Patents by Inventor Norikazu Yamada
Norikazu Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8132049Abstract: A failure diagnosis method diagnoses a failure occurring in a diagnosis target apparatus including a drive mechanism having a drive member that receives power supply to operate and a power transmission member that transmits drive force of the drive member to another member. The method includes automatically acquiring by a sensor an operation state signal indicating an operation state during the drive mechanism operating for a predetermined period; and analyzing the automatically acquired operation state signal based on a failure probability model, which is obtained by modeling a cause of failure occurring in the diagnosis target apparatus with using probabilities, to execute failure diagnosis with respect to each of constituent members of the drive mechanism.Type: GrantFiled: February 23, 2005Date of Patent: March 6, 2012Assignee: Fuji Xerox Co., Ltd.Inventors: Kaoru Yasukawa, Kouji Adachi, Kouki Uwatoko, Norikazu Yamada, Eigo Nakagawa, Tetsuichi Satonaga
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Patent number: 8091884Abstract: A transport device includes a feed unit that feeds transport subjects being loaded in a loading portion one by one in a transport direction, a protrusion amount detection unit that detects a protrusion amount of the transport subjects from the loading portion in the transport direction and an overlap feed sign detection unit that detects a sign of occurrence of overlap feed of the transport subjects based on a detection result of the protrusion amount.Type: GrantFiled: September 3, 2009Date of Patent: January 10, 2012Assignee: Fuji Xerox Co., Ltd.Inventors: Shigehiro Furukawa, Koji Adachi, Kaoru Yasukawa, Norikazu Yamada, Koki Uwatoko, Tetsuichi Satonaga
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Publication number: 20100243607Abstract: A substrate processing method uses a substrate processing apparatus including a chamber for accommodating a substrate, a lower electrode to mount the substrate, a first RF power applying unit for applying an RF power for plasma generation into the chamber, and a second RF power applying unit for applying an RF power for bias to the lower electrode. The RF power for plasma generation is controlled to be intermittently changed by changing an output of the first RF power applying unit at a predetermined timing. If no plasma state or an afterglow state exists in the chamber by a control of the first RF power applying unit, an output of the second RF power applying unit is controlled to be in an OFF state or decreased below an output of the second RF power applying unit when the output of the first RF power applying unit is a set output.Type: ApplicationFiled: March 30, 2010Publication date: September 30, 2010Applicant: TOKYO ELECTRON LIMITEDInventors: Takeshi Ohse, Shinji Himori, Jun Abe, Norikazu Yamada
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Publication number: 20100235140Abstract: A detected data processing apparatus includes a selecting unit that calculates mutual correlation between a plurality of groups of detected data acquired from a detecting unit that detects an operational state of a circuit board, and then selects as analysis data the detected data of a group whose value indicating correlation with other groups is smaller than a threshold value set up in advance; and a first calculating unit that calculates a first Mahalanobis distance on a basis of a first Mahalanobis space generated by using the analysis data selected by the selecting unit from the detected data obtained when a normal circuit board is operated and on a basis of the detected data obtained when a circuit board of diagnosis target is operated.Type: ApplicationFiled: July 20, 2009Publication date: September 16, 2010Applicant: FUJI XEROX CO., LTD.Inventors: Tetsuichi SATONAGA, Koji ADACHI, Kaoru YASUKAWA, Norikazu YAMADA, Koki UWATOKO, Shigehiro FURUKAWA
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Publication number: 20100225052Abstract: A transport device includes a feed unit that feeds transport subjects being loaded in a loading portion one by one in a transport direction, a protrusion amount detection unit that detects a protrusion amount of the transport subjects from the loading portion in the transport direction and an overlap feed sign detection unit that detects a sign of occurrence of overlap feed of the transport subjects based on a detection result of the protrusion amount.Type: ApplicationFiled: September 3, 2009Publication date: September 9, 2010Applicant: FUJI XEROX CO., LTD.Inventors: Shigehiro FURUKAWA, Koji ADACHI, Kaoru YASUKAWA, Norikazu YAMADA, Koki UWATOKO, Tetsuichi SATONAGA
