Patents by Inventor Naoto Ozawa

Naoto Ozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170072493
    Abstract: To provide a method for estimating a concentration of carboxylic acid gas, which is capable of measuring safely the concentration of carboxylic acid gas such as formic acid gas or the like in a chamber of a soldering apparatus in real time, and a soldering apparatus capable of estimating the concentration of the carboxylic acid gas in the chamber. The method includes the steps of measuring a surface temperature of a same object placed in the chamber at a same point in time by using a thermometer (first thermometer) for measuring a temperature without any influence of infrared absorption by carboxylic acid, and a radiation thermometer (second thermometer) for measuring a temperature by infrared in a wavelength region that the carboxylic acid absorbs, and estimating the concentration of the carboxylic acid gas in the chamber on the basis of a temperature difference (?Tx) between temperatures indicated by the first and second thermometers.
    Type: Application
    Filed: November 22, 2016
    Publication date: March 16, 2017
    Inventors: Hideo KOBAYASHI, Naoto OZAWA, Jun MATSUDA
  • Patent number: 9513211
    Abstract: To provide a method for estimating a concentration of carboxylic acid gas, which is capable of measuring safely the concentration of carboxylic acid gas such as formic acid gas or the like in a chamber of a soldering apparatus in real time, and a soldering apparatus capable of estimating the concentration of the carboxylic acid gas in the chamber. The method includes the steps of measuring a surface temperature of a same object placed in the chamber at a same point in time by using a thermometer (first thermometer) for measuring a temperature without any influence of infrared absorption by carboxylic acid, and a radiation thermometer (second thermometer) for measuring a temperature by infrared in a wavelength region that the carboxylic acid absorbs, and estimating the concentration of the carboxylic acid gas in the chamber on the basis of a temperature difference (?Tx) between temperatures indicated by the first and second thermometers.
    Type: Grant
    Filed: January 6, 2015
    Date of Patent: December 6, 2016
    Assignee: ORIGIN ELECTRIC COMPANY, LIMITED
    Inventors: Hideo Kobayashi, Naoto Ozawa, Jun Matsuda
  • Publication number: 20160334330
    Abstract: To provide a method for estimating a concentration of carboxylic acid gas, which is capable of measuring safely the concentration of carboxylic acid gas such as formic acid gas or the like in a chamber of a soldering apparatus in real time, and a soldering apparatus capable of estimating the concentration of the carboxylic acid gas in the chamber. The method includes the steps of measuring a surface temperature of a same object placed in the chamber at a same point in time by using a thermometer (first thermometer) for measuring a temperature without any influence of infrared absorption by carboxylic acid, and a radiation thermometer (second thermometer) for measuring a temperature by infrared in a wavelength region that the carboxylic acid absorbs, and estimating the concentration of the carboxylic acid gas in the chamber on the basis of a temperature difference (?Tx) between temperatures indicated by the first and second thermometers.
    Type: Application
    Filed: January 6, 2015
    Publication date: November 17, 2016
    Inventors: Hideo KOBAYASHI, Naoto OZAWA, Jun MATSUDA
  • Publication number: 20160220955
    Abstract: To provide a formic acid decomposition apparatus and method, which can dispose of formic acid safely and quickly and determine the activity of a filled catalyst. The apparatus is for decomposing formic acid contained in exhaust gas exhausted from a soldering apparatus in which a surface oxide film is reduced with formic acid, into water and carbon dioxide. The apparatus has a formic acid decomposition part in which a formic acid decomposition catalyst is filled; a gas introduction pipe for introducing gas containing formic acid into the decomposition part; and a gas introduction unit for introducing oxygen or gas containing oxygen into the decomposition part. In the apparatus, the activity of the catalyst is determined on the basis of an amount of change of a catalyst temperature by heat generation during a decomposition reaction of formic acid.
    Type: Application
    Filed: July 11, 2014
    Publication date: August 4, 2016
    Inventor: Naoto OZAWA
  • Patent number: 8409671
    Abstract: A method for forming a resin film is provided in which a liquid material is cured by shifting irradiation of light from a central side to an outer circumferential side of a substrate during or after spreading a liquid material on the substrate by rotation, in which the light is annular, and an inner diameter and an outer diameter of the annular light are increased concentrically in relation to a central axis of rotation as irradiation time progresses, so that the annular light shifts from the central side to the outer circumferential side of the substrate.
    Type: Grant
    Filed: August 22, 2007
    Date of Patent: April 2, 2013
    Assignee: Origin Electric Company, Limited
    Inventors: Naoto Ozawa, Takayuki Suzuki
  • Patent number: 8053878
    Abstract: A substrate including therein a plurality of conductor layers laminated via insulating layers, the substrate mounting at least one semiconductor integrated circuit, wherein the substrate includes a first electrode terminal connected to the semiconductor integrated circuit, a second electrode terminal connected to a terminal on an upper substrate arranged in a layer over the substrate, and on at least part of the perimeter of the first and second electrode terminals, a third electrode terminal located outside the outer edge of the upper substrate.
