Abstract: An ion source is provided. The ion source comprises a first cylindrical anode and a second cylindrical anode. The first cylindrical anode is concentric with the second cylindrical anode. The ion source further comprises an electron source positioned within the first cylindrical anode or the second cylindrical anode.

Abstract: A method comprising introducing a workpiece support into a chamber of an apparatus. The workpiece support is for supporting thereon a plurality of workpieces. The apparatus comprising: the chamber having an interior space configured to be maintained at a pressure below atmospheric pressure; a vapor source for supplying the interior space of the chamber with a linearly extending stream of lubricant vapor; the workpiece support for supporting thereon a plurality of workpieces with surfaces facing the vapor source; and a conveyor for continuously moving the workpiece support transversely past the linearly extending stream of lubricant vapor from the vapor source. The method also comprising continuously moving the workpiece support with the plurality of workpieces supported thereon transversely past the linearly extending stream of lubricant vapor from the vapor source and depositing a uniform thickness film of the lubricant on at least one surface of each of the plurality of workpieces.

Abstract: Apparatus and method for vapor deposition of a uniform thickness thin film of lubricant on at least one surface of a disk-shaped substrate. The invention has particular utility in depositing thin films of polymeric lubricants onto disc-shaped substrates in the manufacture of magnetic and MO recording media.

Abstract: A cylindrical magnetron sputtering apparatus includes a rotating cylindrical sputtering target, a non-rotating magnet structure within the cylindrical sputtering target and at least one non-rotating trim magnet adjacent an end of the magnet structure. The trim magnets are manipulated during operation of the apparatus to alter a magnetic field produced by the magnet structure within the cylindrical sputtering cathode. As a result the shape of a racetrack discharge plasma formed at an end of the sputtering target is altered such that the formation of an erosion groove is avoided.

Abstract: Apparatus and method for vapor deposition of a uniform thickness thin film of lubricant on at least one surface of a disk-shaped substrate. The invention has particular utility in depositing thin films of polymeric lubricants onto disc-shaped substrates in the manufacture of magnetic and MO recording media.

Abstract: An apparatus for reorienting the magnetic anisotropy of the soft underlay of a magnetic recording disc having a diameter less than that of the pallet, which operates by first heating the disc, then using a heat transfer plate to cool the disc in the presence of a magnetic field having a radial direction emanating from the center of the magnetic recording disc.

Abstract: An ion source is provided. The ion source comprises a first cylindrical anode and a second cylindrical anode. The first cylindrical anode is concentric with the second cylindrical anode. The ion source further comprises an electron source positioned within the first cylindrical anode or the second cylindrical anode.

Abstract: The invention relates an ion source for ion beam deposition comprising multiple anodes, wherein the ion source deposits multiple zones of a source material and thicknesses of at least two of the multiple zones are different.

Abstract: A method comprising introducing a workpiece support into a chamber of an apparatus. The workpiece support is for supporting thereon a plurality of workpieces. The apparatus comprising: the chamber having an interior space configured to be maintained at a pressure below atmospheric pressure; a vapor source for supplying the interior space of the chamber with a linearly extending stream of lubricant vapor; the workpiece support for supporting thereon a plurality of workpieces with surfaces facing the vapor source; and a conveyor for continuously moving the workpiece support transversely past the linearly extending stream of lubricant vapor from the vapor source. The method also comprising continuously moving the workpiece support with the plurality of workpieces supported thereon transversely past the linearly extending stream of lubricant vapor from the vapor source and depositing a uniform thickness film of the lubricant on at least one surface of each of the plurality of workpieces.

Abstract: An apparatus for performing simultaneous pass-by vapor deposition of a uniform thickness thin film of a lubricant on at least one surface of each of a plurality of substrates. The apparatus includes a (a) chamber member having an interior space adapted to be maintained at a reduced pressure below atmospheric pressure; (b) at least one linearly extending vapor source member for supplying the interior space of the chamber with at least one linearly extending stream of lubricant vapor; (c) a substrate/workpiece mounting/supporting member adapted for supporting thereon a plurality of substrates/workpieces; and (d) a transporter/conveyor member for continuously moving the substrate/workpiece mounting/supporting member transversely past the at least one linearly extending stream of lubricant vapor for depositing a uniform thickness thin film of lubricant on the surfaces of each of a plurality of substrates/workpieces carried by the substrate/workpiece mounting/supporting member.

Abstract: A modular chamber design for manufacturing magnetic disks is provided. The modular chambers are linearly aligned, have a trapezoidal shape, and are inversely oriented. In this inverse orientation, a chamber can be exchanged and/or removed without first having to laterally move the other chambers to create space on each side of the chamber being moved. Because the modular chamber design decreases the amount of time and labor required to exchange or replace chambers in a disk processing line, disk throughput is increased. Thus, the modular chamber design facilitates faster and more efficient chamber exchange/removal.

