Patents by Inventor Pawan Kumar Nimmakayala

Pawan Kumar Nimmakayala has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11161280
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: November 2, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20190232533
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: January 31, 2019
    Publication date: August 1, 2019
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20140117574
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: January 8, 2014
    Publication date: May 1, 2014
    Applicant: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung- Jin Choi
  • Patent number: 8652393
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: February 18, 2014
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Patent number: 8432548
    Abstract: Systems and methods for alignment of template and substrate at the edge of substrate are described.
    Type: Grant
    Filed: October 27, 2009
    Date of Patent: April 30, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Philip D. Schumaker
  • Patent number: 8334967
    Abstract: The present invention includes a substrate support system having a chuck body. The chuck body includes a body surface with a pin extending therefrom having a contact surface lying in a plane. The pin may be movably coupled to the chuck body to move with respect to the plane. The pin may also include a cross-member having multiple contact lands.
    Type: Grant
    Filed: August 27, 2009
    Date of Patent: December 18, 2012
    Assignee: Board of Regents, The University of Texas System
    Inventors: Pawan Kumar Nimmakayala, Sidlgata V. Sreenivasan
  • Patent number: 8231821
    Abstract: Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate.
    Type: Grant
    Filed: November 2, 2009
    Date of Patent: July 31, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Mahadevan GanapathiSubramanian
  • Patent number: 8147731
    Abstract: Methods described include placing a sensor system over a substrate positioned on a chuck. The sensor system generates a beam of optical energy towards the substrate and is configured to receive optical energy deflected from the substrate. The sensor system generates sensor signals in response to variations in received optical energy from the substrate and the chuck.
    Type: Grant
    Filed: October 18, 2010
    Date of Patent: April 3, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi
  • Publication number: 20110026039
    Abstract: Methods described include placing a sensor system over a substrate positioned on a chuck. The sensor system generates a beam of optical energy towards the substrate and is configured to receive optical energy deflected from the substrate. The sensor system generates sensor signals in response to variations in received optical energy from the substrate and the chuck.
    Type: Application
    Filed: October 18, 2010
    Publication date: February 3, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi
  • Patent number: 7880872
    Abstract: The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
    Type: Grant
    Filed: October 8, 2009
    Date of Patent: February 1, 2011
    Assignee: Molecular Imprints, Inc.
    Inventors: Pawan Kumar Nimmakayala, Tom H. Rafferty, Alireza Aghili, Byung-Jin Choi, Philip D. Schumaker, Daniel A. Babbs, Van Nguyen Truskett
  • Patent number: 7837907
    Abstract: A transparent imprint template mold is configured with gratings surrounding the active imprint area. The gratings are fabricated at the same time as the active area and thus accurately define the active area with respect to the gratings. The substrate is positioned in tool coordinates under the template mold. A sensor system generates a beam of optical energy and receives reflected energy only at a specific angular window and is used to locate the template mold. The sensor system is scanned to locate the substrate and the gratings in tool coordinates. In this manner, the relative position of the template mold is determined with respect to the substrate in tool coordinates. The substrate is then accurately positioned with respect to the template mold. The system may be used to track imprinted pattern position relative to the substrate and to determine concentricity of patterns to substrates.
    Type: Grant
    Filed: July 17, 2008
    Date of Patent: November 23, 2010
    Assignee: Molecular Imprints, Inc.
    Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi
  • Patent number: 7785096
    Abstract: An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: August 31, 2010
    Assignee: Molecular Imprints, Inc.
    Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi, Tom H. Rafferty, Philip D. Schumaker
  • Publication number: 20100110434
    Abstract: Systems and methods for alignment of template and substrate at the edge of substrate are described.
    Type: Application
    Filed: October 27, 2009
    Publication date: May 6, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Philip D. Schumaker
  • Publication number: 20100109202
    Abstract: Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate.
    Type: Application
    Filed: November 2, 2009
    Publication date: May 6, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Mahadevan GanapathiSubramanian
  • Publication number: 20100102469
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: October 23, 2009
    Publication date: April 29, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20100038827
    Abstract: The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
    Type: Application
    Filed: October 8, 2009
    Publication date: February 18, 2010
    Applicant: Molecular Imprints, Inc.
    Inventors: Pawan Kumar Nimmakayala, Tom H. Rafferty, Alireza Aghili, Byung-Jin Choi, Philip D. Schumaker, Daniel A. Babbs, Van Nguyen Truskett
  • Publication number: 20100007868
    Abstract: The present invention includes a substrate support system having a chuck body. The chuck body includes a body surface with a pin extending therefrom having a contact surface lying in a plane. The pin may be movably coupled to the chuck body to move with respect to the plane. The pin may also include a cross-member having multiple contact lands.
    Type: Application
    Filed: August 27, 2009
    Publication date: January 14, 2010
    Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: Pawan Kumar Nimmakayala, Sidlgata V. Sreenivasan
  • Patent number: 7630067
    Abstract: The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
    Type: Grant
    Filed: November 30, 2004
    Date of Patent: December 8, 2009
    Assignee: Molecular Imprints, Inc.
    Inventors: Pawan Kumar Nimmakayala, Tom H. Rafferty, Alireza Aghili, Byung-Jin Choi, Philip D. Schumaker, Daniel A. Babbs, Van N. Truskett
  • Publication number: 20090169662
    Abstract: An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.
    Type: Application
    Filed: February 20, 2009
    Publication date: July 2, 2009
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi, Tom H. Rafferty, Philip D. Schumaker
  • Publication number: 20090026657
    Abstract: A transparent imprint template mold is configured with gratings surrounding the active imprint area. The gratings are fabricated at the same time as the active area and thus accurately define the active area with respect to the gratings. The substrate is positioned in tool coordinates under the template mold. A sensor system generates a beam of optical energy and receives reflected energy only at a specific angular window and is used to locate the template mold. The sensor system is scanned to locate the substrate and the gratings in tool coordinates. In this manner, the relative position of the template mold is determined with respect to the substrate in tool coordinates. The substrate is then accurately positioned with respect to the template mold. The system may be used to track imprinted pattern position relative to the substrate and to determine concentricity of patterns to substrates.
    Type: Application
    Filed: July 17, 2008
    Publication date: January 29, 2009
    Applicant: Molecular Imprints, Inc.
    Inventors: Pawan Kumar Nimmakayala, Byung-Jin Choi