Abstract: An exposure apparatus comprises an irradiation optical system for irradiating a pattern formed on an original plate with light emitted from a light source, a projection optical system for projecting a light image from the pattern onto a substrate, a drivable substrate stage for mounting the substrate, and a light absorber disposed on the substrate stage, wherein the light absorber is disposed on the substrate stage by a thermal insulating layer and/or a cooling unit. Thus, an exposure apparatus can be provided which performs exposure of a wafer without being influenced by adverse effects such as thermal deformation of units such as a wafer stage or the like due to exposure process other than exposure of the wafer, such as pre-exposure.

Abstract: An illumination optical system for illuminating a mask using light from a light source includes a shape varying mechanism for continuously making a shape of an effective light source variable, wherein the shape varying mechanism includes a first stop plate that has a first aperture part for allowing the light to pass through the first aperture part, and a second stop plate that has second aperture part for allowing the light that has passed through the first stop plate through the second aperture part.

Abstract: An exposure apparatus comprises an irradiation optical system for irradiating a pattern formed on an original plate with light emitted from a light source, a projection optical system for projecting a light image from the pattern onto a substrate, a drivable substrate stage for mounting the substrate, and a light absorber disposed on the substrate stage, wherein the light absorber is disposed on the substrate stage by a thermal insulating layer and/or a cooling unit. Thus, an exposure apparatus can be provided which performs exposure of a wafer without being influenced by adverse effects such as thermal deformation of units such as a wafer stage or the like due to exposure process other than exposure of the wafer, such as pre-exposure.

Abstract: An illumination optical system for illuminating a mask using light from a light source includes a shape varying mechanism for continuously making a shape of an effective light source variable, wherein the shape varying mechanism includes a first stop plate that has a first aperture part for allowing the light to pass through the first aperture part, and a second stop plate that has second aperture part for allowing the light that has passed through the first stop plate through the second aperture part.