Patents by Inventor Nobukazu Ikeda

Nobukazu Ikeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210356346
    Abstract: A pressure sensor includes a cylindrical member configured to be attached to a body having a fluid passage, and a pressure sensor unit connected to the cylindrical member for detecting a pressure of a fluid flowing through the fluid passage, wherein the cylindrical member is made of a nickel-molybdenum-chromium alloy material or a stainless steel material, wherein the pressure sensor unit includes a sensor body closed at one end with a diaphragm and a pressure detecting element for outputting displacement of the diaphragm as pressure, and wherein the sensor body is made of a cobalt-nickel alloy material, and is connected at an opening side end portion to one end portion of the cylindrical member.
    Type: Application
    Filed: October 2, 2019
    Publication date: November 18, 2021
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Takatoshi NAKATANI, Nobukazu IKEDA, Kouji NISHINO, Ryousuke DOHI
  • Publication number: 20210310844
    Abstract: A control unit 3 of a flow rate control system 1 comprises: a recording unit 31 for recording measured values of a pressure sensor P and a temperature sensor T, a storage unit 32 for storing volume data between a first valve V1 and a second valve V2 corresponding to the measured value of the pressure sensor P, and an arithmetic unit 33 for calculating a flow rate based on a first pressure value P1 and a first temperature value T1 measured after opening the first valve V1 and the second valve V2 to flow a gas and then closing the first valve V1 and the second valve V2 simultaneously in a state where the gas is flowing; a second pressure value P2 and a second temperature value T2 measured after opening the first valve V1 and the second valve V2 to flow a gas, closing the second valve V2 in a state where the gas is flowing, and then closing the first valve V1 after a predetermined time ?t has elapsed; and a volume value V between the first valve V1 and the second valve V2 which corresponds to the second pressure
    Type: Application
    Filed: July 16, 2019
    Publication date: October 7, 2021
    Applicant: FUJIKIN INCORPORATED
    Inventors: Masaaki NAGASE, Satoru YAMASHITA, Masayoshi KAWASHIMA, Masahiko TAKIMOTO, Kouji NISHINO, Nobukazu IKEDA
  • Publication number: 20210239230
    Abstract: A piezoelectric element-driven valve 1 including a main body, a valve element, piezoelectric actuators, a plurality of cylindrical actuator boxes arranged in series, a cylindrical outer connecting jig detachably connecting the adjacent actuator boxes and having an opening for drawing out wiring, a plurality of piezoelectric actuators accommodated in the actuator box respectively in the same direction, and a cylindrical inner connecting jig slidably accommodated in the outer connecting jig and having an opening for positioning the adjacent piezoelectric actuators and drawing out wiring.
    Type: Application
    Filed: January 28, 2021
    Publication date: August 5, 2021
    Applicant: FUJIKIN INCORPORATED
    Inventors: Ryousuke DOHI, Kaoru HIRATA, Katsuyuki SUGITA, Koji KAWADA, Kouji NISHINO, Nobukazu IKEDA
  • Publication number: 20210240208
    Abstract: A flow rate control method performed in a flow control device 100 having a first control valve 6 provided in the flow path, a second control valve 8 provided downstream of the first control valve, and a pressure sensor 3 for measuring a fluid pressure upstream of the first control valve and downstream of the second control valve, comprises, at the time of flow rate raise, a step (a) of determining a pressure remaining downstream of the first control valve by using a pressure sensor in a state of closing the second control valve, and a step (b) of controlling the pressure remaining downstream of the first control valve by adjusting the opening degree of the second control valve on the basis of the output from the pressure sensor, and flowing a fluid at the first flow rate downstream the second control valve.
    Type: Application
    Filed: June 19, 2019
    Publication date: August 5, 2021
    Applicant: FUJIKIN INCORPORATED
    Inventors: Kaoru HIRATA, Shinya OGAWA, Katsuyuki SUGITA, Kouji NISHINO, Nobukazu IKEDA
  • Patent number: 11079774
    Abstract: A flow rate control device (100) comprises: a pressure control valve (6) provided in a flow path; a flow rate control valve (8) provided downstream side of the pressure control valve; and a first pressure sensor (3) for measuring pressure on the downstream side of the pressure control valve and on the upstream side of the flow rate control valve. The flow rate control valve has a valve element (13) seated on/separated from a valve seat (12); a piezoelectric element (10b) for moving the valve element so as be seated on/separated from the valve seat; and a strain sensor (20) provided on a side surface of the piezoelectric element. The pressure control valve (6) is configured to control the pressure control valve (6) on the basis of a signal output from the first pressure sensor (3), and to control the driving of the piezoelectric element of the flow rate control valve (8) based on a signal output from the strain sensor (20).
