Patents by Inventor Nobuhiro Hayashi

Nobuhiro Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180135192
    Abstract: The present invention provides an electrolyzing apparatus that includes a detector configured to detect an abnormality in a electrolytic bath and thereby enables a quick detection of the occurrence of the abnormality and that is less prone to a malfunction in which, due to an environmental change, a normal state is misjudged as abnormal and electrolysis is stopped. An electrolyzing apparatus of the present invention includes an electrolyzing section and a detecting section, the electrolyzing section being configured to receive an electrolytic substance, electrolyze the electrolytic substance to obtain an electrolysis product, and discharge the electrolysis product. The electrolyzing section includes electrolysis electrodes.
    Type: Application
    Filed: August 21, 2015
    Publication date: May 17, 2018
    Inventors: NOBUTOSHI ARAI, NOBUHIRO HAYASHI, KEIICHIRO WATANABE, HIROYUKI AKUZAWA
  • Patent number: 9947904
    Abstract: The present invention (i) uses a mask unit (80) including: a shadow mask (81) that has an opening (82) and that is smaller in area than a vapor deposition region (210) of a film formation substrate (200) and; a vapor deposition source (85) that has a emission hole (86) for emitting a vapor deposition particle, the emission hole (86) being provided so as to face the shadow mask (81), the shadow mask (81) and the vapor deposition source (85) being fixed in position relative to each other, (ii) adjusts an amount of a void between the shadow mask (81) and the film formation substrate (200), (iii) moves at least a first one of the mask unit (80) and the film formation substrate (200) relative to a second one thereof while uniformly maintaining the amount of the void between the mask unit (80) and the film formation substrate (200), and (iv) sequentially deposit the vapor deposition particle onto the vapor deposition region (210) through the opening (82) of the shadow mask (81).
    Type: Grant
    Filed: July 25, 2016
    Date of Patent: April 17, 2018
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Tohru Sonoda, Nobuhiro Hayashi, Shinichi Kawato
  • Publication number: 20180073230
    Abstract: Problem: Provided is a flush toilet capable of increasing the volume of a waste conveyance flow, thereby improving a waste conveyance capability. Solution: The flush toilet includes: a toilet main unit (2) comprising a discharge conduit (16) communicated with the discharge trap pipe. The discharge conduit includes a flow dividing section (26) provided on a downstream side of an upstream discharge conduit section, and a delaying flow passage (28) branched from the flow dividing section. An inward region of the skirt portion includes: a central region (D) and a lateral region (E). The delaying flow passage (28) forms a passage in the lateral region (E) and merges leading flush water having flowed into the delaying flow passage from the flow dividing section (26) with a flush water flow reaching the flow dividing section at a timing after the inflow of the flush water to the delaying flow passage.
    Type: Application
    Filed: September 8, 2017
    Publication date: March 15, 2018
    Applicant: TOTO LTD.
    Inventors: Takahiro NAKASHIMA, Nobuhiro HAYASHI, Hidekazu KITAURA, Haruka SAITO, Isami SAKABA
  • Publication number: 20180074014
    Abstract: An object is to provide an electrophoretic support body and an electrophoretic device which allow a potential of hydrogen (pH) to be easily and reproducibly adjusted. The electrophoretic support body in the present disclosure is an electrophoretic support body including a plurality of fibers, the plurality of fibers form a fibrous body having a void in the fibrous body, and the plurality of fibers include a metal oxide having a predetermined isoelectric point. The electrophoretic device in the present disclosure includes a container, a pair of first electrodes provided in the container, and a first electrophoretic support body disposed between the pair of first electrodes, the first electrophoretic support body includes a fibrous body that is formed of a plurality of fibers and has a void in the fibrous body, and the plurality of fibers include a metal oxide having a predetermined isoelectric point.
    Type: Application
    Filed: March 25, 2016
    Publication date: March 15, 2018
    Inventors: HIROAKI OKA, TAKESHI YANAGIDA, NOBUHIRO HAYASHI
  • Publication number: 20180073236
    Abstract: Problem: Provided is a flush toilet capable of increasing the volume of a waste conveyance flow for washing down waste thereby improving a waste conveyance capability. Solution: The flush toilet includes: a discharge conduit (16) communicated with the discharge trap pipe. The discharge conduit includes: a flow dividing section (26); and a delaying flow passage (28) branched from the flow dividing section. The flow dividing section has a guide portion (32) configured to guide relatively low-speed flush water along the guide portion to the delaying flow passage. The delaying flow passage (28) is configured such that flush water having flowed into the delaying flow passage along the guide portion (32) is enabled to merge with a flush water flow reaching the flow dividing section at a timing after the inflow of the flush water to the delaying flow passage.
