Abstract: A refractory article includes a body including a ceramic having an aluminosilicate present in an amount of at least 70 wt % and not greater than 99 wt % for a total weight of the body, and the body further includes a dopant including a Mg-containing oxide compound and a Fe-containing oxide compound, and the dopant is present in an amount within a range including at least 1 wt % and not greater than 12 wt %.

Abstract: A molten refractory product having the following average chemical composition, in wt % on the basis of oxides and for a total of 100%: Al2O3: balance to 100%; Fe2O3: 0.6%-5.0% and/or TiO2: 1.5%-10.0%; Fe2O3+TiO2?10.0%; Na2O+K2O: 1.0%-8.0%; SiO2: 0.2%-2.0%; CaO+BaO+SrO: ?0.5%; Other oxide species: ?1.5%. Also, a glass-melting furnace and the use of the refractory product in the glass-melting furnace.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: A refractory object can include at least 10 wt % Al2O3. Further, the refractory object may contain less than approximately 6 wt % SiO2 or may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the Al2O3 in the refractory object can be provided as reactive Al2O3. In another embodiment, the refractory object may have a density of at least approximately 3.55 g/cc, a corrosion rate of no greater than approximately 2.69 mm/year, or any combination of the foregoing. In a particular embodiment, the refractory object can be used to form an Al—Si—Mg glass sheet. In an embodiment, the refractory object may be formed by a process using a compound of Ti, Mg, Ta, Nb, or any combination thereof.

Abstract: A refractory object can include at least 10 wt % Al2O3. In an embodiment, the refractory object can further include a dopant including an oxide of a rare earth element, Ta, Nb, Hf, or any combination thereof. In another embodiment, the refractory object may have a property such that the averaged grain size does not increase more than 500% during sintering, an aspect ratio less than approximately 4.0, a creep rate less than approximately 1.0×10?5 ?m/(?m×hr), or any combination thereof. In a particular embodiment, the refractory object can be in the form of a refractory block or a glass overflow forming block. The glass overflow forming block can be useful in forming an Al—Si—Mg glass sheet. In a particular embodiment, a layer including Mg—Al oxide can initially form along exposed surfaces of the glass overflow forming block when forming the Al—Si—Mg glass sheet.

Abstract: A component includes a body including zircon (ZrSiO4) grains, the body having a free silica intergranular phase present between the zircon grains and distributed substantially uniformly through the body. The body comprises a content of free silica not greater than about 2 wt. % for the total weight of the body.

Abstract: A sintered product made from a starting batch containing 5 to 50% zircon and having the following average chemical composition, in weight percentages on the basis of the oxides and for a total of 100%: silica and zirconia, the zirconia content (ZrO2) being at least 64%, at least 0.2% of a dopant selected from V2O5, Nb2O5, Ta2O5, and mixtures thereof, optionally, a stabilizer selected from Y2O3, MgO, CaO, CeO2, and mixtures thereof, at a content of 6% or less, “other oxides” at a content of 6.7% or less.

Abstract: A method for manufacturing sintered refractory grains containing Cr2CO3 from an initial refractory product including one or more chromium that includes: A) optionally, \crushing the starting refractory material; B) grinding a filler, comprising said starting refractory material in a liquid medium to obtain a suspension of particles of said starting refractory material; C) preparing a starting mixture including at least 1 wt % of particles of the suspension obtained during the preceding step; D) shaping the starting mixture into the shape of a preform; E) optionally drying the preform obtained in step D); F) sintering the preform so as to obtain a sintered body; G) optionally grinding the sintered body; and H) the optional selection by particle size.

Abstract: An unshaped product including a particulate mixture containing: a coarse fraction, representing >50%<91% of particulate mixture, in mass percentage, and containing particles size ?50 ?m, “coarse particles”, and matrix fraction, forming remainder up to 100% of particulate mixture, and containing particles sizes <50 ?m, product having chemical analysis, in mass percentage based on oxides of product, such: ?45%<Al2O3, ?7.5%<SiO2<35%, ?0%?ZrO2<33%, providing 10%<SiO2+ZrO2<54%, ?0.15%<B2O3<8%, other oxides: <6%, Al2O3 forming remainder up to 100%, coarse fraction including more than 15% coarse particles having size >1 mm, in mass percentage based on particulate mixture, matrix fraction having a chemical analysis, in mass percentage based on oxides of matrix fraction, such: Al2O3+SiO2+ZrO2>86%, providing 35%<Al2O3.

