Abstract: The invention relates to a substrate (10), provided with a thin-film multilayer comprising an alternation of n functional layers (40, 80) having reflection properties in the infrared and/or in solar radiation and (n+1) coatings (20, 60, 100), where n is an integer ?2, said coatings being composed of a plurality of dielectric layers (24, 26; 64, 66; 104), so that each functional layer (40, 80) is placed between two coatings (20, 60, 100), at least two functional layers (40, 80) each being deposited on a wetting layer (30, 70) itself deposited respectively directly onto a subjacent coating (20, 60), characterized in that two subjacent coatings (20, 60) each comprise at least one dielectric layer (24, 64) and at least one noncrystalline smoothing layer (26, 66) made from a material that is different from the material of said dielectric layer within each coating, said smoothing layer (26, 66) being in contact with said superjacent wetting layer (30, 70) and in that these two subjacent coatings (20, 60) being of d

Abstract: Process for the vacuum deposition of at least one boron-based thin film on a substrate, characterized in that: at least one sputtering species that is chemically inactive or active with respect to boron is chosen; a collimated beam of ions comprising predominantly said sputtering species is generated using at least one linear ion source positioned within an installation of industrial size; said beam is directed onto at least one boron-based target; and at least one surface portion of said substrate facing said target is positioned in such a way that said material sputtered by the ion bombardment of the target or a material resulting from the reaction of said sputtered material with at least one of the sputtering species is deposited on said surface portion.

Abstract: Method for the treatment of at least one surface portion of at least one layer A located between a substrate and a layer B of a thin-film multilayer, the layers of which are vacuum-deposited on the substrate having a glass function, according to the invention, is characterized in that: at least one thin layer A is deposited on a surface portion of said substrate, this deposition phase being carried out by a vacuum deposition process; using at least one linear ion source, a plasma of ionized species is generated from a gas or from a gas mixture; at least one surface portion of the layer A is subjected to said plasma so that said ionized species at least partly modifies the surface state of the layer A; and at least one layer B is deposited on a surface portion of the layer A, this deposition phase being carried out by a vacuum deposition process.

Abstract: Method of producing a target by thermal spraying, especially by plasma spraying, said target comprising at least one compound based on atoms of different types chosen especially from the constituents M belonging to the (Zr, Mo, Ti, Nb, Ta, Hf, Cr) family and silicon, characterized in that at least one fraction of said compound, the constituents of which are bonded by covalent and/or ionic and/or metallic bonds, is injected into a plasma jet, said plasma jet spraying the constituents of said compound onto the target so as to deposit a coating of said compound on a surface portion of said target.

Abstract: The invention relates to a method of modifying a layer having photocatalytic and anti-fouling properties which is based on titanium dioxide (TiO2) and which can absorb photons in the UV region and, in particular, in the UVA region, in order to render same capable of absorbing photons in the visible spectrum, said TiO2-based layer being applied to a substrate either directly or with the insertion of at least one functional sub-layer. The invention is characterised in that the TiO2-based layer is subjected to a heat treatment in an atmosphere comprising nitrogen or nitrogen and at least one reducing gas for a sufficient period of time in order to obtain the desired visible photon absorption property, said substrate and, if necessary, said sub-layer(s) having been selected for their ability to withstand the heat treatment.

Abstract: Transparent substrate (6) comprising an antireflection coating on at least one of its faces, especially at normal incidence, made from a thin-film multilayer (A), characterized in that the multilayer comprises, in succession: a first layer (1), having a refractive index n1 of between 1.8 and 2.3 and a geometrical thickness e1 of between 5 and 50 nm; a second layer (2), having a refractive index n2 of between 1.35 and 1.65 and a geometrical thickness e2 of between 5 and 50 nm; a third layer (3), having a refractive index n3 of between 1.8 and 2.3 and a geometrical thickness e3 of between 40 and 150 nm; and a fourth layer (4), having a refractive index n4 of between 1.35 and 1.65 and a geometrical thickness e4 of between 40 and 150 nm.

Abstract: Method for the continuous vacuum cleaning of a substrate, characterized in that: a species is chosen that has a low sputtering efficiency and is chemically active with regard to the soiling matter; using at least one linear ion source, a plasma is generated from a gas mixture comprising predominantly the species having a low sputtering efficiency, especially one based on oxygen; and at least one surface portion of said substrate is subjected to said plasma so that said ionized species at least partly eliminates, by chemical reaction, the soiling matter possibly adsorbed or located on said surface portion.

Abstract: The invention relates to a structure, comprising a substrate supporting a layer with a photocatalytic and anti-soiling property on at least part of the surface thereof, said layer being based on titanium dioxide (TiO2) which is at least partially crystallized in the anatase form thereof. Said structure is characterised in comprising a sublayer (SC) directly under at least one TiO2 layer, said sublayer having a crystallographic structure which provides assistance to crystallization by heteroepitaxial growth in the anatase form of the TiO2-based upper layer, the photocatalytic property being obtained without any heating step.

Abstract: The invention relates to a transparent substrate provided with a thin-film multilayer comprising at least one functional metal layer, especially a silver-based layer, having reflection properties in the infrared and/or in the solar radiation range, at least one metal barrier layer in contact with the functional layer and at least one upper dielectric layer, characterized in that at least one barrier layer is based on zirconium and in that the upper dielectric layer comprises at least one ZnO-based layer in contact with the functional layer or with the barrier layer.

