Patents by Inventor Pascal Hayoz

Pascal Hayoz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040191191
    Abstract: Disclosed is the use of the compounds of formula 1
    Type: Application
    Filed: March 19, 2004
    Publication date: September 30, 2004
    Inventors: Thomas Ehlis, Stefan Muller, Pascal Hayoz
  • Patent number: 6653484
    Abstract: Triazine, benzotriazole and benzophenone derivatives which are substituted or bridged with polyoxyalkylene groups, according to claim 1, and their use as UV absorbers, especially in photographic materials, in inks, including inkjet inks and printing inks, in transfer prints, in paints and varnishes, organic polymeric materials, plastics, rubber, glass, packaging materials, in sunscreens of cosmetic preparations and in skin protection compositions.
    Type: Grant
    Filed: November 8, 2001
    Date of Patent: November 25, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Vien Van Toan, Andreas Valet, Pascal Hayoz
  • Publication number: 20030096993
    Abstract: Mixtures of compounds comprising a compound G2 and at least one further compound from the group G0, G1, G3, G4, G5, G6, the compounds G0-G6 each corresponding to formula (I) in which, in the compound G0, the radicals R1, R2, R3, R4, R5 and R6 are each hydrogen; G1, the radical R1 is Q and R2, R3, R4, R5 and R6 are each hydrogen; G2, the radicals R1 and R2 independently of one another are each Q and R3, R4, R5 and R6 are each hydrogen; G3 the radicals R1, R2 and R3 independently of one another are each Q and R4, R5 and R6 are each hydrogen; G4, the radicals R1, R2, R3 and R4 independently of one another are each Q and R5 and R6 are each hydrogen; G5, the radicals R1, R2, R3, R4 and R5 independently of one another are each Q and R6 is hydrogen; G6, the radicals R1, R2, R3, R4, R5 and R6 independently of one another are each Q; and Q and the other symbols are as defined in claim 1, are effective as stabilizers for organic material with respect to damaging exposure to light, oxygen and/or heat.
    Type: Application
    Filed: June 19, 2002
    Publication date: May 22, 2003
    Inventor: Pascal Hayoz
  • Publication number: 20030045444
    Abstract: Biphenyl-substituted triazines of the formulae 1
    Type: Application
    Filed: July 31, 2002
    Publication date: March 6, 2003
    Inventors: Ian John Fletcher, Jurgen Kaschig, Georges Metzger, Dieter Reinehr, Pascal Hayoz
  • Patent number: 6509400
    Abstract: Compounds of the formula in which Z, Z′ and Z″ independently of one another are a group of the formula II and R7 is a radical of the formula III, IV or V in which n is 1 or 2; R4, R5 and R6 independently of one another are C1-C18alkyl; C5-C12cycloalkyl; C2-C18alkenyl; phenyl; C7-C11phenylalkyl; C7-C11alkylphenyl; C1-C18alkyl substituted by phenyl, OH, C1-C18alkoxy, C5-C12cycloalkoxy, C3-C18alkenyloxy, COOH, COOR11, O—COR12, CONH2, CONHR13, CONR13R14, CN, NH2, NHR13, NR13R14, NHCOR12, C6-C15bicycloalkyl, C6-C16bicycloalkyl-alkoxy, C6-C16bicycloalkenyl-alkoxy or C6-C15tricycloalkoxy; C5-C12cycloalkyl substituted by OH, C1-C4alkyl, C2-C6alkenyl or O—COR12; or COR15; CO—X—R11; or SO2—R16; or C3-C50alkyl interrupted by O and/or substituted by OH, phenoxy or C7-C18alkylphenoxy; or R5 and R6 together form a ring structure; X and Y independently of one another are O, NH, NR13 or S; and the other symbols are as defined in c
    Type: Grant
    Filed: October 9, 2001
    Date of Patent: January 21, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Thomas Schäfer, Thomas Bolle, Pascal Hayoz
  • Patent number: 6468958
    Abstract: Biphenyl-substituted triazines of the formulae which are notable for high thermal stability, are used as stabilizers for organic polymers to counter damage thereto caused by light, oxygen and heat, as light stabilizers for textile fiber materials and as sunscreens for the human skin.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: October 22, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Ian John Fletcher, Jürgen Kaschig, Georges Metzger, Dieter Reinehr, Pascal Hayoz
  • Publication number: 20020094320
    Abstract: Triazine, benzotriazole and benzophenone derivatives which are substituted or bridged with polyoxyalkylene groups, according to claim 1, and their use as UV absorbers, especially in photographic materials, in inks, including inkjet inks and printing inks, in transfer prints, in paints and varnishes, organic polymeric materials, plastics, rubber, glass, packaging materials, in sunscreens of cosmetic preparations and in skin protection compositions.
