Patents by Inventor Pascal Hayoz

Pascal Hayoz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110004004
    Abstract: The present invention relates to compounds of the formula (I) wherein the substituents are as defined in claim 1, and their use as organic semiconductor in organic devices, like diodes, organic field effect transistors and/or a solar cells. The compounds of the formula I have excellent solubility in organic solvents. High efficiency of energy conversion, excellent field-effect mobility, good on/off current ratios and/or excellent stability can be observed, when said compounds are used in semiconductor devices or organic photovoltaic (PV) devices (solar cells).
    Type: Application
    Filed: September 22, 2008
    Publication date: January 6, 2011
    Applicant: BASF SE
    Inventors: Zhimin Hao, Beat Schmidhalter, Jean-Luc Budry, Margherita Fontana, Matheiu G.R. Turbiez, Frank Bienewald, Mathias Duggeli, Oliver Frederic Aebischer, Pascal Hayoz, Marta Fondrodona Turon
  • Publication number: 20100297540
    Abstract: Compounds of the Formula (I), wherein L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4 and L?4 for example are hydrogen or COT; R, R? and R? for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X? and X? for example are O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6-C14aryl, providedthat at least one of R, R? or R? is unsubstituted or substituted C3-C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
    Type: Application
    Filed: September 22, 2008
    Publication date: November 25, 2010
    Applicant: BASF SE
    Inventors: Pascal Hayoz, Hitoshi Yamato, Toshikage Asakura
  • Publication number: 20100297541
    Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRbO, S, NRc or NCORc; Z is formula (II) or C3-C20heteroaryl; L, L1, L2, L3, L4, L5, L6, L7 and L8 for example independently of one another are hydrogen or an organic substituent; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; R is for example is C5-C20heteroaryl or C6-C14 aryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
    Type: Application
    Filed: September 29, 2008
    Publication date: November 25, 2010
    Applicant: BASF SE
    Inventors: Pascal Hayoz, Hitoshi Yamato, Toshikage Asakura
  • Publication number: 20100297542
    Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2-C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and interrupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1-C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6-C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6-C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a g
    Type: Application
    Filed: September 29, 2008
    Publication date: November 25, 2010
    Applicant: BASF SE
    Inventors: Pascal Hayoz, Hitoshi Yamato
  • Publication number: 20100178512
    Abstract: A process for modifying the surface of an inorganic or organic substrate with strongly adherent nanoparticles is described, providing to the surface modified substrate durable effects like hydrophobicity, hydrophilicity, electrical conductivity, magnetic properties, flame retardance, color, adhesion, roughness, scratch resistance, UV-absorbance, antimicrobial properties, antifouling properties, antiprotein properties, antistatic properties, antifog properties, release properties. In this process, an optional first step a) a low-temperature plasma, ozonization, high energy irradiation, corona discharge or a flame is caused to act on the inorganic or organic substrate, and in a second step b) one or more defined nanoparticles or mixtures of defined nanoparticles with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate.
    Type: Application
    Filed: November 26, 2007
    Publication date: July 15, 2010
    Applicant: CIBA CORPORATION
    Inventors: Thomas Giesenberg, Pascal Hayoz, Thomas Vogel, Andreas Muhlebach, Markus Frey, Stephan Ilg, Rachel Kohli Steck, Laurent Michau, Francois Rime
  • Publication number: 20100112364
    Abstract: The present invention provides a process for imparting decreased adhesion of biological material to the surface of a substrate comprises the following steps (i) oxidizing the surface of the substrate (ii) applying a composition comprising one or more ethylenically unsaturated compounds to the oxidized surface of the substrate and (iii) curing the composition in order to form a coating layer.
    Type: Application
    Filed: April 11, 2008
    Publication date: May 6, 2010
    Applicant: CIBA CORPORATION
    Inventors: Andreas Muehlebach, Erich Nyfeler, Stephan Ilg, Pascal Hayoz, Jens Moeller
  • Publication number: 20100087563
    Abstract: Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
    Type: Application
    Filed: September 24, 2007
    Publication date: April 8, 2010
    Inventors: Pascal Hayoz, Jean-Luc Birbaum, Stephan Ilg
  • Patent number: 7687554
    Abstract: The instant invention pertains to a concentrated aqueous dispersion of organic light stabilizers with a particle size of less than 1000 nm, prepared by heterophase radical polymerization of ethylenically unsaturated monomers in the presence of the light stabilizers, wherein the weight ratio of light stabilizer to polymeric carrier is greater than 50/100. Another aspect of the invention is a process for the preparation of such aqueous dispersions with high light stabilizer content. Aqueous dispersions prepared according to this process are useful ingredients for adhesives, aqueous emulsions of natural or synthetic rubbers, water based inks or a water based coating compositions, which are consequently also subjects of the invention.
    Type: Grant
    Filed: September 1, 2004
    Date of Patent: March 30, 2010
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Carsten Schellenberg, Clemens Auschra, Wolfgang Peter, Delphine Kimpel, Pascal Hayoz
  • Publication number: 20100022676
    Abstract: The invention provides a uv-curable colored composition, comprising (a) at least one selected ethylenically unsaturated photopolymerizable compound; (b) at least one selected curing agent; and (c) at least one selected colorant.
    Type: Application
    Filed: September 24, 2007
    Publication date: January 28, 2010
    Inventors: Jonathan Rogers, Johannes Benkhoff, Karin Powell, Tunja Jung, Kurt Dietliker, Pascal Hayoz, Jean-Luc Birbaum, Thomas Vogel, Rinaldo Hüsler
  • Publication number: 20090208872
    Abstract: Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent ac
    Type: Application
    Filed: June 21, 2006
    Publication date: August 20, 2009
    Inventors: Jean-Pierre Wolf, Attila Latika, Jean-Luc Birbaum, Stephan Ilg, Pascal Hayoz
  • Publication number: 20090197987
    Abstract: Compounds of the formula (I), L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L?3 and L?5 or L?3 and L?5 together denote a single bond, provided that the respective X, X? or X? is not a single bond; and/or L3 and L5, L?3 and L?5 or L?3 and L?5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L?1 and L?3, L?1 and L?, L?5 and L?7, L?1 and L?3, L?1 and L?, or L?5 and L?7, together denote an organic linking group; provided that at least one of L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 is other than hydrogen; X, X? and X? independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an ino
    Type: Application
    Filed: April 4, 2007
    Publication date: August 6, 2009
    Inventors: Pascal Hayoz, Stephan Ilg
  • Publication number: 20090102373
    Abstract: Disclosed are electroluminescent devices that comprise organic layers that contain triazine compounds. The triazine compounds are suitable components of blue-emitting, durable, organo-electroluminescent layers. The electroluminescent devices may be employed for full color display panels in, for example, mobile phones, televisions and personal computer screens.
    Type: Application
    Filed: December 16, 2008
    Publication date: April 23, 2009
    Inventors: Pascal Hayoz, Thomas Schafer, Kristina Bardon
  • Publication number: 20090092768
    Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more defined photoinitiators or mixtures of defined photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) on the substrate so pretreated is applied a further coating.
    Type: Application
    Filed: December 12, 2005
    Publication date: April 9, 2009
    Inventors: Pascal Hayoz, Stephan Ilg
  • Patent number: 7311897
    Abstract: Disclosed is the use of the compounds of formula wherein A is a radical of formula R1 and R5 independently from each other are hydrogen; C1-C18alkyl; or C6-C12aryl; R2, R3 and R4 independently from each other are hydrogen; or a radical of formula wherein, in formula (1a), at least one of the radicals R2, R3 and R4 are a radical of formula (1c); R6, R7, R8, R9 and R10 independently from each other are hydrogen; hydroxy; halogen; C1-C18alkyl; C1-C18alkoxy; C6-C12aryl; biphenylyl; C6-C12aryloxy; C1-C18alkylthio; carboxy; —COOM; C1-C18-alkylcarboxyl; aminocarbonyl; or mono- or di-C1-C18alkylamino; C1-C10acylamino; —COOH; M is an alkali metal ion; x is 1 or 2; and y is a number from 2 to 10; for the protection of human and animal hair and skin against the damaging effect of UV radiation. The compounds of formula (1) are high effective UV absorbers for cosmetic formulations aund can be—depending on their physical properties be used in micronized or soluble form.