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Publication number: 20100161546Abstract: According to an aspect of the present invention, there is provided a failure diagnosis system including: a causal relationship information storage unit configured to store causal relationship information representing a causal relationship between events regarding a diagnosis-target apparatus, the causal relationship information including: common causal relationship information that is commonly used in a plurality of types of failure diagnosis regarding the diagnosis-target apparatus; and specific causal relationship information that is used in each specific type of failure diagnosis among the plurality of types of failure diagnosis; and a diagnosis execution unit configured to selectively execute the plural types of failure diagnosis by using a combined causal relationship information that is a combination of the common causal relationship information and a piece of the specific causal relationship information corresponding to a diagnosis-target type of failure diagnosis.Type: ApplicationFiled: August 27, 2009Publication date: June 24, 2010Applicant: FUJI XEROX CO., LTD.Inventors: Norikazu YAMADA, Koji ADACHI, Kaoru YASUKAWA, Shigehiro FURUKAWA, Koki UWATOKO, Tetuichi SATONAGA
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Publication number: 20100135680Abstract: A paper wrinkle sign monitoring device includes: at least one timing detecting unit that is set on a transport path of a printing medium, and that detects transport timing of the printing medium; and a sign output unit that detects a sign of paper wrinkle generation in the transporting time of the printing medium based on the transport timing of the printing medium detected by the timing detecting unit, and that outputs the sign.Type: ApplicationFiled: April 13, 2009Publication date: June 3, 2010Applicant: FUJI XEROX CO., LTD.Inventors: Koji ADACHI, Kaoru YASUKAWA, Shigehiro FURUKAWA, Norikazu YAMADA, Koki UWATOKO, Tetsuichi SATONAGA
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Publication number: 20100123914Abstract: An image processing apparatus includes a determination unit determining, based on a pixel value of a prescribed background color area in image data obtained by inputting a printed image, and based on information regarding a color of a toner used in printing the image, whether or not the background color of the image corresponds to the color of the toner.Type: ApplicationFiled: August 20, 2009Publication date: May 20, 2010Applicant: FUJI XEROX CO., LTD.Inventors: Koki UWATOKO, Koji ADACHI, Kaoru YASUKAWA, Norikazu YAMADA, Shigehiro FURUKAWA, Tetsuichi SATONAGA
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Publication number: 20100123285Abstract: A medium transport device includes a sensor unit, a timing data collection unit, and a sampling resolution changing unit. The sensor unit is provided in a transport path of a print recording medium to detect a transport timing of the print recording medium. A timing data collection unit receives an output from the sensor unit and samples the output at a sampling interval as timing data. A sampling resolution changing unit changes the sampling interval.Type: ApplicationFiled: September 2, 2009Publication date: May 20, 2010Applicant: FUJI XEROX CO., LTD.Inventors: Kaoru Yasukawa, Koji Adachi, Norikazu Yamada, Koki Uwatoko, Tetsuichi Satonaga, Shigehiro Furukawa
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Publication number: 20100072172Abstract: There are provided a substrate processing apparatus and a substrate processing method realizing an effective reduction of a voltage change of a substrate on an electrode to reduce the variation of incident energy of ions entering the substrate. The substrate processing apparatus includes: a first electrode holding a substrate on a main surface of the first electrode; a second electrode facing the first electrode; a RF power source applying to the first electrode a RF voltage whose frequency is equal to or higher than 40 MHz; and a pulse voltage applying unit applying to the first electrode a pulse voltage decreasing in accordance with a lapse of time, by superimposing the pulse voltage on the RF voltage.Type: ApplicationFiled: September 18, 2009Publication date: March 25, 2010Inventors: Akio Ui, Hisataka Hayashi, Takeshi Kaminatsui, Shinji Himori, Norikazu Yamada, Takeshi Ohse, Jun Abe
