Patents by Inventor Oscar Hemberg

Oscar Hemberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050129177
    Abstract: A method of producing a radiating plasma with an increased flux stability and uniformity is disclosed. The method comprises the steps of generating a primary target by urging a liquid under pressure through a nozzle; directing an energy pre-pulse onto the primary target to generate a secondary target in the form of a gas or plasma cloud; allowing the thus formed secondary target to expand for a predetermined period of time; and directing a main energy pulse onto the secondary target when the predetermined period of time has elapsed in order to produce a plasma radiating X-ray or EUV radiation. The pre-pulse has a beam waist size that is larger, in at least one dimension, than the corresponding dimension of the primary target.
    Type: Application
    Filed: May 13, 2003
    Publication date: June 16, 2005
    Inventors: Magnus Berglund, Bjorn Hansson, Oscar Hemberg, Hans Hertz, Lars Rymell
  • Patent number: 6711233
    Abstract: In a method and an apparatus for generating X-ray or EUV radiation, an electron beam is brought to interact with a propagating target jet, typically in a vacuum chamber. The target jet is formed by urging a liquid substance under pressure through an outlet opening. Hard X-ray radiation may be generated by converting the electron-beam energy to Bremsstrahlung and characteristic line emission, essentially without heating the jet to a plasma-forming temperature. Soft X-ray or EUV radiation may be generated by the electron beam heating the jet to a plasma-forming temperature.
    Type: Grant
    Filed: July 23, 2001
    Date of Patent: March 23, 2004
    Assignee: Jettec AB
    Inventors: Hans Martin Hertz, Oscar Hemberg
  • Publication number: 20020044629
    Abstract: A method and an apparatus is designed to produce X-ray or EUV radiation for use in lithography, microscopy, materials science, or medical diagnostics. The radiation is produced by urging a substance through an outlet (6) to generate a microscopic jet (2) in a direction from the outlet (6), and by directing at least one energy beam (1′) onto the jet (2), wherein the energy beam (1′) interacts with the jet (2) to produce the X-ray or EUV radiation. The temperature of the outlet (6) is controlled to increase the directional stability of the jet (2). The thus-achieved directional stability of the jet (2) provides for reduced pulse-to-pulse fluctuations of the produced radiation, improved spatial stability of the radiation source, as well as high average power since the energy beam (1′) can be tightly focused on the jet (2), even at a comparatively large distance from the jet-generating outlet (6).
    Type: Application
    Filed: October 12, 2001
    Publication date: April 18, 2002
    Inventors: Hans Martin Hertz, Oscar Hemberg, Lars Rymell, Bjorn A.M. Hansson, Magnus Berglund
  • Publication number: 20020015473
    Abstract: In a method and an apparatus for generating X-ray or EUV radiation, an electron beam is brought to interact with a propagating target jet, typically in a vacuum chamber. The target jet is formed by urging a liquid substance under pressure through an outlet opening. Hard X-ray radiation may be generated by converting the electron-beam energy to Bremsstrahlung and characteristic line emission, essentially without heating the jet to a plasma-forming temperature. Soft X-ray or EUV radiation may be generated by the electron beam heating the jet to a plasma-forming temperature.
    Type: Application
    Filed: July 23, 2001
    Publication date: February 7, 2002
    Inventors: Hans Martin Hertz, Oscar Hemberg