Patents by Inventor Osamu Fujita

Osamu Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120061827
    Abstract: A semiconductor device includes a semiconductor substrate having a first surface, a through silicon via (TSV) that is formed so that at least a part thereof penetrates through the semiconductor substrate, and an insulation ring. The insulation ring is formed so as to penetrate through the semiconductor substrate and so as to surround the TSV. The insulation ring includes a tapered portion and a vertical portion. The tapered portion has a sectional area which is gradually decreased from the first surface toward a thickness direction of the semiconductor substrate. The vertical portion has a constant sectional area smaller than the tapered portion.
    Type: Application
    Filed: September 7, 2011
    Publication date: March 15, 2012
    Applicant: ELPIDA MEMORY, INC.
    Inventor: Osamu FUJITA
  • Patent number: 7734456
    Abstract: An important component selection device is provided for selecting a component having a higher importance in a simulation calculation, so that the component having a higher priority is calculated firstly by a calculation device and the importance of the updated component is re-evaluated so as to be reflected in the calculation thereafter. When a high speed is required, the ranking of the important components are realized by hardware. Moreover, when a storage device has a plurality of candidate value data for each of the component data and the calculation device updates the candidate values one by one, the magnitude of variety of the candidate values is used as the importance of the component data and the component having this value which is large is calculated with a higher priority so that the calculation of the component having a small change is omitted, thereby increasing the simulation speed.
    Type: Grant
    Filed: March 14, 2005
    Date of Patent: June 8, 2010
    Inventor: Osamu Fujita
  • Publication number: 20100019962
    Abstract: A controller of a cell phone serving as the position detector reads time-sequentially anteroposterior positional information Pi?1, Pi+1, together with interest positional information Pi that is an object of determination (S103), and calculates, for example, vectors V1 and V2 showing a shift from Pi?1, to Pi and a shift from Pi to Pi+1, respectively (S104, S105), in order to calculate an amplitude of fluctuation representing a direction of change. The amplitude of fluctuation representing a direction of change is expressed by a value of dot product of the calculated vectors V1 and V2 (S106). When the value of dot product is lower than a predetermined value (S107: YES), a position is shown to greatly deviate in the vicinity of the interest positional information Pi. Therefore, the amplitude of fluctuation representing a direction of change is judged to be large, and the positional information is determined to be error (S108).
    Type: Application
    Filed: January 21, 2008
    Publication date: January 28, 2010
    Applicant: OSAKA KYOIKU UNIVERSITY
    Inventor: Osamu Fujita
  • Patent number: 7510981
    Abstract: A semiconductor device includes an element isolation film, which exhibits less variations in the height dimension from the surface of the substrate and has a desired height dimension from the surface of the substrate. A process for manufacturing a semiconductor device includes: providing a predetermined pattern of a silicon nitride film and a protective film which covers the silicon nitride film, on a semiconductor substrate; selectively etching the semiconductor substrate using the protective film as a mask to form a trenched portion; removing the protective film to expose the silicon nitride film; depositing an element isolation film, so as to fill the trenched portion therewith and cover the silicon nitride film; removing the element isolation film formed on the silicon nitride film by polishing thereof until the silicon nitride film is exposed; and removing the silicon nitride film.
    Type: Grant
    Filed: October 4, 2006
    Date of Patent: March 31, 2009
    Assignee: NEC Electronics Corporations
    Inventors: Akira Mitsuiki, Tomoo Nakayama, Osamu Fujita
  • Patent number: 7462562
    Abstract: Fabrication method of semiconductor device to reduce leak current at junction interface of p-type well and n-type well. The method includes forming a first trench portion by selective dry etching of a silicon substrate using a first etching gas and forming a second trench portion including an enlarged width portion downward from a bottom of the first trench portion by additional dry etching of a silicon substrate at the bottom of the first trench portion using a second etching gas. A mixture gas of a chlorine gas and a fluorocarbon gas is used as the second etching gas and also a bias voltage lower than that in the process to form the first trench portion are used in the process to form the second trench portion.
    Type: Grant
    Filed: October 12, 2006
    Date of Patent: December 9, 2008
    Assignee: NEC Electronics Corporation
    Inventor: Osamu Fujita
  • Patent number: 7409937
    Abstract: A hydraulic control system for an internal combustion engine, includes a driven mechanism driven by hydraulic pressure fed through a flowing passage change-over valve. The flowing passage change-over valve includes a valve body formed with a plurality of ports which are respectively communicated with the supply passage and the oil passage, and a spool valve body slidably disposed in the valve body to open and close the plurality of ports, the ports including a supplying port communicated with the supplying passage. The maximum cross-sectional area of the supplying port is larger than a minimum cross-sectional area of the supplying passage. The flowing passage change-over valve is supplied with electric current to heat hydraulic fluid kept in the flowing passage change-over valve so as to lower a viscosity of the hydraulic fluid.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: August 12, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Keiji Hisahara, Toshiro Ichikawa, Seiji Suga, Osamu Fujita, Takanori Sawada
  • Publication number: 20080052496
    Abstract: When performing simulation of a system having a plenty of components such as a physical phenomenon and a social phenomenon, there has been a problem that an enormous calculation time is required if the number of components increases. In order to solve this problem, an important component selection device is provided for selecting a component having a higher importance in the simulation calculation, so that the component having a higher priority is calculated firstly by a calculation device and the importance of the updated component is re-evaluated so as to be reflected in the calculation thereafter. When a high speed is required, the ranking of the important components are realized by hardware.
