Abstract: A micromechanical rate-of-rotation sensor set-up, including a first rate-of-rotation sensor device capable of being driven rotationally by a driving device via a drive frame device, so as to oscillate about a first axis, and is for measuring a first outer rate of rotation about a second axis and a second outer rate of rotation about a third axis; and a second rate-of-rotation sensor device capable of being driven by the driving device via the drive frame device, so as to oscillate linearly along the second axis, and is for measuring a third outer rate of rotation about the first axis. The first rate-of-rotation sensor device is connected to the second rate-of-rotation sensor device by the drive frame device. The drive frame device includes a first and second drive frame, which may be driven by the driving device in phase opposition, along the third axis, in an oscillatory manner.

Abstract: A micromechanical rate-of-rotation sensor set-up, including a first rate-of-rotation sensor device capable of being driven rotationally by a driving device via a drive frame device, so as to oscillate about a first axis, and is for measuring a first outer rate of rotation about a second axis and a second outer rate of rotation about a third axis; and a second rate-of-rotation sensor device capable of being driven by the driving device via the drive frame device, so as to oscillate linearly along the second axis, and is for measuring a third outer rate of rotation about the first axis. The first rate-of-rotation sensor device is connected to the second rate-of-rotation sensor device by the drive frame device. The drive frame device includes a first and second drive frame, which may be driven by the driving device in phase opposition, along the third axis, in an oscillatory manner.

Abstract: A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater e

Abstract: A micromechanical rotation rate sensor system and a corresponding manufacturing method are described. The micromechanical rotation rate sensor system includes a first rotation rate sensor unit drivable rotatorily about a first axis in an oscillating manner for detecting a first outside rotation rate about a second axis and a second outside rotation rate about a third axis, the first, second and third axes being situated perpendicularly to one another, and a second rotation rate sensor unit linearly drivable by a drive unit along the second axis in an oscillating manner for detecting a third outside rotation rate about the first axis. The second rotation rate sensor unit is connected to the first rotation rate sensor unit via a first coupling unit for driving the first rotation rate sensor unit by the drive unit.

Abstract: A microelectromechanical inertial sensor to measure a rate of rotation and/or acceleration, the inertial sensor having a substrate, at least two deflectable masses coupled mechanically to the substrate, and at least one detector detecting movements of the masses along a first direction, the masses being mechanically coupled to one another by at least one first, second, and third coupling element, the coupling elements being configured so that when there is a deflection of the masses from the rest position a pivoting of a first main direction of extension of the first coupling element relative to a second main direction of extension of the second coupling element takes place and a pivoting of the second main direction of extension relative to the third main direction of extension of the third coupling element takes place, and the coupling elements being coupled mechanically to the substrate via at least one substrate connecting point.

Abstract: A micromechanical rotational rate sensor system includes a first rotational rate sensor device that can be driven rotationally about a first axis in oscillating fashion for acquiring a first external rate of rotation about a second axis and a second external rate of rotation about a third axis, the first, second, and third axes being perpendicular to one another; and a second rotational rate sensor device, capable of being driven in linearly oscillating fashion along the second axis, for acquiring a third external rate of rotation about the first axis. The first rotational rate sensor device is connected to the second rotational rate sensor device via a drive frame device. The drive frame device has a first drive frame and a second drive frame that are capable of being driven in oscillating fashion by the drive device with opposite phase along the third axis.

Abstract: A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater e

Abstract: A micromechanical rotation rate sensor system and a corresponding manufacturing method are described. The micromechanical rotation rate sensor system includes a first rotation rate sensor unit drivable rotatorily about a first axis in an oscillating manner for detecting a first outside rotation rate about a second axis and a second outside rotation rate about a third axis, the first, second and third axes being situated perpendicularly to one another, and a second rotation rate sensor unit linearly drivable by a drive unit along the second axis in an oscillating manner for detecting a third outside rotation rate about the first axis. The second rotation rate sensor unit is connected to the first rotation rate sensor unit via a first coupling unit for driving the first rotation rate sensor unit by the drive unit.

Abstract: A microelectromechanical inertial sensor to measure a rate of rotation and/or acceleration, the inertial sensor having a substrate, at least two deflectable masses coupled mechanically to the substrate, and at least one detector detecting movements of the masses along a first direction, the masses being mechanically coupled to one another by at least one first, second, and third coupling element, the coupling elements being configured so that when there is a deflection of the masses from the rest position a pivoting of a first main direction of extension of the first coupling element relative to a second main direction of extension of the second coupling element takes place and a pivoting of the second main direction of extension relative to the third main direction of extension of the third coupling element takes place, and the coupling elements being coupled mechanically to the substrate via at least one substrate connecting point.

