Patents by Inventor Patrick Warnaar

Patrick Warnaar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120242970
    Abstract: Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating or other structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The position of an image of the component structure varies between measurements, and a first type of correction is applied to reduce the influence on the measured intensities, caused by differences in the optical path to and from different positions. A plurality of structures may be imaged simultaneously within the field of view of the optical system, and each corrected for its respective position. The measurements may comprise first and second images of the same target under different modes of illumination and/or imaging, for example in a dark field metrology application.
    Type: Application
    Filed: September 19, 2011
    Publication date: September 27, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Hendrik Jan Hidde SMILDE, Patrick WARNAAR
  • Patent number: 8208139
    Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
    Type: Grant
    Filed: December 30, 2008
    Date of Patent: June 26, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Edo Maria Hulsebos, Franciscus Godefridus Casper Bijnen, Patrick Warnaar
  • Patent number: 8208140
    Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
    Type: Grant
    Filed: March 5, 2010
    Date of Patent: June 26, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Edo Maria Hulsebos, Franciscus Godefridus Casper Bijnen, Patrick Warnaar
  • Patent number: 8208121
    Abstract: An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle ? with respect to the scribe lane direction: 0°<?<90° and a second area comprising second periodic structure formed by second mark lines extending in a second direction, the second direction being at a second angle ? with respect to the scribe lane direction: ?90°??<0°.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: June 26, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Godefridus Casper Bijnen, Manfred Gawein Tenner, Patrick Warnaar, Marc Van Kemenade
  • Publication number: 20120127452
    Abstract: A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing an illumination beam for scanning the mark in a direction perpendicular to a direction of the mark's periodic structure along a first scan path across the mark, scanning the spot of the illumination beam along a second scan path across the mark, the second scan path being parallel to the first scan path, wherein the second scan path is shifted relative to the first scan path over a first shift that corresponds to a fraction of the repeating distance of the periodic structure.
    Type: Application
    Filed: January 27, 2012
    Publication date: May 24, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patrick WARNAAR, Franciscus Godefridus Bijnen
  • Publication number: 20120123581
    Abstract: Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.
    Type: Application
    Filed: November 10, 2011
    Publication date: May 17, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Hendrik Jan Hidde SMILDE, Arno Jan BLEEKER, Patrick WARNAAR, Willem Marie Julia Marcel COENE, Michael KUBIS
  • Patent number: 8130366
    Abstract: A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing an illumination beam for scanning the mark in a direction perpendicular to a direction of the mark's periodic structure along a first scan path across the mark, scanning the spot of the illumination beam along a second scan path across the mark, the second scan path being parallel to the first scan path, wherein the second scan path is shifted relative to the first scan path over a first shift that corresponds to a fraction of the repeating distance of the periodic structure.
    Type: Grant
    Filed: February 27, 2009
    Date of Patent: March 6, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Patrick Warnaar, Franciscus Godefridus Casper Bijnen
  • Patent number: 8080462
    Abstract: A method for forming a mark structure on a substrate comprising a plurality of lines. The lines extend parallel to each other in a first direction and are arranged with a pitch between each pair of lines that is directed in a second direction perpendicular to the first direction. The pitch between each pair of selected lines differs from the pitch between each other pair of selected lines.
    Type: Grant
    Filed: June 15, 2011
    Date of Patent: December 20, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Patrick Warnaar
  • Publication number: 20110244647
    Abstract: A method for forming a mark structure on a substrate comprising a plurality of lines. The lines extend parallel to each other in a first direction and are arranged with a pitch between each pair of lines that is directed in a second direction perpendicular to the first direction. The pitch between each pair of selected lines differs from the pitch between each other pair of selected lines.
    Type: Application
    Filed: June 15, 2011
    Publication date: October 6, 2011
    Applicant: ASML Netherlands B.V.
    Inventor: Patrick WARNAAR
  • Patent number: 7989966
    Abstract: A mark structure includes on a substrate, at least four lines. The lines extend parallel to each other in a first direction and are arranged with a pitch between each pair of lines that is directed in a second direction perpendicular to the first direction. The pitch between each pair of selected lines differs from the pitch between each other pair of selected lines.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: August 2, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Patrick Warnaar
  • Publication number: 20100214550
    Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
    Type: Application
    Filed: March 5, 2010
    Publication date: August 26, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Edo Maria HULSEBOS, Franciscus Godefridus Casper Bijnen, Patrick Warnaar
  • Publication number: 20100123886
    Abstract: A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.
    Type: Application
    Filed: November 18, 2009
    Publication date: May 20, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Franciscus Godefridus Casper BIJNEN, Jozef Cornelis Antonius Roijers, Patrick Warnaar, Marc Van Kemenade, Hoite Pieter Theodoor Tolsma
  • Publication number: 20090237637
    Abstract: A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing an illumination beam for scanning the mark in a direction perpendicular to a direction of the mark's periodic structure along a first scan path across the mark, scanning the spot of the illumination beam along a second scan path across the mark, the second scan path being parallel to the first scan path, wherein the second scan path is shifted relative to the first scan path over a first shift that corresponds to a fraction of the repeating distance of the periodic structure.
    Type: Application
    Filed: February 27, 2009
    Publication date: September 24, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patrick Warnaar, Franciscus Godefridus Casper Bijnen
  • Publication number: 20090212447
    Abstract: A mark structure includes on a substrate, at least four lines. The lines extend parallel to each other in a first direction and are arranged with a pitch between each pair of lines that is directed in a second direction perpendicular to the first direction. The pitch between each pair of selected lines differs from the pitch between each other pair of selected lines.
    Type: Application
    Filed: February 17, 2009
    Publication date: August 27, 2009
    Applicant: ASML Netherlands B.V.
    Inventor: Patrick WARNAAR
  • Publication number: 20090195768
    Abstract: An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle ? with respect to the scribe lane direction: 0°<?<90° and a second area comprising second periodic structure formed by second mark lines extending in a second direction, the second direction being at a second angle ? with respect to the scribe lane direction: ?90°??<0°.
    Type: Application
    Filed: January 30, 2009
    Publication date: August 6, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Franciscus Godefridus Casper Bijnen, Manfred Gawein Tenner, Patrick Warnaar, Marc Van Kemenade
  • Publication number: 20090176167
    Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
    Type: Application
    Filed: December 30, 2008
    Publication date: July 9, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Edo Maria HULSEBOS, Franciscus Godefridus Casper Bijnen, Patrick Warnaar
  • Publication number: 20090147232
    Abstract: The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting surface at a second level. A separation between the first level and the second level determines a phase depth condition. The marker structure further has an additional structure. The additional structure is arranged to modify the separation during manufacture of the marker structure. The invention further relates to a method of forming such a marker structure.
    Type: Application
    Filed: December 4, 2008
    Publication date: June 11, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Sanjaysingh Lalbahadoersing, Sami Musa, Patrick Warnaar, Maya Angelova Doytcheva