Abstract: A component includes a body including zircon (ZrSiO4) grains, the body having a free silica intergranular phase present between the zircon grains and distributed substantially uniformly through the body. The body comprises a content of free silica not greater than about 2 wt. % for the total weight of the body.

Abstract: A zircon body for use in glass manufacturing is provided containing zircon grains and an intergranular phase present between the zircon grains. The intergranular phase may contain silicon oxide. The body may be exposed to a halide to at least partially remove at least a majority of the silicon oxide contained in the intergranular phase from the outer portion or to at least partially remove the intergranular phase along an outer portion of the component.

Abstract: A zircon body for use in glass manufacturing is provided containing zircon grains and an intergranular phase present between the zircon grains. The intergranular phase may contain silicon oxide. The body may be exposed to a halide to at least partially remove at least a majority of the silicon oxide contained in the intergranular phase from the outer portion or to at least partially remove the intergranular phase along an outer portion of the component.

Abstract: A sintered material based on silicon carbide (SiC) reactively sintered between 1,100° C. and 1,700° C. to form a silicon nitride binder (Si3N4), intended in particular for fabricating an aluminum electrolysis cell, including 0.05% to 1.5% of boron, the Si3N4/SiC weight ratio being in the range 0.05 to 0.45. Application, in particular, to an electrolysis cell.

Abstract: A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10?6 h?1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10?5 h?1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.

Abstract: A refractory object can include at least 10 wt % Al2O3. Further, the refractory object may contain less than approximately 6 wt % SiO2 or may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the Al2O3 in the refractory object can be provided as reactive Al2O3. In another embodiment, the refractory object may have a density of at least approximately 3.55 g/cc, a corrosion rate of no greater than approximately 2.69 mm/year, or any combination of the foregoing. In a particular embodiment, the refractory object can be used to form an Al—Si—Mg glass sheet. In an embodiment, the refractory object may be formed by a process using a compound of Ti, Mg, Ta, Nb, or any combination thereof.

Abstract: A component includes a body including zircon (ZrSiO4) grains, the body having a free silica intergranular phase present between the zircon grains and distributed substantially uniformly through the body. The body comprises a content of free silica not greater than about 2 wt. % for the total weight of the body.

Abstract: A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10?6 h?1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10?5 h?1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.

Abstract: A sintered product having an average chemical composition such that, in weight percentages on the basis of the oxides: Cr2O3=80.0-99.0%; 0.5%?TiO2?9.0%; 0.2%?MgO?3.0%; and ZrO2?5.0%, provided that the ratio of TiO2/MgO is between 1.5 and 9.0 and the molar ratio TiO2/Cr2O3 is less than 0.12.

Abstract: A refractory object can include a beta alumina. In an embodiment, the refractory object is capable of being used in a glass fusion process. In another embodiment, the refractory object can have a total Al2O3 content of at least 10% by weight. Additionally, a Mg—Al oxide may not form along a surface of the refractory object when the surface is exposed to a molten glass including an Al—Si—Mg oxide. In a particular embodiment, a refractory object can be in the form of a glass overflow forming block used to form a glass object that includes an Al—Si—Mg oxide. When forming the glass object, the glass material contacts the beta alumina, and during the flowing of the glass material, a Mg—Al oxide does not form along the beta alumina at the surface.

Abstract: A refractory object can include at least 10 wt % Al2O3. Further, the refractory object may contain less than approximately 6 wt % SiO2 or may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the Al2O3 in the refractory object can be provided as reactive Al2O3. In another embodiment, the refractory object may have a density of at least approximately 3.55 g/cc, a corrosion rate of no greater than approximately 2.69 mm/year, or any combination of the foregoing. In a particular embodiment, the refractory object can be used to form an Al—Si—Mg glass sheet. In an embodiment, the refractory object may be formed by a process using a compound of Ti, Mg, Ta, Nb, or any combination thereof.