Patents by Inventor Naoyuki Okamura

Naoyuki Okamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Processing apparatus and processing method
    Patent number: 8002894
    Abstract: In a processing apparatus including a diaphragm valve provided on a process gas discharge line for discharging a process gas from a processing chamber and configured to control the internal pressure of the processing chamber by adjusting the opening of the diaphragm valve, an antistatic agent source is connected to the process gas discharge line at a position upstream of the diaphragm valve. Damage of a diaphragm valve element due to spark discharge resulted from electric charge generated by friction between the gas flowing through the diaphragm valve and the diaphragm valve element can be prevented.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: August 23, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Jiro Higashijima, Naoyuki Okamura, Kousuke Maeda
  • Processing apparatus and processing method
    Publication number: 20070292611
    Abstract: In a processing apparatus including a diaphragm valve provided on a process gas discharge line for discharging a process gas from a processing chamber and configured to control the internal pressure of the processing chamber by adjusting the opening of the diaphragm valve, an antistatic agent source is connected to the process gas discharge line at a position upstream of the diaphragm valve. Damage of a diaphragm valve element due to spark discharge resulted from electric charge generated by friction between the gas flowing through the diaphragm valve and the diaphragm valve element can be prevented.
    Type: Application
    Filed: June 1, 2007
    Publication date: December 20, 2007
    Inventors: Jiro Higashijima, Naoyuki Okamura, Kousuke Maeda