Abstract: The subject of the invention is a transparent substrate, especially made of glass, provided with a thin-film stack comprising a plurality of functional layers, characterized in that said thin-film stack comprises at least three silver-based functional layers, in that said stack has a resistance R?<1.5? per square and in that said substrate may undergo at least one transformation operation involving a heat treatment at a temperature of at least 500° C., so as to make it possible to achieve, using the substrate, alternatively or cumulatively, thermal control and/or electromagnetic shielding and/or heating.

Abstract: The subject of the invention is glazing comprising at least one transparent substrate provided with a stack of thin layers consisting of an alternation of n functional layers having reflection properties in the infrared and/or the solar radiation range and of n+1 coatings composed of one or more layers made of a dielectric, so that each functional layer is placed between two coatings. At Least one layer absorbent in the visible is inserted between two layers of dielectric of at least one of the said coatings.

Abstract: The invention relates to a transparent substrate, especially of the glass type, which comprises a coating that contains at least one layer C based on silicon or aluminum [nitride, carbonitride, oxynitride or oxycarbonitride] or on a mixture of the two, which is surmounted by a cover layer, characterized in that the cover layer is an oxide-base mechanical protection layer, this oxide being optionally oxygen-substoichiometric or oxygen-superstoichiometric and/or optionally nitrided. Application to the production of a glazing assembly, especially a multiple or laminated glazing assembly.

Abstract: The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) coming from an ion source (4), characterized in that said dielectric layer exposed to the ion beam has a refractive index that can be adjusted according to the parameters of the ion source, said ion source being a linear source.

Abstract: The invention relates to glazing that comprises at least one transparent substrate S provided with a stack of thin layers comprising an alternation of n functional layers A having reflection properties in the infrared and/or in solar radiation, especially metal layers, and (n+1) coatings B made of a dielectric, where n?1. The stack satisfies the following criteria: at least one functional layer A is (i) directly in contact with the dielectric coating B placed on top of it and (ii) in contact with the dielectric B placed beneath it via a layer C that absorbs at least in the visible, of the metallic, optionally nitride, type.

Abstract: The invention relates to a method for preparing a material exhibiting photocatalytic properties and comprising at least partially crystallised titanium oxide, in particular in the form of anatase at temperatures higher than 600° C. Said invention also relates to a glass sheet whose at least one face is coated with a material which contains titanium oxide and is thermally treatable at a temperature higher than 600° C. by such methods as quenching and/or bowing, but preserving the photocatalytic activity and required optical properties thereof for a clean-surface glazing. The invention also relates to a monolithic foliated glazing which is simple or multilayer and comprises said glass sheet, and to the use of said glazing for a building, a transport vehicle, as an ordinary glazing, for interior use, street furniture, mirror, a display system screen and photovolatic glazing.

Abstract: A transparent substrate (6), comprising on at least one of its faces an antireflection coating, particularly at normal incidence made of a multilayer (A) of thin layers, characterized in that the multilayer comprises, in succession: a first layer (1), with a refractive index n1 of between 1.8 and 2.2 and geometrical thickness e1 of between 5 and 50 nm, a second layer (2), with a refractive index n2 of between 1.35 and 1.65 and a geometrical thickness e2 of between 5 and 50 nm, a third layer (3) with a refractive index n3 of between 1.8 and 2.2 and a geometrical thickness e3 of between 40 and 150 nm, a fourth layer (4) with a refractive index n4 of between 1.35 and 1.

Abstract: A transparent substrate and methods of making a transparent substrate having, on at least one of its faces, an antireflection coating made of a multilayer stack of alternating thin layers of high and low refractive indices. Preferably, the thin layers are based on a dielectric material. At least one of the thin high-index layers comprises titanium oxide which is modified so as to reduce its refractive index to a value of at most 2.40, preferably to a value of at most 2.35.

Abstract: The subject of the invention is glazing comprising at least one transparent substrate provided with a stack of thin layers consisting of an alternation of n functional layers having reflection properties in the infrared and/or the solar radiation range and of n+1 coatings composed of one or more layers made of a dielectric, so that each functional layer is placed between two coatings. At Least one layer absorbent in the visible is inserted between two layers of dielectric of at least one of the said coatings.

Abstract: The invention concerns a method from cathode spray deposition of a coating with photocatalytic properties comprising titanium oxide at least partly crystallised in anastatic form on a transparent or semi-transparent support substrate, such as glass, vitroceramic, plastic. The substrate is sprayed under a pressure of at least 2 Pa. The invention also concerns the resulting coated substrate, wherein said substrate constitutes the top layer of a series of thin antiglare layers.

Abstract: The invention relates to glazing that comprises at least one transparent substrate S provided with a stack of thin layers comprising an alternation of n functional layers A having reflection properties in the infrared and/or in solar radiation, especially metal layers, and (n+1) coatings B made of a dielectric, where n≧1. The stack satisfies the following criteria: at least one functional layer A is (i) directly in contact with the dielectric coating B placed on top of it and (ii) in contact with the dielectric B placed beneath it via a layer C that absorbs at least in the visible, of the metallic, optionally nitride, type.