    Type: Grant
    Filed: March 19, 2004
    Date of Patent: December 25, 2007
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Thomas Ehlis, Stefan Müller, Pascal Hayoz
  • Publication number: 20060287416
    Abstract: The instant invention pertains to a concentrated aqueous dispersion of organic light stabilizers with a particle size of less than 1000 nm, prepared by heterophase radical polymerization of ethylenically unsaturated monomers in the presence of the light stabilizers, wherein the weight ratio of light stabilizer to polymeric carrier is greater than 50/100. Another aspect of the invention is a process for the preparation of such aqueous dispersions with high light stabilizer content. Aqueous dispersions prepared according to this process are useful ingredients for adhesives, aqueous emulsions of natural or synthetic rubbers, water based inks or a water based coating compositions, which are consequently also subjects of the invention.
    Type: Application
    Filed: September 1, 2004
    Publication date: December 21, 2006
    Inventors: Carsten Schellenberg, Clemens Auschra, Wolfgang Peter, Delphine Kimpel, Pascal Hayoz
  • Publication number: 20060252857
    Abstract: A novel process for preparing a aminophenyl-triazines of the formula (I?), comprises reacting a corresponding halogenophenyltriazine of the formula (I?), with an amine of the formula (IX), H—NR?2R?3, wherein X is chloro or preferably fluoro and the symbols A, A?, R?2, R?3 and R44 are organic residues as defined in claim 1. Products of this process and derivatives thereof are useful as stabilizers and UV absorbers for protecting an organic material against damage by light, oxygen and/or heat, or as recording dye in an optical recording medium, especially for writing or reading digital information in a recording layer using laser radiation of wavelength less than 450 nm.
    Type: Application
    Filed: May 17, 2004
    Publication date: November 9, 2006
    Inventors: Thomas Schäfer, Frédérique Wendeborn, Michèle Gerster, Pascal Hayoz, Beat Schmidhalter, Jean-Luc Budry
  • Publication number: 20060135766
    Abstract: Disclosed are electroluminescent devices that comprise organic layers that contain triazine compounds. The triazine compounds are suitable components of blue-emitting, durable, organo-electroluminescent layers. The electroluminescent devices may be employed for full color display panels in, for example, mobile phones, televisions and personal computer screens.
    Type: Application
    Filed: February 18, 2004
    Publication date: June 22, 2006
    Inventors: Pascal Hayoz, Thomas Schafer, Kristina Bardon
  • Patent number: 6919454
    Abstract: Biphenyl-substituted triazines of the formula which are notable for high thermal stability, are used as stabilizers for organic polymers to counter damage thereto caused by light, oxygen and heat, as light stabilizers for textile fiber materials and as sunscreens for the human skin.
    Type: Grant
    Filed: August 18, 2004
    Date of Patent: July 19, 2005
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Ian John Fletcher, Jürgen Kaschig, Georges Metzger, Dieter Reinehr, Pascal Hayoz
  • Patent number: 6913712
    Abstract: Mixtures of compounds comprising a compound G2 and at least one further compound from the group G0, G1, G3, G4, G5, G6, the compounds G0-G6 corresponding to formula (I) in which, in the compound G0, the radicals R1, R2, R3, R4, R5 and R6 are each hydrogen; G1, the radical R1 is Q and R2, R3, R4, R5 and R6 are each hydrogen; G2, the radicals R1 and R2 independently of one another are each Q and R3, R4, R5 and R6 are each hydrogen; G3 the radicals R1, R2 and R3 independently of one another are each Q and R4, R5 and R6 are each hydrogen; G4, the radicals R1, R2, R3 and R4 independently of one another are each Q and R5 and R6 are each hydrogen; G5, the radicals R1, R2, R3, R4 and R5 independently of one another are each Q and R6 is hydrogen; G6, the radicals R1, R2, R3, R4, R5 and R6 independently of one another are each Q; and Q and the other symbols are as defined in claim 1, are effective as stabilizers for organic material with respect to damaging exposure to light, oxygen and/or heat.
    Type: Grant
    Filed: December 14, 2000
    Date of Patent: July 5, 2005
    Assignee: CIBA Specialty Chemicals Corp.
    Inventor: Pascal Hayoz
  • Publication number: 20050019281
    Abstract: Biphenyl-substituted triazines of the formulae which are notable for high thermal stability, are used as stabilizers for organic polymers to counter damage thereto caused by light, oxygen and heat, as light stabilizers for textile fiber materials and as sunscreens for the human skin.
    Type: Application
    Filed: August 18, 2004
    Publication date: January 27, 2005
    Inventors: Ian Fletcher, Jurgen Kaschig, Georges Metzger, Dieter Reinehr, Pascal Hayoz