    Type: Application
    Filed: September 8, 2017
    Publication date: March 15, 2018
    Applicant: TOTO LTD.
    Inventors: Nobuhiro HAYASHI, Hidekazu KITAURA, Takahiro NAKASHIMA, Haruka SAITO, Isami SAKABA
  • Publication number: 20170314179
    Abstract: A washing machine of the present invention includes an electrolyzed water generating unit and a wash tub. The electrolyzed water generating unit includes an electrolytic solution supplying unit and an electrolysis unit including an electrolysis electrode pair. The electrolytic solution supplying unit is provided so as to supply an aqueous solution of an electrolyte for generating electrolyzed water to the electrolysis unit. The electrolyte for generating electrolyzed water contains an alkali metal chloride and a substance that makes an aqueous solution acidic. The electrolysis unit is provided so that the aqueous solution of the electrolyte for generating electrolyzed water is electrolyzed using the electrolysis electrode pair to generate an electrolyzed water. The electrolyzed water generating unit is provided so as to supply the electrolyzed water generated by the electrolysis unit to the wash tub.
    Type: Application
    Filed: January 28, 2015
    Publication date: November 2, 2017
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Nobutoshi ARAI, Nobuhiro HAYASHI
  • Publication number: 20170298552
    Abstract: An electrolyzed water generating device of the present invention includes an electrolytic solution supplying unit and an electrolysis unit including an electrolysis electrode pair. The electrolytic solution supplying unit is provided so as to supply an aqueous solution of an electrolyte for generating electrolyzed water to the electrolysis unit. The electrolysis unit is provided so that the aqueous solution of the electrolyte for generating electrolyzed water is electrolyzed using the electrolysis electrode pair to generate an electrolyzed water. The electrolyte for generating electrolyzed water contains an alkali metal chloride and a substance that makes an aqueous solution acidic. The electrolyzed water generating device generates an electrolyzed water having a pH of more than 6.5 and less than 8.0.
    Type: Application
    Filed: January 28, 2015
    Publication date: October 19, 2017
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Nobutoshi ARAI, Yasuhiro SAKAMOTO, Nobuhiro HAYASHI
  • Patent number: 9777376
    Abstract: Provided is a film-forming apparatus capable of cleaning a discharge apparatus under a state in which a film-forming space and a cleaning gas ambience are separated from each other while continuing to form a film on an object to be film-formed having a film-like shape.
    Type: Grant
    Filed: July 3, 2014
    Date of Patent: October 3, 2017
    Assignee: ULVAC, INC.
    Inventors: Yixin Yang, Yoshiyuki Mitsuhashi, Masayuki Iijima, Sadatsugu Wakamatsu, Kazuhiko Saito, Tomoharu Fujii, Tsuyoshi Yoshimoto, Togo Hosoya, Takayoshi Hirono, Nobuhiro Hayashi, Nobuaki Kakutani, Naoki Sunagawa, Isao Tada, Hiroyuki Hirano
  • Publication number: 20170145571
    Abstract: An electrolysis device of the present invention includes an electrolysis unit. The electrolysis unit includes a channel for fluid to be treated, at least one electrolysis electrode pair, a flow inlet, and a flow outlet. The electrolysis electrode pair is disposed so as to incline with respect to a vertical direction and includes an upper electrode and a lower electrode disposed so as to face each other. The channel for fluid to be treated is disposed so that a fluid that has flowed in from the flow inlet flows through an interelectrode channel between the upper electrode and the lower electrode from a lower side to an upper side and flows out from the flow outlet.
    Type: Application
    Filed: January 28, 2015
    Publication date: May 25, 2017
    Inventors: Nobutoshi ARAI, Yasuhiro SAKAMOTO, Nobuhiro HAYASHI
  • Patent number: 9580791
    Abstract: A vapor deposition mask (70) includes a first layer (71), a second layer (72) and a third layer (73) in this order. A plurality of first openings (71h), a plurality of second openings (72h) and a plurality of third openings (73h) are formed respectively in the first layer, the second layer and the third layer. The first openings, the second openings and the third openings communicate with each other, thereby constituting mask openings (75). The opening dimension of the second openings is larger than the opening dimension of the first openings and is larger than the opening dimension of the third openings. With this configuration, it is possible to prevent reduction of the opening dimension of the mask openings or clogging of the mask openings due to the vapor deposition particles adhering to the mask openings.
    Type: Grant
    Filed: April 26, 2011
    Date of Patent: February 28, 2017
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Satoshi Inoue, Shinichi Kawato, Nobuhiro Hayashi, Tohru Sonoda
  • Patent number: 9575305
    Abstract: A digital microscope apparatus includes an illumination optical system configured to emit illumination light; a stage having an opening capable of transmitting the light therethrough, on which a preparation can be placed in accordance with a position of the opening; an enlarging imaging unit including an objective lens configured to enlarge an image and disposed to face the system with the stage disposed therebetween, and an imaging device configured to capture an image enlarged by the lens; a white image acquiring unit configured to open the opening, to cause the system to emit the light in a state where an image point of the system is aligned with a focal point of the lens, and to acquire, as a white image, an image formed on an imaging surface of the device; and a calculation unit configured to use the captured white image to calculate a shading correction coefficient.
    Type: Grant
    Filed: March 7, 2014
    Date of Patent: February 21, 2017
    Assignee: Sony Corporation
    Inventors: Norihiro Tanabe, Ryu Narusawa, Nobuhiro Hayashi, Takamichi Yamakoshi, Takashi Yamamoto
  • Publication number: 20160336544
    Abstract: The present invention (i) uses a mask unit (80) including: a shadow mask (81) that has an opening (82) and that is smaller in area than a vapor deposition region (210) of a film formation substrate (200) and; a vapor deposition source (85) that has a emission hole (86) for emitting a vapor deposition particle, the emission hole (86) being provided so as to face the shadow mask (81), the shadow mask (81) and the vapor deposition source (85) being fixed in position relative to each other, (ii) adjusts an amount of a void between the shadow mask (81) and the film formation substrate (200), (iii) moves at least a first one of the mask unit (80) and the film formation substrate (200) relative to a second one thereof while uniformly maintaining the amount of the void between the mask unit (80) and the film formation substrate (200), and (iv) sequentially deposit the vapor deposition particle onto the vapor deposition region (210) through the opening (82) of the shadow mask (81).
    Type: Application
    Filed: July 25, 2016
    Publication date: November 17, 2016
    Inventors: Tohru SONODA, Nobuhiro HAYASHI, Shinichi KAWATO
  • Patent number: 9458532
    Abstract: The present invention (i) uses a mask unit (80) including: a shadow mask (81) that has an opening (82) and that is smaller in area than a vapor deposition region (210) of a film formation substrate (200) and; a vapor deposition source (85) that has a emission hole (86) for emitting a vapor deposition particle, the emission hole (86) being provided so as to face the shadow mask (81), the shadow mask (81) and the vapor deposition source (85) being fixed in position relative to each other, (ii) adjusts an amount of a void between the shadow mask (81) and the film formation substrate (200), (iii) moves at least a first one of the mask unit (80) and the film formation substrate (200) relative to a second one thereof while uniformly maintaining the amount of the void between the mask unit (80) and the film formation substrate (200), and (iv) sequentially deposit the vapor deposition particle onto the vapor deposition region (210) through the opening (82) of the shadow mask (81).
    Type: Grant
    Filed: September 10, 2010
    Date of Patent: October 4, 2016
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Tohru Sonoda, Nobuhiro Hayashi, Shinichi Kawato
  • Patent number: 9391275
    Abstract: A vapor deposition source (60), a plurality of control plates (80) and a vapor deposition mask (70) are disposed in this order. A substrate (10) is moved relative to the vapor deposition mask in a state in which the substrate and the vapor deposition mask are spaced apart at a fixed interval. Vapor deposition particles (91) discharged from a vapor deposition source opening (61) of the vapor deposition source pass through neighboring inter-control plate spaces (81) and mask openings (71) formed in the vapor deposition mask, and then adhere to the substrate to form a coating film (90). At least a part of the coating film is formed by the vapor deposition particles that have passed through two or more different inter-control plate spaces. It is thereby possible to form a coating film in which edge blur and variations in the thickness are suppressed.
    Type: Grant
    Filed: August 17, 2011
    Date of Patent: July 12, 2016
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Tohru Sonoda, Nobuhiro Hayashi, Shinichi Kawato, Satoshi Inoue
  • Patent number: 9264587
    Abstract: An image transfer system configured with an image transmission apparatus, an image transfer apparatus and the image saving apparatus. The image transmission apparatus transmits image data recorded in a storage medium to the image transfer apparatus. The image transfer apparatus receives the image data, records the image data into a first storage device and transfers the image data to the image saving apparatus in response to a request issued from the image saving apparatus. The image saving apparatus receives the image data and records the image data into a second storage device. The image saving apparatus includes: the second storage device; a communication unit; a recording control unit for controlling read/write of management information; a request receiving unit from a user; a decision-making unit as to whether or not target image data are recorded; an image requesting unit for the target image data; and an image recording unit.
    Type: Grant
    Filed: September 3, 2013
    Date of Patent: February 16, 2016
    Assignee: NIKON CORPORATION
    Inventors: Hiromi Kuwata, Nobuhiro Hayashi, Atsushi Ohori
  • Patent number: 9246101
    Abstract: A deposition mask is used to pattern a thin film 3 on a substrate 10 by depositing deposition particles through a plurality of openings K having a stripe pattern. The deposition mask includes a frame 65; a plurality of mask layers 70 provided in the frame so as to overlap each other; and a support layer 71 provided between the mask layers 70. Each of the mask layers 70 is formed by arranging a plurality of mask wires 72 in a stripe pattern in a tensioned state, and the support layer 71 is formed by arranging a plurality of support wires 74 in a tensioned state so as to cross the mask wires 72. A plurality of gaps 73 in each of the plurality of mask layers 70 overlap each other to form a plurality of through gaps 73a that linearly extend through all of the plurality of mask layers 70. The openings K are formed by the through gaps 73a.
    Type: Grant
    Filed: October 29, 2010
    Date of Patent: January 26, 2016
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Tohru Sonoda, Nobuhiro Hayashi, Shinichi Kawato
  • Patent number: 9231210
    Abstract: A vapor deposition source (60), a plurality of limiting plates (81) and a vapor deposition mask (70) are disposed in this order. A substrate spaced apart from the vapor deposition mask at a fixed interval is moved relative to the vapor deposition mask. Vapor deposition particles (91) discharged from vapor deposition source openings (61) of the vapor deposition source pass through between neighboring limiting plates, pass through mask openings (71) formed in the vapor deposition mask, and adhere to the substrate, whereby coating films (90) are formed. The limiting plates limit the incidence angle of the vapor deposition particles that enter the mask openings, as viewed in the relative movement direction of the substrate. In this way, an organic EL element can be formed on a large-sized substrate without increasing the pixel pitch or reducing the aperture ratio.
    Type: Grant
    Filed: May 2, 2011
    Date of Patent: January 5, 2016
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Shinichi Kawato, Nobuhiro Hayashi, Tohru Sonoda, Satoshi Inoue
  • Patent number: 9170281
    Abstract: A current measurement apparatus includes multiple GMR elements and a calculation unit. The multiple GMR elements each include a pinned magnetic layer having a pinned magnetization direction, and a free magnetic layer having a magnetization direction to be changed by an external magnetic field. The calculation unit obtains the magnitude of a current to be detected, from outputs of the multiple GMR elements. The multiple GMR elements are disposed in ring shape around a conductor through which the current to be detected flows, and are electrically connected so as to form a series variable resistor by using the multiple GMR elements. The magnetization directions of the pinned magnetic layers are pinned in the same direction when viewed from an extension direction of the conductor at each of the positions of the elements.
    Type: Grant
    Filed: September 10, 2012
    Date of Patent: October 27, 2015
    Assignee: ALPS GREEN DEVICES CO., LTD.
    Inventors: Nobuhiro Hayashi, Tatsuya Kogure, Akira Takahashi
  • Publication number: 20150264788
    Abstract: Provided is a static eliminator and a static elimination head which are capable of sufficiently eliminating static electricity irrespective of a surrounding environment thereof. Humidified air is generated by humidification of air by the humidified air generating part. The humidified air is allowed to flow out of an air flow outlet of a static elimination head. Further, one or a plurality of static elimination needles and a ground electrode are held in the static elimination head. A voltage for generating corona discharge is applied by a power supply device between the one or the plurality of static elimination needles and the ground electrode. The one or plurality of static elimination needles are arranged in the static elimination head such that ions generated by the corona discharge are sent out by the humidified air that is allowed to flow out of the air flow outlet.
    Type: Application
    Filed: February 23, 2015
    Publication date: September 17, 2015
    Applicant: KEYENCE CORPORATION
    Inventors: Nobuhiro Hayashi, Saeyoung Yang
  • Patent number: 9110306
    Abstract: A tissue-slice image acquirement and display apparatus includes: an entire-image acquirer that acquires a bright-field image of an entirety of a first slice of a tissue and a dark-field image of an entirety of a second slice of the tissue; a modifier that modifies a profile shape of a slice portion in the dark-field image on the basis of a profile shape of a slice portion in the bright-field image; a magnified-image acquirer that determines a range encompassing the second slice on the basis of the profile shape of the modified slice portion and that acquires, in a dark field, a magnified image of the second slice in the determined range; and a display controller that causes the bright-field image to be displayed and that causes a portion of the magnified image, the portion corresponding to a position selected in the bright-field image, to be displayed.
    Type: Grant
    Filed: August 24, 2010
    Date of Patent: August 18, 2015
    Assignee: Sony Corporation
    Inventors: Nobuhiro Hayashi, Koichiro Kishima, Takashi Yamamoto, Nobuhiro Kihara, Takamichi Yamakoshi, Fumiyasu Suzuki, Ryu Narusawa