Patents by Inventor Nobutaka Fujimoto

Nobutaka Fujimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11133191
    Abstract: The etching mask 80 for screen printing according to one embodiment of the present invention includes aliphatic polycarbonate. Further, the method of producing an oxide layer (the channel 44) according to one embodiment of the present invention includes: an etching-mask forming step of forming a pattern of the etching mask 80 including aliphatic polycarbonate; a contact step of, after the etching-mask forming step, contacting the oxide layer with a solution for dissolving a portion of the oxide layer (the channel 44) which is not protected by the etching mask 80; and a heating step of, after the contact step, heating the oxide layer (the channel 44) and the etching mask 80 to or above a temperature at which the etching mask 80 is decomposed.
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: September 28, 2021
    Assignees: JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Satoshi Inoue, Tatsuya Shimoda, Kazuhiro Fukada, Kiyoshi Nishioka, Nobutaka Fujimoto, Masahiro Suzuki
  • Patent number: 10759901
    Abstract: A thermally decomposable binder containing an aliphatic polycarbonate resin containing a constituting unit represented by the formula (1): wherein each of R1, R2 and R3, which may be identical or different, is a hydrogen atom, an alkyl group having from 1 to 10 carbon atoms, or an aryl group having from 6 to 20 carbon atoms; and n is 1 or 2. The thermally decomposable binder and the fine inorganic particle-dispersed paste composition, each containing an aliphatic polycarbonate resin of the present invention can be used in general molded articles, optical materials such as films, fibers, optical fibers, and optical disks, thermally decomposable materials such as ceramic binders, and lost foam casting, medicinal materials such as drug capsules, additives for biodegradable resins, main components for biodegradable resins, and the like.
    Type: Grant
    Filed: September 2, 2015
    Date of Patent: September 1, 2020
    Assignees: NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Koji Nakano, Kiyoshi Nishioka, Masahiro Suzuki, Nobutaka Fujimoto
  • Patent number: 10749034
    Abstract: It is an object of the invention to provide a thin film transistor and a method for producing the same, which will easily achieve self-aligned formation of a source/drain region without through processes under a vacuum or a low pressure or with no use of expensive equipment.
    Type: Grant
    Filed: April 25, 2018
    Date of Patent: August 18, 2020
    Assignees: Japan Advanced Institute of Science and Technology, Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Satoshi Inoue, Tatsuya Shimoda, Nobutaka Fujimoto, Kiyoshi Nishioka, Shuichi Karashima
  • Publication number: 20200095410
    Abstract: The present invention provides a polyolefin-based resin composition that has improved resilience while maintaining mechanical strength and stretching properties, as well as a molded article and a polyolefin-based resin film formed from this composition. The polyolefin-based resin composition comprises a polyolefin-based resin, a polyalkylene carbonate resin, and an ionic liquid. The polyolefin-based resin film of the present invention is formed by molding the polyolefin-based resin composition and is stretched at least in a monoaxial direction.
    Type: Application
    Filed: November 26, 2019
    Publication date: March 26, 2020
    Applicants: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Koh-hei NITTA, Makiko NAKAHARA, Miho MAE, Kiyoshi NISHIOKA, Nobutaka FUJIMOTO, Masahiro SUZUKI
  • Publication number: 20200027743
    Abstract: The etching mask 80 for screen printing according to one embodiment of the present invention includes aliphatic polycarbonate. Further, the method of producing an oxide layer (the channel 44) according to one embodiment of the present invention includes: an etching-mask forming step of forming a pattern of the etching mask 80 including aliphatic polycarbonate; a contact step of, after the etching-mask forming step, contacting the oxide layer with a solution for dissolving a portion of the oxide layer (the channel 44) which is not protected by the etching mask 80; and a heating step of, after the contact step, heating the oxide layer (the channel 44) and the etching mask 80 to or above a temperature at which the etching mask 80 is decomposed.