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Publication number: 20090194508Abstract: A substrate plasma processing apparatus includes a substrate holding electrode and a counter electrode which are arranged in a chamber, a high frequency generating device which applies a high frequency of 50 MHZ or higher to the substrate holding electrode, a DC negative pulse generating device which applies a DC negative pulse voltage in a manner of superimposing on the high frequency, and a controller controlling to cause intermittent application of the high frequency and cause intermittent application of the DC negative pulse voltage according to the timing of on or off of the high frequency.Type: ApplicationFiled: January 30, 2009Publication date: August 6, 2009Inventors: Akio UI, Naoki TAMAOKI, Takashi ICHIKAWA, Hisataka HAYASHI, Takeshi KAMINATSUI, Shinji HIMORI, Norikazu YAMADA, Takeshi OHSE, Jun ABE
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Publication number: 20090098736Abstract: A main etching step is effected in a state shown in FIG. 1A under a first pressure using a gas containing at least HBr, e.g., a mixture gas of HBr and Cl2 as an etching gas. The main etching is ended before a silicon oxide film 102, as shown in FIG. 1B, is exposed. An over-etching process is effected under a second pressure higher than the first pressure using a gas containing at least HBr, e.g., an HBr single gas so as to completely expose the silicon oxide film 102 as shown in FIG. 1C. In such a way, the selectivity of a silicon-containing conductive layer with respect to the silicon oxide film is improved compared to conventional methods. Without etching the silicon oxide film layer, which is an underlying layer, and without marring the shape of the silicon-containing conductive film layer formed by etching, only the desired silicon-containing conductive film layer is removed by etching reliably.Type: ApplicationFiled: December 16, 2008Publication date: April 16, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Etsuo Iijima, Norikazu Yamada
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Patent number: 7489881Abstract: A failure prevention diagnosis support system includes: an acquiring portion that acquires internal information about an internal state of an image forming apparatus; a storage portion that stores one or a plurality of logistic regression models that define an estimate value of a regression coefficient through a logistic regression analysis using the internal information obtained when the image forming apparatus is in a failed state and in a normal state; and a controller that performs a control operation to select a logistic regression model from the one or the plurality of the logistic regression models stored in the storage portion in accordance with the image forming apparatus, and to calculate risk degrees as objective variables that are indicators of failure degrees in the image forming apparatus by assigning the internal information acquired by the acquiring portion or the value obtained from the internal information to the selected logistic regression model.Type: GrantFiled: December 28, 2006Date of Patent: February 10, 2009Assignee: Fuji Xerox Co., Ltd.Inventors: Kaoru Yasukawa, Koji Adachi, Koki Uwatoko, Tetsuichi Satonaga, Norikazu Yamada, Eigo Nakagawa
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Patent number: 7476624Abstract: A main etching step is effected in a state shown in FIG. 1A under a first pressure using a gas containing at least HBr, e.g., a mixture gas of HBr and Cl2 as an etching gas. The main etching is ended before a silicon oxide film 102, as shown in FIG. 1B, is exposed. An over-etching process is effected under a second pressure higher than the first pressure using a gas containing at least HBr, e.g., an HBr single gas so as to completely expose the silicon oxide film 102 as shown in FIG. 1C. In such a way, the selectivity of a silicon-containing conductive layer with respect to the silicon oxide film is improved compared to conventional methods. Without etching the silicon oxide film layer, which is an underlying layer, and without marring the shape of the silicon-containing conductive film layer formed by etching, only the desired silicon-containing conductive film layer is removed by etching reliably.Type: GrantFiled: June 7, 2002Date of Patent: January 13, 2009Assignee: Tokyo Electron LimitedInventors: Etsuo Iijima, Norikazu Yamada
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Patent number: 7403870Abstract: A trouble sensing device has a first unit and a second unit. The first unit determines a total sum of driving current of two or more of a plurality of driving mechanisms that are turned on. The second unit judges whether trouble has arisen based on the total sum of the driving current.Type: GrantFiled: October 4, 2005Date of Patent: July 22, 2008Assignee: Fuji Xerox Co., Ltd.Inventors: Kaoru Yasukawa, Koji Adachi, Norikazu Yamada, Koki Uwatoko, Eigo Nakagawa, Tetsuichi Satonaga
