Abstract: An electromechanical transducer element includes a base substrate, a first electrode on the base substrate, a piezoelectric body on the first electrode, and a second electrode on the piezoelectric body. The base substrate has a void area opposite to the piezoelectric body via the first electrode, and a width of the void area on a cross section cut along a layer direction of the electromechanical transducer element satisfies 0.65?Pw/Cw?0.95, where Cw represents the width of the void area, and Pw represents a width of the piezoelectric body on the cross section.

Abstract: A semiconductor device, comprising a nitride semiconductor layer, a switching element, and a driving transistor; the switching element comprises: a first portion of a first electrode formed on the nitride semiconductor layer; a second electrode formed on the nitride semiconductor layer; and a first control electrode formed on the nitride semiconductor layer and located between the first portion of the first electrode and the second electrode; the driving transistor comprises: a second portion of the first electrode formed on the nitride semiconductor layer and connecting the first portions of the adjacent first electrodes to each other; a third electrode formed on the nitride semiconductor layer and transmitting a signal to the first control electrode; and a second control electrode formed on the nitride semiconductor layer and located between the second portion of the first electrode and the third electrode.

Abstract: An electromechanical transducer element includes a first electrode on a substrate, an electromechanical transducer film on the first electrode, and a second electrode on the electromechanical transducer film. The electromechanical transducer film includes a thin line pattern. The thin line pattern includes a plurality of thin lines that are spaced away from each other.

Abstract: A semiconductor device, comprising a nitride semiconductor layer, a switching element, and a driving transistor; the switching element comprises: a first portion of a first electrode formed on the nitride semiconductor layer; a second electrode formed on the nitride semiconductor layer; and a first control electrode formed on the nitride semiconductor layer and located between the first portion of the first electrode and the second electrode; the driving transistor comprises: a second portion of the first electrode formed on the nitride semiconductor layer and connecting the first portions of the adjacent first electrodes to each other; a third electrode formed on the nitride semiconductor layer and transmitting a signal to the first control electrode; and a second control electrode formed on the nitride semiconductor layer and located between the second portion of the first electrode and the third electrode.

Abstract: There is provided a method of producing an electromechanical transducer that includes a plurality of electromechanical transducer elements on a substrate. The method includes forming a plurality of individual electrodes corresponding to the plurality of electromechanical transducer elements on the substrate, forming an insulation film to cover the plurality of individual electrodes on the substrate, forming a conductive film on the insulation film, forming a plurality of openings to expose the plurality of individual electrodes in each of the insulation film and the conductive film, and forming a plurality of electromechanical transducer films on the plurality of individual electrodes exposed in the plurality of openings.

Abstract: An electromechanical transducer element includes a first electrode; an electromechanical transducer film stacked on one surface of the first electrode; a second electrode stacked on the electromechanical transducer film; and wiring formed on the second electrode. In an at least one cross section, each of a boundary, on a second electrode side, of the electromechanical transducer film and a boundary, on a side opposite to the electromechanical transducer film, of the second electrode is a curved shape protruding away from the first electrode. In the at least one cross section, each of a film thickness of the electromechanical transducer film and a film thickness of the second electrode becomes thinner toward end portions from a maximum height portion.

Abstract: A functional ink that includes a precursor sol-gel solution and a solvent is provided. The precursor sol-gel solution is used for forming an oxide dielectric film having a perovskite structure represented by a general formula ABO3, and has been subjected to a partial hydrolysis process in which a viscosity change resulting from the partial hydrolysis process is controlled to be less than or equal to 50%, and water contained in the precursor sol-gel solution is controlled to be greater than or equal to 0.50 times and less than or equal to 10 times by molar ratio with respect to a B site atom contained in the precursor sol-gel solution. The functional ink has a metal oxide concentration and a viscosity that renders the functional ink suitable for being discharged from a nozzle of a liquid droplet discharge apparatus included in a thin film fabrication apparatus.

Abstract: An electromechanical transducer element includes a first electrode on a substrate, an electromechanical transducer film on the first electrode, and a second electrode on the electromechanical transducer film. The electromechanical transducer film includes a thin line pattern. The thin line pattern includes a plurality of thin lines that are spaced away from each other.

Abstract: A functional ink that includes a precursor sol-gel solution and a solvent is provided. The precursor sol-gel solution is used for forming an oxide dielectric film having a perovskite structure represented by a general formula ABO3, and has been subjected to a partial hydrolysis process in which a viscosity change resulting from the partial hydrolysis process is controlled to be less than or equal to 50%, and water contained in the precursor sol-gel solution is controlled to be greater than or equal to 0.50 times and less than or equal to 10 times by molar ratio with respect to a B site atom contained in the precursor sol-gel solution. The functional ink has a metal oxide concentration and a viscosity that renders the functional ink suitable for being discharged from a nozzle of a liquid droplet discharge apparatus included in a thin film fabrication apparatus.

Abstract: There is provided a method of producing an electromechanical transducer that includes a plurality of electromechanical transducer elements on a substrate. The method includes forming a plurality of individual electrodes corresponding to the plurality of electromechanical transducer elements on the substrate, forming an insulation film to cover the plurality of individual electrodes on the substrate, forming a conductive film on the insulation film, forming a plurality of openings to expose the plurality of individual electrodes in each of the insulation film and the conductive film, and forming a plurality of electromechanical transducer films on the plurality of individual electrodes exposed in the plurality of openings.

Abstract: An electromechanical transducer element includes a first electrode; an electromechanical transducer film stacked on one surface of the first electrode; a second electrode stacked on the electromechanical transducer film; and wiring formed on the second electrode. In an at least one cross section, each of a boundary, on a second electrode side, of the electromechanical transducer film and a boundary, on a side opposite to the electromechanical transducer film, of the second electrode is a curved shape protruding away from the first electrode. In the at least one cross section, each of a film thickness of the electromechanical transducer film and a film thickness of the second electrode becomes thinner toward end portions from a maximum height portion.

Abstract: Disclosed is a method of fabricating an electromechanical transducer film. The method includes treating a surface of a first electrode to be liquid-repellent, the first electrode being formed on one surface of a substrate, irradiating the surface of the first liquid-repellent electrode with an energy ray while moving an irradiation position in accordance with a shape of the electromechanical transducer film to be formed and a shape of an alignment mark to be formed, and forming the alignment mark by applying an application liquid to an area including a portion irradiated with the energy ray in accordance with the shape of the alignment mark in the irradiating step, the application liquid being applied by an inkjet method.

Abstract: A method of fabricating an electromechanical transducer film includes applying a precursor solution on a support substrate, heating the substrate at a first temperature to form a ceramic thin-film in amorphous state, applying a sol-gel solution onto the ceramic thin-film, and heating the ceramic thin-film at a second temperature to form an electromechanical transducer thin-film in amorphous state. The method further includes heating the ceramic and transducer thin-films at a third temperature to thermally decompose an organic substance in the sol-gel solution and form a unitary thin-film, processing the unitary thin-film to form a patterned unitary thin-film, modifying an area on which the patterned film is not formed, discharging the sol-gel solution onto a surface of the patterned film by a liquid discharge head to apply the sol-gel solution to the surface of the patterned film, and heating the patterned film at a fourth temperature to crystallize the patterned film.

Abstract: An electro-mechanical transducer element is disclosed. The electro-mechanical transducer element includes a first electrode formed on a substrate; an electro-mechanical transducer film formed on at least a part of the first electrode; and a second electrode formed on at least a part of the electro-mechanical transducer film. In at least one cross section of the electro-mechanical transducer film, a film thickness distribution shape is convex to the second electrode side.

Abstract: An electronic device includes a substrate; and a plurality of thin-film elements formed on the substrate. Further, the thin-film element includes a thin-film section having a function selected from a group including piezoelectric effect, inverse piezoelectric effect, charge storage, semiconductivity, and conductivity, and the plurality of thin-film elements includes the thin-film sections having two or more different functions.

Abstract: A manufacturing method of an electromechanical transducing device includes forming a vibration plate on a substrate; forming a first electrode made of a metal on the vibration plate; forming a second electrode made of an electrically conductive oxide on the first electrode; coating a surface modification material and carrying out surface modification of only the first electrode; forming an electromechanical transducing film on the second electrode; and forming a third electrode made of an electrically conductive oxide on the electromechanical transducing film.

Abstract: A method of fabricating an electromechanical transducer film includes applying a precursor solution on a support substrate, heating the substrate at a first temperature to form a ceramic thin-film in amorphous state, applying a sol-gel solution onto the ceramic thin-film, and heating the ceramic thin-film at a second temperature to form an electromechanical transducer thin-film in amorphous state. The method further includes heating the ceramic and transducer thin-films at a third temperature to thermally decompose an organic substance in the sol-gel solution and form a unitary thin-film, processing the unitary thin-film to form a patterned unitary thin-film, modifying an area on which the patterned film is not formed, discharging the sol-gel solution onto a surface of the patterned film by a liquid discharge head to apply the sol-gel solution to the surface of the patterned film, and heating the patterned film at a fourth temperature to crystallize the patterned film.

Abstract: A method of making a liquid discharge head which includes a nozzle to discharge liquid, a pressure chamber communicating with the nozzle, a pressure chamber substrate to form surfaces of the pressure chamber, and a piezoelectric actuator to apply pressure to liquid in the pressure chamber having a lower electrode, a ferroelectric film, and an upper electrode, includes a silicon wafer supplying process, a position adjustment process, a surface treatment process to reform a surface of the lower electrode, a liquid applying process to apply ferroelectric precursor on the lower electrode by an inkjet method, a heating process to heat the ferroelectric precursor film, and a cooling process. A series of processes from the position adjustment process to the cooling process is iterated to form a ferroelectric film having a predetermined thickness. The series of processes is performed with certain waiting times inserted between key processes.

Abstract: A precursor sol-gel solution is provided that has been subjected to a partial hydrolysis process and is used for forming an oxide dielectric film having a perovskite structure represented by the general formula ABO3. The precursor sol-gel solution is subjected to a stabilization process for controlling a viscosity change resulting from the partial hydrolysis process to be less than or equal to 50%, and water contained in the precursor sol-gel solution is controlled to be greater than or equal to 0.50 times and less than or equal to 10 times by molar ratio with respect to a B site atom contained in the precursor sol-gel solution.

Abstract: Disclosed is an electromechanical transducer film forming method including a surface modification process; an application process; and processes of drying, thermally decomposing, and crystallizing sol-gel solution applied to a portion of a surface of a first electrode. An electromechanical transducer film is formed on a desired pattern area on the surface of the first electrode by repeating the above processes. In the application process, each of dots of the sol-gel solution applied by the inkjet method drops onto both a first area inside the desired pattern area and a second area outside the desired pattern area. The first area is a hydrophilic area on the surface of the first electrode, and the second area is a hydrophobic area on the surface of the first electrode. The hydrophilic area and the hydrophobic area have been modified by the surface modification process.