Patents by Inventor Paul J. Duval

Paul J. Duval has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6593578
    Abstract: A charged particle filter such as a Wien filter in which components used as the pole pieces and electrodes are precisely and reliably secured to a supporting structure through which they extend and to which they are brazed. Electrical insulating gaps in the magnetic circuit are located very remotely from the pole faces of the pole pieces so as to minimize any adverse effect of the gaps on the produced magnetic field.
    Type: Grant
    Filed: November 8, 2001
    Date of Patent: July 15, 2003
    Assignee: Schlumberger Technologies, Inc.
    Inventors: Paul J. Duval, Allan I. Rubin, Ira Rosenberg, Vladimir Vayner, Neal T. Sullivan
  • Patent number: 5955244
    Abstract: The process of the present invention is used to form resist features (22) having controlled predefined cross-sectional profiles, and is particular useful for forming features having reentrant profiles (24). In the process, a layer of a basic agent is formed on the substrate surface (20). Thereafter, a resist layer is formed on the layer of basic agent, causing at least a portion of the basic agent to diffuse into regions of the resist layer. The resist layer is exposed to radiant energy through a mask to form a patterned resist layer, which is developed to form resist features (22) having reentrant profiles (24) at those regions of the resist layer containing the diffused basic agent. The reentrant resist features (22) formed by the present method facilitates manufacture of magnetic heads, magnetoresistive sensors (102), and electronic components.
    Type: Grant
    Filed: August 20, 1996
    Date of Patent: September 21, 1999
    Assignee: Quantum Corporation
    Inventor: Paul J. Duval
  • Patent number: 5448822
    Abstract: A method of making a thin film magnetic head having multi-layer coils wherein a raised insulative photoresist spiral pattern having undercut sidewalls is formed. Two layers of coils are fabricated simultaneously by evaporating metal onto the upper surface of the spiral pattern and in spaces between the pattern. The cross-section of the bottom coil decreases in width with an increase in height. The coils are insulated from each other with a layer of insulative photoresist.
    Type: Grant
    Filed: March 10, 1993
    Date of Patent: September 12, 1995
    Assignee: Quantum Corporation
    Inventors: Andrew L. Wu, Paul J. Duval