Abstract: A micromechanical yaw rate sensor includes a substrate and a rotationally oscillating mass having a rotationally oscillating mass bearing. The rotationally oscillating mass bearing includes a rocker bar, a rocker spring rod which resiliently connects the rocker bar to the substrate, and two support spring rods which resiliently connect, on opposite sides of the rocker spring rod, the rocker bar to the rotationally oscillating mass.

Abstract: A micromechanical rate-of-rotation sensor includes a first Coriolis element. The micromechanical rate-of-rotation sensor further includes a first drive beam arranged along the first Coriolis element. The first drive beam is coupled via a first spring to the first Coriolis element. The micromechanical rate-of-rotation sensor further includes a first drive electrode carrier extending from the first drive beam in a direction opposite to the first Coriolis element. The first drive electrode carrier is configured to carry a multiplicity of first drive electrodes extending parallel to the first drive beam.

Abstract: A micromechanical device and a corresponding manufacturing method. The micromechanical device includes: a spring element which is moveably coupleable or is moveably coupled to a frame unit at at least one connecting point of the spring element, the spring element including at least one web, which extends outward from the at least one connecting point; and the at least one web being structured in such a way that it includes at least one first section as well as at least one widening section for reducing a non-linearity of the spring element, which is widened compared to the first section.

Abstract: A micromechanical component is provided, the micromechanical component including a deflection device which is deflectable parallel to a deflection direction, and the micromechanical component including a damping device, a surface of the deflection device facing the damping device being greater than a sectional area of the deflection device disposed perpendicular to the deflection direction and situated in a region of the deflection device that is facing away from the damping device.

Abstract: A micromechanical rotational rate sensor system includes a first rotational rate sensor device that can be driven rotationally about a first axis in oscillating fashion for acquiring a first external rate of rotation about a second axis and a second external rate of rotation about a third axis, the first, second, and third axes being perpendicular to one another; and a second rotational rate sensor device, capable of being driven in linearly oscillating fashion along the second axis, for acquiring a third external rate of rotation about the first axis. The first rotational rate sensor device is connected to the second rotational rate sensor device via a drive frame device. The drive frame device has a first drive frame and a second drive frame that are capable of being driven in oscillating fashion by the drive device with opposite phase along the third axis.

Abstract: A micromechanical rate-of-rotation sensor includes a first Coriolis element. The micromechanical rate-of-rotation sensor further includes a first drive beam arranged along the first Coriolis element. The first drive beam is coupled via a first spring to the first Coriolis element. The micromechanical rate-of-rotation sensor further includes a first drive electrode carrier extending from the first drive beam in a direction opposite to the first Coriolis element. The first drive electrode carrier is configured to carry a multiplicity of first drive electrodes extending parallel to the first drive beam.

Abstract: A rotation rate sensor which includes a substrate, a first structure which is movable relative to the substrate and a second structure which is movable relative to the substrate and relative to the first structure. The first structure includes at least one first drive device and the second structure includes at least one second drive device. The first and second drive devices are situated for the joint deflection of the first structure from a neutral position of the first structure in parallel to a drive direction and of the second structure from a neutral position of the second structure in parallel to the drive direction, due to an interaction between the first and second drive devices in such a way that the first and second structures are excitable into an oscillation in phase opposition, in each case with a motion component in parallel to the drive direction.

Abstract: A micromechanical yaw rate sensor includes a substrate and a rotationally oscillating mass having a rotationally oscillating mass bearing. The rotationally oscillating mass bearing includes a rocker bar, a rocker spring rod which resiliently connects the rocker bar to the substrate, and two support spring rods which resiliently connect, on opposite sides of the rocker spring rod, the rocker bar to the rotationally oscillating mass.

Abstract: A micromechanical device and a corresponding manufacturing method. The micromechanical device includes: a spring element which is moveably coupleable or is moveably coupled to a frame unit at at least one connecting point of the spring element, the spring element including at least one web, which extends outward from the at least one connecting point; and the at least one web being structured in such a way that it includes at least one first section as well as at least one widening section for reducing a non-linearity of the spring element, which is widened compared to the first section.

Abstract: A rotation rate sensor includes a substrate having a main extension plane and a Coriolis element, in which the rotation rate sensor is configured so that the Coriolis element is excitable with the aid of an excitation arrangement to carry out an excitation oscillation along a first direction and in parallel to the main extension plane, the rotation rate sensor including a compensation element for exerting a compensation force, the compensation force having a non-linear dependence on the excitation oscillation.

Abstract: A micromechanical component is provided, the micromechanical component including a deflection device which is deflectable parallel to a deflection direction, and the micromechanical component including a damping device, a surface of the deflection device facing the damping device being greater than a sectional area of the deflection device disposed perpendicular to the deflection direction and situated in a region of the deflection device that is facing away from the damping device.