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: August 3, 2021
    Assignee: FUJIKIN INCORPORATED
    Inventors: Katsuyuki Sugita, Ryousuke Dohi, Kaoru Hirata, Koji Kawada, Nobukazu Ikeda, Kouji Nishino
  • Patent number: 11054052
    Abstract: A piezoelectric-element-driven valve includes a valve seat provided on a flow path, a valving element detachably seated on the valve seat, and a piezoelectric element, and is configured to move the valve body by extension of the piezoelectric element. The piezoelectric-element-driven valve also is provided with a detection mechanism for detecting an extension amount of the piezoelectric element, the detection mechanism including a strain sensor, and being capable of detecting an movement amount of the valving element from an output of the strain sensor.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: July 6, 2021
    Assignee: FUJIKIN INCORPORATED
    Inventors: Ryousuke Dohi, Kaoru Hirata, Katsuyuki Sugita, Koji Kawada, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20210157341
    Abstract: A flow rate control method performed using a flow rate control device 100 comprising a first control valve 6 provided in a flow path, a second control valve 8 provided downstream of the first control valve, and a pressure sensor 3 for measuring fluid pressure downstream of the first control valve, the method comprising steps of: (a) closing the opening of the first control valve from a state in which, while controlling the opening of the first control valve based on an output of the pressure sensor so as to be the first flow rate, maintaining the opening of the second control valve in an open state, and flowing a fluid at the first flow rate; and (b) based on the output of the pressure sensor, the pressure remaining downstream of the first control valve is controlled by adjusting the opening of the second control valve, and flowing the fluid at the second flow rate downstream of the second control valve.
    Type: Application
    Filed: April 19, 2019
    Publication date: May 27, 2021
    Applicant: FUJIKIN INCORPORATED
    Inventors: Kaoru HIRATA, Shinya OGAWA, Katsuyuki SUGITA, Kouji NISHINO, Nobukazu IKEDA
  • Patent number: 10976240
    Abstract: A concentration measurement device for measuring the concentration of a measured fluid within a measurement cell by detecting transmitted light that has passed through the measurement cell having a light incidence window and a light emission window disposed opposing to each other, comprising a reflected-light detector for detecting reflected light of the light incidence window.
    Type: Grant
    Filed: August 9, 2016
    Date of Patent: April 13, 2021
    Assignees: TOKUSHIMA UNIVERSITY, FUJIKIN INCORPORATED
    Inventors: Yoshihiro Deguchi, Masaaki Nagase, Michio Yamaji, Nobukazu Ikeda, Kouji Nishino, Masayoshi Kawashima, Kazuteru Tanaka
  • Patent number: 10969259
    Abstract: In a method of calibrating a flow rate control device in which a flow rate is calibrated based on comparison with a flow rate measured by a flow rate reference gauge, a predetermined permissible error range is set for a plurality of flow rate settings, and the permissible error range of at least one specific flow rate setting among the plurality of flow rate settings is set to be smaller than the predetermined permissible error range.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: April 6, 2021
    Assignee: FUJIKIN INCORPORATED
    Inventors: Yohei Sawada, Masaaki Nagase, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 10928813
    Abstract: A pressure-type flow rate control device includes a restriction part, a control valve disposed upstream of the restriction part, an upstream pressure sensor, a downstream pressure sensor, and a controller that diagnoses flow rate control by using pressure drop data on a flow passage between the control valve and the restriction part and reference pressure drop data, wherein a close command is issued to the control valve and a shutoff valve provided downstream of the downstream pressure sensor, and the controller determines whether a predetermined critical expansion condition is satisfied by using outputs of the upstream pressure sensor and the downstream pressure sensor after the control valve is closed, and diagnoses flow rate control by using the pressure drop data acquired during a period in which the predetermined critical expansion condition is satisfied.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: February 23, 2021
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Kaoru Hirata, Yohei Sawada, Katsuyuki Sugita, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 10928303
    Abstract: A concentration measuring device includes a measuring cell having a flow passage and a translucent window, a light source for emitting light to the measuring cell through the window, a reflective member for reflecting light propagating through the measuring cell to the window, a light detector for detecting the light exiting from the window, a calculation part for calculating the concentration of the fluid on the basis of a detection signal from the light detector, and an optical device for guiding the light from the light source to the window and guiding the light from the window to the light detector.
