Abstract: A glass furnace including an additive-containing product including an additive selected from: phosphorus compounds other than glasses and vitroceramics, tungsten compounds other than glasses and vitroceramics, molybdenum compounds other than glasses and vitroceramics, iron in the form of metal, aluminum in the form of metal, silicon in the form of metal, and their mixtures, silicon carbide, boron carbide, silicon nitride, boron nitride, glasses including elemental phosphorus and/or iron and/or tungsten and/or molybdenum, vitroceramics including elemental phosphorus and/or iron and/or tungsten and/or molybdenum, and their mixtures, and having the following chemical analysis, exclusively of the additive, as a percentage by weight on the basis of the oxides: Cr2O3?2%, and Cr2O3+Al2O3+CaO+ZrO2+MgO+Fe2O3+SiO2+TiO2?90%, and Cr2O3+Al2O3+MgO?60%, the content by weight of additive being in the range 0.01% to 6%.

Abstract: A refractory article includes a body including a ceramic having an aluminosilicate present in an amount of at least 70 wt % and not greater than 99 wt % for a total weight of the body, and the body further includes a dopant including a Mg-containing oxide compound and a Fe-containing oxide compound, and the dopant is present in an amount within a range including at least 1 wt % and not greater than 12 wt %.

Abstract: A method for producing a glass furnace, including a refractory portion, a waveguide with a measurement portion extending into the refractory portion and an interrogator connected to an input of the waveguide to inject an interrogation signal. The measurement portion incorporating a sensor to send a response signal to the interrogator in response to the injection. The interrogator analyzing the response signal and sending a message. Arranging, inside a mold, a temporary part configured to leave space for a compartment for the measurement portion. Preparing a starting feedstock and introducing the starting feedstock into the mold such that the part is embedded therein to obtain a preform. Hardening the preform to form the refractory portion. Removing the temporary part to make the compartment. Assembling the refractory portion with other constituent elements and introducing the measurement portion into the compartment and connecting the interrogator to the input of the waveguide.

Abstract: A refractory object may include a zircon body that is intentionally doped with a dopant including an alkaline earth element and aluminum. The refractory object can have an improved creep deformation rate. In an embodiment, the refractory object can have a creep deformation rate of not greater than about 1.8 E-5 h?1 at a temperature of 1350° C. and a stress of 2 MPa. In another embodiment, the zircon body may include an amorphous phase including an alkaline earth metal element.

Abstract: A process for the manufacture of a refractory block including more than 80% zirconia, in percentage by weight based on the oxides. The process includes the following successive stages: melting, under reducing conditions, of a charge including more than 50% zircon, in percentage by weight, such as to reduce the zircon and obtain a molten material, application of oxidizing conditions to the molten material, casting of the molten material, and cooling until at least partial solidification of the molten material in the form of a block. Also, the process can include heat treatment of the block.

Abstract: A refractory object may include a zircon body that is intentionally doped with a dopant including an alkaline earth element and aluminum. The refractory object can have an improved creep deformation rate. In an embodiment, the refractory object can have a creep deformation rate of not greater than about 1.8 E-5 h?1 at a temperature of 1350° C. and a stress of 2 MPa. In another embodiment, the zircon body may include an amorphous phase including an alkaline earth metal element.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: A refractory object may include a zircon body that is intentionally doped with a dopant including an alkaline earth element and aluminum. The refractory object can have an improved creep deformation rate. In an embodiment, the refractory object can have a creep deformation rate of not greater than about 1.8 E-5 h?1 at a temperature of 1350° C. and a stress of 2 MPa. In another embodiment, the zircon body may include an amorphous phase including an alkaline earth metal element.

Abstract: A process for the manufacture of a refractory block including more than 80% zirconia, in percentage by weight based on the oxides. The process includes the following successive stages: melting, under reducing conditions, of a charge including more than 50% zircon, in percentage by weight, such as to reduce the zircon and obtain a molten material, application of oxidizing conditions to the molten material, casting of the molten material, and cooling until at least partial solidification of the molten material in the form of a block. Also, the process can include heat treatment of the block.