    Type: Application
    Filed: September 27, 2019
    Publication date: January 23, 2020
    Inventors: Satoshi INOUE, Tatsuya SHIMODA, Kazuhiro FUKADA, Kiyoshi NISHIOKA, Nobutaka FUJIMOTO, Masahiro SUZUKI
  • Patent number: 10400336
    Abstract: An aliphatic polycarbonate, an oxide precursor, and an oxide layer are provided, which are capable of controlling stringiness, when a thin film that can be employed for an electronic device or a semiconductor element is formed by a printing method. In an oxide precursor of the present invention, a compound of metal to be oxidized into a metal oxide is dispersed in a solution containing a binder (possibly including inevitable impurities) made of aliphatic polycarbonates, and an aliphatic polycarbonate having a molecular weight of 6000 or more and 400000 or less constitutes 80% by mass or more of all the aliphatic polycarbonates.
    Type: Grant
    Filed: October 5, 2015
    Date of Patent: September 3, 2019
    Assignees: JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Tatsuya Shimoda, Satoshi Inoue, Kazuhiro Fukada, Kiyoshi Nishioka, Nobutaka Fujimoto, Masahiro Suzuki
  • Patent number: 10340388
    Abstract: It is an object of the invention to provide a thin film transistor and a method for producing the same, which will easily achieve self-aligned formation of a source/drain region without through processes under a vacuum or a low pressure or with no use of expensive equipment.
    Type: Grant
    Filed: April 25, 2018
    Date of Patent: July 2, 2019
    Assignees: Japan Advanced Institute of Science and Technology, Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Satoshi Inoue, Tatsuya Shimoda, Nobutaka Fujimoto, Kiyoshi Nishioka, Shuichi Karashima
  • Patent number: 10164244
    Abstract: A negative electrode mixture for a nonaqueous electrolyte secondary cell according to the present invention includes: a negative electrode active material; a conductive assistant; and a binder. The binder contains a copolymer of vinyl alcohol and an alkali metal-neutralized product of ethylene-unsaturated carboxylic acid.
    Type: Grant
    Filed: March 19, 2014
    Date of Patent: December 25, 2018
    Assignees: National Institute of Advanced Industrial Science and Technology, Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Yuji Kinpara, Junichi Fujishige, Nobutaka Fujimoto, Takashi Mukai, Masanori Morishita, Tetsuo Sakai
  • Patent number: 10164259
    Abstract: This binder for use in a positive electrode for a lithium ion secondary battery contains a copolymer of both vinyl alcohol and an alkali-metal-neutralized ethylenically unsaturated carboxylic acid.
    Type: Grant
    Filed: October 1, 2013
    Date of Patent: December 25, 2018
    Assignees: National Institute of Advanced Industrial Science and Technology, Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Takashi Mukai, Masanori Morishita, Tetsuo Sakai, Yuji Kinpara, Junichi Fujishige, Nobutaka Fujimoto, Shuichi Karashima
  • Publication number: 20180315861
    Abstract: It is an object of the invention to provide a thin film transistor and a method for producing the same, which will easily achieve self-aligned formation of a source/drain region without through processes under a vacuum or a low pressure or with no use of expensive equipment.
    Type: Application
    Filed: April 25, 2018
    Publication date: November 1, 2018
    Inventors: Satoshi INOUE, Tatsuya SHIMODA, Nobutaka FUJIMOTO, Kiyoshi NISHIOKA, Shuichi KARASHIMA
  • Patent number: 10068717
    Abstract: A binder for an electric double-layer capacitor electrode according to the present invention includes a copolymer of vinyl alcohol and an alkali metal-neutralized product of ethylene-unsaturated carboxylic acid.
