Abstract: The invention relates to a wireless sensor device configured for sensing motion of an object in an area. The device comprises a motion sensor configured for generating a sensing signal when sensing motion in the area and a signal processor configured for processing the sensing signal. A power supply is provided for providing power to the motion sensor. Furthermore, the wireless sensor device comprises a controller configured for distinguishing, from the sensing signal, large object movements and small object movements of the object in the area. The wireless sensor device is configured to perform one or more power consumption reduction operations upon detection of large object movement. The power consumption reduction operations include temporarily disconnecting the motion sensor from the power supply and decreasing a duty cycle of the signal processor.

Abstract: A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

Abstract: An illumination system (10), comprising:—four lamps (12A, 12B, 12C, 12D);—four lamp drivers (13A, 13B, 13C, 13D) capable of driving their corresponding lamps with respective dim factors (?1, ?2, ?3, ?4);—a common controller (15) for controlling the dim factors of the respective lamps. The controller is responsive to an input signal indicating a target color point (T) having target chromaticity coordinates (xT, yT) and target brightness (BT). The controller sets the dim factor (?4) of one lamp to be equal to 1, and calculates an optimum solution for the other three dim factors as a function of the target chromaticity coordinates (xT, yT), for the maximum allowed value of the luminance (YMAX) for which 0???1 applies for each of said dim factors (?1S, ?2S, ?3S).

Abstract: A transducer (800) is provided where a membrane (830) is formed over a front substrate (615); and a piezoelectric layer (820) is formed over the membrane (830) at an active portion (821) and peripheral portions located adjacent the active portion (821). A patterned conductive layer including first and second electrodes (840, 845) is formed over the piezoelectric layer (820). Further, a back substrate structure is provided having supports (822, 824) located at the peripheral portions adjacent the active portion (821). The height (826) of the supports (822, 824) is greater than a combined height (828) of the patterned piezoelectric layer and the patterned conductive layer. Many transducers may be connected to form an array, where a controller may be provided for controlling the array, such as steering a beam of the array, and processing signals received by the array, for presence or motion detection and/or imaging, for example.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A lamp driver circuit (400) comprises a feedback circuit for controlling stable operation of a discharge lamp (La), e.g. an inductively coupled discharge lamp such as a molecular radiation lamp, and for controlling a light output level of the discharge lamp (La). In particular, if the discharge lamp (La) is operated at a dimmed light output level, the light output is sensitive to changes in the lamp voltage (VLa), possibly resulting in flickering. In order to control stable lamp operation and prevent flickering, a high-sp feedback circuit is provided for controlling an operating frequency. In order to provide a relatively large dimming range for controlling the light output level, a low-speed feedback circuit is provided for controlling a DC supply voltage level (VDC).

Abstract: An illumination system (1) comprises a plurality of lamps (11, 12, 13) for generating light (R, G, B) with mutually different colors; in an embodiment, the lamps are fluorescent lamps. A sensing system (50) comprising a color sensor (51) provides a sensor output signal (Ss) that indicates the color of the light received by the color sensor. The sensing system comprises a light guide arrangement (60) interposed between the lamps and the sensor, which is arranged in a service room (74) shielded from ambient light. Each light guide captures light from one lamp only, and the sensor receives a mixture of the captured lights. The color sensor and light guide are used in a feedback system that corrects for tolerances, lamp aging, ambient temperature etc.

Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

Abstract: A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.

Abstract: A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

Abstract: The invention relates to thermoplastic cross-linked polymer compound with thermally reversible urethane crosslinkages comprising the following essential components a) to d): a) a thermoplastic polymer component with saturated molecular main chain: b) a component containing isocyanate group(s), either attached to the polymer chain or being present in mobile form in the polymer matrix; c) a component containing hydroxyl group(s) either attached to the polymer chain or being present in mobile form in the polymer matrix; d) a catalyst package promoting the reversible formation and thermal dissociation of urethane bonds, characterized in that at least one of the components b) and c) is attached to the polymer chain and at least one of the additives present in the compound is multi-functional, playing a role in more than one, functionally independent processes.

Abstract: The invention relates to a flame retardant polymer compound comprising from 50-95 wt % polymer matrix related to the total amount of the flame retardant polymeric compound and 5-50 wt % of flame retardant additive system related to the total amount of the flame retardant polymeric compound.