    Type: Application
    Filed: March 14, 2005
    Publication date: February 28, 2008
    Inventor: Osamu Fujita
  • Publication number: 20070095316
    Abstract: A hydraulic control system for an internal combustion engine, includes a driven mechanism driven by hydraulic pressure fed through a flowing passage change-over valve. The flowing passage change-over valve includes a valve body formed with a plurality of ports which are respectively communicated with the supply passage and the oil passage, and a spool valve body slidably disposed in the valve body to open and close the plurality of ports, the ports including a supplying port communicated with the supplying passage. The maximum cross-sectional area of the supplying port is larger than a minimum cross-sectional area of the supplying passage. The flowing passage change-over valve is supplied with electric current to heat hydraulic fluid kept in the flowing passage change-over valve so as to lower a viscosity of the hydraulic fluid.
    Type: Application
    Filed: October 27, 2006
    Publication date: May 3, 2007
    Inventors: Keiji Hisahara, Toshiro Ichikawa, Seiji Suga, Osamu Fujita, Takanori Sawada
  • Publication number: 20070087520
    Abstract: A semiconductor device includes an element isolation film, which exhibits less variations in the height dimension from the surface of the substrate and has a desired height dimension from the surface of the substrate. A process for manufacturing a semiconductor device includes: providing a predetermined pattern of a silicon nitride film and a protective film which covers the silicon nitride film, on a semiconductor substrate; selectively etching the semiconductor substrate using the protective film as a mask to form a trenched portion; removing the protective film to expose the silicon nitride film; depositing an element isolation film, so as to fill the trenched portion therewith and cover the silicon nitride film; removing the element isolation film formed on the silicon nitride film by polishing thereof until the silicon nitride film is exposed; and removing the silicon nitride film.
    Type: Application
    Filed: October 4, 2006
    Publication date: April 19, 2007
    Applicant: NEC Electronics Corporation
    Inventors: Akira Mitsuiki, Tomoo Nakayama, Osamu Fujita
  • Publication number: 20070087521
    Abstract: Fabrication method of semiconductor device to reduce leak current at junction interface of p-type well and n-type well. The method comprises forming a first trench portion 109 by selective dry etching of a silicon substrate 101 using a first etching gas and forming a second trench portion 113 including an enlarged width portion downward from the bottom of the first trench portion 109 by additional dry etching of a silicon substrate 101 at the bottom of the first trench portion 109 using a second etching gas. A mixture gas of a chlorine gas and a fluorocarbon gas is used as the second etching gas and also a bias voltage lower than that in the process to form the first trench portion 109 are used in the process to form the second trench portion 113.
    Type: Application
    Filed: October 12, 2006
    Publication date: April 19, 2007
    Applicant: NEC ELECTRONICS CORPORATION
    Inventor: Osamu Fujita
  • Patent number: 6505585
    Abstract: In a vane type valve timing control apparatus, when an amplitude of a rotation phase of a cam shaft with respect to a crank shaft is above a predetermined value, a target value for the rotation phase is forcibly changed to a maximum advance angle and a maximum delay angle, so that oil of an advance angle side hydraulic chamber and a delay angle side hydraulic chamber is discharged together with air.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: January 14, 2003
    Assignee: Unisia Jecs Corporation
    Inventors: Kenichi Machida, Satoru Watanabe, Osamu Fujita
  • Patent number: 6218075
    Abstract: A photosensitive lithographic printing plate has an aluminum support anodized and treated with an aqueous solution of polyvinylphosphonic acid adjusted to pH 1.5 or below to ensure no deterioration of impression capacity and prevention of the water-ink balance scum in the lithographic printing plate made therefrom even when a cleaner is used in the course of printing.
    Type: Grant
    Filed: August 25, 1998
    Date of Patent: April 17, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Takeshi Kimura, Osamu Fujita
  • Patent number: 5912520
    Abstract: A feed-screw unit includes a rotor formed with a female screw, and a reciprocating shaft disposed inside the rotor to be moved forward and backward in the axial direction of the rotor in accordance with rotation thereof. The reciprocating shaft includes a male screw with a first portion to be in engagement with the female screw of the rotor and a second portion to be in non-engagement therewith.
    Type: Grant
    Filed: March 13, 1997
    Date of Patent: June 15, 1999
    Assignee: Unisia Jecs Corporation
    Inventors: Yoshiyuki Kobayashi, Minoru Suzuki, Hideaki Nakamura, Yuzuru Morioka, Toshiro Ichikawa, Osamu Fujita
  • Patent number: 5534240
    Abstract: A contrasting composition for gastrointestinal tract MRI which contains a trace amount of unchelated manganese is disclosed. The composition has a marked contrasting effect in MRI without causing harm to a living body.
    Type: Grant
    Filed: March 6, 1995
    Date of Patent: July 9, 1996
    Assignee: Meiji Milk Products Company, Ltd.
    Inventors: Hideo Hasegawa, Kikuhei Tateno, Tamotsu Kuwata, Yoshiro Yamamoto, Kumiko Hiraishi, Osamu Fujita, Isamu Narabayashi
  • Patent number: 5501486
    Abstract: An air bag activation device for a vehicle air bag system eliminates the need to feed a small test current during the standby state so that the power consumption is minimized, and detects faults of the air bag activating device accurately even if the battery voltage fluctuates, and prevents the air bag from expanding erroneously. The device bases the fault detection on the calculation of the difference between an amplified voltage when a small constant current is fed to the air bag activating device from a constant current circuit, and an amplified voltage in the absence of the current.
    Type: Grant
    Filed: October 21, 1994
    Date of Patent: March 26, 1996
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Osamu Fujita, Katsuhiko Ohmae
  • Patent number: 5170084
    Abstract: In a brush motor comprising a stator assembly constituted by a permanent magnet assembly and a cylindrical yoke, a stator provided with coils diametrically opposing to each other and rotatably disposed within the stator assembly, and a brush, the permanent magnet assembly is constituted by two arc segment magnets each having magnetic anisotropy in a radial direction and an arc angle .theta. of 170.degree.-180.degree., so that the permanent magnet assembly has a magnetic flux density distribution having a smooth wave form substantially free from localized deformations in a circumferential direction approximately on an inner surface thereof. Such an arc segment magnet is manufactured by a wet molding method and sintering.
    Type: Grant
    Filed: October 1, 1990
    Date of Patent: December 8, 1992
    Assignee: Hitachi Metals Ltd.
    Inventor: Osamu Fujita
  • Patent number: 4451799
    Abstract: The present invention purports to provide a novel B-class complementary circuit of direct-coupling type having good characteristics of low dispersions of voltage gain and low temperature dependency. The apparatus of the present invention can perform the above-mentioned excellent characteristics by utilizing several current-mirror circuits in a direct coupled circuit which comprisesan output stage driving circuit,a B-class complementary connected output stage, anda bias-stabilization circuit, formed as a differential amplifier working as a pre-drive stage for driving the output stage driving circuit; andby utilizing further current-mirror circuits for constant current feeding to a load circuit of the driving circuit and for the bias stabilizing circuit.
    Type: Grant
    Filed: July 24, 1981
    Date of Patent: May 29, 1984
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Osamu Fujita
  • Patent number: 4412104
    Abstract: A magnetic circuit for a loudspeaker characterized in a substantially rectangular parellelepiped yoke provided with a hollow penetrating two opposed lateral faces thereof has a substantially rectangular parallelepiped sintered magnet mounted therein of a specified size and composition and having a recoil permeance coefficient from 1.0 to 1.2, a polepiece connected to the top surface of said parallelepiped sintered magnet forms a magnetic air gap with the end of a through hole formed in the top face of said rectangular yoke for a movable coil.
    Type: Grant
    Filed: November 21, 1979
    Date of Patent: October 25, 1983
    Assignee: Hitachi Metals, Ltd.
    Inventors: Osamu Fujita, Noriaki Goshi, Shinya Okayasu, Motoharu Shimizu, Nobuo Kakinuma
  • Patent number: 4402029
    Abstract: A protective circuit for a class B OTL circuit such as a vertical deflection circuit and a sound output circuit of a television set. The protective circuit comprises a first voltage comparator circuit having one input terminal applied with a detection signal in the form of an average voltage of an output signal of the OTL circuit and the other input terminal applied with a first reference voltage, and a second voltage comparator circuit having one input terminal applied with the detection signal and the other input terminal applied with a second reference voltage which is different from the first reference voltage. Either one of the voltage comparator circuits is operated when the output terminal of the OTL circuit is short-circuited to either the power supply voltage line or earth.
    Type: Grant
    Filed: June 2, 1980
    Date of Patent: August 30, 1983
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Osamu Fujita
  • Patent number: 4052645
    Abstract: A vertical deflection circuit having a vertical amplifier stage bias voltage stabilizing circuit including a differential amplifier circuit which operates only during the retrace period. One input of the differential amplifier circuit receives a D.C. bias voltage and the other input receives the mean voltage of an output signal. The output of the differential amplifier circuit is fed back to a drive stage to stabilize the bias voltage.
    Type: Grant
    Filed: June 14, 1976
    Date of Patent: October 4, 1977
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Osamu Fujita