Patents by Inventor Paul Way
Paul Way has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11285456Abstract: This invention relates to a Cu-BTC MOF which is water stable. The Cu-BTC MOF has open coordination sites and has been post synthesis modified by partially occupying the open sites with a ligand such as acetonitrile (CH3CN). The resultant MOF retains at least 40% of its as synthesized surface area after exposure to liquid water at 60° C. for 6 hours. This is an unexpected result versus the MOF which has not been post treated with ligands such as acetonitrile. This MOF can be used to abate contaminants such as ammonia in gas streams and especially air streams.Type: GrantFiled: August 14, 2020Date of Patent: March 29, 2022Assignee: NuMat Technologies, Inc.Inventor: Paul Wai-Man Siu
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Publication number: 20210106940Abstract: A method of adsorbing a highly reactive gas onto an adsorbent material comprising adsorbing the highly reactive gas to the adsorbent material. The absorbent material comprises at least one Lewis basic functional group, or pores of a size to hold a single molecule of the highly reactive gas, or inert moieties which are provided to the adsorbent material at the same time at the same time as the highly reactive gas, prior to adsorbing the highly reactive gas or after adsorbing the highly reactive gas, or the highly reactive gas reacts with moieties of the adsorbent material resulting in passivation of the adsorbent material. A rate of decomposition of the adsorbed highly reactive gas is lower than a rate of decomposition for the neat gas at equal volumetric loadings and equal temperatures for both the adsorbed highly reactive gas and the neat gas.Type: ApplicationFiled: December 22, 2020Publication date: April 15, 2021Inventors: Glenn M. TOM, Paul Wai-Man SIU, Jose ARNO, Omar K. FARHA, Ross VERPLOEGH
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Patent number: 10940426Abstract: A method of adsorbing a highly reactive gas onto an adsorbent material comprising adsorbing the highly reactive gas to the adsorbent material. The adsorbent material comprises at least one Lewis basic functional group, or pores of a size to hold a single molecule of the highly reactive gas, or inert moieties which are provided to the adsorbent material at the same time at the same time as the highly reactive gas, prior to adsorbing the highly reactive gas or after adsorbing the highly reactive gas, or the highly reactive gas reacts with moieties of the adsorbent material resulting in passivation of the adsorbent material. A rate of decomposition of the adsorbed highly reactive gas is lower than a rate of decomposition for the neat gas at equal volumetric loadings and equal temperatures for both the adsorbed highly reactive gas and the neat gas.Type: GrantFiled: September 24, 2018Date of Patent: March 9, 2021Assignee: NUMAT TECHNOLOGIES, INC.Inventors: Glenn M. Tom, Paul Wai-Man Siu, Jose Arno, Omar K. Farha, Ross Verploegh
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Publication number: 20210046447Abstract: This invention relates to a Cu-BTC MOF which is water stable. The Cu-BTC MOF has open coordination sites and has been post synthesis modified by partially occupying the open sites with a ligand such as acetonitrile (CH3CN). The resultant MOF retains at least 40% of its as synthesized surface area after exposure to liquid water at 60° C. for 6 hours. This is an unexpected result versus the MOF which has not been post treated with ligands such as acetonitrile. This MOF can be used to abate contaminants such as ammonia in gas streams and especially air streams.Type: ApplicationFiled: August 14, 2020Publication date: February 18, 2021Applicant: Numat Technologies Inc.Inventor: Paul Wai-Man Siu
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Patent number: 10898847Abstract: A method of adsorbing a highly reactive gas onto an adsorbent material comprising adsorbing the highly reactive gas to the adsorbent material. The adsorbent material comprises at least one Lewis basic functional group, or pores of a size to hold a single molecule of the highly reactive gas, or inert moieties which are provided to the adsorbent material at the same time at the same time as the highly reactive gas, prior to adsorbing the highly reactive gas or after adsorbing the highly reactive gas, or the highly reactive gas reacts with moieties of the adsorbent material resulting in passivation of the adsorbent material. A rate of decomposition of the adsorbed highly reactive gas is lower than a rate of decomposition for the neat gas at equal volumetric loadings and equal temperatures for both the adsorbed highly reactive gas and the neat gas.Type: GrantFiled: September 24, 2018Date of Patent: January 26, 2021Assignee: NUMAT TECHNOLOGIES, INC.Inventors: Glenn M. Tom, Paul Wai-Man Siu, Jose Arno, Omar K. Farha, Ross Verploegh