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: February 23, 2021
    Assignees: TOKUSHIMA UNIVERSITY, FUJIKIN INCORPORATED
    Inventors: Yoshihiro Deguchi, Takashi Fukawa, Taiki Hattori, Masaaki Nagase, Kazuteru Tanaka, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 10895484
    Abstract: A gas supply system capable of flow measurement includes a flow controller that controls the flow rate of a flowing gas, a first shutoff valve provided downstream of the flow controller, a second shutoff valve provided in a first flow passage communicating with the downstream side of the first shutoff valve, a second flow passage that branches from the first flow passage, a third shutoff valve provided in the second flow passage, a pressure sensing device that detects a pressure in a flow passage controlled by the first, second, and third shutoff valves, a temperature sensing device that detects a temperature in the flow passage controlled by the first, second, and third shutoff valves, a volume measuring tank connected downstream of the third shutoff valve and having a known volume, and an arithmetic and control unit that obtains a passage volume controlled by the first, second, and third shutoff valves by applying Boyle's law to open and closed states of the third shutoff valve and calculates the flow rate
    Type: Grant
    Filed: January 12, 2017
    Date of Patent: January 19, 2021
    Assignee: FUJIKIN INCORPORATED
    Inventors: Yohei Sawada, Nobukazu Ikeda, Kouji Nishino, Masaaki Nagase
  • Patent number: 10884436
    Abstract: A flow rate signal correction method applicable to a pressure-type flow rate control device that controls a flow rate by controlling pressure existing upstream of a restriction part includes a step of generating a primary signal indicating the flow rate in accordance with an output of a pressure sensor provided upstream of the restriction part and a step of generating a secondary signal as a corrected signal of the primary signal such that the current value of the primary signal and a value including information regarding one or a plurality of past values of the primary signal are used to derive a current value corrected according to a predetermined relational expression. The secondary signal is output as a flow rate signal during a stable flow rate period, and the secondary signal is not output as a flow rate signal during a transient change period.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: January 5, 2021
    Assignee: FUJIKIN INCORPORATED
    Inventors: Katsuyuki Sugita, Nobukazu Ikeda, Kouji Nishino, Kaoru Hirata, Masahiko Takimoto, Masayoshi Kawashima, Takahiro Imai
  • Patent number: 10884435
    Abstract: A pressure-type flow rate control device 1, while maintaining an upstream pressure P1 of an orifice 5 at approximately at least twice a downstream pressure P2, calculates a flow factor FF of a mixed gas consisting of two types of gases mixed at a mixture ratio of X:(1?X) by FF=(k/?){2/(?+1)}1/(??1)[?/{(?+1)R}]1/2 using an average density ?, an average specific heat ratio ?, and an average gas constant R of the mixed gas that are calculated by weighting the densities, specific heat ratios, and gas constants of the two types of gases at the mixture ratio, and calculates a flow rate Q of the mixed gas passing through the orifice by Q=FF·S·P1(1/T1)1/2, where S is the orifice cross section, and P1 and T1 are respectively the pressure and temperature of the mixed gas on the upstream side of the orifice.
    Type: Grant
    Filed: August 24, 2017
    Date of Patent: January 5, 2021
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Kaoru Hirata, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 10883866
    Abstract: The pressure-type flow rate control device includes: a restriction part interposed in a flow channel; an upstream-side pressure sensor detecting a fluid pressure on the upstream side of the restriction part; a downstream-side pressure sensor detecting a fluid pressure on the downstream side of the restriction part; a flow control valve provided in the flow channel on the upstream side of the upstream-side pressure sensor; and computation control circuit controlling the flow control valve based on detected values of the upstream-side pressure sensor and the downstream-side pressure sensor, thereby controlling the flow. Under conditions where no fluid flow occurs in the flow channel, the computation control circuit computes the difference between the detected value of the upstream-side pressure sensor and the detected value of the downstream-side pressure sensor, and outputs a signal for pressure sensor malfunction determination based on the computed difference.
    Type: Grant
    Filed: September 15, 2016
    Date of Patent: January 5, 2021
    Assignee: FUJIKIN INCORPORATED
    Inventors: Katsuyuki Sugita, Kouji Nishino, Kaoru Hirata, Masahiko Takimoto, Nobukazu Ikeda
  • Patent number: 10876870
    Abstract: A substrate processing system includes a gas supply unit having a first gas flow channel. A second gas flow channel of a flow rate measurement system is connected to the first gas flow channel. The flow rate measurement system further includes a third gas flow channel connected to the second gas flow channel, and a pressure sensor and a temperature sensor that measure a pressure and a temperature, respectively, in the third gas flow channel. In a method, a flow rate of a gas output from a flow rate controller of the gas supply unit is calculated using a build-up method. The flow rate of a gas is calculated without using the total volume of the first gas flow channel and the second gas flow channel and temperatures in the first gas flow channel and the second gas flow channel.
