Publication number: 20030096993
Abstract: Mixtures of compounds comprising a compound G2 and at least one further compound from the group G0, G1, G3, G4, G5, G6, the compounds G0-G6 each corresponding to formula (I) in which, in the compound G0, the radicals R1, R2, R3, R4, R5 and R6 are each hydrogen; G1, the radical R1 is Q and R2, R3, R4, R5 and R6 are each hydrogen; G2, the radicals R1 and R2 independently of one another are each Q and R3, R4, R5 and R6 are each hydrogen; G3 the radicals R1, R2 and R3 independently of one another are each Q and R4, R5 and R6 are each hydrogen; G4, the radicals R1, R2, R3 and R4 independently of one another are each Q and R5 and R6 are each hydrogen; G5, the radicals R1, R2, R3, R4 and R5 independently of one another are each Q and R6 is hydrogen; G6, the radicals R1, R2, R3, R4, R5 and R6 independently of one another are each Q; and Q and the other symbols are as defined in claim 1, are effective as stabilizers for organic material with respect to damaging exposure to light, oxygen and/or heat.
Type:
Application
Filed:
June 19, 2002
Publication date:
May 22, 2003
Inventor:
Pascal Hayoz
Patent number: 6013704
Abstract: There are described compounds of formula A whereinr.sub.1 and r.sub.2 are each independently of the other 0 or 1;Y.sub.1 to Y.sub.9 are each independently of the others --H, --OH, C.sub.1 -C.sub.20 alkyl, C.sub.4 -C.sub.20 cycloalkyl, C.sub.2 -C.sub.20 -alkenyl, C.sub.1 -C.sub.20 alkoxy, C.sub.4 -C.sub.12 cycloalkoxy, C.sub.2 -C.sub.20 alkenyloxy, C.sub.7 -C.sub.20 aralkyl, halogen, --C.tbd.N, C.sub.1 -C.sub.5 haloalkyl, --SO.sub.2 R', --SO.sub.3 H, --SO.sub.3 M, wherein M is an alkali metal, --COOR', --CONHR', --CONR'R", --OCOOR', --OCOR', --OCONHR', (meth)acrylamino, (meth)-acryloxy, C.sub.6 -C.sub.12 aryl; C.sub.6 -C.sub.12 aryl substituted by C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 alkoxy, CN and/or by halogen; C.sub.3 -C.sub.12 heteroaryl; C.sub.3 -C.sub.12 heteroaryl substituted by C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 alkoxy, CN and/or by halogen; or Q of formula I, and at least one substituent Y.sub.1 to Y.sub.9 must be Q ##STR1## wherein q is 0 or 1,R is a cyclic radical andR.sub.
Type:
Grant
Filed:
September 10, 1997
Date of Patent:
January 11, 2000
Assignee:
Ciba Specialty Chemicals Corporation
Inventors:
Pascal Hayoz, Andreas Valet, Vien Van Toan