    Type: Application
    Filed: November 8, 2001
    Publication date: July 18, 2002
    Inventors: Vien Van Toan, Andreas Valet, Pascal Hayoz
  • Publication number: 20020086922
    Abstract: Compounds of the formula 1
    Type: Application
    Filed: October 9, 2001
    Publication date: July 4, 2002
    Inventors: Thomas Schafer, Thomas Bolle, Pascal Hayoz
  • Patent number: 6369267
    Abstract: Triazine, benzotriazole and benzophenone derivatives which are substituted or bridged with polyoxyalkylene groups, according to claim 1, and their use as UV absorbers, especially in photographic materials, in inks, including inkjet inks and printing inks, in transfer prints, in paints and varnishes, organic polymeric materials, plastics, rubber, glass, packaging materials, in sunscreens of cosmetic preparations and in skin protection compositions.
    Type: Grant
    Filed: October 4, 2000
    Date of Patent: April 9, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Vien Van Toan, Andreas Valet, Pascal Hayoz
  • Patent number: 6346619
    Abstract: Compounds of the formula in which Z, Z′ and Z″ independently of one another are a group of the formula II and R7 is a radical of the formula III, IV or V in which n is 1 or 2; R4, R5 and R6 independently of one another are C1-C18alkyl; C5-C12cycloalkyl; C2-C18alkenyl; phenyl; C7-C11phenylalkyl; C7-C11alkylphenyl; C1-C18alkyl substituted by phenyl, OH, C1-C18alkoxy, C5-C12cycloalkoxy, C3-C18alkenyloxy, COOH, COOR11, O—COR12, CONH2, CONHR13, CONR13NR14, CN,NH2, NHR13, NR13R14, NHCOR12, C6-C15bicycloalkyl, C6-C16bicycloalkyl-alkoxy, C6-C16bicycloalkenyl-alkoxy or C6-C15tricycloalkoxy; C5-C12cycloalkyl substituted by OH, C1-C4alkyl, C2-C6alkenyl or O—COR12; or COR15; CO—X—R11; or SO2—R16; or C3-C50alkyl interrupted by O and/or substituted by OH, phenoxy or C7-C18alkylphenoxy; or R5 and R6 together form a ring structure; X and Y independently of one another are O, NH, NR13 or S; and the other symbols are as defined in c
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: February 12, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Thomas Schäfer, Thomas Bolle, Pascal Hayoz
  • Publication number: 20010039341
    Abstract: Biphenyl-substituted triazines of the formulae 1
    Type: Application
    Filed: May 3, 2001
    Publication date: November 8, 2001
    Inventors: Ian John Fletcher, Jurgen Kaschig, Georges Metzger, Dieter Reinehr, Pascal Hayoz
  • Patent number: 6255483
    Abstract: Biphenyl-substituted triazines of the formulae which are notable for high thermal stability, are used as stabilizers for organic polymers to counter damage thereto caused by light, oxygen and heat, as light stabilizers for textile fiber materials and as sunscreens for the human skin.