    Type: Grant
    Filed: March 19, 2015
    Date of Patent: September 4, 2018
    Assignees: Sumitomo Seika Chemicals Co., Ltd., National Institute of Advanced Industrial Science and Technology
    Inventors: Yuji Kinpara, Junichi Fujishige, Nobutaka Fujimoto, Shuichi Karashima, Takashi Mukai, Tetsuo Sakai
  • Patent number: 9985137
    Abstract: It is an object of the invention to provide a thin film transistor and a method for producing the same, which will easily achieve self-aligned formation of a source/drain region without through processes under a vacuum or a low pressure or with no use of expensive equipment. An exemplary method for producing a thin film transistor according to the invention includes an aliphatic polycarbonate layer forming step of forming an aliphatic polycarbonate layer 50 that covers a gate electrode layer 40 disposed above a semiconductor layer 20 with a gate insulator 30 being interposed between the gate electrode layer 40 and the semiconductor layer 20, and also covers the semiconductor layer 20, and has a dopant causing the semiconductor layer 20 to become an n-type or p-type semiconductor layer, and a heating step of heating at a temperature causing introduction of the dopant into the semiconductor layer 20 and decomposition of the aliphatic polycarbonate layer 50.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: May 29, 2018
    Assignees: Japan Advanced Institute of Science and Technology, Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Satoshi Inoue, Tatsuya Shimoda, Nobutaka Fujimoto, Kiyoshi Nishioka, Shuichi Karashima
  • Publication number: 20180096853
    Abstract: The etching mask 80 for screen printing according to one embodiment of the present invention includes aliphatic polycarbonate. Further, the method of producing an oxide layer (the channel 44) according to one embodiment of the present invention includes: an etching-mask forming step of forming a pattern of the etching mask 80 including aliphatic polycarbonate; a contact step of, after the etching-mask forming step, contacting the oxide layer with a solution for dissolving a portion of the oxide layer (the channel 44) which is not protected by the etching mask 80; and a heating step of, after the contact step, heating the oxide layer (the channel 44) and the etching mask 80 to or above a temperature at which the etching mask 80 is decomposed.
    Type: Application
    Filed: March 14, 2016
    Publication date: April 5, 2018
    Inventors: Satoshi INOUE, Tatsuya SHIMODA, Kazuhiro FUKADA, Kiyoshi NISHIOKA, Nobutaka FUJIMOTO, Masahiro SUZUKI
  • Publication number: 20180030203
    Abstract: A thermally decomposable binder containing an aliphatic polycarbonate resin containing a constituting unit represented by the formula (1): wherein each of R1, R2 and R3, which may be identical or different, is a hydrogen atom, an alkyl group having from 1 to 10 carbon atoms, or an aryl group having from 6 to 20 carbon atoms; and n is 1 or 2. The thermally decomposable binder and the fine inorganic particle-dispersed paste composition, each containing an aliphatic polycarbonate resin of the present invention can be used in general molded articles, optical materials such as films, fibers, optical fibers, and optical disks, thermally decomposable materials such as ceramic binders, and lost foam casting, medicinal materials such as drug capsules, additives for biodegradable resins, main components for biodegradable resins, and the like.
    Type: Application
    Filed: September 2, 2015
    Publication date: February 1, 2018
    Applicants: NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Koji NAKANO, Kiyoshi NISHIOKA, Masahiro SUZUKI, Nobutaka FUJIMOTO
  • Patent number: 9842916
    Abstract: The invention provides an oxide semiconductor layer that has less cracks and is excellent in electrical property and stability, as well as a semiconductor element and an electronic device each including the oxide semiconductor layer. The invention provides an exemplary method of producing an oxide semiconductor layer, and the method includes the precursor layer forming step of forming, on or above a substrate, a layered oxide semiconductor precursor including a compound of metal to be oxidized into an oxide semiconductor dispersed in a solution including a binder made of aliphatic polycarbonate, and the annealing step of heating the precursor layer at a first temperature achieving decomposition of 90 wt % or more of the binder, and then annealing the precursor layer at a temperature equal to or higher than a second temperature (denoted by X) that is higher than the first temperature, achieves bonding between the metal and oxygen, and has an exothermic peak value in differential thermal analysis (DTA).