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Patent number: 10260148Abstract: A porous material, including metal organic frameworks (MOFs) and porous organic polymer (POP), with reactivity with or sorptive affinity towards (a) electronic gas to substantially remove or abate electronic gas in an electronic gas-containing effluent, or (b) contaminants in a stream of electronic gas to substantially remove the contaminants from a stream of electronic gas and increase the purity of said electronic gas, or (c) trace mercury contaminant in a hydrocarbon stream to substantially remove said mercury contaminant and increase the purity of said hydrocarbon stream. MOFs are the coordination product of metal ions and multidentate organic ligands, whereas POPs are the product of polymerization between organic monomers.Type: GrantFiled: December 2, 2015Date of Patent: April 16, 2019Assignee: NUMAT TECHNOLOGIES, INC.Inventors: Paul Wai-Man Siu, Mitchell Hugh Weston
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Publication number: 20190091620Abstract: A method of adsorbing a highly reactive gas onto an adsorbent material comprising adsorbing the highly reactive gas to the adsorbent material. The absorbent material comprises at least one Lewis basic functional group, or pores of a size to hold a single molecule of the highly reactive gas, or inert moieties which are provided to the adsorbent material at the same time at the same time as the highly reactive gas, prior to adsorbing the highly reactive gas or after adsorbing the highly reactive gas, or the highly reactive gas reacts with moieties of the adsorbent material resulting in passivation of the adsorbent material. A rate of decomposition of the adsorbed highly reactive gas is lower than a rate of decomposition for the neat gas at equal volumetric loadings and equal temperatures for both the adsorbed highly reactive gas and the neat gas.Type: ApplicationFiled: September 24, 2018Publication date: March 28, 2019Inventors: Glenn M. TOM, Paul Wai-Man SIU, Jose ARNO, Omar K. FARHA, Ross VERPLOEGH
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Patent number: 9751074Abstract: A metal organic framework (MOF) includes a coordination product of a metal ion and an at least bidentate organic ligand, where the metal ion and the organic ligand are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas. A porous organic polymer (POP) includes polymerization product from at least a plurality of organic monomers, where the organic monomers are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas.Type: GrantFiled: August 17, 2015Date of Patent: September 5, 2017Assignee: NUMAT TECHNOLOGIES, INC.Inventors: Han Sung Kim, Mitchell Hugh Weston, Patrick Fuller, Paul Wai-Man Siu
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Publication number: 20170203277Abstract: A metal organic framework (MOF) includes a coordination product of a metal ion and an at least bidentate organic ligand, where the metal ion and the organic ligand are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas. A porous organic polymer (POP) includes polymerization product from at least a plurality of organic monomers, where the organic monomers are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas.Type: ApplicationFiled: April 5, 2017Publication date: July 20, 2017Inventors: Han Sung Kim, Mitchell Hugh Weston, Patrick Fuller, Paul Wai-Man Siu
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Patent number: 9427722Abstract: Adsorption systems providing a capacity of at least 200 g/L for oxygen-containing mixtures, or an oxygen-nitrogen selectivity of at least 1.4:1 or at least 1:2 with an adsorbed capacity of at least 0.6 mmol/g at 4 bar and 22° C.Type: GrantFiled: October 16, 2014Date of Patent: August 30, 2016Assignee: NUMAT TECHNOLOGIES, INC.Inventors: Mitchell Hugh Weston, Patrick Fuller, Paul Wai-Man Siu
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Publication number: 20160160348Abstract: A porous material, including metal organic frameworks (MOFs) and porous organic polymer (POP), with reactivity with or sorptive affinity towards (a) electronic gas to substantially remove or abate electronic gas in an electronic gas-containing effluent, or (b) contaminants in a stream of electronic gas to substantially remove the contaminants from a stream of electronic gas and increase the purity of said electronic gas, or (c) trace mercury contaminant in a hydrocarbon stream to substantially remove said mercury contaminant and increase the purity of said hydrocarbon stream. MOFs are the coordination product of metal ions and multidentate organic ligands, whereas POPs are the product of polymerization between organic monomers.Type: ApplicationFiled: December 2, 2015Publication date: June 9, 2016Inventors: Paul Wai-Man SIU, Mitchell Hugh WESTON
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Publication number: 20150352519Abstract: A metal organic framework (MOF) includes a coordination product of a metal ion and an at least bidentate organic ligand, where the metal ion and the organic ligand are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas. A porous organic polymer (POP) includes polymerization product from at least a plurality of organic monomers, where the organic monomers are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas.Type: ApplicationFiled: August 17, 2015Publication date: December 10, 2015Inventors: Han Sung Kim, Mitchell Hugh Weston, Patrick Fuller, Paul Wai-Man Siu
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Patent number: 9138720Abstract: A metal organic framework (MOF) includes a coordination product of a metal ion and an at least bidentate organic ligand, where the metal ion and the organic ligand are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas. A porous organic polymer (POP) includes polymerization product from at least a plurality of organic monomers, where the organic monomers are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas.Type: GrantFiled: August 4, 2014Date of Patent: September 22, 2015Assignee: NUMAT TECHNOLOGIES, INC.Inventors: Han Sung Kim, Mitchell Hugh Weston, Patrick Fuller, Paul Wai-Man Siu
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Patent number: 8987119Abstract: A method of making a semiconductor device includes providing an insulating layer containing a plurality of openings, forming a first semiconductor layer in the plurality of openings in the insulating layer and over the insulating layer, and removing a first portion of the first semiconductor layer, such that first conductivity type second portions of the first semiconductor layer remain in lower portions of the plurality of openings in the insulating layer, and upper portions of the plurality of openings in the insulating layer remain unfilled. The method also includes forming a second semiconductor layer in the upper portions of the plurality of openings in the insulating layer and over the insulating layer, and removing a first portion of the second semiconductor layer located over the insulating layer.Type: GrantFiled: February 14, 2011Date of Patent: March 24, 2015Assignee: Sandisk 3D LLCInventors: Vance Dunton, S. Brad Herner, Paul Wai Kie Poon, Chuanbin Pan, Michael Chan, Michael Konevecki, Usha Raghuram
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Publication number: 20150034500Abstract: A metal organic framework (MOF) includes a coordination product of a metal ion and an at least bidentate organic ligand, where the metal ion and the organic ligand are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas. A porous organic polymer (POP) includes polymerization product from at least a plurality of organic monomers, where the organic monomers are selected to provide a deliverable adsorption capacity of at least 70 g/l for an electronic gas.Type: ApplicationFiled: August 4, 2014Publication date: February 5, 2015Inventors: Han Sung KIM, Mitchell Hugh WESTON, Patrick FULLER, Paul Wai-Man SIU
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Patent number: 8394464Abstract: A method of lining tubing within a wellbore comprises applying a polymerisable fluid composition containing a photoinitiator to the interior surface of that tubing and initiating polymerisation of the composition by exposing it to actinic radiation, suitably light or ultraviolet with wavelength 250 to 800 nm. The composition is preferably stable against heat but polymerises quickly when exposed to the actinic radiation. The composition may be spread onto the tubing and exposed to actinic radiation as soon as it has been spread into a layer, suitably with a tool which skims the tubing surface with applicator pads for dispensing and spreading the composition, immediately followed by exposing the spread composition to actinic radiation. A second option is that the composition is provided as a sleeve which is expanded against the tubing, exposure to actinic radiation preferably then being achieved using light guides or light emitting diodes within the sleeve.Type: GrantFiled: March 31, 2009Date of Patent: March 12, 2013Assignee: Schlumberger Technology CorporationInventors: Louise Bailey, Benoit Vidick, Paul Way, John Cook
