Patents by Inventor Paul McHugh

Paul McHugh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200098628
    Abstract: Exemplary methods of producing a semiconductor substrate may include characterizing a substrate pattern to identify a zonal distribution of a plurality of vias and a height and a radius of each via of the plurality of vias. The methods may include determining a fill rate for each via within the zonal distribution of the plurality of vias. The methods may include modifying a die pattern to adjust via fill rates between two zones of vias. The methods may also include producing a substrate according to the die pattern.
    Type: Application
    Filed: September 17, 2019
    Publication date: March 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Paul McHugh, Kwan Wook Roh, Gregory J. Wilson
  • Patent number: 10546762
    Abstract: Methods of drying a semiconductor substrate may include applying a drying agent to a semiconductor substrate, where the drying agent wets the semiconductor substrate. The methods may include heating a chamber housing the semiconductor substrate to a temperature above an atmospheric pressure boiling point of the drying agent until a vapor-liquid equilibrium of the drying agent within the chamber has been reached. The methods may further include venting the chamber, where the venting vaporizes the liquid phase of the drying agent from the semiconductor substrate.
    Type: Grant
    Filed: November 15, 2017
    Date of Patent: January 28, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Eric J. Bergman, John L. Klocke, Paul McHugh, Stuart Crane, Richard W. Plavidal
  • Patent number: 10531762
    Abstract: A beverage making machine having a cartridge holder with an upper portion movable in pivotal and/or linear ways relative to a lower portion. An actuator for the cartridge portion may include a handle-actuated spur gear and link to move the upper portion, which may be guided in movement via a cam and cam follower engagement. Information from a cartridge detector may be used based on movement of cartridge holder portions, e.g., as an upper portion moves from an open position to a closed position. A mixing chamber may be held by a drawer so as to be removable, and movement of the drawer may engage/disengage the mixing chamber from a fluid supply.
    Type: Grant
    Filed: February 12, 2016
    Date of Patent: January 14, 2020
    Assignee: BEDFORD SYSTEMS LLC
    Inventors: William Philip McHugh, Jeremy B. Gordon, Scott Grubb, Steven Mackey, Thomas Fedorka, Peter Rae Peterson, Thomas J. Novak, Thomas Paul Dutremble, Gwynn Masada, Bradford Range, Enrico Raffaele Cafaro, Steven Raphaelson, Michael Sack, Brian B. Johnson
  • Patent number: 10499762
    Abstract: A beverage making machine may include a cartridge holder to hold a cartridge used to form a beverage. The cartridge holder may include a lower portion arranged to receive and hold the cartridge and a movable upper portion arranged to clamp the cartridge in place. The cartridge holder may be arranged to hold upper and lower compartments of the cartridge in spaces having a different pressure, e.g., an upper compartment of the cartridge may be held under relatively high pressure, and a lower compartment may be held in a space at ambient pressure. The cartridge holder may pierce upper and/or lower compartments of the cartridge to introduce activating fluid and/or receive carbonating gas from the upper compartment, and/or to introduced pressurized air into the lower compartment to force beverage medium to exit.
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: December 10, 2019
    Assignee: BEDFORD SYSTEMS LLC
    Inventors: Jeremy B. Gordon, Thomas Fedorka, Thomas Paul Dutremble, Gwynn Masada, Bradford Range, William Philip McHugh
  • Patent number: 10494731
    Abstract: Embodiments of the present technology may include an electroplating system. The electroplating system may include a vessel. The system may also include a wafer holder configured for holding a wafer in the vessel. The system may further include an anode in the vessel. In addition, the method may include a plurality of thief electrodes. For each thief electrode of the plurality of thief electrodes, a thief current channel may be defined by a channel wall. The channel wall for each thief electrode may define an aperture adjacent to the wafer holder. The thief current channel may extend from each thief electrode to the aperture. The system may include a current control system in electrical communication with the plurality of thief electrodes. The current control system may be configured such that an amount of current delivered to each thief electrode can be adjusted independently.
    Type: Grant
    Filed: December 11, 2017
    Date of Patent: December 3, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Paul McHugh, Gregory J. Wilson, Daniel Woodruff, Marvin Bernt
  • Publication number: 20190345624
    Abstract: Electroplating systems according to the present technology may include a two-bath electroplating chamber including a separator configured to provide fluid separation between a first bath configured to maintain a catholyte during operation and a second bath configured to maintain an anolyte during operation. The system may include a catholyte tank fluidly coupled with the first bath of the two-bath electroplating chamber. The system may also include a contaminant retrieval system configured to remove contaminant ions from the catholyte.
