Patents by Inventor Ohad Bachar
Ohad Bachar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9080971Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: GrantFiled: October 16, 2014Date of Patent: July 14, 2015Assignee: KLA-Tencor Corp.Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Publication number: 20150116717Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.Type: ApplicationFiled: December 23, 2014Publication date: April 30, 2015Inventors: Amnon MANASSEN, Andrew HILL, Daniel KANDEL, Ilan SELA, Ohad BACHAR, Barak BRINGOLTZ
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Publication number: 20150036142Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: ApplicationFiled: October 16, 2014Publication date: February 5, 2015Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Patent number: 8873054Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: GrantFiled: April 17, 2013Date of Patent: October 28, 2014Assignee: KLA-Tencor Corp.Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Publication number: 20140168650Abstract: The disclosure is directed to a system and method of controlling spectral attributes of illumination. According to various embodiments, a portion of illumination including an excluded selection of illumination spectra is blocked, while another portion of the illumination including a transmitted selection of illumination spectra is directed along an illumination path. In some embodiments, optical metrology is performed utilizing the spectrally controlled illumination to enhance measurement capability. For instance, the spectral attributes of illumination utilized to analyze different portions of a sample, such as different semiconductor layers, may be selected according to certain measurement characteristics associated with the analyzed portions of the sample.Type: ApplicationFiled: July 18, 2013Publication date: June 19, 2014Inventors: Amnon Manassen, Andrew V. Hill, Ohad Bachar, Avi Abramov, Daria Negri
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Publication number: 20140146322Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.Type: ApplicationFiled: July 8, 2013Publication date: May 29, 2014Inventors: Andrew V. Hill, Amnon Manassen, Barak Bringoltz, Ohad Bachar, Mark Ghinovker, Zeev Bomzon, Daniel Kandel
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Publication number: 20140111791Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.Type: ApplicationFiled: October 18, 2013Publication date: April 24, 2014Inventors: Amnon Manassen, Ohad Bachar, Daria Negri, Boris Golovanevsky, Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
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Patent number: 8582114Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.Type: GrantFiled: August 15, 2011Date of Patent: November 12, 2013Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Daniel Kandel, Moshe Baruch, Vladimir Levinski, Noam Sapiens, Joel Seligson, Andy Hill, Ohad Bachar, Daria Negri, Ofer Zaharan
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Publication number: 20130229661Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: ApplicationFiled: April 17, 2013Publication date: September 5, 2013Applicant: KLA-Tencor CorporationInventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Patent number: 8441639Abstract: Various metrology systems and methods are provided.Type: GrantFiled: August 31, 2010Date of Patent: May 14, 2013Assignee: KLA-Tencor Corp.Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Publication number: 20130044331Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.Type: ApplicationFiled: August 15, 2011Publication date: February 21, 2013Applicant: KLA-TENCOR CORPORATIONInventors: Amnon Manassen, Daniel Kandel, Moshe Baruch, Vladimir Levinski, Noam Sapiens, Joel Seligson, Andy Hill, Ohad Bachar, Daria Negri, Ofer Zaharan
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Publication number: 20120033226Abstract: The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.Type: ApplicationFiled: July 22, 2011Publication date: February 9, 2012Applicant: KLA-TENCOR CORPORATIONInventors: Amnon Manassen, Daniel Kandel, Moshe Baruch, Joel L. Seligson, Alexander Svizher, Guy Cohen, Efraim Rotem, Ohad Bachar, Daria Negri, Noam Sapiens
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Publication number: 20110069312Abstract: Various metrology systems and methods are provided.Type: ApplicationFiled: August 31, 2010Publication date: March 24, 2011Applicant: KLA-TENCOR CORPORATIONInventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem