Patents by Inventor Nobutaka Magome

Nobutaka Magome has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190338174
    Abstract: Fluid synthesis system and corresponding method for synthesis of slurry containing abrasive particles. The system and method are configured to substantially segregate the abrasive particles passing through the filter, used at the filtering step of the process, from the sticky components that clog such filter prior to the filtering step of the synthesis process to achieve a sustaining filtration of the slurry as a result of which the filter remains substantially unclogged for the whole predetermined duration of the filtering process.
    Type: Application
    Filed: July 22, 2019
    Publication date: November 7, 2019
    Inventors: Takashi Nagata, Ting-Chien Teng, Nobutaka Magome, Bausan Yuan
  • Patent number: 10461039
    Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: October 29, 2019
    Assignee: NIKON CORPORATION
    Inventors: Yuji Shiba, Tomoharu Fujiwara, Nobutaka Magome
  • Publication number: 20190164900
    Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.
    Type: Application
    Filed: January 31, 2019
    Publication date: May 30, 2019
    Applicant: NIKON CORPORATION
    Inventors: Yuji SHIBA, Tomoharu FUJIWARA, Nobutaka MAGOME
  • Publication number: 20190121246
    Abstract: A liquid immersion exposure apparatus includes a movable stage configured to move below and relative to a projection system, a liquid supply inlet and a first liquid collection outlet, the movable stage having a second liquid collection outlet. A first measurement system is provided downstream of the first liquid collection outlet and measures an amount of liquid collected via the first liquid collection outlet. A second measurement system is provided downstream of the second liquid collection outlet and measures an amount of liquid collected via the second liquid collection outlet. A substrate held on the movable stage is exposed with an exposure beam from the projection system via liquid in a liquid immersion area which covers a portion of an upper surface of the substrate and which is formed while performing liquid supply via the liquid supply inlet and liquid collection via the first liquid collection outlet.
    Type: Application
    Filed: December 18, 2018
    Publication date: April 25, 2019
    Applicant: NIKON CORPORATION
    Inventors: Nobutaka MAGOME, Naoyuki KOBAYASHI
  • Patent number: 10236259
    Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.
    Type: Grant
    Filed: March 7, 2018
    Date of Patent: March 19, 2019
    Assignee: NIKON CORPORATION
    Inventors: Yuji Shiba, Tomoharu Fujiwara, Nobutaka Magome
  • Patent number: 10185232
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a first liquid collection outlet, and a separator fluidically connected to the first liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the first liquid collection outlet, from the other. A stage which holds a substrate has a second liquid collection outlet that collects a portion of the liquid supplied from the liquid supply inlet which comes from a gap between an upper surface of the substrate and an upper surface of the stage.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: January 22, 2019
    Assignee: NIKON CORPORATION
    Inventors: Nobutaka Magome, Naoyuki Kobayashi
  • Publication number: 20180197820
    Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.
    Type: Application
    Filed: March 7, 2018
    Publication date: July 12, 2018
    Applicant: NIKON CORPORATION
    Inventors: Yuji SHIBA, Tomoharu FUJIWARA, Nobutaka MAGOME
  • Patent number: 9941217
    Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer; allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.
    Type: Grant
    Filed: January 6, 2015
    Date of Patent: April 10, 2018
    Assignee: NIKON CORPORATION
    Inventors: Yuji Shiba, Tomoharu Fujiwara, Nobutaka Magome
  • Publication number: 20170363972
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a first liquid collection outlet, and a separator fluidically connected to the first liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the first liquid collection outlet, from the other. A stage which holds a substrate has a second liquid collection outlet that collects a portion of the liquid supplied from the liquid supply inlet which comes from a gap between an upper surface of the substrate and an upper surface of the stage.
    Type: Application
    Filed: August 29, 2017
    Publication date: December 21, 2017
    Applicant: NIKON CORPORATION
    Inventors: Nobutaka MAGOME, Naoyuki KOBAYASHI
  • Patent number: 9846371
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: December 19, 2017
    Assignee: NIKON CORPORATION
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Publication number: 20170329234
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Application
    Filed: July 31, 2017
    Publication date: November 16, 2017
    Applicant: NIKON CORPORATION
    Inventors: Soichi OWA, Nobutaka MAGOME, Shigeru HIRUKAWA, Yoshihiko KUDO, Jiro INOUE, Hiroyuki NAGASAKA, Hirotaka KOHNO, Masahiro NEI, Motokatsu IMAI, Kenichi SHIRAISHI, Yasufumi NISHII, Hiroaki TAKAIWA
  • Patent number: 9760026
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other, a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet, and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: September 12, 2017
    Assignee: NIKON CORPORATION
    Inventors: Nobutaka Magome, Naoyuki Kobayashi
  • Publication number: 20170038694
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other, a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet, and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet.
    Type: Application
    Filed: October 24, 2016
    Publication date: February 9, 2017
    Applicant: NIKON CORPORATION
    Inventors: Nobutaka MAGOME, Naoyuki KOBAYASHI
  • Patent number: 9494871
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet from the other, and a flow-meter configured to measure an amount of the liquid collected via the liquid collection outlet.
    Type: Grant
    Filed: April 29, 2014
    Date of Patent: November 15, 2016
    Assignee: NIKON CORPORATION
    Inventors: Nobutaka Magome, Naoyuki Kobayashi
  • Patent number: 9268237
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: February 23, 2016
    Assignee: NIKON CORPORATION
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Patent number: 9235139
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: January 12, 2016
    Assignee: NIKON CORPORATION
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Publication number: 20150301457
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Application
    Filed: April 27, 2015
    Publication date: October 22, 2015
    Applicant: Nikon Corporation
    Inventors: Soichi OWA, Nobutaka MAGOME, Shigeru HIRUKAWA, Yoshihiko KUDO, Jiro INOUE, Hirotaka KOHNO, Masahiro NEI, Motokatsu IMAI, Hiroyuki NAGASAKA, Kenichi SHIRAISHI, Yasufumi NISHII, Hiroaki TAKAIWA
  • Publication number: 20150200165
    Abstract: A mark forming method includes: a step of forming a resist mark including recessed portion based on an image of a mark exposed on a wafer; a step of coating the recessed portion, in an area of the wafer in which the resist mark has been formed, with a polymer layer containing a block copolymer; a step of performing annealing for the polymer layer so as to allow the polymer layer to form a self-assembled area; a step of performing etching so as to selectively remove a portion of the self-assembled area; and a step of forming a wafer mark in the wafer by using the self-assembled area from which the portion thereof has been removed. When forming a circuit pattern by using the directed self-assemble of the block copolymer, a mark can be also formed, in parallel with the formation of the circuit pattern.
    Type: Application
    Filed: January 6, 2015
    Publication date: July 16, 2015
    Inventors: Yuji SHIBA, Tomoharu FUJIWARA, Nobutaka MAGOME
  • Patent number: 9019467
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: April 28, 2015
    Assignee: Nikon Corporation
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Publication number: 20140233002
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet from the other, and a flow-meter configured to measure an amount of the liquid collected via the liquid collection outlet.
    Type: Application
    Filed: April 29, 2014
    Publication date: August 21, 2014
    Applicant: NIKON CORPORATION
    Inventors: Nobutaka MAGOME, Naoyuki KOBAYASHI