Patents by Inventor Oh-Jin Kwon

Oh-Jin Kwon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130028690
    Abstract: Provided are an apparatus and method for treating a substrate. More particularly, an apparatus and method for treating a substrate through a supercritical process are provided. The apparatus includes a housing having an entrance in a side thereof and providing a space for performing a process, a door for opening and closing the entrance, and a support member disposed on the door to receive a substrate thereon.
    Type: Application
    Filed: July 27, 2012
    Publication date: January 31, 2013
    Applicant: SEMES CO., LTD.
    Inventors: Joo Jib Park, Woo Young Kim, Oh Jin Kwon, Boong Kim
  • Publication number: 20110273400
    Abstract: A switched capacitor integrator circuit is disclosed. The switched capacitor integrator circuit comprises an inverting switched capacitor integrator circuit, and a non-inverting switched capacitor integrator circuit connected to the inverting switched capacitor integrator circuit. A sampling capacitor of the inverting switched capacitor integrator circuit is shared by the non-inverting switched capacitor integrator circuit.
    Type: Application
    Filed: May 11, 2011
    Publication date: November 10, 2011
    Applicant: ZINITIX CO., LTD.
    Inventors: Oh-Jin KWON, Il-Hyun YUN, Seon-Woong JANG, Hyung-Cheol SHIN
  • Publication number: 20110163768
    Abstract: According to the present invention, a charging and discharging circuit is electrically connected to an operation signal line and a detection signal line, and repeats a charging and discharging operation of a node capacitor. The present invention also includes an integration capacitor electrically connected to the detection signal line and an integration circuit charging the integration capacitor to a unit charging voltage every charging and discharging operation of the node capacitor such that the integration capacitor is charged to a first voltage that is integrated according to a charging and discharging number. The integration circuit may include a reset switch electrically connected to the integration capacitor and discharging the first voltage integrated and charged to the integration capacitor for initializing.
    Type: Application
    Filed: October 5, 2010
    Publication date: July 7, 2011
    Applicant: SAIN InfoCom
    Inventors: Oh Jin Kwon, Il Hyun Yun, Hyung Cheol Shin, Seung Hun Ko
  • Publication number: 20110050631
    Abstract: A touch sensor includes a plurality of operation patterns arranged in a first axis direction and supplied with a voltage, a dielectric material layer formed over the plurality of operation patterns, and a plurality of sense patterns formed over the dielectric material layer and arranged in a second axis direction to cross the first axis direction. At least one of the plurality of sense patterns has a parallel structure in which the sense pattern is separated into two or more lines, and the separated sense patterns are recombined once or more. A touch screen having a low resistance value can be obtained.
    Type: Application
    Filed: August 23, 2010
    Publication date: March 3, 2011
    Applicant: SAIN InfoCom.
    Inventors: Oh Jin KWON, II Hyun Yun, Kyung Dae Kim, Jae Min Lee, Hyung Cheol Shin
  • Publication number: 20110021115
    Abstract: Provided is a substrate polishing apparatus that includes a polishing unit and a pad supporting member. The polishing unit includes a polishing pad polishing a substrate seated on a substrate supporting member, and a pad driving member moving the polishing pad. The pad supporting member is disposed at a side of the substrate supporting member to support a portion of a polishing surface the polishing pad without contacting the substrate when an edge of the substrate seated on the substrate supporting member is polished. Accordingly, the substrate polishing apparatus prevents the polishing pad from being inclined to the outer side of a substrate while an edge of the substrate is polished, thereby improving polishing efficiency and preventing the breakage of a substrate during a polishing process.
    Type: Application
    Filed: July 23, 2010
    Publication date: January 27, 2011
    Inventors: Sehoon OH, Oh Jin KWON, Jang Hyun KIM
  • Publication number: 20100268714
    Abstract: The present invention relates to an information analysis system comprising: a summary table creation unit for analyzing an input file if the file is inputted, extracting a field list corresponding to the field list information stored in a provided database, and creating a summary table including the extracted field list; a preprocessing module for performing a preprocess including at least one of field refinement, group creation, and sub-data set creation, for fields of the summary table created by the summary table creation unit; a matrix creation unit for creating a matrix based on matrix setting information inputted by a user, for the fields created by the summary table creation unit or the preprocessing module; a cluster analysis unit for analyzing a cluster of corresponding fields according to a cluster analysis method inputted by the user, for fields selected by the user among the fields created by the summary table creation unit or the preprocessing module; and a visualization data creation unit for cr
    Type: Application
    Filed: December 16, 2008
    Publication date: October 21, 2010
    Applicant: KOREA INSTITUTE OF SCIENCE & TECHNOLOGY INFOMATION
    Inventors: Yeong Ho Moon, Sang Pil Lee, Chang Hoan Lee, Sang Jin Bae, June Young Lee, Oh Jin Kwon, Bang Rae Lee, Eui Seob Jeong, Woon Dong Yeo
  • Publication number: 20090108545
    Abstract: The present invention is directed to a spin chuck for use in a process, such as a cleaning process and an etching process, performed while rotating a substrate. The spin chuck includes a spin head on which a substrate is placed, a driving part configured to rotate the spin head, and a fix bracket installed on the spin head and having a contact surface that is in contact with a flat surface of a flat zone of the substrate at a position corresponding to the flat zone to prevent a vortex caused by the flat zone. Since the fix bracket has the same shape as the flat zone of the substrate, an air current unbalance resulting from the flat zone is suppressed to uniformly inject etchants to a rear surface of the substrate.