    Type: Grant
    Filed: August 25, 1999
    Date of Patent: July 3, 2001
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Ian John Fletcher, Jürgen Kaschig, Georges Metzger, Dieter Reinehr, Pascal Hayoz
  • Patent number: 6242598
    Abstract: A process for preparing 2-(2,4-dihydroxyphenyl)-4.6-diaryl-s-triazines in three steps starting with cyanuric chloride is described. Step 1 involves the nucleophilic (basic) displacement of one chlorine atom with a phenolic moiety. Step 2 involves a Friedel-Crafts reaction using a Lewis acid catalyst (preferably aluminum chloride) to replace the remaining two chlorine atoms with aryl groups such as xylyl. Finally, step 3 involves replacing the phenolic moiety with resorcinol using either a Lewis acid or protic acid catalyst or combinations thereof. Some additional processes only peripherally related to the three-step process outlined above are also described for the preparation of various s-triazine compounds. The s-triazines prepared are useful as UV absorbers for the stabilization of organic substrates against the adverse effects of actinic light.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: June 5, 2001
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Tyler Arthur Stevenson, Michael Ackerman, Pascal Hayoz, Roger Meuwly, John Francis Oswald, Christian Schregenberger
  • Patent number: 6225384
    Abstract: Adhesive compositions are rendered stable against degradation caused by ultraviolet light through the incorporation of a highly soluble, high extinction, photostable hydroxyphenyl-s-triazine UV absorber or mixtures of s-triazine UV absorbers. An example of such compounds is 2,4-bis(2,4-dimethylphenyl)-6-[2-hydroxy-4-(3-nonyloxy*-2-hydroxypropyloxy)-5-&agr;-cumylphenyl]-s-triazine (* denotes a mixture of octyloxy, nonyloxy and decyloxy groups). Such compounds exhibit high extinction, excellent photostability and are highly soluble in adhesive formulations. The laminated articles derived from these compositions include, for example, solar control films, films and glazings, UV absorbing glasses and glass coatings, windscreens, retroreflective sheetings and signs, solar reflectors, optical films and the like.
    Type: Grant
    Filed: April 17, 2000
    Date of Patent: May 1, 2001
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Walter Renz, Mervin Wood, Joseph Suhadonlik, Ramanathan Ravichandran, Revathi Iyengar, Pascal Hayoz
  • Patent number: 6060543
    Abstract: Mixtures comprising a compound of the formula I and a compound of the formula II ##STR1## in which E.sub.1 and E.sub.2 ##STR2## q is 0 or 1, p and k are each 1 or 2, and the remaining symbols are as defined in claim 1, are outstandingly suitable for stabilizing organic material, especially coating materials.
    Type: Grant
    Filed: September 8, 1997
    Date of Patent: May 9, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Thomas Bolle, Pascal Hayoz
  • Patent number: 6013704
    Abstract: There are described compounds of formula A whereinr.sub.1 and r.sub.2 are each independently of the other 0 or 1;Y.sub.1 to Y.sub.9 are each independently of the others --H, --OH, C.sub.1 -C.sub.20 alkyl, C.sub.4 -C.sub.20 cycloalkyl, C.sub.2 -C.sub.20 -alkenyl, C.sub.1 -C.sub.20 alkoxy, C.sub.4 -C.sub.12 cycloalkoxy, C.sub.2 -C.sub.20 alkenyloxy, C.sub.7 -C.sub.20 aralkyl, halogen, --C.tbd.N, C.sub.1 -C.sub.5 haloalkyl, --SO.sub.2 R', --SO.sub.3 H, --SO.sub.3 M, wherein M is an alkali metal, --COOR', --CONHR', --CONR'R", --OCOOR', --OCOR', --OCONHR', (meth)acrylamino, (meth)-acryloxy, C.sub.6 -C.sub.12 aryl; C.sub.6 -C.sub.12 aryl substituted by C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 alkoxy, CN and/or by halogen; C.sub.3 -C.sub.12 heteroaryl; C.sub.3 -C.sub.12 heteroaryl substituted by C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 alkoxy, CN and/or by halogen; or Q of formula I, and at least one substituent Y.sub.1 to Y.sub.9 must be Q ##STR1## wherein q is 0 or 1,R is a cyclic radical andR.sub.