    Type: Grant
    Filed: December 13, 2016
    Date of Patent: December 12, 2017
    Assignees: JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Satoshi Inoue, Tatsuya Shimoda, Tomoki Kawakita, Nobutaka Fujimoto, Kiyoshi Nishioka
  • Publication number: 20170335461
    Abstract: An aliphatic polycarbonate, an oxide precursor, and an oxide layer are provided, which are capable of controlling stringiness, when a thin film that can be employed for an electronic device or a semiconductor element is formed by a printing method. In an oxide precursor of the present invention, a compound of metal to be oxidized into a metal oxide is dispersed in a solution containing a binder (possibly including inevitable impurities) made of aliphatic polycarbonates, and an aliphatic polycarbonate having a molecular weight of 6000 or more and 400000 or less constitutes 80% by mass or more of all the aliphatic polycarbonates.
    Type: Application
    Filed: October 5, 2015
    Publication date: November 23, 2017
    Inventors: Tatsuya SHIMODA, Satoshi INOUE, Kazuhiro FUKADA, Kiyoshi NISHIOKA, Nobutaka FUJIMOTO, Masahiro SUZUKI
  • Patent number: 9783665
    Abstract: This invention provides a polyolefin-based resin composition excellent in mechanical strength and elasticity. The polyolefin-based resin composition comprises a polyolefin-based resin, and, per 100 parts by mass of the polyolefin-based resin, 0.05 to 10 parts by mass of an aliphatic polycarbonate resin and 0.01 to 2 parts by mass of an acid modified polypropylene.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: October 10, 2017
    Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Nobutaka Fujimoto, Kiyoshi Nishioka, Tomoki Kawakita, Koh-Hei Nitta, Makiko Nakahara
  • Publication number: 20170253733
    Abstract: The present invention provides a polyolefin-based resin composition that has improved resilience while maintaining mechanical strength and stretching properties, as well as a molded article and a polyolefin-based resin film formed from this composition. The polyolefin-based resin composition comprises a polyolefin-based resin, a polyalkylene carbonate resin, and an ionic liquid. The polyolefin-based resin film of the present invention is formed by molding the polyolefin-based resin composition and is stretched at least in a monoaxial direction.
    Type: Application
    Filed: August 18, 2015
    Publication date: September 7, 2017
    Applicants: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY, SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Koh-hei NITTA, Makiko NAKAHARA, Miho MAE, Kiyoshi NISHIOKA, Nobutaka FUJIMOTO, Masahiro SUZUKI
  • Publication number: 20170117393
    Abstract: The invention provides an oxide semiconductor layer that has less cracks and is excellent in electrical property and stability, as well as a semiconductor element and an electronic device each including the oxide semiconductor layer. The invention provides an exemplary method of producing an oxide semiconductor layer, and the method includes the precursor layer forming step of forming, on or above a substrate, a layered oxide semiconductor precursor including a compound of metal to be oxidized into an oxide semiconductor dispersed in a solution including a binder made of aliphatic polycarbonate, and the annealing step of heating the precursor layer at a first temperature achieving decomposition of 90 wt % or more of the binder, and then annealing the precursor layer at a temperature equal to or higher than a second temperature (denoted by X) that is higher than the first temperature, achieves bonding between the metal and oxygen, and has an exothermic peak value in differential thermal analysis (DTA).
    Type: Application
    Filed: December 13, 2016
    Publication date: April 27, 2017
    Inventors: Satoshi INOUE, Tatsuya SHIMODA, Tomoki KAWAKITA, Nobutaka FUJIMOTO, Kiyoshi NISHIOKA
  • Publication number: 20170025230
    Abstract: A binder for an electric double-layer capacitor electrode according to the present invention includes a copolymer of vinyl alcohol and an alkali metal-neutralized product of ethylene-unsaturated carboxylic acid.
    Type: Application
    Filed: March 19, 2015
    Publication date: January 26, 2017
    Applicants: Sumitomo Seika Chemicals Co., Ltd., National Institute of Advanced Industrial Science and Technology
    Inventors: Yuji Kinpara, Junichi Fujishige, Nobutaka Fujimoto, Shuichi Karashima, Takashi Mukai, Tetsuo Sakai