Patents by Inventor Nobuyuki Moriwaki
Nobuyuki Moriwaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5515312Abstract: A semiconductor memory device comprising a pair of bit lines, a word line, a cell plate electrode, a memory cell connected to each of the bit lines, the word line and the cell plate electrode, and a prevention means that permits only a predetermined number of readouts of data stored in the memory cell, after which the data is destroyed and is not retrieved with subsequent readout attempts.Type: GrantFiled: October 13, 1994Date of Patent: May 7, 1996Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Tetsuji Nakakuma, Tatsumi Sumi, Hiroshige Hirano, George Nakane, Nobuyuki Moriwaki, Toshio Mukunoki
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Patent number: 5467302Abstract: Bit lines BL0 and /BL0 are connected to a sense amplifier SA0, the gate of a first MOS transistor to a first word line WL0, a first electrode of a first ferrodielectric capacitor Cs1 to the source of the first Qn, the drain of the first Qn to BL0, a second electrode of Cs1 to a first plate electrode CP0, the gate of a second MOS transistor Qn to a second word line DWL0, a first electrode of a second ferrodielectric capacitor Cd2 to the source of the second Qn, the drain of the second Qn to /BL0, and a second electrode of Cd1 to a second plate electrode DCP0, and after turning off the second Qn, the logic voltage of DCP0 is inverted. Hence, in a semiconductor memory device employing the ferrodielectric element, the dummy memory capacitor is initialized securely, and high speed reading is enabled without concentration of power consumption.Type: GrantFiled: December 12, 1994Date of Patent: November 14, 1995Assignee: Matsushita Electric Industrial Company, Ltd.Inventors: Hiroshige Hirano, Tatsumi Sumi, Nobuyuki Moriwaki, George Nakane
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Patent number: 5396100Abstract: Herein disclosed is a semiconductor integrated circuit device which has a memory array or a memory mat formed of memory cells arranged regularly in a matrix shape. At the end portion or inside of the memory array or memory cell in the region of the device where the patterning of the memory cells is discontinued or interrupted, the shape of an element isolating insulating film, which is formed for regulating the memory cells having pattern interruptions, is made substantially identical to the shape of the element isolating insulating film for regulating the memory cells in the region of the device where the patternings of the memory cells are of an uninterrupted regular form. In the location on the chip front face where the regular patterns associated with the memory area are discontinued, there is formed a dummy pattern having a shape made substantially identical to that of a gate electrode arranged at the end portion of the location where the regular patterns are interrupted.Type: GrantFiled: March 31, 1992Date of Patent: March 7, 1995Assignees: Hitachi, Ltd., Hitachi VLSI Engineering Corp.Inventors: Kohji Yamasaki, Nobuyuki Moriwaki, Shuji Ikeda, Hideaki Nakamura, Shigeru Honjo
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Patent number: 5392234Abstract: Bit lines BL0 and /BL0 are connected to a sense amplifier SA0, the gate of a first MOS transistor to a first word line WL0, a first electrode of a first Ferroelectric capacitor Cs1 to the source of the first Qn, the drain of the first Qn to BL0, a second electrode of Cs1 to a first plate electrode CP0, the gate of a second MOS transistor Qn to a second word line DWL0, a first electrode of a second Ferroelectric capacitor Cd2 to the source of the second Qn, the drain of the second Qn to /BL0, and a second electrode of Cd1 to a second plate electrode DCP0, and after turning off the second Qn, the logic voltage of DCP0 is inverted. Hence, in a semiconductor memory device employing the Ferroelectric element, the dummy memory capacitor is initialized securely, and high speed reading is enabled without concentration of power consumption.Type: GrantFiled: December 2, 1993Date of Patent: February 21, 1995Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Hiroshige Hirano, Tatsumi Sumi, Nobuyuki Moriwaki, George Nakane
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Patent number: 5239196Abstract: A MOSFET Static Random Access Memory (SRAM) cell has a symmetrical construction, with a pair of word lines. The word lines are in second level polysilicon, so that they may overlap the driving transistor gates which are in first level polysilicon.Type: GrantFiled: February 11, 1991Date of Patent: August 24, 1993Inventors: Shuji Ikeda, Satoshi Meguro, Soichiro Hashiba, Isamu Kuramoto, Atsuyoshi Koike, Katsuro Sasaki, Koichiro Ishibashi, Toshiaki Yamanaka, Naotaka Hashimoto, Nobuyuki Moriwaki
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Patent number: 5146427Abstract: In a semiconductor memory, a latch circuit is arranged between the outputs of a sense amplifier and the inputs of a data output buffer. First pass-gates are arranged between the outputs of the sense amplifier and the latch circuit, while second pass-gates are arranged between the latch circuit and the inputs of the data output buffer. The outputs of the sense amplifier are transmitted to the inputs of the data output buffer through signal paths which bypass the first pass-gates, the latch circuit and the second pass-gates, whereby the data output buffer generates a data output quickly. Thereafter, the first pass-gates and the second pass-gates are controllably brought to a signal-through condition, whereby the output information items of the sense amplifier are stored in the latch circuit. The data output buffer holds the data output in conformity with the stored information items of the latch circuit.Type: GrantFiled: January 21, 1992Date of Patent: September 8, 1992Assignees: Hitachi Ltd., Hitachi VISI Engineering Corp.Inventors: Katsuro Sasaki, Nobuyuki Moriwaki, Shigeru Honjo, Hideaki Nakamura