    Type: Grant
    Filed: November 8, 2007
    Date of Patent: November 8, 2011
    Assignee: Panasonic Corporation
    Inventors: Hiroki Iwamura, Naoto Ozawa, Hiroshi Hirai
  • Patent number: 7842202
    Abstract: In order to control a warp of a disc substrate so as to be a desired level, an optical disc production method includes: a step of supplying resin on the disc substrate; a step of mounting the disc substrate on an inside diameter portion of a turntable after supplying the resin; a step of providing an air-gap between an outside diameter portion of the turntable and a portion of the disc substrate that is not mounted; a step of extending the resin by spinning; and a curing step of curing the resin while spinning the disc substrate mounted on the inside diameter portion of the turntable, wherein in the step of extending the resin, a negative pressure is affected on a portion of the disc substrate that is not mounted, and in the curing step, the warp is controlled by curing the resin on the spinning disc substrate while maintaining effect of the negative pressure.
    Type: Grant
    Filed: December 27, 2006
    Date of Patent: November 30, 2010
    Assignee: Origin Electric Company Limited
    Inventors: Naoto Ozawa, Masahiro Nakamura, Takayuki Suzuki
  • Publication number: 20100028558
    Abstract: A method for forming a resin film is provided in which a liquid material is cured by shifting irradiation of light from a central side to an outer circumferential side of a substrate during or after spreading a liquid material on the substrate by rotation, in which the light is annular, and an inner diameter and an outer diameter of the annular light are increased concentrically in relation to a central axis of rotation as irradiation time progresses, so that the annular light shifts from the central side to the outer circumferential side of the substrate.
    Type: Application
    Filed: August 22, 2007
    Publication date: February 4, 2010
    Applicant: ORIGIN ELECTRIC COMPANY, LIMITED
    Inventors: Naoto Ozawa, Takayuki Suzuki
  • Publication number: 20090040913
    Abstract: In order to control a warp of a disc substrate so as to be a desired level, an optical disc production method includes: a step of supplying resin on the disc substrate; a step of mounting the disc substrate on an inside diameter portion of a turntable after supplying the resin; a step of providing an air-gap between an outside diameter portion of the turntable and a portion of the disc substrate that is not mounted; a step of extending the resin by spinning; and a curing step of curing the resin while spinning the disc substrate mounted on the inside diameter portion of the turntable, wherein in the step of extending the resin, a negative pressure is affected on a portion of the disc substrate that is not mounted, and in the curing step, the warp is controlled by curing the resin on the spinning disc substrate while maintaining effect of the negative pressure.
    Type: Application
    Filed: December 27, 2006
    Publication date: February 12, 2009
    Inventors: Naoto Ozawa, Masahiro Nakamura, Takayuki Suzuki
  • Publication number: 20090029063
    Abstract: A resin film forming device is provided which includes a spinner on which a circular disc having a hole at the center thereof is mounted, the spinner making the disc spin about the hole; a resin supply unit which applies resin around the hole of the disc; and a light irradiation unit which irradiates the resin on the disc mounted on the spinner with light to cure the resin, the light irradiation unit shifting a light irradiation position from an inner circumference side toward an outer circumference side of the disc mounted on the spinner, and stopping the light irradiation before the light irradiation unit reaches the outer circumference of the disc.
    Type: Application
    Filed: February 5, 2007
    Publication date: January 29, 2009
    Inventors: Hideyuki Kokaji, Naoto Ozawa
  • Publication number: 20080105964
    Abstract: A substrate including therein a plurality of conductor layers laminated via insulating layers, the substrate mounting at least one semiconductor integrated circuit, wherein the substrate includes a first electrode terminal connected to the semiconductor integrated circuit, a second electrode terminal connected to a terminal on an upper substrate arranged in a layer over the substrate, and on at least part of the perimeter of the first and second electrode terminals, a third electrode terminal located outside the outer edge of the upper substrate.
    Type: Application
    Filed: November 8, 2007
    Publication date: May 8, 2008
    Inventors: Hiroki Iwamura, Naoto Ozawa, Hiroshi Hirai
  • Publication number: 20080057181
    Abstract: With respect to a liquid material such as an adhesive supplied at an inside portion between substrates, or the liquid material supplied to the inside portion on a substrate, a step of extending by rotation at a high speed and a step of rotating at a low speed are repeatedly and alternately conducted, and radiation of light is continuously or intermittently moved in order to gradually semi-cure or cure the liquid material in a radial direction from inside to outside. Therefore, the thickness of a resin layer made from the liquid material is gradually fixed in a radial direction from inside to outside.
    Type: Application
    Filed: September 14, 2004
    Publication date: March 6, 2008
    Applicant: ORIGIN ELECTRIC COMPANY, LIMITED
    Inventors: Hideo Kobayashi, Takayuki Suzuki, Naoto Ozawa
  • Publication number: 20060153054
    Abstract: An optical disk manufacturing method including a process of toroidally supplying a first resin on one side of a first disk substrate having an aperture at the center, in a region adjacent to the perimeter of the aperture; a process of rotating the first disk substrate provided with the first resin at a first rotational speed, and spreading the first resin; a process of curing the spread first resin in the surrounding vicinity of the aperture; a process of toroidally supplying a second resin that is superimposed on the first resin of the first disk substrate on which the first resin has cured, in the region adjacent to the perimeter of the aperture; a process of rotating the first disk substrate provided with the second resin at a second rotational speed, and spreading the second resin; and a process of curing the spread second resin.
    Type: Application
    Filed: January 3, 2006
    Publication date: July 13, 2006
    Inventors: Hideo Kobayashi, Takayuki Suzuki, Masahiro Nakamura, Naoto Ozawa