Abstract: Fluid synthesis system and corresponding method for synthesis of slurry containing abrasive particles. The system and method are configured to substantially segregate the abrasive particles passing through the filter, used at the filtering step of the process, from the sticky components that clog such filter prior to the filtering step of the synthesis process to achieve a sustaining filtration of the slurry as a result of which the filter remains substantially unclogged for the whole predetermined duration of the filtering process.

Abstract: Fluid synthesis system and corresponding method for synthesis of slurry containing abrasive particles. The system and method are configured to substantially segregate the abrasive particles passing through the filter, used at the filtering step of the process, from the sticky components that clog such filter prior to the filtering step of the synthesis process to achieve a sustaining filtration of the slurry as a result of which the filter remains substantially unclogged for the whole predetermined duration of the filtering process.

Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.

Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.

Abstract: A liquid immersion exposure apparatus includes a movable stage configured to move below and relative to a projection system, a liquid supply inlet and a first liquid collection outlet, the movable stage having a second liquid collection outlet. A first measurement system is provided downstream of the first liquid collection outlet and measures an amount of liquid collected via the first liquid collection outlet. A second measurement system is provided downstream of the second liquid collection outlet and measures an amount of liquid collected via the second liquid collection outlet. A substrate held on the movable stage is exposed with an exposure beam from the projection system via liquid in a liquid immersion area which covers a portion of an upper surface of the substrate and which is formed while performing liquid supply via the liquid supply inlet and liquid collection via the first liquid collection outlet.

Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.

Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a first liquid collection outlet, and a separator fluidically connected to the first liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the first liquid collection outlet, from the other. A stage which holds a substrate has a second liquid collection outlet that collects a portion of the liquid supplied from the liquid supply inlet which comes from a gap between an upper surface of the substrate and an upper surface of the stage.

Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.

Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer; allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.

Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a first liquid collection outlet, and a separator fluidically connected to the first liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the first liquid collection outlet, from the other. A stage which holds a substrate has a second liquid collection outlet that collects a portion of the liquid supplied from the liquid supply inlet which comes from a gap between an upper surface of the substrate and an upper surface of the stage.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other, a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet, and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet.

Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other, a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet, and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet.

Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet from the other, and a flow-meter configured to measure an amount of the liquid collected via the liquid collection outlet.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: A mark forming method includes: a step of forming a resist mark including recessed portion based on an image of a mark exposed on a wafer; a step of coating the recessed portion, in an area of the wafer in which the resist mark has been formed, with a polymer layer containing a block copolymer; a step of performing annealing for the polymer layer so as to allow the polymer layer to form a self-assembled area; a step of performing etching so as to selectively remove a portion of the self-assembled area; and a step of forming a wafer mark in the wafer by using the self-assembled area from which the portion thereof has been removed. When forming a circuit pattern by using the directed self-assemble of the block copolymer, a mark can be also formed, in parallel with the formation of the circuit pattern.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.