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Patent number: 5132771Abstract: A semiconductor static random access memory having a high .alpha.-ray immunity and a high packing density is provided which is also capable of high-speed operation. A semiconductor memory device comprises static random access memory cells each including a flip-flop circuit. Storage nodes of each flip-flop circuit have respective pn-junctions formed at regions sandwiched between gate electrodes of first insulated gate field effect transistors and gate electrodes of second insulated gate field effect transistors, respectively. The pn-junction has an area smaller than that of a channel portion of the first or second insulated gate field effect transistor.Type: GrantFiled: April 4, 1990Date of Patent: July 21, 1992Assignees: Hitachi, Ltd., Hitachi VLSI Engineering CorporationInventors: Toshiaki Yamanaka, Naotaka Hashimoto, Takashi Hashimoto, Akihiro Shimizu, Koichiro Ishibashi, Katsuro Sasaki, Katsuhiro Shimohigashi, Eiji Takeda, Yoshio Sakai, Takashi Nishida, Osamu Minato, Toshiaki Masuhara, Shoji Hanamura, Shigeru Honjo, Nobuyuki Moriwaki
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Patent number: 5025422Abstract: A static random access memory device is provided with an internal activation signal generator and circuit means for overriding application of the internal activation signals to the memory circuit under predetermined circumstances. In normal read/write operation modes, word lines and a sense amplifier are activated only during a predetermined period in response to the internal activation signals in order to reduce power consumption. On the other hand, in a test mode, since the circuit means detects a higher voltage level of a predetermined external terminal of the device, the internal activation signals from the pulse generator are not used to limit the operating time of the word lines and sense amplifier. Therefore, during the test mode, the word lines and the sense amplifier are activated for a longer period than during the normal read/write operation mode. Because of this, the device is able to shorten aging time which occurs in the test mode.Type: GrantFiled: October 10, 1989Date of Patent: June 18, 1991Assignees: Hitachi, Ltd., Hitachi VLSI Engineering Corp.Inventors: Nobuyuki Moriwaki, Mitsuhiro Higuchi, Mitsuhiro Toshita
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Patent number: 4853894Abstract: A semiconductor memory having static cells each composed of two driver MOS transistors formed on a semiconductor substrate and two transfer MOS transistors and two load resistors, which are formed on the substrate and are connected to the drains of the driver MOS transistors, respectively. A conductive film for fixing the sources of the driver MOS transistors to a ground voltage is formed above the principal surface of the semiconductor substrate, and this conductive film defines one electrode of a capacitance element formed on the substrate. The conductive film is formed over the load resistors formed on the semiconductor substrate so as to constitute an electric field shield for the load resistors.Type: GrantFiled: July 9, 1987Date of Patent: August 1, 1989Assignee: Hitachi, Ltd.Inventors: Toshiaki Yamanaka, Norio Suzuki, Yoshio Sakai, Yoshifumi Kawamoto, Osamu Minato, Koichiro Ishibashi, Nobuyuki Moriwaki, Satoshi Meguro
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Patent number: 4841486Abstract: A semiconductor memory device having a memory plane defined by a plurality of memory cells, a decoder line for accessing the memory cells, a common data line on which a signal output from an accessed memory cell is collected, and a sense amplifier for amplifying the signal collected on the common data line. The sense amplifier has an amplifying circuit portion which is composed of a pair of common-collector type bipolar transistors supplied with the signal collected on the common data line as a differential input, and a plurality of MOS transistors for converting a change in current into a change in voltage. Each of the MOS transistors has a lightly-doped drain structure.Type: GrantFiled: December 29, 1986Date of Patent: June 20, 1989Assignee: Hitachi, Ltd.Inventors: Osamu Minato, Toshiaki Masuhara, Koichiro Ishibashi, Shoji Hanamura, Shigeru Honjyo, Nobuyuki Moriwaki
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Patent number: 4797717Abstract: Each of the memory cells in a SRAM includes two driver MOS transistors, two transfer gate MOS transistors and two load resistances. The gate electrode layers of the MOS transistors are formed from a first-level conductive layer provided on the surface of a semiconductor substrate. The source regions of the two driver MOS transistors in each memory cell are connected in common and further connected to a ground potential point through a second-level conductive layer. The two load resistances in each memory cell are formed from a third-level high-resistance material layer. The second-level conductive layer is formed from a low-resistance material layer. Thus the resistance of the sources of the two driver MOS transistors is lowered.Type: GrantFiled: April 17, 1987Date of Patent: January 10, 1989Assignee: Hitachi, Ltd.Inventors: Koichiro Ishibashi, Osamu Minato, Toshiaki Masuhara, Yoshio Sakai, Toshiaki Yamanaka, Naotaka Hashimoto, Shoji Hanamura, Nobuyuki Moriwaki, Shigeru Honjyo, Kiyotsugu Ueda
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Patent number: 4747082Abstract: A semiconductor memory is provided with automatic refresh means including a timer, a refresh counter and a refresh buffer each formed on a semiconductor chip mounted with an asynchronous memory, for automatically performing a periodic refresh operation on the basis of a basic clock signal which is generated in response to the detection of a logical change in the output of the refresh counter. The automatic refresh counter includes means for performing one of a read operation and a write operation which are based upon a regular address signal asynchronous with the periodic refresh operation, in preference to the periodic refresh operation.Type: GrantFiled: July 21, 1987Date of Patent: May 24, 1988Assignees: Hitachi Ltd., Hitachi VLSI Eng. Corp.Inventors: Osamu Minato, Toshiaki Masuhara, Katsuhiro Shimohigashi, Shoji Hanamura, Shigeru Honjyo, Nobuyuki Moriwaki, Fumio Kojima