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Patent number: 8329512Abstract: A method of making a device includes forming a first photoresist layer over a sacrificial layer, patterning the first photoresist layer to form first photoresist features, rendering the first photoresist features insoluble to a solvent, forming a second photoresist layer over the first photoresist features, patterning the second photoresist layer to form second photoresist features, forming a spacer layer over the first and second photoresist features, etching the spacer layer to form spacer features and to expose the first and second photoresist features, forming third photoresist features between the spacer features, removing the spacer features, and patterning the sacrificial layer using the first, second and third photoresist features as a mask to form sacrificial features.Type: GrantFiled: May 3, 2012Date of Patent: December 11, 2012Assignee: SanDisk 3D LLCInventors: Natalie Nguyen, Paul Wai Kie Poon, Steven J. Radigan, Michael Konevecki, Yung-Tin Chen, Raghuveer Makala, Vance Dunton
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Publication number: 20120276744Abstract: A method of making a device includes forming a first photoresist layer over a sacrificial layer, patterning the first photoresist layer to form first photoresist features, rendering the first photoresist features insoluble to a solvent, forming a second photoresist layer over the first photoresist features, patterning the second photoresist layer to form second photoresist features, forming a spacer layer over the first and second photoresist features, etching the spacer layer to form spacer features and to expose the first and second photoresist features, forming third photoresist features between the spacer features, removing the spacer features, and patterning the sacrificial layer using the first, second and third photoresist features as a mask to form sacrificial features.Type: ApplicationFiled: May 3, 2012Publication date: November 1, 2012Applicant: SanDisk 3D LLCInventors: Natalie Nguyen, Paul Wai Kie Poon, Steven J. Radigan, Michael Konevecki, Yung-Tin Chen, Raghuveer Makala, Vance Dunton
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Patent number: 8241969Abstract: A method of making a device includes forming a first photoresist layer over a sacrificial layer, patterning the first photoresist layer to form first photoresist features, rendering the first photoresist features insoluble to a solvent, forming a second photoresist layer over the first photoresist features, patterning the second photoresist layer to form second photoresist features, forming a spacer layer over the first and second photoresist features, etching the spacer layer to form spacer features and to expose the first and second photoresist features, forming third photoresist features between the spacer features, removing the spacer features, and patterning the sacrificial layer using the first, second and third photoresist features as a mask to form sacrificial features.Type: GrantFiled: August 24, 2011Date of Patent: August 14, 2012Assignee: SanDisk 3D LLCInventors: Natalie Nguyen, Paul Wai Kie Poon, Steven J. Radigan, Michael Konevecki, Yung-Tin Chen, Raghuveer Makala, Vance Dunton
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Patent number: 8187932Abstract: A non-volatile memory device contains a three dimensional stack of horizontal diodes located in a trench in an insulating material, a plurality of storage elements, a plurality of word lines extending substantially vertically, and a plurality of bit lines. Each of the plurality of bit lines has a first portion that extends up along at least one side of the trench and a second portion that extends substantially horizontally through the three dimensional stack of the horizontal diodes. Each of the horizontal diodes is a steering element of a respective non-volatile memory cell of the non-volatile memory device, and each of the plurality of storage elements is located adjacent to a respective steering element.Type: GrantFiled: October 15, 2010Date of Patent: May 29, 2012Assignee: SanDisk 3D LLCInventors: Natalie Nguyen, Paul Wai Kie Poon, Steven J. Radigan, Michael Konevecki, Raghuveer S. Makala