Patents by Inventor Olav Waldemar Vladimir Frijns
Olav Waldemar Vladimir Frijns has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140375974Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma-forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.Type: ApplicationFiled: January 10, 2013Publication date: December 25, 2014Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
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Patent number: 8766212Abstract: A method to align a discharge axis of a discharge radiation source with respect to optics of the lithographic apparatus includes creating a discharge in a substance in a discharge space between an anode and a cathode to form a plasma so as to generate electromagnetic radiation. The discharge is triggered by irradiating an area on a surface proximate the discharge space with an energetic beam. The position of the area is controlled in response to a property of the radiation in the lithographic apparatus and/or the temperature of a collector of the lithographic apparatus. Controlling the position of the area which is irradiated improves alignment of the discharge axis with the different lithographic modules, such as the contamination barrier, the illumination system, the substrate table and/or the projection system.Type: GrantFiled: July 19, 2006Date of Patent: July 1, 2014Assignee: ASML Netherlands B.V.Inventor: Olav Waldemar Vladimir Frijns
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Patent number: 8736806Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.Type: GrantFiled: October 8, 2009Date of Patent: May 27, 2014Assignee: ASML Netherlands B.V.Inventors: Olav Waldemar Vladimir Frijns, Johannes Christiaan Leonardus Franken, Kurt Gielissen
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Publication number: 20140078486Abstract: A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.Type: ApplicationFiled: January 18, 2012Publication date: March 20, 2014Applicant: ASML Netherlands B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Olav Waldemar Vladimir Frijns
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Patent number: 8610089Abstract: A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.Type: GrantFiled: April 17, 2012Date of Patent: December 17, 2013Assignees: ASML Netherlands B.V., Stichting Nationaal Lucht—en RuimtevaartlaboratoriumInventors: Sjoerd Nicolaas Lambertus Donders, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Gerrit Van Donk, Henk Jan Van Gerner
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Publication number: 20120267550Abstract: A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.Type: ApplicationFiled: April 17, 2012Publication date: October 25, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Sjoerd Nicolaas Lambertus DONDERS, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Gerrit Van Donk, Henk Jan Van Gerner
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Publication number: 20110242516Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.Type: ApplicationFiled: October 8, 2009Publication date: October 6, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Olav Waldemar Vladimir Frijns, Johannes Christiaan Leonardus Franken, Kurt Gielissen
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Patent number: 7863591Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.Type: GrantFiled: May 13, 2009Date of Patent: January 4, 2011Assignees: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen
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Patent number: 7724349Abstract: A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.Type: GrantFiled: May 2, 2007Date of Patent: May 25, 2010Assignee: ASML Netherlands B.V.Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Niels Machiel Driessen, Vadim Yevgenyevich Banine, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Derek Jan Wilfred Klunder
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Publication number: 20090309048Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.Type: ApplicationFiled: May 13, 2009Publication date: December 17, 2009Applicant: ASML Netherlands B.V.Inventors: Maarten Marinus Johannes Wilhelmus VAN HERPEN, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardu Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen
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Patent number: 7541603Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.Type: GrantFiled: September 27, 2006Date of Patent: June 2, 2009Assignee: ASML Netherlands B.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen
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Patent number: 7528395Abstract: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.Type: GrantFiled: September 17, 2003Date of Patent: May 5, 2009Assignee: ASML Netherlands B.V.Inventors: Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine, Vladimir Vital'Evitch Ivanov, Erik René Kieft, Erik Roelof Loopstra, Lucas Henricus Johannes Stevens, Yurii Victorovitch Sidelkov, Vsevolod Grigorevitch Koloshnikov, Vladimir Mihailovitch Krivtsun, Robert Rafilevitch Gayazov, Olav Waldemar Vladimir Frijns
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Patent number: 7470916Abstract: A collector is disclosed that is constructed to receive radiation from a radiation source and to transmit radiation to an illumination system, the collector comprising a reflective element which is internally provided with a fluid channel.Type: GrantFiled: June 20, 2006Date of Patent: December 30, 2008Assignee: ASML Netherlands B.V.Inventors: Wilhelmus Josephus Box, Harm-Jan Voorma, Olav Waldemar Vladimir Frijns, Maurice Piërre Marie Arthur Limpens
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Publication number: 20080273188Abstract: A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.Type: ApplicationFiled: May 2, 2007Publication date: November 6, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Niels Machiel Driessen, Vadim Yevgenyevich Banine, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Derk Jan Wilfred Klunder
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Publication number: 20080074655Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.Type: ApplicationFiled: September 27, 2006Publication date: March 27, 2008Applicants: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen
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Publication number: 20080017810Abstract: A method to align a discharge axis of a discharge radiation source with respect to optics of the lithographic apparatus includes creating a discharge in a substance in a discharge space between an anode and a cathode to form a plasma so as to generate electromagnetic radiation. The discharge is triggered by irradiating an area on a surface proximate the discharge space with an energetic beam. The position of the area is controlled in response to a property of the radiation in the lithographic apparatus and/or the temperature of a collector of the lithographic apparatus. Controlling the position of the area which is irradiated improves alignment of the discharge axis with the different lithographic modules, such as the contamination barrier, the illumination system, the substrate table and/or the projection system.Type: ApplicationFiled: July 19, 2006Publication date: January 24, 2008Applicant: ASML Netherlands B.V.Inventor: Olav Waldemar Vladimir Frijns
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Patent number: 7113261Abstract: A radiation system includes a radiation generator to generate radiation, a source, and an illumination system configured to receive the radiation and provide a beam of radiation. The illumination system includes a beam measuring system configured measure at least one of position and tilt of the beam of radiation relative to the illumination system and a projecting device configured to redirect only a part of a cross section of the beam of radiation to the beam measuring system. The beam measuring system may include several position sensors, the readouts of which can be used to determine incorrect alignment of the radiation source with respect to the illumination system. Diaphragms are connected to the collector of the radiation generator, so that in addition to X, Y, and Z corrections, Rx, Ry and Rz corrections are possible.Type: GrantFiled: June 8, 2004Date of Patent: September 26, 2006Assignee: ASML Netherlands B.V.Inventors: Marcel Mathijs Theodore Marie Dierichs, Markus Franciscus Antonius Eurlings, Olav Waldemar Vladimir Frijns
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Publication number: 20040105082Abstract: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.Type: ApplicationFiled: September 17, 2003Publication date: June 3, 2004Applicant: ASML Netherlands B. V.Inventors: Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine, Vladimir Vital?apos;Evitch Ivanov, Erik Rene Kieft, Erik Roelof Loopstra, Lucas Henricus Johannes Stevens, Yurii Victorovitch Sidelkov, Vsevolod Grigorevitch Koloshnikov, Vladimir Mihailovitch Krivtsun, Robert Rafilevitch Gayazov, Olav Waldemar Vladimir Frijns