Patents by Inventor Olav Waldemar Vladimir Frijns
Olav Waldemar Vladimir Frijns has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230063156Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.Type: ApplicationFiled: December 24, 2020Publication date: March 2, 2023Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ronald Peter ALBRIGHT, Kursat BAL, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Sjoerd Frans DE VRIES, Olav Waldemar Vladimir FRIJNS, Yang-Shan HUANG, Zhuangxiong HUANG, Johannes Henricus Wilhelmus JACOBS, Johannes Hubertus Josephina MOORS, Georgi Nanchev NENCHEV, Andrey NIKIPELOV, Thomas Maarten RAASVELD, Manish RANJAN, Edwin TE SLIGTE, Karl Robert UMSTADTER, Eray UZGÖREN, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
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Publication number: 20210375498Abstract: A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.Type: ApplicationFiled: August 6, 2021Publication date: December 2, 2021Applicant: ASML Netherlands B.V.Inventors: Pieter Willem Herman DE JAGER, Sipke Jacob BIJLSMA, Olav Waldemar Vladimir FRIJNS, Andrey Alexandrovich NIKIPELOV, Nicolaas TEN KATE, Antonius Theodorus Anna Maria DERKSEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Robert Gabriël Maria LANSBERGEN, Aukje Arianne Annette KASTELIJN
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Patent number: 11170907Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).Type: GrantFiled: November 3, 2016Date of Patent: November 9, 2021Assignee: ASML Netherlands B.V.Inventors: Pieter Willem Herman De Jager, Sipke Jacob Bijlsma, Olav Waldemar Vladimir Frijns, Andrey Alexandrovich Nikipelov, Nicolaas Ten Kate, Antonius Theodorus Anna Maria Derksen, Jacobus Johannus Leonardus Hendricus Verspay, Robert Gabriël Maria Lansbergen, Aukje Arianne Annette Kastelijn
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Patent number: 10580545Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.Type: GrantFiled: September 24, 2014Date of Patent: March 3, 2020Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Petrus Rutgerus Bartraij, Ramon Pascal Van Gorkom, Lucas Johannes Peter Ament, Pieter Willem Herman De Jager, Gosse Charles De Vries, Rilpho Ludovicus Donker, Wouter Joep Engelen, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Erik Roelof Loopstra, Han-Kwang Nienhuys, Andrey Alexandrovich Nikipelov, Michael Jozef Mathijs Renkens, Franciscus Johannes Joseph Janssen, Borgert Kruizinga
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Patent number: 10437154Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.Type: GrantFiled: October 20, 2017Date of Patent: October 8, 2019Assignee: ASML Netherlands B.V.Inventors: Andrey Alexandrovich Nikipelov, Olav Waldemar Vladimir Frijns, Erik Roelof Loopstra, Wouter Joep Engelen, Johannes Antonius Gerardus Akkermans
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Publication number: 20190066859Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).Type: ApplicationFiled: November 3, 2016Publication date: February 28, 2019Applicant: ASML Netherlands B.V.Inventors: Pieter Willem Herman DE JAGER, Sipke Jacob BIJLSMA, Olav Waldemar Vladimir FRIJNS, Andrey Alexandrovich NIKIPELOV, Nicolaas TEN KATE, Antonius Theodorus Anna Maria DERKSEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Robert Gabriël Maria LANSBERGEN, Aukje KASTELIJN
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Patent number: 10103508Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.Type: GrantFiled: May 19, 2017Date of Patent: October 16, 2018Assignee: ASML Netherlands B.V.Inventors: Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op 'T Root
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Patent number: 9983482Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.Type: GrantFiled: February 26, 2014Date of Patent: May 29, 2018Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Erik Roelof Loopstra, Olav Waldemar Vladimir Frijns, Stig Bieling, Antonius Theodorus Wilhelmus Kempen, Ivo Vanderhallen, Nicolaas Ten Kate, Ruud Antonius Catharina Maria Beerens, Richard Henricus Adrianus Van Lieshout, Theodorus Petrus Maria Cadee, Sjoerd Nicolaas Lambertus Donders, Alexander Matthijs Struycken, Marcus Petrus Scheepers
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Publication number: 20180081278Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.Type: ApplicationFiled: October 20, 2017Publication date: March 22, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Olav Waldemar Vladimir FRIJNS, Gosse Charles DE VRIES, Erik Roelof LOOPSTRA, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS, Borgert KRUIZINGA, Wouter Joep ENGELEN, Otger Jan LUITEN, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Vladimir LITVINENKO