Abstract: A sputtering apparatus allowing thick targets and method of making the same. The apparatus includes a sputtering target with a glow discharge plasma formed thereon during sputtering. The sputtering target is disposed in a plane, with a front of the plane defined as the side on which the glow discharge plasma is located during sputtering and a back of the plane defined as the opposite side. The sputtering apparatus also includes a magnetic circuit with an electrically floating center pole and an electrically floating outside pole. Both the center pole and outside pole are at least partially disposed on the front side of the plane defined by the sputtering target.

Abstract: A cylindrical magnetron sputtering apparatus includes a rotating cylindrical sputtering target, a non-rotating magnet structure within the cylindrical sputtering target and at least one non-rotating trim magnet adjacent an end of the magnet structure. The trim magnets are manipulated during operation of the apparatus to alter a magnetic field produced by the magnet structure within the cylindrical sputtering cathode. As a result the shape of a racetrack discharge plasma formed at an end of the sputtering target is altered such that the formation of an erosion groove is avoided.

Abstract: The invention relates an ion source for ion beam deposition comprising multiple anodes, wherein the ion source deposits multiple zones of a source material and thicknesses of at least two of the multiple zones are different.

Abstract: A system and method for sputtering having a substrate holder, the target-cathode and the shield that are all electrically isolated from each other and are all capable of independently being subjected to different voltages. The substrate holder can be a pallet that holds a plurality of substrates. The system further includes a plurality of target-cathodes and shields disposed along the path of travel of the moving substrate holder, and a controller configured to selectively vary the target-cathode voltage, the shield voltage, and the pallet bias voltage while the pallet moves along the path of travel. The target-cathodes and shields are spaced apart along the path of travel by a distance less than a length of the pallet and on both sides of the path of travel. The controller can include a timing circuit for synchronizing changes in the target-cathode voltages with changes in the pallet bias voltage and shield voltage.

Abstract: A system and method for sputtering using a plurality of different bias voltages, a plurality of target-cathodes that can be powered at different voltages disposed along said path of travel, and a controller configured to selectively vary the target-cathode voltage and the pallet bias voltage while the pallet moves along the path of travel. The target-cathodes are spaced apart along the path of travel by a distance less than a length of the pallet and on both sides of the path of travel. The controller can include a timing circuit for synchronizing changes in the target-cathode voltages with changes in the pallet bias voltage.

Abstract: An apparatus for performing treatments to the surface of disk-shaped workpieces/substrates, as in the manufacture of multi-layer, thin-film recording media. The apparatus includes treatment stations for performing treatments to a surface of each of the disk-shaped workpieces/substrates; a pallet adapted for mounting the disk-shaped workpieces/substrates, a plurality of bias potential sources; and a transporting source to transport the pallet past the treatment stations. The pallet includes electrically conductive segments and each segment is electrically insulated from other segments; is adapted to mount and expose at lest one surface of a disk-shaped workpiece; and includes an electrical contact for providing electrical contact with the bias potential source of the apparatus.

Abstract: An apparatus for performing simultaneous pass-by vapor deposition of a uniform thickness thin film of a lubricant on at least one surface of each of a plurality of substrates, comprising: (a) chamber means having an interior space adapted to be maintained at a reduced pressure below atmospheric pressure, including entrance and exit means at opposite ends thereof; (b) at least one linearly extending vapor source means for supplying the interior space of the chamber with at least one linearly extending stream of lubricant vapor; (c) a substrate/workpiece mounting/supporting means adapted for supporting thereon a plurality of substrates/workpieces; and (d) a transporter/conveyor means for continuously moving the substrate/workpiece mounting/supporting means transversely past the at least one linearly extending stream of lubricant vapor for depositing a uniform thickness thin film of lubricant on the surfaces of each of a plurality of substrates/workpieces carried by the substrate/workpiece mounting/supporting me

Abstract: A single, or common, ion beam source is utilized for ion beam deposition (IBD) of defect-free multilayer coatings, e.g., multilayer, carbon-based protective overcoats for magnetic and/or magneto-optical (MO) data recording/information storage and retrieval media such as hard disks. According to the inventive methodology, a plurality of source gas supply means for supplying a single IBD source with different source gases for each of the layers of the multilayer are selectively operated in “vent” and “run” modes by means of a plurality of valves, the opening and closing of which are determined by a programmable gas flow controller. The inventive method and apparatus advantageously provide IBD of multilayer coatings with minimum cross-contamination of individual layers, at a reduced equipment cost and size obtained by elimination of the need for separate ion beam sources and associated vacuum pump for each constituent layer of the multilayer.

Abstract: An in-line, multi-station apparatus including an improved pallet for transporting a plurality of workpieces/substrates through the apparatus, the pallet comprising: (a) a sheet of electrically conductive material provided with a plurality of spaced-apart regions extending at least partway therethrough, each of the regions adapted to mount therein and expose at least one major surface of respective workpieces/substrates for receipt of the treatment; and (b) a plurality of electrical contact means for selectively and controllably electrically contacting respective ones of said plurality of workpieces/substrates for applying an electrical bias potential thereto during treatment. Embodiments include in-line apparatus for performing bias sputtering of electrically conductive thin films on insulative substrates in the manufacture of multi-layer magnetic and/or magneto-optical recording media.