Abstract: A method and system for determining an optimal combination of value offers from a plurality of value offers available to a consumer having selected a group of products or services for purchase.

Abstract: A method to recover caustic from a caustic waste stream comprises reducing the temperature of a caustic waste stream comprising dissolved Na2CO3 to a temperature less than or equal to the temperature at which the Na2CO3 precipitates from the caustic waste stream to form a caustic waste stream comprising precipitated Na2CO3 and separating the precipitated Na2CO3.

Abstract: A system and method in one embodiment includes modules for detecting an access attempt to a critical address space (CAS) of a guest operating system (OS) that has implemented address space layout randomization in a hypervisor environment, identifying a process attempting the access, and taking an action if the process is not permitted to access the CAS. The action can be selected from: reporting the access to a management console of the hypervisor, providing a recommendation to the guest OS, and automatically taking an action within the guest OS. Other embodiments include identifying a machine address corresponding to the CAS by forcing a page fault in the guest OS, resolving a guest physical address from a guest virtual address corresponding to the CAS, and mapping the machine address to the guest physical address.

Abstract: The present invention provides compositions and methods for polishing a molybdenum metal-containing surface. A polishing composition (slurry) described herein comprises an abrasive concentration of an inorganic particulate abrasive material (e.g., alumina or silica) suspended in an acidic aqueous medium containing a water soluble surface active material and an oxidizing agent. The surface active material is selected based on the zeta potential of the particulate abrasive, such that when the abrasive has a positive zeta potential, the surface active material comprises a cationic material, and when the particulate abrasive has a negative zeta potential, the surface active material comprises an anionic material, a nonionic material, or a combination thereof.

Abstract: The present invention provides chemical-mechanical polishing (CMP) compositions and methods for polishing copper- and/or silver-containing substrates. The compositions of the present invention comprise a particulate abrasive, a primary film-forming metal-complexing agent, and a secondary film-forming metal-passivating agent in an aqueous carrier. Methods of polishing a substrate with the compositions of the invention are also disclosed.

Abstract: A system and method in one embodiment includes modules for detecting an access attempt to a critical address space (CAS) of a guest operating system (OS) that has implemented address space layout randomization in a hypervisor environment, identifying a process attempting the access, and taking an action if the process is not permitted to access the CAS. The action can be selected from: reporting the access to a management console of the hypervisor, providing a recommendation to the guest OS, and automatically taking an action within the guest OS. Other embodiments include identifying a machine address corresponding to the CAS by forcing a page fault in the guest OS, resolving a guest physical address from a guest virtual address corresponding to the CAS, and mapping the machine address to the guest physical address.

Abstract: The invention provides a chemical-mechanical polishing composition for polishing a substrate. The polishing composition comprises silica, a compound selected from the group consisting of an amine-substituted silane, a tetraalkylammonium salt, a tetraalkylphosphonium salt, and an imidazolium salt, a carboxylic acid having seven or more carbon atoms, an oxidizing agent that oxidizes a metal, and water. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition.

Abstract: The present invention provides chemical-mechanical polishing (CMP) compositions and methods for polishing copper- and/or silver-containing substrates. The compositions of the present invention comprise a particulate abrasive, a primary film-forming metal-complexing agent, and a secondary film-forming metal-passivating agent in an aqueous carrier. Methods of polishing a substrate with the compositions of the invention are also disclosed.

Abstract: The invention provides a chemical-mechanical polishing composition for polishing a substrate. The polishing composition comprises silica, a compound selected from the group consisting of an amine-substituted silane, a tetraalkylammonium salt, a tetraalkylphosphonium salt, and an imidazolium salt, a carboxylic acid having seven or more carbon atoms, an oxidizing agent that oxidizes a metal, and water. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition.

Abstract: Provided are processes for the preparation of sertraline and sertraline hydrochloride.

Abstract: The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.

Abstract: A crosslinked poly(arylene ether) film is prepared by a method that includes forming a film from a composition that includes a poly(arylene ether) having an intrinsic viscosity of at least 0.25 deciliter per gram and a polydispersity index less than or equal to 10, and irradiating the poly(arylene ether) film with a dosage of about 50 to about 50,000 kiloGrays of accelerated electrons. The films exhibit good flexibility and solvent resistance. Films prepared by the method are described, as are articles that include such films.

Abstract: Provided are processes for the preparation of sertraline and sertraline hydrochloride.

Abstract: Provided are processes for the preparation of sertraline and sertraline hydrochloride.

Abstract: Provided are processes for the preparation of sertraline and sertraline hydrochloride.

Abstract: Provided are processes for the preparation of sertraline and sertraline hydrochloride.

Abstract: Provided are processes for the preparation of sertraline and sertraline hydrochloride.

Abstract: The invention is in the field of cell culture, particularly recombinant cell culture. More specifically, the invention relates to methods of fed batch CHO cell culture.