    Type: Application
    Filed: October 26, 2006
    Publication date: April 30, 2009
    Inventors: Oh-Jin Kwon, Jeong-Yong Bae, Jeong-Yeol Choi
  • Patent number: 7377579
    Abstract: A structure for mounting a horizontal hood latch to an automobile includes an upper panel of a front-end module and a bracket over-molded onto the upper panel of the front-end module. A pair of through-openings are provided on opposite side portions of the bracket that allow both surfaces of the bracket to be coated by plastic material and the bracket to be mounted onto the upper panel, as the plastic material is poured thereon.
    Type: Grant
    Filed: May 12, 2005
    Date of Patent: May 27, 2008
    Assignee: Hyundai Mobis Co., Ltd.
    Inventor: Oh-jin Kwon
  • Publication number: 20050253419
    Abstract: A structure for mounting a horizontal hood latch to an automobile includes an upper panel of a front-end module and a bracket over-molded onto the upper panel of the front-end module. A pair of through-openings are provided on opposite side portions of the bracket that allow both surfaces of the bracket to be coated by plastic material and the bracket to be mounted onto the upper panel, as the plastic material is poured thereon.
    Type: Application
    Filed: May 12, 2005
    Publication date: November 17, 2005
    Applicant: HYUNDAI MOBIS CO., LTD.
    Inventor: Oh-jin Kwon
  • Patent number: 6849690
    Abstract: The present invention relates to a method of preparing rubber-modified styrene copolymer resin with excellent transparency and impact resistance, specifically to a method of preparing transparent resin of rubber-modified styrene copolymer comprising graft-copolymerizing styrene monomer and (meth)acrylate monomer in the presence of block or random styrene-butadiene copolymer which has 30-50% of styrene skeleton content and 20-40 cp of 5% toluene solution viscosity at 25 iÉ. According to the method of the present invention, the transparent resin containing the rubber particles of a double structure comprising onion and core-shell structure can provide transparent resin of rubber-modified styrene copolymer resin with excellent transparency and impact resistance as well as good gloss.
    Type: Grant
    Filed: December 12, 2001
    Date of Patent: February 1, 2005
    Assignee: LG Chem, Ltd.
    Inventors: Chang-Hun Han, Oh-Jin Kwon, Dae-Woo Lee
  • Publication number: 20040048982
    Abstract: The present invention relates to a method of preparing rubber-modified styrene copolymer resin with excellent transparency and impact resistance, specifically to a method of preparing transparent resin of rubber-modified styrene copolymer comprising graft-copolymerizing styrene monomer and (meth)acrylate monomer in the presence of block or random styrene-butadiene copolymer which has 30-50% of styrene skeleton content and 20-40 cp of 5% toluene solution viscosity at 25 ié. According to the method of the present invention, the transparent resin containing the rubber particles of a double structure comprising onion and core-shell structure can provide transparent resin of rubber-modified styrene copolymer resin with excellent transparency and impact resistance as well as good gloss.
    Type: Application
    Filed: June 12, 2003
    Publication date: March 11, 2004
    Inventors: Chang-Hun Han, Oh-Jin Kwon, Dae-Woo Lee
  • Publication number: 20020178362
    Abstract: Disclosed is a method of embedding a hidden digital watermark (also called digital stamp, digital seal, digital signature, etc.) into a produced image which can permanently identify the copyrighter of the produced image to cope with an illegal use or modification thereof by imbedding the hidden digital watermark into the produced image so that the copyrighter can identify his/her authorship when the digital image is first produced by the copyrighter. A color or black-and-white image that only the copyrighter possesses is used as the digital watermark, and the digital watermark is embedded into the produced image in a manner that the human eyes cannot realize the difference between the images before and after imbedding the digital watermark.
    Type: Application
    Filed: May 10, 2001
    Publication date: November 28, 2002
    Inventor: Oh-Jin Kwon
  • Patent number: 6221969
    Abstract: Disclosed is a method for producing a rubber-modified styrenic resin. The method includes the steps of (a) producing a rubber solution by dissolving a rubber polymer in a vinyl monomer; (b) producing a rubber composition by continuously supplying the above rubber solution in a first reactor to polymerize the rubber polymer with the vinyl monomer at a reaction temperature of 120°-145° C. to perform phase inversion of the rubber polymer, thereby producing the polymer of conversion ratio of 10-40 wt %, and realized through 50-99% of rubber particles having an average particle diameter of 0.1-0.
    Type: Grant
    Filed: March 22, 1999
    Date of Patent: April 24, 2001
    Assignee: LG Chemical, Ltd.
    Inventors: Oh-jin Kwon, Yong-jun Kim, Hyung-sub Lee