Patents by Inventor Norbertus Benedictus Koster

Norbertus Benedictus Koster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system
    Publication number: 20080128636
    Abstract: A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross-sectional area of the channel section.
    Type: Application
    Filed: November 21, 2006
    Publication date: June 5, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Norbertus Benedictus Koster, Richard Versluis, Bart Dinand Paarhuis
  • Lithographic projection apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7115886
    Abstract: In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
    Type: Grant
    Filed: October 27, 2004
    Date of Patent: October 3, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster
  • Lithographic projection apparatus, device manufacturing method, and device manufacturing thereby
    Patent number: 6862075
    Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.
    Type: Grant
    Filed: August 15, 2003
    Date of Patent: March 1, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital′evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine
  • Lithographic projection apparatus, device manufacturing method and device manufactured thereby
    Patent number: 6828569
    Abstract: Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected from water, nitrogen oxide and oxygen-containing hydrocarbons. Generally, the space will be purged with an ozone-less purge gas which contains a small amount of the oxygen-containing species in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of the oxygen-containing species into the space.
    Type: Grant
    Filed: November 19, 2001
    Date of Patent: December 7, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster
  • Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
    Patent number: 6724460
    Abstract: In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
    Type: Grant
    Filed: November 19, 2001
    Date of Patent: April 20, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Willem Van Schaik, Antonie Ellert Duisterwinkel, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster
  • Lithographic projection apparatus, device manufacturing method, and device manufacturing thereby
    Publication number: 20040032574
    Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.
    Type: Application
    Filed: August 15, 2003
    Publication date: February 19, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital?apos;evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine
  • Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6614505
    Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.
    Type: Grant
    Filed: January 7, 2002
    Date of Patent: September 2, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital'evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine
  • Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
    Publication number: 20030095240
    Abstract: Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected from water, nitrogen oxide and oxygen-containing hydrocarbons. Generally, the space will be purged with an ozone-less purge gas which contains a small amount of the oxygen-containing species in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of the oxygen-containing species into the space.
    Type: Application
    Filed: November 19, 2001
    Publication date: May 22, 2003
    Applicant: ASM LITHOGRAPHY B.V.
    Inventors: Willem Van Schaik, Antonie Ellert Duisterwinkel, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster
  • Lithographic projection apparatus, device manufacturing method and device manufactured thereby
    Publication number: 20030096193
    Abstract: In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
    Type: Application
    Filed: November 19, 2001
    Publication date: May 22, 2003
    Inventors: Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster
  • Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20020154279
    Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.
    Type: Application
    Filed: January 7, 2002
    Publication date: October 24, 2002
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital?apos;evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine