Patents by Inventor Osamu Matsushita

Osamu Matsushita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080149231
    Abstract: A forged product is made of a magnesium alloy and includes a through hole making portion to make a through hole that runs in a predetermined direction, and a bottom portion that lies on a plane intersecting with the predetermined direction. The through hole includes a first portion that has been formed by a forging process and a second portion that has been formed after the forging process. The second portion of the through hole has shifted toward the bottom portion with respect to the middle of the through hole in the predetermined direction.
    Type: Application
    Filed: December 17, 2007
    Publication date: June 26, 2008
    Applicant: YAMAHA HATSUDOKI KABUSHIKI KAISHA
    Inventors: Toru KITSUNAI, Osamu MATSUSHITA
  • Patent number: 6511363
    Abstract: White light from a light source is applied onto a wafer through an observation window which is formed on a polishing pad, and a spectrometric analysis is performed to the light which has been reflected on the wafer, whereby a polishing end point of the wafer is detected. In this case, an amount of the reflected light is measured and brightness of the light source is corrected so that the amount of the reflected light is constant. Thereby, the polishing end point is accurately detected.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: January 28, 2003
    Assignee: Tokyo Seimitsu Co., Ltd.
    Inventors: Akihiko Yamane, Osamu Matsushita
  • Publication number: 20020115380
    Abstract: White light from a light source is applied onto a wafer through an observation window which is formed on a polishing pad, and a spectrometric analysis is performed to the light which has been reflected on the wafer, whereby a polishing end point of the wafer is detected. In this case, an amount of the reflected light is measured and brightness of the light source is corrected so that the amount of the reflected light is constant. Thereby, the polishing end point is accurately detected.
    Type: Application
    Filed: December 19, 2001
    Publication date: August 22, 2002
    Inventors: Akihiko Yamane, Osamu Matsushita
  • Patent number: 5156935
    Abstract: A lead-acid battery using dilute sulfuric acid as the electrolyte, has a plate group composed of at least one positive plate, one negative plate and an intervening separator. Whiskers of at least one type selected from carbon, graphite and potassium titanate, having an electronic conductivity, with a diameter of 10 .mu.m or less and an aspect ratio of 50 or more, and a specific surface area of 2 m.sup.2 /g are mixed with at least one of the active materials of the positive and negative plates by 0.01 to 10 wt. % of the active material so as to connect the active material particles mutually and/or active material and current collector electronic conductively.
    Type: Grant
    Filed: June 28, 1989
    Date of Patent: October 20, 1992
    Assignee: Yuasa Battery Co., Ltd.
    Inventors: Eiji Hohjo, Kenjiro Kishimoto, Yoshio Kasai, Hiroto Nakashima, Osamu Matsushita
  • Patent number: 4403030
    Abstract: There is disclosed a photosensitive lithographic printing plate material comprising a photosensitive layer having a slip sheet laid on the surface thereof, said slip sheet comprising natural pulp, 5 to 50% by weight of polyolefinic synthetic pulp and 0.2 to 2.0% by weight of an alkali metal halide.
    Type: Grant
    Filed: December 2, 1981
    Date of Patent: September 6, 1983
    Assignees: Mitsubishi Chemical Industries Limited, Konishiroku Photo Industry Co., Ltd.
    Inventors: Konoe Miura, Shin-ichi Tanaka, Hiroshi Kojima, Takeshi Tanaka, Osamu Matsushita