    Type: Grant
    Filed: September 10, 1997
    Date of Patent: January 11, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Pascal Hayoz, Andreas Valet, Vien Van Toan
  • Patent number: 5998116
    Abstract: The invention relates to a color-photographic recording material comprising, on a support, a blue-sensitive, a green-sensitive and/or a red-sensitive silver-halide emulsion layer, a protection layer above the sensitive layers, and, if desired, separation layers between the sensitive layers, where at least one of said layers includes a UV absorber of the formula ##STR1## The stabilizers of the formula (1) or (1a) have good inherent stability and high light absorption; the photographic recording material described has excellent stability of the magenta, cyan and yellow layers.
    Type: Grant
    Filed: September 8, 1997
    Date of Patent: December 7, 1999
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Pascal Hayoz, Christophe Bulliard, David George Leppard
  • Patent number: 5869588
    Abstract: The invention relates to novel 2-hydroxyphenyltriazines and to homopolymers and copolymers obtainable therefrom, as described in greater detail in claims 1 and 5; the novel compounds can be used as UV absorbers in or for organic materials.
    Type: Grant
    Filed: May 29, 1997
    Date of Patent: February 9, 1999
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Vien Van Toan, David George Leppard, Gerhard Rytz, Norbert Wurms, Pascal Hayoz
  • Patent number: 5672704
    Abstract: s-Triazine UV absorbers of formula I ##STR1## where R.sub.1 is ##STR2## --CH.sub.2 --C(.dbd.CH.sub.2)--R.sub.10, --(CH.sub.2).sub.p --SiR.sub.11 R.sub.11 '--CH.dbd.CH.sub.2, --C(.dbd.O)--(CH.sub.2).sub.q --CH.dbd.CH.sub.2 or --C(.dbd.O)--O--CH.sub.2 --C(.dbd.CH.sub.2)--R.sub.10 ; and E.sub.1 and E.sub.2 are phenyl groups which may be unsubstituted or substituted with a variety of substituents including inter alia alkyl, OH and R.sub.1 ; are polymerizable and are effective stabilizers for a variety of polymeric and other organic substrates.
    Type: Grant
    Filed: September 28, 1995
    Date of Patent: September 30, 1997
    Assignee: Ciba-Geigy Corporation
    Inventors: Vien Van Toan, David George Leppard, Gerhard Rytz, Norbert Wurms, Pascal Hayoz
  • Patent number: 5668200
    Abstract: A mixture comprising a compound of the formula I and a compound of the formula II ##STR1## in which n is 1 or 2; R.sub.1, R'.sub.1, R.sub.2, R'.sub.2, R.sub.3 and R.sub.4, independently of one another, are H, C.sub.1 -C.sub.12 alkyl; C.sub.2 -C.sub.6 alkenyl; C.sub.1 -C.sub.12 alkoxy; C.sub.2 -C.sub.18 alkenoxy; halogen; trifluoromethyl; C.sub.7 -C.sub.11 phenylalkyl; phenyl; phenyl which is substituted by C.sub.1 -C.sub.18 alkyl, C.sub.1 -C.sub.18 alkoxy or halogen; phenoxy; or phenoxy which is substituted by C.sub.1 -C.sub.18 alkyl, C.sub.1 -C.sub.18 alkoxy or halogen;R.sub.6 is hydrogen, C.sub.1 -C.sub.24 alkyl, C.sub.5 -C.sub.12 cycloalkyl or C.sub.7 -C.sub.15 phenylalkyl;R.sub.7, in the case where n=1, and R'.sub.7, independently of one another, are hydrogen or C.sub.1 -C.sub.18 alkyl; or are C.sub.1 -C.sub.12 alkyl which is substituted by OH, C.sub.1 -C.sub.18 alkoxy, allyloxy, halogen, --COOH, --COOR.sub.8, --CONH.sub.2, --CONHR.sub.9, --CON(R.sub.9)(R.sub.10), --NH.sub.2, --NHR.sub.9, --N(R.sub.9)(R.
    Type: Grant
    Filed: January 16, 1996
    Date of Patent: September 16, 1997
    Assignee: Ciba-Geigy Corporation
    Inventors: Andreas Valet, Gerhard Rytz, Pascal Hayoz