Abstract: A method for producing a glass furnace, including a refractory portion, a waveguide with a measurement portion extending into the refractory portion and an interrogator connected to an input of the waveguide to inject an interrogation signal. The measurement portion incorporating a sensor to send a response signal to the interrogator in response to the injection. The interrogator analyzing the response signal and sending a message. Arranging, inside a mold, a temporary part configured to leave space for a compartment for the measurement portion. Preparing a starting feedstock and introducing the starting feedstock into the mold such that the part is embedded therein to obtain a preform. Hardening the preform to form the refractory portion. Removing the temporary part to make the compartment. Assembling the refractory portion with other constituent elements and introducing the measurement portion into the compartment and connecting the interrogator to the input of the waveguide.

Abstract: A glass furnace including a refractory portion defining a hot face in contact or intended to be in contact with molten glass or with a gaseous environment in contact with molten glass, and a cold face at a distance from the hot face, and a temperature measurement device. The temperature measurement device including a waveguide that includes a measurement portion including at least one temperature measurement sensor configured to send a response signal in response to the injection of an interrogation signal into the waveguide. The temperature measurement device including an interrogator connected to an input of the waveguide and configured to inject the interrogation signal into the input, to receive the response signal returned by the sensor in response to the injection of the interrogation signal, to analyze the response signal received and to transmit a message according to the analysis.

Abstract: A glass furnace including an additive-containing product including an additive selected from: phosphorus compounds other than glasses and vitroceramics, tungsten compounds other than glasses and vitroceramics, molybdenum compounds other than glasses and vitroceramics, iron in the form of metal, aluminum in the form of metal, silicon in the form of metal, and their mixtures, silicon carbide, boron carbide, silicon nitride, boron nitride, glasses including elemental phosphorus and/or iron and/or tungsten and/or molybdenum, vitroceramics including elemental phosphorus and/or iron and/or tungsten and/or molybdenum, and their mixtures, and having the following chemical analysis, exclusively of the additive, as a percentage by weight on the basis of the oxides: Cr2O3?2%, and Cr2O3+Al2O3+CaO+ZrO2+MgO+Fe2O3+SiO2+TiO2?90%, and Cr2O3+Al2O3+MgO?60%, the content by weight of additive being in the range 0.01% to 6%.

Abstract: A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10?6 h?1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10?5 h?1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.

Abstract: A molten refractory product having the following average chemical composition, in wt % on the basis of oxides and for a total of 100%: Al2O3: balance to 100%; Fe2O3: 0.6%-5.0% and/or TiO2: 1.5%-10.0%; Fe2O3+TiO2?10.0%; Na2O+K2O: 1.0%-8.0%; SiO2: 0.2%-2.0%; CaO+BaO+SrO: ?0.5%; Other oxide species: ?1.5%. Also, a glass-melting furnace and the use of the refractory product in the glass-melting furnace.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: An unshaped product including a particulate mixture containing: a coarse fraction, representing >50%<91% of particulate mixture, in mass percentage, and containing particles size ?50 ?m, “coarse particles”, and matrix fraction, forming remainder up to 100% of particulate mixture, and containing particles sizes <50 ?m, product having chemical analysis, in mass percentage based on oxides of product, such: ?45%<Al2O3, ?7.5%<SiO2<35%, ?0%?ZrO2<33%, providing 10%<SiO2+ZrO2<54%, ?0.15%<B2O3<8%, other oxides: <6%, Al2O3 forming remainder up to 100%, coarse fraction including more than 15% coarse particles having size >1 mm, in mass percentage based on particulate mixture, matrix fraction having a chemical analysis, in mass percentage based on oxides of matrix fraction, such: Al2O3+SiO2+ZrO2>86%, providing 35%<Al2O3.

Abstract: A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10?6 h?1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10?5 h?1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10?6 h?1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10?5 h?1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.