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Patent number: 7324909Abstract: A fault diagnosis section activates a driving component alone, measures an operation state signal and a paper passage time, and stores feature values (Vm, ?v, Tqs, ?ts) extracted as a determination reference in a storage medium. A paper passage fault determination section determines whether or not a fault has arisen on the basis of the paper passage time when an apparatus is under normal operating conditions. A diagnosis target block determination section determines an order to operate a detail fault diagnosis when it is determined that there is a plurality of diagnosis target blocks.Type: GrantFiled: December 27, 2006Date of Patent: January 29, 2008Assignee: Fuji Xerox Co., Ltd.Inventors: Kaoru Yasukawa, Koji Adachi, Eigo Nakagawa, Tetsuichi Satonaga, Norikazu Yamada, Koki Uwatoko
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Publication number: 20070280706Abstract: A failure prevention diagnosis support system includes: an acquiring portion that acquires internal information about an internal state of an image forming apparatus; a storage portion that stores one or a plurality of logistic regression models that define an estimate value of a regression coefficient through a logistic regression analysis using the internal information obtained when the image forming apparatus is in a failed state and in a normal state; and a controller that performs a control operation to select a logistic regression model from the one or the plurality of the logistic regression models stored in the storage portion in accordance with the image forming apparatus, and to calculate risk degrees as objective variables that are indicators of failure degrees in the image forming apparatus by assigning the internal information acquired by the acquiring portion or the value obtained from the internal information to the selected logistic regression model.Type: ApplicationFiled: December 28, 2006Publication date: December 6, 2007Applicant: FUJI XEROX CO., LTD.Inventors: Kaoru Yasukawa, Koji Adachi, Koki Uwatoko, Tetsuichi Satonaga, Norikazu Yamada, Eigo Nakagawa
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Patent number: 7275009Abstract: A fault diagnosis section activates a driving component alone, measures an operation state signal and a paper passage time, and stores feature values (Vm, ?v, Tqs, ?ts) extracted as a determination reference in a storage medium. A paper passage fault determination section determines whether or not a fault has arisen on the basis of the paper passage time when an apparatus is under normal operating conditions. A diagnosis target block determination section determines an order to operate a detail fault diagnosis when it is determined that there is a plurality of diagnosis target blocks.Type: GrantFiled: April 20, 2006Date of Patent: September 25, 2007Assignee: Fuji Xerox Co., Ltd.Inventors: Kaoru Yasukawa, Koji Adachi, Eigo Nakagawa, Tetsuichi Satonaga, Norikazu Yamada, Koki Uwatoko
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Patent number: 7250781Abstract: A circuit board inspection device for inspecting the operation of a circuit board having a predetermined part or wire formed therein includes a supporting substrate disposed substantially in parallel with the parts mounting surface of the circuit board, and a signal change detection unit made of a coil or a capacitor disposed in a position of the supporting substrate corresponding to the part or wire of the circuit board, with the supporting substrate being disposed substantially in parallel with the circuit board.Type: GrantFiled: November 26, 2003Date of Patent: July 31, 2007Assignee: Fuji Xerox Co., Ltd.Inventors: Eigo Nakagawa, Koji Adachi, Kaoru Yasukawa, Norikazu Yamada, Koki Uwatoko, Tetsuichi Satonaga
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Patent number: 7243045Abstract: A failure diagnosis method diagnoses failure occurring in an image forming apparatus. The failure causes defect in an image output from the image forming apparatus. The failure diagnosis method includes acquiring operation state signals indicating operation states during the image forming apparatus operating in different operation conditions, respectively; and analyzing the acquired operation state signals based on a failure probability model, which is obtained by modeling a cause of the failure occurring in the image forming apparatus with using probabilities, to execute failure diagnosis with respect to each of constituent members constituting the image forming apparatus.Type: GrantFiled: February 23, 2005Date of Patent: July 10, 2007Assignee: Fuji Xerox Co., Ltd.Inventors: Kouki Uwatoko, Kouji Adachi, Kaoru Yasukawa, Norikazu Yamada, Eigo Nakagawa, Tetsuichi Satonaga