    Type: Application
    Filed: May 9, 2019
    Publication date: November 14, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Kwan Wook Roh, Paul McHugh, Sam Lee, Kyle M. Hanson, Marvin L. Bernt, Bioh Kim
  • Patent number: 10373864
    Abstract: Methods of wetting a semiconductor substrate may include forming a controlled atmosphere in a processing chamber housing the semiconductor substrate. The semiconductor substrate may define a plurality of features, which may include vias. The methods may include flowing a wetting agent into the processing chamber. A chamber pressure may be maintained below about 100 kPa. The methods may also include wetting the plurality of features defined in the substrate.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: August 6, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Paul McHugh, Bridger Hoerner, Marvin Bernt, Thomas H. Oberlitner, Brian Aegerter, Richard W. Plavidal, Andrew Anten, Adam McClure, Randy Harris
  • Publication number: 20190177869
    Abstract: Embodiments of the present technology may include an electroplating system. The electroplating system may include a vessel. The system may also include a wafer holder configured for holding a wafer in the vessel. The system may further include an anode in the vessel. In addition, the method may include a plurality of thief electrodes. For each thief electrode of the plurality of thief electrodes, a thief current channel may be defined by a channel wall. The channel wall for each thief electrode may define an aperture adjacent to the wafer holder. The thief current channel may extend from each thief electrode to the aperture. The system may include a current control system in electrical communication with the plurality of thief electrodes. The current control system may be configured such that an amount of current delivered to each thief electrode can be adjusted independently.
    Type: Application
    Filed: December 11, 2017
    Publication date: June 13, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Paul McHugh, Gregory J. Wilson, Daniel Woodruff, Marvin Bernt
  • Publication number: 20190019688
    Abstract: Methods of etching a semiconductor substrate may include applying an etchant to the semiconductor substrate. The semiconductor substrate may include an exposed region of an oxygen-containing material and an exposed region of a nitrogen-containing material. The methods may include heating the semiconductor substrate from a first temperature to a second temperature. The methods may include maintaining the semiconductor substrate at the second temperature for a period of time sufficient to perform an etch of the nitrogen-containing material relative to the oxygen-containing material. The methods may also include quenching the etch subsequent the period of time.
    Type: Application
    Filed: July 16, 2018
    Publication date: January 17, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Eric J. Bergman, John L. Klocke, Charles Sharbono, Kyle Moran Hanson, Paul McHugh
  • Publication number: 20180340259
    Abstract: Apparatus and methods to deposit a film using a batch processing chamber with a plurality of heating zones are described. The film is deposited on one or more substrates and the uniformity of the deposition thickness is determined at a plurality of points. The heating zones set points are applied to a sensitivity matrix and new temperature or power set points for the heating zones are determined and set. One or more substrates are processed using the new set points and the thickness uniformity is determined and may be adjusted again to increase the uniformity.
    Type: Application
    Filed: May 22, 2018
    Publication date: November 29, 2018
    Inventors: Gregory J. Wilson, Paul McHugh, Karthik Ramanathan
  • Publication number: 20180182664
    Abstract: Methods of wetting a semiconductor substrate may include forming a controlled atmosphere in a processing chamber housing the semiconductor substrate. The semiconductor substrate may define a plurality of features, which may include vias. The methods may include flowing a wetting agent into the processing chamber. A chamber pressure may be maintained below about 100 kPa. The methods may also include wetting the plurality of features defined in the substrate.
    Type: Application
    Filed: December 22, 2017
    Publication date: June 28, 2018
    Applicant: Applied Materials, Inc.
    Inventors: Paul McHugh, Bridger Hoerner, Marvin Bernt, Thomas H. Oberlitner, Brian Aegerter, Richard W. Plavidal, Andrew Anten, Adam McClure, Randy Harris
  • Publication number: 20180144954
    Abstract: Methods of drying a semiconductor substrate may include applying a drying agent to a semiconductor substrate, where the drying agent wets the semiconductor substrate. The methods may include heating a chamber housing the semiconductor substrate to a temperature above an atmospheric pressure boiling point of the drying agent until a vapor-liquid equilibrium of the drying agent within the chamber has been reached. The methods may further include venting the chamber, where the venting vaporizes the liquid phase of the drying agent from the semiconductor substrate.
    Type: Application
    Filed: November 15, 2017
    Publication date: May 24, 2018
    Applicant: Applied Materials, Inc.
    Inventors: Eric J. Bergman, John L. Klocke, Paul McHugh, Stuart Crane, Richard W. Plavidal
  • Publication number: 20180019119
    Abstract: Methods of drying a semiconductor substrate may include applying a drying agent to a semiconductor substrate, where the drying agent wets the semiconductor substrate. The methods may include heating a chamber housing the semiconductor substrate to a temperature above an atmospheric pressure boiling point of the drying agent until a vapor-liquid equilibrium of the drying agent within the chamber has been reached. The methods may further include venting the chamber, where the venting vaporizes the liquid phase of the drying agent from the semiconductor substrate.
