Abstract: A plurality of bipolar transistors are formed by forming a common conduction region, a plurality of control regions extending each in an own active areas on the common conduction region, a plurality of silicide protection strips, and at least one control contact region. Silicide regions are formed on the second conduction regions and the control contact region. The second conduction regions may be formed by selectively implanting a first conductivity type dopant areas on a first side of selected silicide protection strips. The control contact region is formed by selectively implanting an opposite conductivity type dopant on a second side of the selected silicide protection strips.

Abstract: A memory architecture includes at least one matrix of memory cells of the EEPROM type organized in rows or word lines and columns or bit lines. Each memory cell includes a floating gate cell transistor and a selection transistor and is connected to a source line shared by the matrix. The memory cells are organized in words, all the memory cells belonging to a same word being driven by a byte switch, which is, in turn, connected to at least one control gate line. The memory cells further have accessible substrate terminals connected to a first additional line.

Abstract: A phase-change memory device, wherein memory cells form a memory array arranged in rows and columns. The memory cells are formed by a MOS selection device and a phase-change region connected to the selection device. The selection device is formed by first and second conductive regions which extend in a semiconductor substrate and are spaced from one another via a channel region, and by an isolated control region connected to a respective row and overlying the channel region. The first conductive region is connected to a connection line extending parallel to the rows, the second conductive region is connected to the phase-change region, and the phase-change region is connected to a respective column. The first connection line is a metal interconnection line and is connected to the first conductive region via a source-contact region made as point contact and distinct from the first connection line.

Abstract: A memory device is proposed. The memory device includes a plurality of memory cells, wherein each memory cell includes a storage element and a selector for selecting the corresponding storage element during a reading operation or a programming operation. The selector includes a unipolar element and a bipolar element. The memory device further includes control means for prevalently enabling the unipolar element during the reading operation or the bipolar element during the programming operation.

Abstract: A process for manufacturing a byte selection transistor for a matrix of non volatile memory cells organised in rows and columns integrated on a semiconductor substrate, each memory cell comprising a floating gate transistor and a selection transistor, the process providing the following steps: defining on a same semiconductor substrate respective active areas for the byte selection transistor, for the floating gate transistor and for the selection transistor split by portions of insulating layer; depositing a multilayer structure comprising at least a gate oxide layer, a first polysilicon layer, a dielectric layer on the whole substrate and a second polysilicon layer, characterised in that it comprises the following steps: removing through a traditional photolithographic technique the multilayer structure to form at least a couple of two bands developing substantially in a parallel way to the columns of the matrix of memory cells, the first band being effective to define the gate regions of the byte selection

Abstract: In a matrix of non volatile memory cells integrated on a semiconductor substrate, each memory cell includes a floating gate transistor and a selection transistor formed in a first active area, while each byte includes a byte selection transistor formed in a second active area separated from the first by portions of insulating layer. A portion of a multilayer structure including a gate oxide layer, a first polysilicon layer, a dielectric layer, and a second polysilicon layer extends over the byte selection and selection transistors, forming the gate regions thereof, and further extending on a portion of insulating layer. A conductive layer is formed in an opening in the second polysilicon and dielectric layers, over the portion of insulating layer, putting the first polysilicon layer in electric contact with the second polysilicon layer. Another portion of the multiplayer structure comprises the gate region of the floating gate transistor.

Abstract: A process for fabricating high-voltage drain-extension transistors, whereby the transistors are integrated in a semiconductor substrate along with non-volatile memory cells that include floating gate transistors.

Abstract: The invention relates to a method of adjusting the erase/program voltage in semiconductor non-volatile memories. The memories are formed of at least one matrix of memory cells having a floating gate, a control gate, and drain and source terminals, and are organized by the byte in rows and columns, each byte comprising a group of cells having respective control gates connected in parallel with one another to a common control line through a selection element of the byte switch type, and each cell being connected to a respective control column through a selection element of the bit switch type. Advantageously, a double adjustment is provided for the program voltage of the memory cells, whereby the program voltage during the erasing phase can be higher in modulo than the program voltage during the writing phase.

Abstract: A process for manufacturing a byte selection transistor for a matrix of non volatile memory cells organised in rows and columns integrated on a semiconductor substrate, each memory cell comprising a floating gate transistor and a selection transistor, the process providing the following steps: defining on a same semiconductor substrate respective active areas for the byte selection transistor, for the floating gate transistor and for the selection transistor split by portions of insulating layer; depositing a multilayer structure comprising at least a gate oxide layer, a first polysilicon layer, a dielectric layer on the whole substrate and a second polysilicon layer, characterised in that it comprises the following steps: removing through a traditional photolithographic technique the multilayer structure to form at least a couple of two bands developing substantially in a parallel way to the columns of the matrix of memory cells, the first band being effective to define the gate regions of the byte selection

Abstract: A process for fabricating high-voltage drain-extension transistors, whereby the transistors are integrated in a semiconductor substrate along with non-volatile memory cells that include floating gate transistors.

Abstract: A field effect transistor having a variable doping profile is presented. The field effect transistor is integrated on a semiconductor substrate with a respective active area of the substrate including a source and drain region. A channel region is interposed between the source and drain regions and has a predefined nominal width. The effective width of the channel region is defined by a variable doping profile.

Abstract: The invention relates to a method of adjusting the erase/program voltage in semiconductor non-volatile memories. The memories are formed of at least one matrix of memory cells having a floating gate, a control gate, and drain and source terminals, and are organized by the byte in rows and columns, each byte comprising a group of cells having respective control gates connected in parallel with one another to a common control line through a selection element of the byte switch type, and each cell being connected to a respective control column through a selection element of the bit switch type. Advantageously, a double adjustment is provided for the program voltage of the memory cells, whereby the program voltage during the erasing phase can be higher in modulo than the program voltage during the writing phase.

Abstract: The invention relates to a method of adjusting the erase/program voltage in semiconductor non-volatile memories. The memories are formed of at least one matrix of memory cells having a floating gate, a control gate, and drain and source terminals, and are organized by the byte in rows and columns, each byte comprising a group of cells having respective control gates connected in parallel with one another to a common control line through a selection element of the byte switch type, and each cell being connected to a respective control column through a selection element of the bit switch type. Advantageously, a double adjustment is provided for the program voltage of the memory cells, whereby the program voltage during the erasing phase can be higher in modulo than the program voltage during the writing phase.

Abstract: Chip Outline Band (COB) structure for an integrated circuit integrated in a semiconductor chip having a semiconductor substrate of a first conductivity type and biased at a common reference potential of the integrated circuit, the COB structure comprising a substantially annular region formed in the substrate along a periphery thereof, and at least one annular conductor region superimposed on and contacting the substantially annular region, wherein the substantially annular region is electrically connected at the common reference potential.

Abstract: A field effect transistor having a variable doping profile is presented. The field effect transistor is integrated on a semiconductor substrate with a respective active area of the substrate including a source and drain region. A channel region is interposed between the source and drain regions and has a predefined nominal width. The effective width of the channel region is defined by a variable doping profile.

Abstract: A field effect transistor having a variable doping profile is presented. The field effect transistor is integrated on a semiconductor substrate with a respective active area of the substrate including a source and drain region. A channel region is interposed between the source and drain regions and has a predefined nominal width. The effective width of the channel region is defined by a variable doping profile.