is set to be equal to or more than the number of times of the adhesive layer bending in a concave manner.

Abstract: A temporary protective film including a support film and an adhesive layer provided on one surface or both surfaces of the support film. The support film is a polyimide film. The thickness of the adhesive layer is less than 8 ?m.

Abstract: Disclosed is a temporary protective film for semiconductor sealing molding comprising: a support film; and an adhesive layer provided on one surface or both surfaces of the support film and containing a resin and a silane coupling agent, and the content of the silane coupling agent in the temporary protective film may be more than 5% by mass and less than or equal to 35% by mass with respect to the total mass of the resin.

Abstract: A temporary protective film for semiconductor sealing molding includes a support film and an adhesive layer provided on one surface or both surfaces of the support film and containing a resin and a silane coupling agent. The content of the silane coupling agent in the temporary protective film may be more than 5% by mass and less than or equal to 35% by mass with respect to the total mass of the resin.

Abstract: A temporary protective film for temporarily protecting a surface of a semiconductor substrate that is opposite to a surface on which a semiconductor element is mounted. The temporary protective film includes an adhesive layer containing acrylic rubber. When the temporary protective film is attached to a copper alloy plate at 25° C. so that the adhesive layer is in contact with the copper alloy plate, and the obtained laminate is sequentially heated at 180° C. for 60 minutes and at 200° C. for 60 minutes, a 90-degree peeling strength of the temporary protective film against the copper alloy plate is 5 N/m or more at 25° C. before heating the laminate and 150 N/m or less at 50° C. after heating the laminate.

Abstract: Disclosed is a temporary protective film for semiconductor sealing molding 10 including a support film 1; and an adhesive layer 2 provided on the support film 1 and containing an acrylic rubber. A solid shear modulus at 200° C. of the temporary protective film for semiconductor sealing molding 10 may be 5.0 MPa or higher.

Abstract: A temporary protective film comprising a support film and an adhesive layer provided on one surface or both surfaces of the support film is disclosed. The coefficient of linear expansion at 30° C. to 200° C. of the temporary protective film may be greater than or equal to 16 ppm/° C. and less than or equal to 20 ppm/° C. in at least one in-plane direction of the temporary protective film.

Abstract: Disclosed is a temporary protective film for semiconductor sealing molding comprising: a support film; and an adhesive layer provided on one surface or both surfaces of the support film and containing a resin and a silane coupling agent, and the content of the silane coupling agent in the temporary protective film may be more than 5% by mass and less than or equal to 35% by mass with respect to the total mass of the resin.

Abstract: Disclosed is a temporary protective film for semiconductor sealing molding 10 including a support film 1; and an adhesive layer 2 provided on the support film 1 and containing an acrylic rubber. A solid shear modulus at 200° C. of the temporary protective film for semiconductor sealing molding 10 may be 5.0 MPa or higher.