    Type: Application
    Filed: July 14, 2017
    Publication date: January 18, 2018
    Applicant: Applied Materials Inc,
    Inventors: Eric J. Bergman, John L. Klocke, Paul McHugh, Stuart Crane, Richard W. Plavidal
  • Patent number: 9859135
    Abstract: An example waterfall apparatus includes (1) a first portion of a first width having (a) a first plenum, a second plenum, and a restricted fluid path therebetween; (b) a first coupling surface; and (c) an inlet opening that creates a fluid path between the first coupling surface and the first plenum; and (2) a second portion of a second width larger than the first width and having (a) a second coupling surface; and (b) an inlet aligned with the first portion inlet opening. The first and second coupling surfaces form a slot that extends along at least a portion of a length of the waterfall apparatus and that connects to the second plenum. Fluid introduced into the second portion inlet fills the first plenum, travels through the restricted fluid path to the second plenum, and exits the slot between the first and second portions to form a rinsing fluid waterfall.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: January 2, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Jonathan S. Frankel, Brian J. Brown, Vincent S. Francischetti, Paul McHugh, Kyle M. Hanson, Ekaterina Mikhaylichenko
  • Publication number: 20160175857
    Abstract: An example waterfall apparatus includes (1) a first portion of a first width having (a) a first plenum, a second plenum, and a restricted fluid path therebetween; (b) a first coupling surface; and (c) an inlet opening that creates a fluid path between the first coupling surface and the first plenum; and (2) a second portion of a second width larger than the first width and having (a) a second coupling surface; and (b) an inlet aligned with the first portion inlet opening. The first and second coupling surfaces form a slot that extends along at least a portion of a length of the waterfall apparatus and that connects to the second plenum. Fluid introduced into the second portion inlet fills the first plenum, travels through the restricted fluid path to the second plenum, and exits the slot between the first and second portions to form a rinsing fluid waterfall.
    Type: Application
    Filed: February 19, 2015
    Publication date: June 23, 2016
    Inventors: Jonathan S. Frankel, Brian J. Brown, Vincent S. Francischetti, Paul McHugh, Kyle M. Hanson, Ekaterina Mikhaylichenko
  • Publication number: 20120036131
    Abstract: A method for obtaining and analyzing information objects including generating, collecting or discovering information objects. The information objects are signified at least in part using deliberately ambiguated signifier prompts, for example, linear scale opposing negatives or positives, and/or multi-dimensional signifier prompts. The information objects may comprise text or non-text fragments, and may be generated or selected. The responses to the signifier prompts are stored with the fragments to provide a dataset of signified fragments. The signified fragments may be analyzed based on the signifiers and can be utilized as part of an explorable knowledge repository, or objective measures can be created to aid in mass opinion capture or human attitude auditing. The fragments may be represented on a graphical template.
    Type: Application
    Filed: September 30, 2011
    Publication date: February 9, 2012
    Applicant: COGNITIVE EDGE PTE LTD
    Inventors: Steven Anthony Bealing, David John Snowden, Michael Alexander Cheveldave, Peter Richard Stanbridge, Kenneth John-Paul McHugh
  • Patent number: 8031201
    Abstract: A method for obtaining and analyzing information objects including generating, collecting or discovering information objects. The information objects are signified at least in part using deliberately ambiguated signifier prompts, for example, linear scale opposing negatives or positives, and/or multi-dimensional signifier prompts. The information objects may comprise text or non-text fragments, and may be generated or selected. The responses to the signifier prompts are stored with the fragments to provide a dataset of signified fragments. The signified fragments may be analyzed based on the signifiers and can be utilized as part of an explorable knowledge repository, or objective measures can be created to aid in mass opinion capture or human attitude auditing. The fragments may be represented on a graphical template.
    Type: Grant
    Filed: February 13, 2009
    Date of Patent: October 4, 2011
    Assignee: Cognitive Edge Pte Ltd
    Inventors: David John Snowden, Steven Anthony Bealing, Michael Alexander Cheveldave, Peter Richard Stanbridge, Kenneth John-Paul McHugh
  • Publication number: 20100211603
    Abstract: A method for obtaining and analyzing information objects including generating, collecting or discovering information objects. The information objects are signified at least in part using deliberately ambiguated signifier prompts, for example, linear scale opposing negatives or positives, and/or multi-dimensional signifier prompts. The information objects may comprise text or non-text fragments, and may be generated or selected. The responses to the signifier prompts are stored with the fragments to provide a dataset of signified fragments. The signified fragments may be analyzed based on the signifiers and can be utilized as part of an explorable knowledge repository, or objective measures can be created to aid in mass opinion capture or human attitude auditing. The fragments may be represented on a graphical template.
    Type: Application
    Filed: February 13, 2009
    Publication date: August 19, 2010
    Applicant: COGNITIVE EDGE PTE LTD, A SINGAPORE COMPANY
    Inventors: Steven Anthony Bealing, David John Snowden, Michael Alexander Cheveldave, Peter Richard Stanbridge, Kenneth John-Paul McHugh
  • Publication number: 20080217166
    Abstract: An apparatus and method for electrochemical processing of microelectronic workpieces in a reaction vessel.
    Type: Application
    Filed: March 29, 2005
    Publication date: September 11, 2008
    Inventors: Kyle Hanson, Thomas Ritzdorf, Gregory Wilson, Paul McHugh
  • Publication number: 20080217165
    Abstract: An apparatus and method for electrochemical processing of microelectronic workpieces in a reaction vessel.
    Type: Application
    Filed: March 29, 2005
    Publication date: September 11, 2008
    Inventors: Kyle Hanson, Thomas Ritzdorf, Gregory Wilson, Paul McHugh