Abstract: A method for operating a rotational rate sensor having a substrate and at least one structure movable relative thereto, at least one first and at least one fourth electrodes fastened to the structure, and at least one second, at least one third, at least one fifth, and at least one sixth electrodes fixed to the substrate, the first electrode being situated at least partially between second and third electrodes, the fourth electrode being situated at least partially between fifth and sixth electrodes, in each case in a rest position of the structure and along a direction essentially parallel to a first axis, the structure being excited, in a first task, from a rest position of the structure to an oscillation having a movement component essentially parallel to a second axis running perpendicular to the first axis during at least one first time interval within at least one oscillation period.

Abstract: A rotation rate sensor which includes a substrate, a first structure which is movable relative to the substrate and a second structure which is movable relative to the substrate and relative to the first structure. The first structure includes at least one first drive device and the second structure includes at least one second drive device. The first and second drive devices are situated for the joint deflection of the first structure from a neutral position of the first structure in parallel to a drive direction and of the second structure from a neutral position of the second structure in parallel to the drive direction, due to an interaction between the first and second drive devices in such a way that the first and second structures are excitable into an oscillation in phase opposition, in each case with a motion component in parallel to the drive direction.

Abstract: A rotation rate sensor for detecting a rotation rate about a rotational axis parallel to a main extension plane of a substrate of the sensor includes: a first oscillating mass; and a second oscillating mass mechanically coupled to the first oscillating mass. The first oscillating mass is (i) deflectable along a first oscillations plane parallel to the main extension plane, (ii) extends in a planar manner parallel to the first oscillations plane in a rest position, and (iii) deflectable out of the first oscillations plane into a first deflection position. The second oscillating mass is (i) deflectable along a second oscillations plane parallel to the first oscillations plane, (ii) extends in a planar manner parallel to the second oscillations plane in a rest position, and (iii) deflectable out of the second oscillations plane into a second deflection position.

Abstract: A rotation rate sensor includes a substrate having a main extension plane and a Coriolis element, in which the rotation rate sensor is configured so that the Coriolis element is excitable with the aid of an excitation arrangement to carry out an excitation oscillation along a first direction and in parallel to the main extension plane, the rotation rate sensor including a compensation element for exerting a compensation force, the compensation force having a non-linear dependence on the excitation oscillation.

Abstract: A micromechanical spring mechanism, having two spring legs, which essentially are disposed in parallel with one another; and at least one stop element, which is placed so as to prevent the two spring legs from striking each other.

Abstract: A micromechanical spring for an inertial sensor, including segments of a monocrystalline base material, the segments having surfaces which are situated at a right angle to one another with respect to a plane of oscillation of the spring and normal to the plane of oscillation of the spring, the segments being manufactured in a crystal-direction-dependent etching process and each having two different orientations normal to the plane of oscillation, in which the spring includes a defined number of segments situated in a defined manner.

Abstract: A rotation rate sensor for detecting a rotation rate about a rotational axis parallel to a main extension plane of a substrate of the sensor includes: a first oscillating mass; and a second oscillating mass mechanically coupled to the first oscillating mass. The first oscillating mass is (i) deflectable along a first oscillations plane parallel to the main extension plane, (ii) extends in a planar manner parallel to the first oscillations plane in a rest position, and (iii) deflectable out of the first oscillations plane into a first deflection position. The second oscillating mass is (i) deflectable along a second oscillations plane parallel to the first oscillations plane, (ii) extends in a planar manner parallel to the second oscillations plane in a rest position, and (iii) deflectable out of the second oscillations plane into a second deflection position.

Abstract: A yaw rate sensor is described which includes a substrate having a main plane of extension and a Coriolis element, the Coriolis element being excitable to a driving oscillation along a first direction parallel to the main plane of extension, using a driving arrangement, and a deflection of the Coriolis element along a second direction perpendicular to the first direction being detectable, and the yaw rate sensor having an interference element for exciting the Coriolis element to an interference oscillation.

Abstract: A yaw rate sensor is described which includes a substrate having a main plane of extension and a Coriolis element, the Coriolis element being excitable to a driving oscillation along a first direction parallel to the main plane of extension, using a driving arrangement, and a deflection of the Coriolis element along a second direction perpendicular to the first direction being detectable, and the yaw rate sensor having an interference element for exciting the Coriolis element to an interference oscillation.

Abstract: A micromechanical inertial sensor having at least one seismic mass which may be deflected relative to a substrate, and at least one electrode surface which in terms of circuitry, together with at least portions of the seismic mass forms at least one capacitor having a capacitance which is dependent on the deflection of the seismic mass. At least one additional auxiliary electrode is included which is located outside the region which forms the capacitor and which may be set at a potential that deviates from the potential of the seismic mass.

Abstract: A micromechanical inertial sensor having at least one seismic mass which may be deflected relative to a substrate, and at least one electrode surface which in terms of circuitry, together with at least portions of the seismic mass forms at least one capacitor having a capacitance which is dependent on the deflection of the seismic mass. At least one additional auxiliary electrode is included which is located outside the region which forms the capacitor and which may be set at a potential that deviates from the potential of the seismic mass.

Abstract: The invention relates to a gas sensor comprising a membrane layer (3) formed on a semiconductor substrate (2), an evaluation structure (7) being arranged on said substrate in an evaluation area (8) and a heating structure (9) outside the evaluation area (8), in addition to a gas-sensitive layer (10) arranged above the evaluation structure (7) and the heating structure (9), wherein said gas-sensitive layer (10) can be heated by the heating structure (9) and the electrical resistance of the gas-sensitive layer (10) can be evaluated by the evaluation structure (7). The heating structure (9) is arranged on an adhesion-promoting oxide layer (6) on the top surface of the membrane layer (3) and is separated from the gas-sensitive layer by a cover oxide layer (11).