Patents by Inventor Pawan Kumar Nimmakayala
Pawan Kumar Nimmakayala has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11161280Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.Type: GrantFiled: January 31, 2019Date of Patent: November 2, 2021Assignee: Molecular Imprints, Inc.Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
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Publication number: 20190232533Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.Type: ApplicationFiled: January 31, 2019Publication date: August 1, 2019Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
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Publication number: 20140117574Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.Type: ApplicationFiled: January 8, 2014Publication date: May 1, 2014Applicant: Molecular Imprints, Inc.Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung- Jin Choi
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Patent number: 8652393Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.Type: GrantFiled: October 23, 2009Date of Patent: February 18, 2014Assignee: Molecular Imprints, Inc.Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
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Patent number: 8432548Abstract: Systems and methods for alignment of template and substrate at the edge of substrate are described.Type: GrantFiled: October 27, 2009Date of Patent: April 30, 2013Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Philip D. Schumaker
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Patent number: 8334967Abstract: The present invention includes a substrate support system having a chuck body. The chuck body includes a body surface with a pin extending therefrom having a contact surface lying in a plane. The pin may be movably coupled to the chuck body to move with respect to the plane. The pin may also include a cross-member having multiple contact lands.Type: GrantFiled: August 27, 2009Date of Patent: December 18, 2012Assignee: Board of Regents, The University of Texas SystemInventors: Pawan Kumar Nimmakayala, Sidlgata V. Sreenivasan
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Patent number: 8231821Abstract: Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate.Type: GrantFiled: November 2, 2009Date of Patent: July 31, 2012Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Mahadevan GanapathiSubramanian
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Patent number: 8147731Abstract: Methods described include placing a sensor system over a substrate positioned on a chuck. The sensor system generates a beam of optical energy towards the substrate and is configured to receive optical energy deflected from the substrate. The sensor system generates sensor signals in response to variations in received optical energy from the substrate and the chuck.Type: GrantFiled: October 18, 2010Date of Patent: April 3, 2012Assignee: Molecular Imprints, Inc.Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi
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Publication number: 20110026039Abstract: Methods described include placing a sensor system over a substrate positioned on a chuck. The sensor system generates a beam of optical energy towards the substrate and is configured to receive optical energy deflected from the substrate. The sensor system generates sensor signals in response to variations in received optical energy from the substrate and the chuck.Type: ApplicationFiled: October 18, 2010Publication date: February 3, 2011Applicant: MOLECULAR IMPRINTS, INC.Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi
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Patent number: 7880872Abstract: The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.Type: GrantFiled: October 8, 2009Date of Patent: February 1, 2011Assignee: Molecular Imprints, Inc.Inventors: Pawan Kumar Nimmakayala, Tom H. Rafferty, Alireza Aghili, Byung-Jin Choi, Philip D. Schumaker, Daniel A. Babbs, Van Nguyen Truskett
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Patent number: 7837907Abstract: A transparent imprint template mold is configured with gratings surrounding the active imprint area. The gratings are fabricated at the same time as the active area and thus accurately define the active area with respect to the gratings. The substrate is positioned in tool coordinates under the template mold. A sensor system generates a beam of optical energy and receives reflected energy only at a specific angular window and is used to locate the template mold. The sensor system is scanned to locate the substrate and the gratings in tool coordinates. In this manner, the relative position of the template mold is determined with respect to the substrate in tool coordinates. The substrate is then accurately positioned with respect to the template mold. The system may be used to track imprinted pattern position relative to the substrate and to determine concentricity of patterns to substrates.Type: GrantFiled: July 17, 2008Date of Patent: November 23, 2010Assignee: Molecular Imprints, Inc.Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi
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Patent number: 7785096Abstract: An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.Type: GrantFiled: February 20, 2009Date of Patent: August 31, 2010Assignee: Molecular Imprints, Inc.Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi, Tom H. Rafferty, Philip D. Schumaker
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Publication number: 20100109202Abstract: Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate.Type: ApplicationFiled: November 2, 2009Publication date: May 6, 2010Applicant: MOLECULAR IMPRINTS, INC.Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Mahadevan GanapathiSubramanian
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Publication number: 20100110434Abstract: Systems and methods for alignment of template and substrate at the edge of substrate are described.Type: ApplicationFiled: October 27, 2009Publication date: May 6, 2010Applicant: MOLECULAR IMPRINTS, INC.Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Philip D. Schumaker
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Publication number: 20100102469Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.Type: ApplicationFiled: October 23, 2009Publication date: April 29, 2010Applicant: MOLECULAR IMPRINTS, INC.Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
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Publication number: 20100038827Abstract: The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.Type: ApplicationFiled: October 8, 2009Publication date: February 18, 2010Applicant: Molecular Imprints, Inc.Inventors: Pawan Kumar Nimmakayala, Tom H. Rafferty, Alireza Aghili, Byung-Jin Choi, Philip D. Schumaker, Daniel A. Babbs, Van Nguyen Truskett
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Publication number: 20100007868Abstract: The present invention includes a substrate support system having a chuck body. The chuck body includes a body surface with a pin extending therefrom having a contact surface lying in a plane. The pin may be movably coupled to the chuck body to move with respect to the plane. The pin may also include a cross-member having multiple contact lands.Type: ApplicationFiled: August 27, 2009Publication date: January 14, 2010Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEMInventors: Pawan Kumar Nimmakayala, Sidlgata V. Sreenivasan
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Patent number: 7630067Abstract: The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.Type: GrantFiled: November 30, 2004Date of Patent: December 8, 2009Assignee: Molecular Imprints, Inc.Inventors: Pawan Kumar Nimmakayala, Tom H. Rafferty, Alireza Aghili, Byung-Jin Choi, Philip D. Schumaker, Daniel A. Babbs, Van N. Truskett
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Publication number: 20090169662Abstract: An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.Type: ApplicationFiled: February 20, 2009Publication date: July 2, 2009Applicant: MOLECULAR IMPRINTS, INC.Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi, Tom H. Rafferty, Philip D. Schumaker
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Publication number: 20090026657Abstract: A transparent imprint template mold is configured with gratings surrounding the active imprint area. The gratings are fabricated at the same time as the active area and thus accurately define the active area with respect to the gratings. The substrate is positioned in tool coordinates under the template mold. A sensor system generates a beam of optical energy and receives reflected energy only at a specific angular window and is used to locate the template mold. The sensor system is scanned to locate the substrate and the gratings in tool coordinates. In this manner, the relative position of the template mold is determined with respect to the substrate in tool coordinates. The substrate is then accurately positioned with respect to the template mold. The system may be used to track imprinted pattern position relative to the substrate and to determine concentricity of patterns to substrates.Type: ApplicationFiled: July 17, 2008Publication date: January 29, 2009Applicant: Molecular Imprints, Inc.Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi