Abstract: [Object] To provide a slide tray having excellent practicality, convenience, and the like. [Solving Means] A slide tray includes a slide tray body having a first surface on which one or more slides can be mounted, and one or more first convex portions that protrude from the first surface of the slide tray body and set an area in which paper sheets can be mounted on the first surface while being held from one side in a first axis direction of two axis directions orthogonal to each other on the first surface.

Abstract: A deposition apparatus 50 forms a thin film 3 in a predetermined pattern on a substrate 10 for an organic EL display. A first correction plate 81 and a second correction plate 82 are placed between a shadow mask 60 and a deposition source 53 that emits deposition particles. Each of the correction plates 81, 82 has a plurality of blade plates 83 and a frame 84 that supports the plurality of blade plates 83. The blade plates 83 are placed so as to be tilted with respect to the shadow mask 60, and to extend parallel to each other with an opening 86 between adjoining ones of the blade plates 83 as viewed in a direction perpendicular the deposition mask 60.

Abstract: Provided is an information processing apparatus including a detection unit configured to detect a failure requiring reimaging relating to an image captured using a digital microscope by evaluating the image, and a generation unit configured to, if the failure was detected by the detection unit, generate setting information for setting an imaging condition for during reimaging.

Abstract: Provided is a film-forming apparatus capable of cleaning a discharge apparatus under a state in which a film-forming space and a cleaning gas ambience are separated from each other while continuing to form a film on an object to be film-formed having a film-like shape.

Abstract: A digital microscope apparatus includes an illumination optical system configured to emit illumination light; a stage having an opening capable of transmitting the light therethrough, on which a preparation can be placed in accordance with a position of the opening; an enlarging imaging unit including an objective lens configured to enlarge an image and disposed to face the system with the stage disposed therebetween, and an imaging device configured to capture an image enlarged by the lens; a white image acquiring unit configured to open the opening, to cause the system to emit the light in a state where an image point of the system is aligned with a focal point of the lens, and to acquire, as a white image, an image formed on an imaging surface of the device; and a calculation unit configured to use the captured white image to calculate a shading correction coefficient.

Abstract: A deposition mask 601 is used to form a thin film 3 in a prescribed pattern on a substrate 10 by deposition. Each of a plurality of improved openings 62A of the deposition mask 601 has a protruding opening portion 64, and is formed so that the opening amount at an end in a lateral direction is larger than that in a central portion in the lateral direction. In a deposition apparatus 50, the deposition mask 601 is held in a fixed relative positional relation with a deposition source 53 by a mask unit 55. In the case of forming the thin film 3 in a stripe pattern on the substrate 10 by the deposition apparatus 50, deposition particles are sequentially deposited on the substrate 10 while relatively moving the substrate 10 along a scanning direction with a gap H being provided between the substrate 10 and the deposition mask 601.

Abstract: A vapor deposition device (50) includes a mask (60) having periodic patterns, and only a region of the mask (60) where a one-period pattern is formed is exposed. A length of the mask base material along a direction perpendicular to a long-side direction of the mask base material is shorter than a length of a film formation substrate (200) along a direction of scanning of the film formation substrate (200). The mask (60) is provided so that the long-side direction of the mask base material is perpendicular to the direction of scanning and that the exposed region is allowed to move in a direction perpendicular to the direction of scanning by rotation of a wind-off roll (91) and a wind-up roll (92).

Abstract: An image transfer system configured with an image transmission apparatus, an image transfer apparatus and the image saving apparatus. The image transmission apparatus transmits image data recorded in a storage medium to the image transfer apparatus. The image transfer apparatus receives the image data, records the image data into a first storage device and transfers the image data to the image saving apparatus in response to a request issued from the image saving apparatus. The image saving apparatus receives the image data and records the image data into a second storage device. The image saving apparatus includes: the second storage device; a communication unit; a recording control unit for controlling read/write of management information; a request receiving unit from a user; a decision-making unit as to whether or not target image data are recorded; an image requesting unit for the target image data; and an image recording unit.

Abstract: A fluorescent image obtaining device includes a light source that irradiates light such that a fluorescent material marked on a target in a biological sample lies in a non-excited state and a fluorescent material marked on a control with the target lies in an excited state, and an imaging unit that takes an image including the entire biological sample.

Abstract: Disclosed herein is a microscope, including: an illumination optical system; a first image creation optical system; a second image creation optical system; an illumination-field-diaphragm focus adjustment section; and a characteristic-quantity computation block, wherein the illumination-field-diaphragm focus adjustment section adjusts the image creation position for the illumination field diaphragm on the basis of the characteristic quantity computed by the characteristic-quantity computation block.

Abstract: A vapor deposition device (50) includes a mask (60) having periodic patterns, and only a region of the mask (60) where a one-period pattern is formed is exposed. A length of the mask base material along a direction perpendicular to a long-side direction of the mask base material is shorter than a length of a film formation substrate (200) along a direction of scanning of the film formation substrate (200). The mask (60) is provided so that the long-side direction of the mask base material is perpendicular to the direction of scanning and that the exposed region is allowed to move in a direction perpendicular to the direction of scanning by rotation of a wind-off roll (91) and a wind-up roll (92).

Abstract: An image transmission apparatus includes: a deletion unit that deletes an image file recorded in a storage medium; an identifying unit that identifies an image file booked for transmission by an external image reception apparatus; a prohibiting unit that prohibits the deletion unit from deleting the image file recorded in the storage medium, which has been identified by the identifying unit; and a transmission control unit that reads the image file recorded in the storage medium, which has been identified by the identifying unit, and transmits the image file to the image reception apparatus.

Abstract: A vapor deposition source (60), a plurality of control plates (80) and a vapor deposition mask (70) are disposed in this order. A substrate (10) is moved relative to the vapor deposition mask in a state in which the substrate and the vapor deposition mask are spaced apart at a fixed interval. Vapor deposition particles (91) discharged from a vapor deposition source opening (61) of the vapor deposition source pass through neighboring inter-control plate spaces (81) and mask openings (71) formed in the vapor deposition mask, and then adhere to the substrate to form a coating film (90). At least a part of the coating film is formed by the vapor deposition particles that have passed through two or more different inter-control plate spaces. It is thereby possible to form a coating film in which edge blur and variations in the thickness are suppressed.

Abstract: A vapor deposition mask (70) includes a first layer (71), a second layer (72) and a third layer (73) in this order. A plurality of first openings (71h), a plurality of second openings (72h) and a plurality of third openings (73h) are formed respectively in the first layer, the second layer and the third layer. The first openings, the second openings and the third openings communicate with each other, thereby constituting mask openings (75). The opening dimension of the second openings is larger than the opening dimension of the first openings and is larger than the opening dimension of the third openings. With this configuration, it is possible to prevent reduction of the opening dimension of the mask openings or clogging of the mask openings due to the vapor deposition particles adhering to the mask openings.

Abstract: A vapor deposition source (60), a plurality of limiting plates (81) and a vapor deposition mask (70) are disposed in this order. A substrate spaced apart from the vapor deposition mask at a fixed interval is moved relative to the vapor deposition mask. Vapor deposition particles (91) discharged from vapor deposition source openings (61) of the vapor deposition source pass through between neighboring limiting plates, pass through mask openings (71) formed in the vapor deposition mask, and adhere to the substrate, whereby coating films (90) are formed. The limiting plates limit the incidence angle of the vapor deposition particles that enter the mask openings, as viewed in the relative movement direction of the substrate. In this way, an organic EL element can be formed on a large-sized substrate without increasing the pixel pitch or reducing the aperture ratio.

Abstract: A deposition apparatus 50 forms a thin film 3 in a predetermined pattern on a substrate 10 for an organic EL display. A first correction plate 81 and a second correction plate 82 are placed between a shadow mask 60 and a deposition source 53 that emits deposition particles. Each of the correction plates 81, 82 has a plurality of blade plates 83 and a frame 84 that supports the plurality of blade plates 83. The blade plates 83 are placed so as to be tilted with respect to the shadow mask 60, and to extend parallel to each other with an opening 86 between adjoining ones of the blade plates 83 as viewed in a direction perpendicular the deposition mask 60.

Abstract: A current measurement apparatus includes multiple GMR elements and a calculation unit. The multiple GMR elements each include a pinned magnetic layer having a pinned magnetization direction, and a free magnetic layer having a magnetization direction to be changed by an external magnetic field. The calculation unit obtains the magnitude of a current to be detected, from outputs of the multiple GMR elements. The multiple GMR elements are disposed in ring shape around a conductor through which the current to be detected flows, and are electrically connected so as to form a series variable resistor by using the multiple GMR elements. The magnetization directions of the pinned magnetic layers are pinned in the same direction when viewed from an extension direction of the conductor at each of the positions of the elements.

Abstract: A deposition mask is used to pattern a thin film 3 on a substrate 10 by depositing deposition particles through a plurality of openings K having a stripe pattern. The deposition mask includes a frame 65; a plurality of mask layers 70 provided in the frame so as to overlap each other; and a support layer 71 provided between the mask layers 70. Each of the mask layers 70 is formed by arranging a plurality of mask wires 72 in a stripe pattern in a tensioned state, and the support layer 71 is formed by arranging a plurality of support wires 74 in a tensioned state so as to cross the mask wires 72. A plurality of gaps 73 in each of the plurality of mask layers 70 overlap each other to form a plurality of through gaps 73a that linearly extend through all of the plurality of mask layers 70. The openings K are formed by the through gaps 73a.