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Publication number: 20180031982Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.Type: ApplicationFiled: February 16, 2016Publication date: February 1, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Han-Kwang NIENHUYS, Erik Willem BOGAART, Rilpho Ludovicus Donker, Borgert KRUIZINGA, Erik Roelof LOOPSTRA, Hako BOTMA, Gosse Charles DE VRIES, Olav Waldemar Vladimir FRIJNS, Johannes Jacobus Matheus BASELMANS
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Patent number: 9823572Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.Type: GrantFiled: June 17, 2014Date of Patent: November 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Andrey Alexandrovich Nikipelov, Olav Waldemar Vladimir Frijns, Gosse Charles De Vries, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Rilpho Ludovicus Donker, Han-Kwang Nienhuys, Borgert Kruizinga, Wouter Joep Engelen, Otger Jan Luiten, Johannes Antonius Gerardus Akkermans, Leonardus Adrianus Gerardus Grimminck, Vladimir Litvinenko
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Publication number: 20170264071Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.Type: ApplicationFiled: May 19, 2017Publication date: September 14, 2017Applicant: ASML Netherlands B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op 'T Root
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Patent number: 9728931Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.Type: GrantFiled: November 27, 2014Date of Patent: August 8, 2017Assignee: ASML Netherlands B.V.Inventors: Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op'T Root
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Patent number: 9632419Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.Type: GrantFiled: August 23, 2012Date of Patent: April 25, 2017Assignee: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Vadim Yevgenyevich Banine, Olav Waldemar Vladimir Frijns, Hermanus Kreuwel, Johannes Hubertus Josephina Moors, Uwe Bruno Heini Stamm, Gerardus Hubertus Petrus Maria Swinkels, Ivo Vanderhallen, Andrei Mikhailovich Yakunin
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Publication number: 20160301180Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.Type: ApplicationFiled: November 27, 2014Publication date: October 13, 2016Applicant: ASML Netherlands B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Johannes Antonius Gerardus AKKERMANS, Erik LOOPSTRA, Wouter Joep ENGELEN, Petrus Rutgerus BARTRAIJ, Teis Johan COENEN, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
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Patent number: 9411238Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.Type: GrantFiled: January 10, 2013Date of Patent: August 9, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
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Publication number: 20160225477Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.Type: ApplicationFiled: September 24, 2014Publication date: August 4, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich BANINE, Peturs Rutgerus BARTRAIJ, Ramon Pascal VAN GORKOM, Lucas Johannes Peter AMENT, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Rilpho Ludovicus DONKER, Wouter Joep ENGELEN, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Erik Roelof LOOPSTRA, Han-Kwang NIENHUYS, Andrey Alexandrovich NIKIPELOV, Michael Jozef Mathijs RENKENS, Franciscus Johannes Joseph JANSSEN, Borgert KRUIZINGA
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Patent number: 9377695Abstract: A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.Type: GrantFiled: January 18, 2012Date of Patent: June 28, 2016Assignee: ASML Netherlands B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Olav Waldemar Vladimir Frijns
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Publication number: 20160147161Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.Type: ApplicationFiled: June 17, 2014Publication date: May 26, 2016Inventors: Andrey Alexandrovich NIKIPELOV, Olav Waldemar Vladimir FRIJNS, Gosse Charles DE VRIES, Erik Roelof LOOPSTRA, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS, Borgert KRUIZINGA, Wouter Joep ENGELEN, Otger Jan LUITEN, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Vladimir LITVINENKO
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Publication number: 20160026091Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.Type: ApplicationFiled: February 26, 2014Publication date: January 28, 2016Applicants: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Erik Roelof LOOPSTRA, Olav Waldemar Vladimir FRIJNS, Stig BIELING, Antonius Theodorus Wilhelmus KEMPEN, Ivo VANDERHALLEN, Nicolaas TEN KATE, Ruud Antonius Catharina Maria BEERENS, Richard Henricus Adrianus VAN LIESHOUT, Theodorus Petrus Maria CADEE, Sjoerd Nicolaas Lambertus DONDERS, Alexander Matthijs STRUYCKEN, Marcus Petrus SCHEEPERS