    Type: Grant
    Filed: January 3, 2019
    Date of Patent: December 29, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Risako Miyoshi, Norihiko Amikura, Kazuyuki Miura, Masaaki Nagase, Satoru Yamashita, Yohei Sawada, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 10838435
    Abstract: A pressure-type flow rate control device includes a control valve; a pressure sensor provided downstream of the control valve; an orifice-built-in valve provided downstream of the pressure sensor; and a control unit connected to the control valve and pressure sensor. The built-in orifice valve has a valve mechanism comprising a valve seat body and a valve element for opening/closing a flow path; a drive mechanism for driving the valve mechanism, and an orifice member provided in the vicinity of the valve mechanism. The pressure-type flow rate control device further includes an opening/closing-detection mechanism for detecting the open/closed state of the valve mechanism, the control unit being configured to receive a detection signal from the opening/closing-detection mechanism.
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: November 17, 2020
    Assignee: FUJIKIN INCORPORATED
    Inventors: Kaoru Hirata, Katsuyuki Sugita, Nobukazu Ikeda, Kouji Nishino
  • Publication number: 20200348158
    Abstract: A self-diagnosis method of a flow rate control device includes: a step (a) for measuring a pressure drop characteristic after a pressure control valve (6) has been changed to a closed state from a state where a fluid flows from the upstream side of the pressure control valve with the opening of a flow rate control valve (8) is larger than a restriction part; a step (b) for measuring the pressure drop characteristic after the pressure control valve has been changed to the closed state from a state where the fluid flows from the upstream side of the flow rate control valve to the downstream side with the opening of the flow rate control valve is smaller than the restriction part; a step (c) for determining whether there is an abnormality by comparing the pressure drop characteristic measured in step (a) with a corresponding reference pressure drop characteristic; a step (d) for determining whether there is an abnormality by comparing the pressure drop characteristic measured in step (b) with a corresponding ref
    Type: Application
    Filed: November 20, 2018
    Publication date: November 5, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Katsuyuki SUGITA, Ryousuke DOHI, Kaoru HIRATA, Koji KAWADA, Nobukazu IKEDA, Kouji NISHINO
  • Publication number: 20200348704
    Abstract: A flow rate control device (100) comprises: a pressure control valve (6) provided in a flow path; a flow rate control valve (8) provided downstream side of the pressure control valve; and a first pressure sensor (3) for measuring pressure on the downstream side of the pressure control valve and on the upstream side of the flow rate control valve. The flow rate control valve has a valve element (13) seated on/separated from a valve seat (12); a piezoelectric element (10b) for moving the valve element so as be seated on/separated from the valve seat; and a strain sensor (20) provided on a side surface of the piezoelectric element. The pressure control valve (6) is configured to control the pressure control valve (6) on the basis of a signal output from the first pressure sensor (3), and to control the driving of the piezoelectric element of the flow rate control valve (8) based on a signal output from the strain sensor (20).
    Type: Application
    Filed: November 20, 2018
    Publication date: November 5, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Katsuyuki SUGITA, Ryousuke DOHI, Kaoru HIRATA, Koji KAWADA, Nobukazu IKEDA, Kouji NISHINO
  • Publication number: 20200232873
    Abstract: An abnormality detection method performed using a flow rate control device including a restriction portion, a control valve, a first pressure sensor, a second pressure sensor, and a downstream valve, includes a step of changing the control valve and the downstream valve from an open state to a closed state, a step of measuring an upstream pressure or a downstream pressure in the closed state, and at least one step of (a) extracting an upstream pressure at a point when a difference between the upstream pressure and the downstream pressure reaches a predetermined value as an upstream convergence pressure, and extracting the downstream pressure as a downstream convergence pressure, and (b) extracting the time from a point when the control valve are changed to a closed state to a point when a difference between the upstream pressure and the downstream pressure reaches a predetermined value as a convergence time.
    Type: Application
    Filed: December 15, 2016
    Publication date: July 23, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Masaaki NAGASE, Kaoru HIRATA, Yohei SAWADA, Kouji NISHINO, Nobukazu IKEDA